• 폴리머
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• 제38권1호
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• pp.74-79
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• 2014

두 가지 서로 다른 실란 화합물인 3-aminopropyltriethoxysilane(APS)과 3-mercaptopropyltriethoxysilane(MRPS) 그리고 lauroyl chloride를 이용하여 마이크로피브릴화 셀룰로오스(MFC) 표면을 화학적으로 개질하였다. 화학적으로 표면 처리한 MFC의 구조 및 특성은 FTIR, EDX, TGA, 접촉각 등을 측정하여 분석하였다. 이렇게 유기 관능기로 치환된 MFC와 폴리아마이드(PA) 섬유를 사용하여 복합 페이퍼를 제조하였다. MFC의 표면 개질은 MFC 사이의 응집을 막아줄 뿐만 아니라 PA 섬유와의 접착성을 향상시켜 주는 역할을 한다. 단섬유인 PA 섬유를 연결시켜주는 바인더 역할을 하는 MFC 없이는 페이퍼를 제조할 수가 없었다. 즉, 표면 개질된 MFC는 PA 섬유 내에서 분산되어 PA 섬유들을 연결시켜 복합페이퍼의 제조를 가능하게 하였다. 두 가지 실란 화합물로 개질된 MFC를 이용한 복합페이퍼의 인장강도와 인장탄성률의 기계적 물성은 lauroyl 그룹으로 치환된 MFC를 이용한 복합페이퍼에 비하여 우수하였다. 화학적으로 표면 처리한 MFC와 PA 섬유로 제조된 복합페이퍼의 모폴로지와 기계적 물성은 SEM과 UTM을 통하여 분석하였다.

• 대한치과재료학회지
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• 제45권4호
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• pp.257-274
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• 2018

본 논문에서는 순수 티타늄(cp-Ti) 임플란트를 SLA (Sandblasting with Large grit and Acid) 처리할 때 산-처리 용액의 유형, 산-처리 온도 및 산-처리 시간 등이 티타늄 표면에 주는 영향을 평가하고자 하였다. 원판형의 cp-Ti 시편을 준비하여 표면을 인산칼슘계 세라믹 분말로 RBM (Resorbable Blast Media) 처리하였다. 산-처리 용액으로 염산을 30 vol%로 고정하고 황산의 농도를 10, 20, 30, 35 vol%로 증가시키며 혼합한 용액에 증류수를 추가하여 4종의 산-처리 용액을 준비하였다. 실험군은 4종의 산-처리 용액, 3 종의 처리온도 및 3 종의 처리시간 등 36 가지로 분류하여 실험군당 4개의 시편을 산-처리하였다. 산-처리 전 후 시편 무게를 전자저울로 측정하여 무게 감소비율을 계산하였고, 공초점주사전자현미경으로 표면거칠기를 측정하였다. X-선 회절분석기(XRD)로 XRD 패턴을 측정하였고, 주사전자현미경으로 표면 형상을 관찰하였으며, 에너지 분산형 분석기(EDX)와 광전자분광법(XPS)로 표면성분을 분석하였다. 무게 감소비율과 표면거칠기 측정값은 Tukey-multiple comparison test (p = 0.05)로 통계 분석하여 다음의 결과를 얻었다. 산-처리에 따른 티타늄 시편의 무게 감소는 황산의 농도 및 산-처리 용액의 온도가 높을수록 유의하게 증가하였다. 산-처리한 티타늄의 표면 거칠기는 산-처리 조건(황산 농도, 온도, 시간)에 일정한 영향을 받지 않았다. XRD 분석에서 산-처리한 모든 시편에서 티타늄(${\alpha}-Ti$)과 수소화 티타늄($TiH_2$) 결정상이 관찰되었고, XPS 분석으로 티타늄 표면에 얇은 n산화 티타늄 층이 형성된 것을 알 수 있었다. $90^{\circ}C$ 산-용액에서 처리할 경우 티타늄 표면이 과도하게 용해될 수 있으므로 주의하여야 한다.

• 한국표면공학회지
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• 제41권5호
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• pp.181-188
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• 2008

A.C. impedance properties of HA/Ti compound layer coated Ti-30Ta-($3{\sim}15$)Nb alloys have been studied by electrochemical method. Ti-30Ta binary alloys contained 3, 7, 10 and 15 wt% Nb were manufactured by the vacuum furnace system. And then specimen was homogenized at $1000^{\circ}C$ for 24 hrs. The sample was cut and polished for corrosion test and coating. It was coated with HA/Ti compound layer by magnetron sputter. The non-coated and coated morphology of Ti alloy were analyzed by X-ray diffractometer (XRD), energy X-ray dispersive spectroscopy (EDX) and filed emission scanning electron microscope (FE-SEM). The corrosion behaviors were investigated using A.C. impedance test (PARSTAT 2273, USA) in 0.9% NaCl solution at $36.5{\pm}1^{\circ}C$. Ti-30Ta-($3{\sim}15\;wt%$)Nb alloys showed the ${\alpha}+{\beta}$ phase, and $\beta$ phase peak was predominantly appeared in the case of increasingly Nb contents. The microstructures of Ti alloy were transformed from needle-like structure to equiaxed structure as Nb content increased. From the analysis of coating surface, HA/Ti composite surface uniformed coating layer with 750 nm thickness. The growth directions of film were (211), (112), (300) and (202) for HA/Ti composite coating on the surface after heat treatment at $550^{\circ}C$, whereas, the growth direction of film was (110) for Ti coating. The polarization resistance ($R_p$) of HA/Ti composite coated Ti-alloys were higher than those of the Ti and HA coated samples in 0.9% NaCl solution at $36.5{\pm}1^{\circ}C$. Especially, corrosion resistance of Ti-Ta-Nb system increased as Nb content increased.

• 공업화학
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• 제17권6호
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• pp.575-579
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• 2006

리튬의 삽입과 탈리가 가능한 탄소전극은 첫 싸이클 동안 카본전극 계면에 solid electrolyte interface가 형성된다. 초기 충전과정에서의 용매분해로 형성된 막은 전지의 성능에 영향을 미치게 되며, 이러한 용매분해는 초기 비가역 용량의 주된 요인중의 하나이다. 본 연구에서는 초기 비가역 반응을 억제하기위해 카본 표면 위에 부동태 막 형성을 위한 첨가제로서 $Li_{2}CO_{3}$을 사용하였다. $Li_{2}CO_{3}$ 첨가 효과를 시간대 전압법, 순환 전압-전류법, 그리고 임피던스법을 이용하여 조사하였고, 또한 SEM, EDX 그리고 XRD를 통해 표면 현상과 조성의 변화를 관찰하였다. 1 M $LiPF_{6}$/EC : MA (1 : 3, v/v) 전해질 용액에 $Li_{2}CO_{3}$의 첨가는 전극 표면에서의 용매분해 억제를 통하여 초기 비가역 용량을 감소시킴을 확인하였다.

• The Journal of Advanced Prosthodontics
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• 제13권6호
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• pp.385-395
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• 2021

PURPOSE. To characterize the microstructure of three yttria partially stabilized zirconia ceramics and to compare their hardness, indentation fracture resistance (IFR), biaxial flexural strength (BFS), and fatigue flexural strength. MATERIALS AND METHODS. Disc-shaped specimens were obtained from 3Y-TZP (Vita YZ HT), 4Y-PSZ (Vita YZ ST) and 5Y-PSZ (Vita YZ XT), following the ISO 6872/2015 guidelines for BFS testing (final dimensions of 12 mm in diameter, 0.7 and 1.2 ± 0.1 mm in thicknesses). Energy-dispersive X-ray spectroscopy (EDX), X-ray diffraction (XRD) and scanning electron microscopy (SEM) analyses were performed, and mechanical properties were assessed by Vickers hardness, IFR, quasi-static BFS and fatigue tests. RESULTS. All ceramics showed similar chemical compositions, but mainly differed in the amount of yttria, which was higher as the amount of cubic phase in the diffractogram (5Y-PSZ > 4Y-PSZ > 3Y-TZP). The 4Y- and 5Y-PSZ specimens showed surface defects under SEM, while 3Y-TZP exhibited greater grain uniformity on the surface. 5Y-PSZ and 3Y-TZP presented the highest hardness values, while 3Y-TZP was higher than 4Y- and 5Y-PSZ with regard to the IFR. The 5Y-PSZ specimen (0.7 and 1.2 mm) showed the worst mechanical performance (fatigue BFS and cycles until failure), while 3Y-TZP and 4Y-PSZ presented statistically similar values, higher than 5Y-PSZ for both thicknesses (0.7 and 1.2 mm). Moreover, 3Y-TZP showed the highest (1.2 mm group) and the lowest (0.7 mm group) degradation percentage, and 5Y-PSZ had higher strength degradation than 4Y-PSZ group. CONCLUSION. Despite the microstructural differences, 4Y-PSZ and 3Y-TZP had similar fatigue behavior regardless of thickness. 5Y-PSZ had the lowest mechanical performance.

• Asian Journal of Atmospheric Environment
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• 제6권2호
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• pp.83-95
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• 2012

China has been a top producer and exporter of refined lead products in the world since the year 2000. After the phasing-out of leaded gasoline in the late 1990s, non-ferrous metallurgy and coal combustion have been identified as potential major sources of aerosol lead in China. This paper presents the single particle analytical results of ambient aerosol particles collected near a lead smelter using a scanning electron microscopy- energy dispersive x-ray spectroscopy (SEM-EDX). Aerosol particle samples were collected over a 24-hour period, starting from 8 pm on 31 May 2002, using a high volume TSP sampler. For this near source sample, 73 particles among 377 particles analyzed (accounting for 19.4%) were lead-containing particles mixed with other species (S, Cl, K, Ca, and/or C), which probably appeared to be from a nearby lead smelter. Lead-containing particles of less than $2{\mu}m$ size in the near source sample were most frequently encountered with the relative abundances of 42%. SEM-EDX analysis of individual standard particles, such as PbO, PbS, $PbSO_4$, $PbCl_2$, and $PbCO_3$, was also performed to assist in the clear identification of lead-containing aerosol particles. Lead-containing particles were frequently associated with arsenic and zinc, indicating that the smelter had emitted those species during the non-ferrous metallurgical process. The frequently encountered particles following the lead-containing particles were mineral dust particles, such as aluminosilicates (denoted as AlSi), $SiO_2$, and $CaCO_3$. Nitrate- and sulfate-containing particles were encountered frequently in $2-4{\mu}m$ size range, and existed mostly in the forms of $Ca(NO_3,SO_4)/C$, $(Mg,Ca)SO_4/C$, and $AlSi+(NO_3,SO_4)$. Particles containing metals (e.g., Fe, Cu, and As) in this near source sample had relative abundances of approximately 10%. Although the airborne particles collected near the lead smelter contained elevated levels of lead, other types of particles, such as $CaCO_3$-containing, carbonaceous, metal-containing, nitrates, sulfates, and fly-ash particles, showed the unique signatures of samples influenced by emissions from the lead smelter.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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• pp.145-145
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• 2008

High-k materials have been paid much more attention for their characteristics with high permittivity to reduce the leakage current through the scaled gate oxide. Among the high-k materials, $ZrO_2$ is one of the most attractive ones combing such favorable properties as a high dielectric constant (k= 20 ~ 25), wide band gap (5 ~ 7 eV) as well as a close thermal expansion coefficient with Si that results in good thermal stability of the $ZrO_2$/Si structure. During the etching process, plasma etching has been widely used to define fine-line patterns, selectively remove materials over topography, planarize surfaces, and trip photoresist. About the high-k materials etching, the relation between the etch characteristics of high-k dielectric materials and plasma properties is required to be studied more to match standard processing procedure with low damaged removal process. Among several etching techniques, we chose the inductively coupled plasma (ICP) for high-density plasma, easy control of ion energy and flux, low ownership and simple structure. And the $BCl_3$ was included in the gas due to the effective extraction of oxygen in the form of $BCl_xO_y$ compounds. During the etching process, the wafer surface temperature is an important parameter, until now, there is less study on temperature parameter. In this study, the etch mechanism of $ZrO_2$ thin film was investigated in function of $Cl_2$ addition to $BCl_3$/Ar gas mixture ratio, RF power and DC-bias power based on substrate temperature increased from $10^{\circ}C$ to $80^{\circ}C$. The variations of relative volume densities for the particles were measured with optical emission spectroscopy (OES). The surface imagination was measured by scanning emission spectroscope (SEM). The chemical state of film was investigated using energy dispersive X-ray (EDX).

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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• pp.363-363
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• 2008

The development of dry etching process for sapphire wafer with plasma has been key issues for the opto-electric devices. The challenges are increasing control and obtaining low plasma induced-damage because an unwanted scattering of radiation is caused by the spatial disorder of pattern and variation of surface roughness. The plasma-induced damages during plasma etching process can be classified as impurity contamination of residual etch products or bonding disruption in lattice due to charged particle bombardment. Therefor, fine pattern technology with low damaged etching process and high etch rate are urgently needed. Until now, there are a lot of reports on the etching of sapphire wafer with using $Cl_2$/Ar, $BCl_3$/Ar, HBr/Ar and so on [1]. However, the etch behavior of sapphire wafer have investigated with variation of only one parameter while other parameters are fixed. In this study, we investigated the effect of pressure and other parameters on the etch rate and the selectivity. We selected $BCl_3$ as an etch ant because $BCl_3$ plasmas are widely used in etching process of oxide materials. In plasma, the $BCl_3$ molecule can be dissociated into B radical, $B^+$ ion, Cl radical and $Cl^+$ ion. However, the $BCl_3$ molecule can be dissociated into B radical or $B^+$ ion easier than Cl radical or $Cl^+$ ion. First, we evaluated the etch behaviors of sapphire wafer in $BCl_3$/additive gases (Ar, $N_2,Cl_2$) gases. The behavior of etch rate of sapphire substrate was monitored as a function of additive gas ratio to $BCl_3$ based plasma, total flow rate, r.f. power, d.c. bias under different pressures of 5 mTorr, 10 mTorr, 20 mTorr and 30 mTorr. The etch rates of sapphire wafer, $SiO_2$ and PR were measured with using alpha step surface profiler. In order to understand the changes of radicals, volume density of Cl, B radical and BCl molecule were investigated with optical emission spectroscopy (OES). The chemical states of $Al_2O_3$ thin films were studied with energy dispersive X-ray (EDX) and depth profile anlysis of auger electron spectroscopy (AES). The enhancement of sapphire substrate can be explained by the reactive ion etching mechanism with the competition of the formation of volatile $AlCl_3$, $Al_2Cl_6$ or $BOCl_3$ and the sputter effect by energetic ions.

• 공업화학
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• 제31권2호
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• pp.220-225
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• 2020

모발은 여러 가지 아미노산들을 포함하는 단백질로 이루어져 있다. 자외선(UV)은 태양광선중에서 모발손상에 가장 큰 영향을 미치며 모발 노화에 주된 역할을 한다. 본 연구의 목적은 전자현미경(SEM), 공초점현미경(CLSM) 및 적외선 현미경분광법(IR micro spectroscopy)을 이용하여 정상모발에 UVB를 조사한 후 특징적인 형태학적 및 화학적 구조변화를 알아보는 것이다. 에너지 분산형 X선 분광기가 부착된 전자현미경은 자외선 조사모발의 표면이 정상모발과 비교했을 때 거칠고 높은 산소원소의 함량을 보였다. 형광 및 3차원 위상 이미지를 CLSM으로 분석한 결과 정상모발의 초록색 형광방출이 UVB 조사모발에 비해 매우 높았다. 또한 fluorescamine 형광 염색법을 통해 UVB 조사모발은 정상모발에 비해 펩타이드 결합의 파괴로 생성된 자유 아미노기가 많음을 확인할 수 있었다. UVB 조사모발의 강한 푸른색 형광은 아미노기의 함량이 높다는 것을 의미하며, 이는 CLSM에서도 관찰되었다. 따라서 fluorescamine은 UVB 조사모발에서 펩타이드 결합의 파괴를 관찰하는데 유용한 도구가 될 수 있다. 정상모발과 UVB 조사모발의 단면을 IR micro-spectroscopy를 통해 이미지 맵핑(mapping)한 결과, UVB 조사모발은 정상 모발에 비해 모발의 표면은 물론 내부에 걸쳐 디설파이드 결합(disulfide bond)의 산화가 일어나고 있음을 확인할 수 있었다. 이러한 분광학적 방법은 단독 또는 다른 분석법과 함께 모발화장품의 개발에 응용될 수 있을 것이다.

• 한국결정성장학회지
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• 제23권4호
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• pp.167-172
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• 2013

266 nm 파장을 갖는 Nd : YAG 레이저를 이용한 펄스레이저증착법(PLD)에 의해 모재인 $Al_2O_3$ 입자표면에 코팅된 $TiO_2$ 나노 입자를 제조하였다. 펄스레이저 에너지는 100 mJ/pulse로 고정하였으며, 레이저가 $TiO_2$ 타겟에 조사되는 동안 아르곤 가스를 챔버 내로 공급하였다. 이때, 압력은 $1{\times}10^{-2}Pa$에서 100 Pa로 변화시겼다. 증착된 나노 입자의 형태와 특성에 대한 증착 압력의 효과는 투과전자현미경과 에너지 분산형 X선 분광기를 이용하여 조사하였다. 모재 표면($Al_2O_3$)에 흡착된 나노 입자는 거의 구형이며 10~30 nm의 크기를 갖는다. 증착된 나노 입자의 형태는 기체 압력에 큰 영향을 받지 않는다. 그러나, 증착된 나노입자의 크기와 결정성은 기체 분압이 증가함에 따라서 증가한다. 이 방법에 의해서, 증착된 나노입자의 크기와 결정성은 기체 압력에 의해서 쉽게 조정할 수 있다.