• Title/Summary/Keyword: Emitter

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Simulation Study on the Effect of the Emitter Orientation and Photonic Crystals on the Outcoupling Efficiency of Organic Light-Emitting Diodes

  • Lee, Ju Seob;Ko, Jae-Hyeon;Park, Jaehoon;Lee, Jong Wan
    • Journal of the Optical Society of Korea
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    • v.18 no.6
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    • pp.732-738
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    • 2014
  • Combined optical simulation of the ray-tracing technique and the finite difference time domain method was used to investigate the effect of the emitter orientation and the photonic crystal layer on the outcoupling efficiency (OCE) of bottom-emission type organic light emitting diodes (OLEDs). The OLED with a horizontal emitter exhibited an opposite interference effect to that of one with a vertical emitter, which suggested that the OCE would be very sensitive to the emitter orientation at a fixed emitter-cathode distance. The OLED with a horizontal emitter exhibited much larger OCE than that with a vertical emitter did, which was due to the substantial difference in the radiation pattern along with the different coupling with the surface plasmon excitation. The OCE with a horizontal emitter was increased by approximately 1.3 times by inserting a photonic crystal layer between the indium tin oxide layer and the glass substrate. The present study suggested that appropriate control of the emitter orientation and its combination to other outcoupling structures could be used to enhance the OCE of OLEDs substantially.

Fabrication of Carbon Nanotube Field Emitters

  • Yoon, Hyeun-Joong;Jeong, Dae-Jung;Jun, Do-Han;Yang, Sang-Sik
    • Journal of Electrical Engineering and Technology
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    • v.3 no.1
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    • pp.121-124
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    • 2008
  • This paper presents the fabrication and field emission of carbon nanotube field emitters for a micro mass spectrometer. The carbon nanotube is an adequate material as a field emitter since it has good characteristics. We have successfully fabricated a diode field emitter and a triode field emitter. Each field emitter has been constructed using several micromachining processes and a thermal CVD process. In the case of the diode field emitter, to increase the electric field, the carbon nanotubes are selectively grown on the patterned nickel catalyst layer. The electron current of the diode field emitter is 73.2 ${\mu}A$ when the anode voltage is 1100V. That of the triode field emitter is 3.4 pA when the anode voltage is 1000V.

Design analysis of high efficiency crystalline silicon solar cell using the selective emitter (선택적 에미터를 적용한 고효율 결정질 실리콘 태양전지 구조 설계)

  • Lim, Jong-Keun;Lee, Won-Jae;Moon, In-Sik;Oh, Hoon;Cho, Eun-Chel
    • 한국신재생에너지학회:학술대회논문집
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    • 2009.11a
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    • pp.355-358
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    • 2009
  • This paper presents the technology of selective emitter for high efficiency crystalline silicon solar cell. The effect of selective emitter is analyzed by using the simulation program for solar cell, PC1D. The selective emitter shows better spectral response in short wavelength regions compared to homogeneous emitter. Therefore, the efficiency of solar cell with selective emitter can be improved by changing the sheet resistance from 60 $\Omega/\square$ to 120 $\Omega/\square$. In addition, the power loss of solar cell can be minimized by optimizing width and gap of the finger electrodes on the selective emitter.

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A Study on the Current Gain Variation with the Emitter Size in AlGaAs/GaAs HBTs (AlGaAs/GaAs HBTs의 에미터 크기에 따른 전류 이득 변화에 관한 연구)

  • 정준오;이헌용;이태우;김일호;박문평;박성호;편광의
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1996.11a
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    • pp.10-12
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    • 1996
  • AlGaAs/GaAs Heterojunotion Bipolar Transistors (HBTs) with various emitter areas were fabricated and the device size dependence on the current gain was examined. With the different emitter areas, the passivated devices having the same peripheral length were fabricated and measured. The measured base current density in the Gummel plots shows an ideality factor of nearly 2. It is found that as the emitter area becomes small, the base current density with the ideality factor of 2 increases linearly, and as the emitter perimeter/area ratio becomes large, the surface recombination current density component increases. The current gain performance in AlGaAs/GaAs HBTs is mainly determined by either the larger emitter area or the smaller ratio of the emitter perimeter to the emitter area. These results will be compared with experimental works for GaInP/GaAs HBTs

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Stablilization of Field Emission Current (Field Emission 전류의 안정화)

  • Yamamoto, Shigehiko
    • Journal of the Korean Vacuum Society
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    • v.2 no.3
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    • pp.335-338
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    • 1993
  • 텅스텐으로 만들어진 field emitter와 탄소로 만들어진 field emitter에서 생기는 step이나 spike 형태의 잡음에 대하여 비교 연구하였다. 그리고 dispenser 형태의 field emiter와 array 형태의 field emitter와 같은 새로운 형태의 field emitter를 설명하였다.

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Simulation을 이용한 N-type Si 태양전지의 p+ Boron Emitter 특성분석

  • Kim, Eun-Yeong;Yun, Seong-Yeon;Kim, Jeong
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2011.05a
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    • pp.44.1-44.1
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    • 2011
  • 본 연구에서는 태양전지 설계를 위해 기존의 반도체소자 simulation에 사용되고 있는 Silvaco TCAD tool을 사용하여 p+ boron emitter의 특성분석 실험을 하였다. 변수로는 emitter의 농도와 접촉저항 이 두 가지 놓고 표면 재결합과 의 영향을 염두에 두고 실험을 하였다. 농도는 $1{\times}10^{17}\;cm^{-3}$에서 $2{\times}10^{22}\;cm^{-3}$까지 두었고, 각각의 농도에 해당되는 contact 저항을 설정하여 전기적 특성을 보았다. 실험 결과 두 가지 변수를 모두 입력하였을 때 처음에 Isc가 조금씩 올라가다가 $1{\times}10^8\;cm^{-3}$에서 가장 높았고 그 이후에는 표면 재결합이 커지면서 Isc가 계속 떨어졌다. 하지만 contact 저항으로 인해 가장 높은 효율은 $1{\times}10^9\;cm^{-3}$ 부근에서 보였다. 농도에 따라 표면 재결합과 contact 저항이 서로 반대로 변하기 때문에 emitter를 표면 재결합이 늘어남에도 불구하고 contact 저항으로 인해 비교적 고농도로 doping 해야만 했다. 하지만 우리가 준 contact 저항은 농도에 따라 생긴 저항으로 실제 전극의 contact 저항은 훨씬 더 클 것으로 예상되고 이로 인해 더 고농도의 doping이 필요하게 된다. 그렇게 된다면 표면의 재결합으로 인한 손실은 더 크게 되어 전체적으로 효율은 떨어진다. 우리는 이 손실을 보완하고 줄이기 위해 selective emitter 개념을 넣어 이에 대한 영향은 보았다. selective를 하지 않은 $1{\times}10^{19}\;cm^{-3}$의 doping 농도의 가장 높은 효율을 보인 기존의 emitter와 전극 부분을 제외한 표면은 $1{\times}10^{18}\;cm^{-3}$으로 하고 전극 부분의 emitter는 $2{\times}10^{20}\;cm^{-3}$으로 한 selective emitter를 비교해보았다. 이는 selective emitter가 기존 emitter에 비해 Isc와 Fill Factor로 인해 효율이 약 0.7% 정도 높았다.

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Equipment Manufacturing of Lamp Heating to Fabricate Selective Emitter Silicon Solar Cell (선택적 에미터 결정질 실리콘 태양전지 제작을 위한 할로겐 램프 장치 개발)

  • Han, Kyu-Min;Choi, Sung Jin;Lee, Hi-Deok;Song, Hee-Eun
    • Journal of the Korean Solar Energy Society
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    • v.32 no.5
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    • pp.102-107
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    • 2012
  • Halogen lamp was applied to fabricate the selective emitter crystalline silicon solar cell. In selective emitter structure, the recombination of minority carriers is reduced with heavily doped emitter under metal grid, consequently improving the conversion efficiency. Laser selective emitter process which is recently used the most generally induces the damage on the silicon surface. However the lamp has enough heat to form heavily doped emitter layer by diffusing phosphorus from PSG without surface damage. In this work, we have studied to find the design and the suitable condition for halogen lamp such as power, time, temperature and figured out the possibility to fabricate the selective emitter silicon solar cell by lamp heating. The sheet resistance with $100{\Omega}/{\Box}$ was lower to $50{\Omega}/{\Box}$ after halogen lamp treatment. Heat transfer to lightly doped emitter region was blocked by using the shadow mask.

Effect of forward common emitter current gain on emitter area in NPN transistors (NPN 트랜지스터의 에미터 면적이 에미터 전류 이득에 미치는 영향)

  • Lee, Jung-Hwan
    • Journal of Korea Society of Industrial Information Systems
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    • v.19 no.2
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    • pp.37-43
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    • 2014
  • In this paper, we present the effect of forward current gain on emitter area in NPN transistors are used widely in the almost linear integrated circuits and integrated injection logic. Relations between forward current gain and emitter area were conformed with the simulation with examined calculation and experiments. At the same emitter length, as junction depth is increased, common emitter current gain is decreased. Ratio of Emitter bottom area comparing to side area increases, the emitter current gain is increased. The theory and simulation results were fitted in with the experimental data very well.

Selective Emitter Formation of Borosilicate-Glass (BSG) Layer using UV Laser (UV Laser를 이용한 Borosilicate-Glass (BSG)층의 선택적 에미터 형성)

  • Kim, Ga Min;Chang, Hyo Sik
    • Korean Journal of Materials Research
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    • v.31 no.12
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    • pp.727-731
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    • 2021
  • In this study, we have investigated a selective emitter using a UV laser on BBr3 diffusion doping layer. The selective emitter has two regions of high and low doping concentration alternatively and this structure can remove the disadvantages of homogeneous emitter doping. The selective emitters were fabricated by using UV laser of 355 nm on the homogeneous emitters which were formed on n-type Si by BBr3 diffusion in the furnace and the heavy boron doping regions were formed on the laser regions. In the optimized laser doping process, we are able to achieve a highly concentrated emitter with a surface resistance of up to 43 Ω/□ from 105 ± 6 Ω/□ borosilicate glass (BSG) layer on Si. In order to compare the characteristics and confirm the passivation effect, the annealing is performed after Al2O3 deposition using an ALD. After the annealing, the selective emitter shows a better effect than the high concentration doped emitter and a level equivalent to that of the low concentration doped emitter.

A Study on the Sensitivity Increase of the Magnetotransistor with Combined Hall Effect and Emitter Injection Modulation Operated in the Saturation Region (홀 효과와 에미터 인젝션 모듈레이션이 결합된 자기트랜지스터의 포화영역에서의 민감도 증가 현상에 관한 연구)

  • Kang, Uk-Song;Lee, Seung-Ki
    • Proceedings of the KIEE Conference
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    • 1995.07c
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    • pp.1434-1436
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    • 1995
  • We designed and fabricated a highly sensitive magnetotransistor which employes the emitter region as a Hall plate for inducing Hall voltage across the emitter. The Hall voltage modulates the emitter basic junction bias on both sides of the emitter so that a large collector current difference is resulted. The specially designed $p^+$ ring around the emitter enhances accumulation of drifted electrons in the emitter and thus the Hall voltage. A relative sensitivity of 240/tesla is measured by operating the device in the saturation mode.

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