• Title/Summary/Keyword: Electronic devices

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Organic Photovoltaic Effects Depending on the Layer Thickness (CuPc/$C_{60}$를 이용한 유기 광기전 소자에서 유기층의 두께에 따른 특성)

  • Han, Wone-Keun
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.07a
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    • pp.535-536
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    • 2005
  • Organic photovoltaic effects were studied in a device structure of ITO/CuPc/Al and ITO/CuPc/$C_{60}$/BCP/Al. A thickness of CuPc layer was varied from 10 nm to 50 nm, we have obtained that the optimum CuPc layer thickness is around 40 nm from the analysis of the current density-voltage characteristics in CuPc single layer photovoltaic cell. From the thickness-dependent photovoltaic effects in CuPc/$C_{60}$ heterojunction devices, higher power conversion efficiency was obtained in ITO/20nm CuPc/40nm $C_{60}$/Al, which has a thickness ratio (CuPc:$C_{60}$) of 1:2 rather than 1:1 or 1:3. Light intensity on the device was measured by calibrated Si-photodiode and radiometer/photometer of International Light Inc(IL14004).

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Interaction between Oxygens and Secondary Defects Induced in Silicon by High Energy $B^+$Ion Implantation and Two-Step Annealing

  • Yoon, Sahng-Hyun;Jeon, Joon-Hyung;Kim, Kwang-Tea;Kim, Hyun-Hoo;Park, Chul-Hyun
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.07a
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    • pp.185-186
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    • 2005
  • Intrinsic gettering is usually used to improve wafer quality which is an important factor for reliable ULSI devices. The two-step annealing method was adopted in order to investigate interactions between oxygens and secondary defects during oxygen precipitation process in lightly and heavily boron doped silicon wafers with high energy $^{11}B^+$ ion implantation. Secondary defects were inspected nearby the projected range by high resolution transmission electron microscopy. Oxygen pileup was measured in the vicinity of the projected range by secondary ion mass spectrometry for heavily boron doped silicon wafers.

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Transport property of a Se:As films for digital x ray imaging

  • Kim, Jae-Hyung;Nam, Sang-Hee
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.04a
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    • pp.85-88
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    • 2006
  • The transport properties of amorphous selenium typical of the material used in direct conversion x-ray imaging devices are reported. The effects of As addition on the carrier mobility and recombination lifetime in amorphous selenium (a-Se) films have been studied using the moving photocarrier grating (MPG) technique. We have found an increase in hole drift mobility and recombination lifetime, especially when 0.3% As is added into a-Se film, whereas electron mobility decreases with As addition due to the defect density. The transport properties for As doped a-Se films obtained by using MPG technique have been compared with the drift mobilities of holes and electrons obtained by time of flight (TOF) measurement.

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A Study on the Transference Mechanism of Charge carriers within the Devices (소자 내부에서 전하 운송체의 이동 메카니즘에 관한 연구)

  • Shim, Hye-Yeon;Kim, Jun-Ho;Kim, Young-Kwan
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.07a
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    • pp.508-509
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    • 2005
  • In case of ITO/MEH-PPV/Al structure, the quantity of charge carriers flowing through the organic material was few and the density of them is fixed. The electric field inside of the device almost didn't change with the position. On the other hands, in case of Au/MEH-PPV/Au structure, the hole density increased rapidly nearby the anode but decreased nearby the cathode. The space charge phenomenon followed sufficient hole injection resulted in the change of the electric field with the position inside of the device. We verified that the result of the current-voltage simulation corresponded with experimental result.

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Analysis of the Electrical Characteristics of 4H-SiC LDMOSFET (4H-SiC RESURF LDMOSFET 소자의 전기적 특성분석)

  • Kim, Hyoung-Woo;Kim, Sang-Cheol;Bahng, Wook;Kim, Nam-Kyun;Seo, Kil-Soo;Kim, Enn-Dong
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.07a
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    • pp.101-102
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    • 2005
  • SiC lateral power semiconductor device has high breakdown voltage and low on-state voltage drop due to the material characteristics. And, because the high breakdown voltage can be obtained, RESURF technique is mostly used in silicon power semiconductor devices. In this paper, we presents the electrical characteristics of the 4H-SiC RESURF LDMOSFET as a function of the epi-layer length, concentration and thickness. 240~780V of breakdown voltage can be obtained as a function of epi-layer length and thickness with same epi-layer concentration.

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Analyzing the characteristics of Thermal Transient on MOSFET depending on Heat Sink surface area (히트싱크 크기에 따른 MOSFET의 열전달 특성변화 분석)

  • Kim, Ki-Hyun;Seo, Kil-Soo;Kim, Hyoung-Woo;Kim, Sang-Choel;Bahng, Wook;Kang, In-Ho
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.07a
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    • pp.170-171
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    • 2005
  • Generally when Power MOSFET is operated, a heat sink is attached to it to emit heat caused by the operation. As the surface area of a heat sink is smaller, the thermal impedance is larger, which causes a negative influence on the characteristics of the chips and the devices and shortens the lifespan of them. In this experiment, we've compared and analysed different effects of heat sinks with 5 different surface areas on the characteristics of Thermal Transient when they are applied respectively.

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Study on 3-dimension Image Process based on Organic light Emitting Diode (유기발광소자 (Organic Light Emitting Diode)를 이용한 3차원 영상에 대한 연구)

  • Lee, Jung-Ho
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.07a
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    • pp.497-499
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    • 2005
  • A portable terminal assistant market grows rapidly every year and it requires many change in research on display devices. Among many newly developing methods, OLED(Organic Light Emitting Diode) is considered an advanced flat display device because its excellent characteristics, including high speed response, full color performance, low power consumption and flux of panel. However changes in the market of display shows that the market will require 3-dimensional images, but it is hard for existing 2-dimensional displays to make 3-dimensional images. Therefore we will try to find various methods such as holograms. In this paper, we will show existing flat displays can make 3-dimensional images by applying Lenticular Screen printing techniques on the organic semiconductor display device.

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A Study on design of the PZT Cantilever for Micro Switch (Micro Switch용 PZT Cantilever의 설계에 관한 연구)

  • Kim, In-Sung;Song, Jae-Sung;Min, Bok-Ki;Jeong, Soon-Jong;Muller, A.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.07a
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    • pp.422-423
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    • 2005
  • RF Micro switches is a miniature device or an array of integration devices and mechanical components and fabricated with Ie batch-processing techniques. RF Micro switches application area are in phased arrays and reconfigurable apertures for defence and telecommunication systems, switching network for satellite communication, and single-pole double throw switches for wireless application. Recently, RF Micro switches have been developed for the application to the milimeter wave system. RF Micro switches offer a substantilly higher performance than PIN diode or FET switches. In this paper, SPDT(single-pole-double-throw) switch are designed to use 10 GHz. Actuation voltage and displacement are simulated by tool.

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The n-p-n-p layer stacked color detector for CMOS image sensor (CMOS 이미지 센서용 n-p-n-p 적층형 색 검출기)

  • Song, Young-Sun;Yun, Il-Gu
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.07a
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    • pp.72-73
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    • 2005
  • In this paper, the simulation of the n-p-n-p layer stacked color detector is presented. A color detector based on vertically integrated structures of silicon can overcome color moire or color aliasing effect. The color detector is designed to separate the fundamental chromatic components at each junction and exhibits maxima of the spectral sensitivity at red, green, and blue region, respectively. From this result, it is observed that the spectral response can be controlled by the doping concentration and structure of the devices.

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Impedance characteristics with various $Alq_3$ thickness in ITO/$Alq_3$/Al organic light-emitting diodes (ITO/$Alq_3$/Al의 유기 발광 소자에서 $Alq_3$의 두께 변화에 따른 임피던스 특성)

  • Gong, Doo-Won;Koo, Ja-Ryong;Kim, Young-Kwan
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.07a
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    • pp.477-478
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    • 2005
  • The devices with a structure of ITO/$Alq_3$/Al were fabricated and their impedance properties were analyzed. It is obtained that an effect of resistance $R_p$ of the device was dominant at the low frequency and the high voltage region, emitting region, and it is ignored at the high frequency region. Capacitance $C_p$ appears intensely in a range of all frequencies of non-emitting region, below turn on voltage.

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