• Title/Summary/Keyword: Electroreflectance

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Electroreflectance Study of ZnSe in ZnSe/GaAs Heterostructure (ZnSe/GaAs 이종접합 구조에서 ZnSe의 Electroreflectance 연구)

  • Jo, Hyun-Jun;Bae, In-Ho
    • Journal of the Korean Vacuum Society
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    • v.21 no.6
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    • pp.322-327
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    • 2012
  • The strain effects of ZnSe epilayer on ZnSe/GaAs heterojunction structure grown by molecular beam epitaxy have been investigated by using electroreflectance (ER) spectroscopy. The ER measurements were performed as a function of modulation voltage, dc bias voltage, and temperature. From the room temperature ER spectrum, we observed a heavy-hole (HH: 2.609 eV) and light-hole (LH: 2.628 eV) transitions due to a compressive strain. With increasing the bias voltage, the amplitude of HH transition signal decreased and the amplitude of LH transition signal was almost the same. From the temperature dependence of ER spectra, we have studied the interaction between the strain and the thermal expansion coefficient.

A Study on $E_1$Transition in Si-Doped $Al_{0.32}Ga_{0.68}As$by Electroreflectance Measurement (Electroreflectance 측정에 의한 Si이 첨가된 $Al_{0.32}Ga_{0.68}As$에서의 $E_1$ 전이에 대한 연구)

  • 김동렬;손정식;김근형;이철욱;배인호
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.11 no.9
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    • pp.687-692
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    • 1998
  • Silicon doped $Al_{0.32}Ga_{0.68}As$ were growth by molecular beam epitaxy. Electroreflectance(ER) spectra of the $E_1$ transition of Schottky barrier Au/n-$Al_{0.32}Ga_{0.68}As$ have been measured at various modulation voltage($V_{ac}$) and dc bias voltage($V_{bias}$). from the $E_1$peak, band gap energy of the $Al_{0.32}Ga_{0.68}As$ is 1.883 eV which corresponds to an Al composition of 32%. As modulation voltage($V_{bias}$) is changed, a line shape at the $E_1$transition does not change, but its amplitude varies linearly. The amplitude of $E_1$signal decrease with increasing the forward dc bias voltage($V_{bias}$), but the line shape does not change. It suggests that the low field theory rather than Franz-Keldysh oscillation is Required to interpret spectra. Also, spectra at the $E_1$transition were broadened with increasing the reverse dc bias voltage($V_{bias}$) which suggests the presence of Field-induced broadening.

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A Study on Electroreflectance in Si-Doped $Al_{0.33}Ga_{0.67}As$ (Si이 첨가된 $Al_{0.33}Ga_{0.67}As$에서의 Electroreflectance에 관한 연구)

  • 김근형;김동렬;김종수;김인수;배인호;한병국
    • Electrical & Electronic Materials
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    • v.10 no.7
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    • pp.692-699
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    • 1997
  • The silicon doped $Al_{0.33}$G $a_{0.67}$As were grown by molecular beam epitaxy. The electroreflectance(ER) spectra of Schottky barrier Au/n-Al/suu x/G $a_{1-x}$ As have been measured at various modulation voltage( $V_{ac}$ ) and dc bias voltage( $V_{bias}$). From the observed Franz-Keldysh oscillations(FKO) peak, the band gap energy of the $Al_{x}$G $a_{1-x}$ As is 1.91 eV which corresponds to an Al composition of 33%. The internal electric field( $E_{i}$)of this sample is 2.96$\times$10$^{5}$ V/cm. As the modulation voltage( $V_{ac}$ ) is changed, the line shape of ER signal does not change but its amplitude varies linearly. The amplitude as a function of modulation voltage has saturated at 0.8 V. The internal electric field has decreased from 6.47$\times$10$^{5}$ V/cm to 2.00$\times$10$^{5}$ V/cm as the dc bias voltage( $V_{bias}$) increases from -3.5 V to +0.8 V. The values of built-in voltage( $V_{bi}$ ) and carrier concentration(N) determined from the plot of $V_{bias}$ from the plot of $V_{bias}$ versus $E_{i}$$^{2}$ are 0.855 V and 3.83$\times$10$^{17}$ c $m^{-3}$ , respectively.ively.y.y.y.

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Electroreflectance Study of CIGS Thin Film Solar Cells

  • Jo, Hyun-Jun;Jeon, Dong-Hwan;Ko, Byoung Soo;Sung, Shi-Joon;Bae, In-Ho;Kim, Dae-Hwan
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.415-415
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    • 2013
  • We have investigated the optical and electrical properties of the CIGS thin film solar cells by the electroreflectance (ER), photoreflectance (PR), photoluminescence (PL), and photocurrent (PC) spectroscopies at room temperature. The ER spectrum had two narrow signal regions and one broad signal region. We measured PL and PC to confirm the signals at low energy region (1.02~1.35 eV), so these signals are related to the CIGS thin film, and the high energy region (2.10~2.52 eV) is related to the CdS bandgap energy. The broad signal region (1.35~2.09 eV) is due to the internal electric field by the p-n junction from the comparison between PR and ER spectra, and we calculated the internal electric field by the p-n junction. In the high efficiency solar cell, the CdS signal of ER spectrum is narrower than the lower efficiency solar cells.

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Measurement of III-V Compound Semiconductor Characteristics using the Contactless Electroreflectance Method

  • Yu, Jae-In;Choi, Soon-Don;Chang, Ho-Gyeong
    • Journal of Electrical Engineering and Technology
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    • v.6 no.4
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    • pp.535-538
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    • 2011
  • The electromodulation methods of photoreflectanceand the related technique of contactless electroreflectance(CER) are valuable tools in the evaluation of important device parameters for structures such as heterojunction bipolar transistors, pseudomorphic high electron mobility transistors, and quantum dots(QDs). CER is a very general principle of experimental physics. Instead of measuring the optical reflectance of the material, the derivative with respect to a modulating electric field is evaluated. This procedure generates sharp, differential-like spectra in the region of interband (intersubband) transitions. We conduct electric-optical studies of both GaAs layers and InAs selfassembled QDs grown by molecular beam epitaxy. Strong GaAsbandgap energy is measured in both structures. In the case of lnAs monolayers in GaAs matrices, the strong GaAsbandgap energy is caused by the lateral quantum confinement.

Contactless Electroreflectance Study of $Zn_{1-x}Mg_xO$

  • Kim, Sung-Soo;Cheong, Hyeonsik;Park, W. I.;Yi, Gyu-Chul
    • Journal of Korean Vacuum Science & Technology
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    • v.6 no.4
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    • pp.139-142
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    • 2002
  • Contactless electroreflectance measurements at room temperature were used to determine the bandgap energies of Zn$_{1-x}$ Mg$_{x}$O thin films grown by metal-organic vapor phase epitaxy. It is found that the bandgap energy increases monotonically with the Mg composition x, up to the highest composition measured (x=0.45). The obtained correlation between the bandgap energy and the Mg composition can be used in the analysis of the electronic structure of ZnO/Zn$_{1-x}$ Mg$_{x}$O heterostructures at room temperature.ature.

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Contactless Electroreflectance Spectroscopy of In0.5(Ga1-xAlx)0.5P/GaAs Double Heterostructures (In0.5(Ga1-xAlx)0.5P/GaAs 이중 이종접합 구조의 Contactless Electroreflectance에 관한 연구)

  • Kim, Jeong-Hwa;Jo, Hyun-Jun;Bae, In-Ho
    • Journal of the Korean Vacuum Society
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    • v.19 no.2
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    • pp.134-140
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    • 2010
  • We have investigated the contactless electroreflectance (CER) properties of $In_{0.5}(Ga_{1-x}Al_x)_{0.5}P$/GaAs double heterostructures grown by metal-organic chemical vapour deposition (MOCVD). The CER measurements on the sample were studied as a function of temperature, modulation voltage ($V_{ac}$), and dc bias voltage ($V_{bias}$). Five signals observed at room temperature are related to the GaAs, $In_{0.5}Ga_{0.5}P$, $In_{0.5}(Ga_{0.73}Al_{0.27})_{0.5}P$, $In_{0.5}(Ga_{0.5}Al_{0.5})_{0.5}P$, and $In_{0.5}(Ga_{0.2}Al_{0.8})_{0.5}P$ transitions, respectively. From the temperature dependence of CER spectrum, the Varshni coefficients and broadening parameters were determined and discussed. In addition, we found that the behavior of the CER amplitude for the reverse bias is larger than that of the forward.

A study on electroreflectance in undoped n-GaAs (불순물이 첨가되지 않은 n-GaAs에서의 Electroreflectance에 관한 연구)

  • 김인수;김근형;손정식;이철욱;배인호;김상기
    • Journal of the Korean Vacuum Society
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    • v.6 no.2
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    • pp.136-142
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    • 1997
  • An/n-GaAs(100) Schottky barrier diode has been investigated by using electoreflectance(ER). From the observed Franz-Keldysh oscillatins(FKO), the internal electric field(Ei) of the sample is $5.76\times 10^{4}$V/cm at 300 K. As the modulation voltage($V_{ac}$) IS changed, the line shape of ER signal does not change but its amplitude various linerly. For increasing forward and reverse dc bias boltage($V_{bias}$), the amplitude of ER signal decreases. The internal electric field decreased from $19.3\times 10^4\sim4.39\times10^4$V/cm as $V_{bias}$ INCREASES FROM -5.0 V TO 0.6 V. For Au/n-GaAs the valve of built-in voltage($V_{bi}$) determined from the plot of $V_{bias}$ versus $E_i^2$ is 0.70 V. This value agrees with that observed in the plot of $V_{bias}$ versus amplitude of FKO peak. In addition, the carrier concentraion(N) and potential barrier($\Phi$) of the sample at 300 K are found to be about $2.4\times 10^{16}\textrm{cm}^{-3}$ and 0.78 eV, respectively.

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