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Study on point defect for $ZnIn_2S_4$ epilayers grown by Hot Wall Epitaxy (Hot Wall Epitaxy (HWE)법에 의해 성장된 $ZnIn_2S_4$ 에피레이어의 점결함 연구)

  • Hong, Kwang-Joon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.141-142
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    • 2008
  • Single crystal $ZnIn_2S_4$ layers were grown on thoroughly etched semi-insulating GaAs(100) substrate at $450^{\circ}C$ with hot wall epitaxy (HWE) system by evaporating $ZnIn_2S_4$ source at $610^{\circ}C$. The temperature dependence of the energy band gap of the $ZnIn_2S_4$ obtained from the absorption spectra was well described by the Varshni's relation, $E_g$(T) = 2.9514eV - ($7.24\times10^{-4}$ eV/K)$T^2$/(T + 489 K). After the as-grown $ZnIn_2S_4$ single crystal thin films was annealed in Zn-, S-, and In-atmospheres, the origin of point defects of $ZnIn_2S_4$ single crystal thin films has been investigated by the photoluminescence(PL) at 10 K. The native defects of $V_{Zn}$, $V_s$, $Zn_{int}$, and $S_{int}$, obtained by PL measurements were classified as a donors or acceptors type. And we concluded that the heat-treatment in the S-atmosphere converted $ZnIn_2S_4$ single crystal thin films to an optical p-type. Also, we confirmed that In in $ZnIn_2S_4$/GaAs did not form the native defects because In in $ZnIn_2S_4$ single crystal thin films existed in the form of stable bonds.

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Point defect for $AgGaSe_2$ epilayers grown by hot wall epitaxy (Hot Wall Epitaxy (HWE)법에 의해 성장된 $AgGaSe_2$ 에피레이어의 점결함 연구)

  • Hong, Myung-Seok;Hong, Kwang-Joon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.98-99
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    • 2008
  • To obtain the single crystal thin films, $AgGaSe_2$ mixed crystal was deposited on thoroughly etched semi-insulating GaAs(100) substrate by the hot wall epitaxy (HWE) system. The source and substrate temperatures were $630^{\circ}C$ and $420^{\circ}C$, respectively. The temperature dependence of the energy band gap of the $AgGaSe_2$ obtained from the absorption spectra was well described by the Varshni's relation, $E_g$(T) 1.9501 eV - ($8.79\times10^{-4}$ eV/K)$T^2$/(T + 250 K). After the as-grown $AgGaSe_2$ single crystal thin films was annealed in Ag-, Se-, and Ga-atmospheres, the origin of point defects of $AgGaSe_2$ single crystal thin films has been investigated by the photoluminescence(PL) at 10K. The native defects of $V_{Ag}$, $V_{Se}$, $Ag_{int}$, and $Se_{int}$ obtained by PL measurements were classified as a donors or acceptors type. And we concluded that the heat-treatment in the Ag-atmosphere converted $AgGaSe_2$ single crystal thin films to an optical p-type. Also, we confirmed that Ga in $AgGaSe_2$/GaAs did not form the native defects because Ga in $AgGaSe_2$ single crystal thin films existed in the form of stable bonds.

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Treatment of Oil Contaminated Groundwater Using DAF and Fenton Oxidation Process (DAF와 펜톤 산화 공정을 이용한 유류 오염 지하수 처리)

  • Lee, Chaeyoung
    • Journal of the Korean GEO-environmental Society
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    • v.11 no.10
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    • pp.49-55
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    • 2010
  • The oil spill occurred frequently due to probably the increased consumption of oil as the energy source and the raw materials of various chemicals. For the treatment of oil contaminated groundwater, DAF(Dissolved Air Flotation) is being used but the removal efficiency is low. Therefore it is necessary to reduce the free phase oil, oil-in water type or water-in oil type emulsified oil, and soluble oil which are the main sources of contaminated groundwater. In this study, treatment of contaminated groundwater was performed using the Fenton oxidation process. The optimum conditions for the removal of THP(Total Petroleum Hydrocarbon) were 3 of pH, 25mM of $H_2O_2$ concentration and 25mM of $Fe^{2+}$ concentration. THP and COD(Chemical Oxygen Demand) concentrations decreased less than 1.5mg/L and 40.0mg/L in 7 minutes using DAF and Fenton oxidation process. However it is necessary to install the settling basin as the sludge concentration increased approximately 5 times.

Growth and Effect of Thermal Annealing for ZnIn2S4 Single Crystal Thin Film by Hot Wall Epitaxy (Hot Wall Epitaxy (HWE)법에 의한 ZnIn2S4 단결정 박막 성장과 열처리 효과)

  • Park, Chang-Sun;Hong, Kwang-Joon
    • Korean Journal of Materials Research
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    • v.18 no.6
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    • pp.318-325
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    • 2008
  • Single crystal $ZnIn_2S_4$ layers were grown on thoroughly etched semi-insulating GaAs(100) substrate at $450^{\circ}C$ with hot wall epitaxy (HWE) system by evaporating $ZnIn_2S_4$ source at $610^{\circ}C$. The crystalline structure of the single crystal thin films was investigated by the photoluminescence (PL) and double crystal X-ray rocking curve (DCRC). The temperature dependence of the energy band gap of the $ZnIn_2S_4$ obtained from the absorption spectra was well described by the Varshni's relation, $E_g(T)=2.9514\;eV-(7.24{\times}10^{-4}\;eV/K)T^2/(T+489\;K)$. After the as-grown $ZnIn_2S_4$ single crystal thin films were annealed in Zn-, S-, and In-atmospheres, the origin of point defects of $ZnIn_2S_4$ single crystal thin films has been investigated by the photoluminescence (PL) at 10 K. The native defects of $V_{Zn}$, $V_S$, $Zn_{int}$, and $S_{int}$ obtained by PL measurements were classified as a donors or acceptors type. And we concluded that the heat-treatment in the S-atmosphere converted $ZnIn_2S_4$ single crystal thin films to an optical p-type. Also, we confirmed that In in $ZnIn_2S_4$/GaAs did not form the native defects because In in $ZnIn_2S_4$ single crystal thin films existed in the form of stable bonds.

The effect of thermal annealing and growth of $AgInS_2$/GaAs single crystal thin film by hot wal epitaxy (Hot wall Epitaxy(HWE)법에 의한 $AgInS_2$단결정 박막 성장과 열처리 효과)

  • Hong, Kwang-Joon
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.11 no.6
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    • pp.274-284
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    • 2001
  • A stoichimetric mixture of evaporating materials for $AgInS_2$ single crystal thin films was prepared from horizontal furnace. To obtain the single crystal thin films. $AgInS_2$mixed crystal was deposited on thorughly etched semi-insulating GaAs(100) substrate by the Hot wall Epitaxy (HWE) system. The source and substrate temperatures were $680^{\circ}C$ and $410^{\circ}C$, respectively. The crystalline structure of the single thin films was investigated by the photoluminescence and double crystal X-ray diffraction(DCXD). The carrier density and mobility of $AgInS_2$ single crystal the films measured from Hall effect by van der Pauw method are $9.35\times 10^{16}/\terxtm{cm}^3$ and $294\terxtm{cm}^2$/V.s at 293 K, respectively. From the optical absorption measurement the temperature dependence of the energy band gap on AgInS$_2$ single crystal thin film was found to be $E_g$(T)= 2.1365eV-($9.89\times 10^{-3}eV/T^2$/(2930+T). After the as-grown $AgInS_2$ single crystal thin films was annealed in $Ag^-S^-$ and In-atmospheres, the origin of point defects of AgInS$_2$ single crystal the films has been investigated by using the photoluminescence(PL) at 10K. The native defects of $V_{Ag},V_s, Ag_{int}$ and $S_{int}$ int/ obtained from PL measurements were classified as a donors or acceptors type. And we concluded that the heat-treatment in the S-atmosphere converted $AgInS_2$ single crystal thin films to an optical p-type. Also, we confirmed that In in $AgInS_2$ /GaAs did not form the native defects because In is $AgInS_2$ single crystal thin films did exist in the form of stable bonds.

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Modeling of Pervaporation Process: Prediction of Feed Temperature Distribution in A Frame and Plate Type of Membrane Module (판틀형 투과증발 막모듈내에서 feed 온도 분포 예측을 위한 모델링)

  • 원장묵;염충균;임지원;배성렬;하백현
    • Membrane Journal
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    • v.6 no.1
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    • pp.44-52
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    • 1996
  • For the purpose of the optimal design of a frame and plate type of pervaporation module, model equations which can predict the effects of feed flow condition on the temperature distribution of the feed developed in the module were established and the temperature distribution with feed flow condition was investigated through the model si$$\mu$ation. With increasing the Reynolds number of feed flow in the module, the flow velocity gradient in the channel height-direction as well as the volume rate of feed which acts as energy source for the evaporation of perrneants on the permeate-side surface of a membrane increased to such an extent that both mass and heat flux in the channel height direction could increase and the temperature drop of feed due to the evaporation of the permeant could be reduced correspondingly. A decrease in channel height caused the temperature drop of feed because of decreasing feed flow in the module. It was observed that the si$$\mu$ation result on the effect of Re on the temperature distribution of feed in the module has an agreement with experiment.

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Growth and effect of thermal annealing for ZnIn2Se4 single crystalline thick film by hot wall epitaxy (Hot Wall Epitaxy (HWE)법에 의한 ZnIn2Se4 단결정 후막 성장과 열처리 효과)

  • Hong, Myung-Seuk;Hong, Kwang-Joon
    • Journal of Sensor Science and Technology
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    • v.17 no.6
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    • pp.437-446
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    • 2008
  • Single crystalline ${ZnIn_2}{Se_4}$ layers were grown on thoroughly etched semi-insulating GaAs (100) substrate at $400^{\circ}C$ with hot wall epitaxy (HWE) system by evaporating ${ZnIn_2}{Se_4}$ source at $630^{\circ}C$. The crystalline structure of the single crystalline thick films was investigated by the photoluminescence (PL) and Double crystalline X-ray rocking curve (DCRC). The carrier density and mobility of ${ZnIn_2}{Se_4}$ single crystalline thick films measured from Hall effect by van der Pauw method are $9.41{\times}10^{16}cm^{-3}$ and $292cm^2/V{\cdot}s$ at 293 K, respectively. The temperature dependence of the energy band gap of the ${ZnIn_2}{Se_4}$ obtained from the absorption spectra was well described by the Varshni's relation, $E_g(T)$=1.8622 eV-$(5.23{\times}10^{-4}eV/K)T^2$/(T+775.5 K). After the as-grown ${ZnIn_2}{Se_4}$ single crystalline thick films was annealed in Zn-, Se-, and In-atmospheres, the origin of point defects of ${ZnIn_2}{Se_4}$ single crystalline thick films has been investigated by the photoluminescence (PL) at 10 K. The native defects of $V_{Zn}$, $V_{Se}$, $Zn_{int}$, and $Se_{int}$ obtained by PL measurements were classified as a donors or acceptors type. And we concluded that the heat-treatment in the Se-atmosphere converted ${ZnIn_2}{Se_4}$ single crystalline thick films to an optical p-type. Also, we confirmed that In in ${ZnIn_2}{Se_4}$/GaAs did not form the native defects because In in ${ZnIn_2}{Se_4}$ single crystalline thick films existed in the form of stable bonds.

Growth and effect of thermal annealing of impurity for $AgGaSe_2$ single crystal thin film by hot wall epitaxy (Hot Wall Epitaxy (HWE)법에 의한 $AgGaSe_2$ 단결정 박막 성장과 불순물 열처리 효과)

  • Lee, Sang-Youl;Hong, Kwang-Joon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.11a
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    • pp.79-80
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    • 2007
  • To obtain the single crystal thin films, $AgGaSe_2$ mixed crystal was deposited on thoroughly etched semi-insulating GaAs(100) substrate by the hot wall epitaxy (HWE) system. The source and substrate temperatures were $630^{\circ}C\;and\;420^{\circ}C$, respectively. The temperature dependence of the energy band gap of the $AgGaSe_2$ obtained from the absorption spectra was well described by the Varshni's relation, $E_g$(T) = 1.9501 eV - ($8.79{\times}10^{-4}$ eV/K)$T^2$/(T + 250 K). After the as-grown $AgGaSe_2$ single crystal thin films was annealed in Ag-, Se-, and Ga-atmospheres, the origin of point defects of $AgGaSe_2$ single crystal thin films has been investigated by the photoluminescence(PL) at 10 K. The native defects of $V_{Ag},\;V_{Se},\;Ag_{int},\;and\;Se_{int}$ obtained by PL measurements were classified as a donors or acceptors type. And we concluded that the heat-treatment in the Ag-atmosphere converted $AgGaSe_2$ single crystal thin films to an optical p-type. Also, we confirmed that Ga in $AgGaSe_2$/GaAs did not form the native defects because Ga in $AgGaSe_2$ single crystal thin films existed in the form of stable bonds.

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Study on Measurements in Thyroid Uptake Rate Test (갑상선섭취율검사시(甲狀腺攝取率檢査時) 측정조건(測定條件)에 관(關)한 조사연구(調査硏究))

  • Kyong, Kwang-Hyon;Kim, Hwa-Gon
    • Journal of radiological science and technology
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    • v.4 no.1
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    • pp.55-62
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    • 1981
  • This study was conducted, during the period of 20-30th, July in 1981, to survey measurement methods in thyroid uptake rate test in Seoul city. The results were summarized as follows: 1. For the great part of nuclear medcine department, a mount of radioiodine($^{131}I$) administrated to the patients was $50-100{\mu}Ci$ in thyroid uptake rate test. 2. Distribution of scintillation, counter with crystal size of $1\frac{1}{2}inch$ was 43%, 3inch(22%), 2.5inch(14%) and $2\frac{1}{2}inch$ was 7% in RAI uptake rate test. 3. When RAI uptake rate test was performed, distribution of collimator in use was flat field type collimator(78%) in general and cylindrical type collimator was 22%. 4. High voltage applied to the P-M tube was $900{\sim}1000V$(50%) and most units provided $3{\sim}15%$ of the window range for the $^{131}I$ peak $\gamma-ray$ energy. 5. Distribution on the use of neck phantom for measurements standard solution was 57% and distribution of b filter in use for room background counts and extrathyroidal tissue was 43% and 50%. 6. The distance between the counter and the source was 25cm(58%) in measuring radioactivity of standard solution, thyroid tissue and background radioactivity count. 7. The early uptake measurements(2, 4, 6 hours) are done after administration of the radioiodine dose and also 24-hour and 48-hour uptake measurements are done in routine test.

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Effect of Gas Channel/Rib Width in Solid Oxide Fuel Cells (고체산화물 연료전지에서 가스채널/리브 폭의 영향에 관한 연구)

  • Jeon, Dong Hyup;Shin, Dong-Ryul;Ryu, Kwang-Hyun;Song, Rak-Hyun
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.41 no.2
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    • pp.109-115
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    • 2017
  • Using the computational fluid dynamics (CFD) technique, we performed a numerical simulation in anodesupported solid oxide fuel cell (SOFC). The effect of gas channel/rib width on the cell performance and temperature uniformity was investigated in planar type SOFC. The open source CFD toolbox, OpenFOAM, was used as a numerical analysis tool. As a result, the effect of gas channel/rib width on the cell performance and temperature uniformity was not significant if the oxygen depletion is not occurring. On the other hand, the usage of a wide rib and operation at high current density may lead to performance degradation due to oxygen depletion.