• Title/Summary/Keyword: Electron-beam deposition

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Characterization of ZnO thin films prepared by pulsed laser ablation method (Laser Ablation법에 의해 형성된 ZnO 박막의 특성평가)

  • 조중연;장호정;서광종
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2003.03a
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    • pp.103-103
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    • 2003
  • ZnO$_{1-x}$(또는 Zn$_{1+x}$O) 산화아연은 과잉의 아연(또는 oxygen vacancy)이 도우너(donor) 역할을 하는 비화학양론적 n형 산화물 반도체이다. ZnO는 높은 투과율을 가지고 온도나 주변환경에 대해 매우 안정하며, 또한 이미 상용화된 ITO (Indium tin oxide)에 비해 식각 특성이 우수하고, 수소 플라즈마에 대한 저항성이 크다는 장점 때문에 가스센서와 디스플레이용 소자 등 다양한 분야에 응용이 가능하다. ZnO 박막은 CVD, Reactive Magnetron Sputtering, Electron-beam Evaporation 등 여러 가지방법으로 제작할 수 있다. 본 연구에서는 형성된 박막의 구성성분이 타겟의 성분과 유사하고 낯은 기판온도에서도 박막이 형성되어지는 장점을 가지는 Pulsed Laser Deposition 방법을 사용하여 유리 기판위에 ZnO 박막을 형성하였다.다.

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Development of certified reference material (CRM)s for surface analysis II : multilayer thin films for sputter depth profiling (표면분석용 인증표준물질의 개발 II : 깊이분포도용 다층 박막 표준물질의 개발)

  • 김경중;문대원
    • Journal of the Korean Vacuum Society
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    • v.8 no.3B
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    • pp.283-289
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    • 1999
  • Multilayer thin film reference materials for the sputter depth profiling analysis are used to calibrate the sputter depth scale by measuring the sputtering rate and to optimize the sputtering conditions for the best depth resolution. Surface analysis group of Korea Research Institute of Standards and science (KRISS) have developed various types of multilayer thin films by using an ion beam sputter deposition and in-situ surface analysis system. The chemical states of the thin films reference materials were certified by in-situ XPS and the thicknesses were certified by transmission electron microscopy (TEM).

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Fabrication of Nano-photonic Crystals with Lattice Constant of 460-nm by Inductively-coupled Plasma Etching Process (유도결합형 플라즈마 식각공정을 통해 제작된 460 nm 격자를 갖는 나노 광결정 특성)

  • Choi, Jae-Ho;Kim, Keun-Joo
    • Journal of the Semiconductor & Display Technology
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    • v.5 no.2 s.15
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    • pp.1-5
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    • 2006
  • The GaN thin film on the 8 periods InGaN/GaN multi-quantum well structure was grown on the sapphire substrate using metal-organic chemical vapor deposition. The nano-scaled triangular-lattice holes with the diameter of 150 nm were patterned on a polymethylmethacrylate blocking film using an electron beam nano-lithography system. The thin slab and two-dimensional photonic crystals with the thickness of 28 nm were fabricated on the GaN layer for the blue light diffraction sources. The photonic crystal with the lattice parameter of 460 nm enhances spectral intensity of photoluminescence indicating that the photonic crystals provides the source of nano-diffraction for the blue light of the 450-nm wavelength.

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Development of real-time nanoscale contaminant particle characteristics diagnosis system in vacuum condition (진공공간 내 나노급 오염입자의 실시간 진단시스템 개발)

  • Kang, Sang-Woo;Kim, Taesung
    • Vacuum Magazine
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    • v.2 no.3
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    • pp.11-15
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    • 2015
  • Particle characteristics diagnosis system (PCDS) was developed to measure submicron particle characteristics by modulation of particle beam mass spectrometry (PBMS) with scanning electron microscopy (SEM) and energy dispersive x-ray spectroscopy (EDS). It is possible to measure the particle size distribution in real-time, and the shape, composition can be measured in sequence keeping vacuum condition. Apparatus was calibrated by measuring the size classified NaCl particle which generated at atmospheric pressure. After the calibration, particles were sampled from the exhaust line of plasma enhanced chemical vapor deposition (PECVD) process and measured. Result confirms that PCDS is capable for analyzing particles in vacuum condition.

Challenges for large size TV manufacturing;Process and Test Equipment

  • Kang, In-Doo;Brunner, Mathias;Tanaka, Tak;Sun, Sheng;Li, Julia
    • 한국정보디스플레이학회:학술대회논문집
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    • 2006.08a
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    • pp.1673-1675
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    • 2006
  • As the manufacturing capacity needs for large size LCD TV shifts very fast into next generation, processing and test equipment makers face more difficult challenges in accommodating productivity, reliability and lead time of panel makers as well as the prerequisite of high process quality. In this paper, AKT will discuss its new innovative productivity solutions in PECVD (Plasma Enhanced Chemical Vapor Deposition), as the key thin film process system, and EBT (Electron Beam Test), as the key array test system, for the huge glass size with surface dimension larger than 2 meter by 2 meter.

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Durability Improvement of Electrochromic Tungsten Oxides Films

  • Yang, J.Y.;Kim, J.W.;Kang, G.H.;K.D.Ko;Lee, G.D.
    • Proceedings of the Korean Vacuum Society Conference
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    • 1999.07a
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    • pp.157-157
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    • 1999
  • Electrochromic tungsten oxide films were prepared by the electron beam deposition, and the dependence of the electrochemical stability and the optical properties on the titanium concentration, and on the annealing temperature, that was investigated. coloring and bleaching experiments were repeated by cyclic voltammetry in a propylene carbonate solution of LiClO4. Spectrometry was used to assess the stability of the transmittance in the degraded films. Tungsten oxide films with titanium contents of about 10~15 mol% were found to be most stable, undergoing the least degradation during the repeated for coloring and bleaching cycles. The reason for this small amount of degradation was the reduction of lithium ion trapping sites in the films, which results in an increased durability. Tungsten oxide films with titanium contents of about 20 mol% were annealed at 20$0^{\circ}C$ for 1 hour, and this results showed that durability of films were increased.

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Preparation and Photovoltaic Properties of the CdTe and CdS-CdTe heterojunction (CdTe와 CdS-CdTe 이종접합 제작과 그 광전특성)

  • Kim, Seong-Ku;Park, Gye-Choon;Lee, Jean
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1992.11a
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    • pp.49-54
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    • 1992
  • Devices of ITO/CdS/CdTe/Te/Al were prepared by Electron-Beam deposition under a vacuum of $7{\times}10^{-6}$[torr]. Optical, Electrical, Structural and Photovoltaic properties of thin film CdS/CdTe at substrate. temperature 300~500[$^{\circ}C$] were also investigated, The structure of CdTe films deposited was of the zincblende type a preferential orientation of the (111) plane parallel to the substrate, the CdTe dark resistivity was about $10^6[{\Omega}cm]$. The conversion, efficiency of the cell increased with increasing substrate temperature. The best-fabricated Cell was a conversion efficiency of 9.1[%].

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Cold spray technology as a potential additive manufacturing (3D 프린팅 공정 관점의 저온분사 기술)

  • Kim, Hyeong-Jun;Yun, Sang-Hun
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2017.05a
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    • pp.90-90
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    • 2017
  • Cold spray (Cold gas dynamic spray, kinetic spray) is the latest spray coating process that is known as solid state deposition process. In cold spray, inert gases (typically nitrogen and helium) accelerate powder particles prior to impact onto the substrate. Accelerating particles start to deposit onto the substrate after reaching certain critical velocities depending on the coating materials and substrate. Since process gas temperatures are kept below to melting temperature of the coating materials, it is possible to spray temperature sensitive materials such as copper and titanium, nanocrystal materials, and amorphous metals without affecting the phase change and oxide formation. It is also possible to deposit thick coatings because cold spray coatings present compressive residual stresses. This ability to deposit thick coatings is suitable to repair or rebuild parts as an additive manufacturing process. In this presentation, cold spray is introduced and compared to other additive manufacturing processes such as laser and electron beam based processes. It is also presented some applications especially in the view point of additive manufacturing process.

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Failure Mechanisms for Zirconia Based Thermal Barrier Coatings

  • Lee, Eui Y.;Kim, Jong H.
    • The Korean Journal of Ceramics
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    • v.4 no.4
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    • pp.340-344
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    • 1998
  • Failure mechanisms were investigated for the two layer thermal barrier coatings consisting of NiCrAlY bond coat and $ZrO_2$-8wt.% $Y_2O_3$ ceramic coating during cyclic oxidation. $Al_2O_3$ developed at the ceramic coating/bond coat interface first, followed by the Cr/Ni rich oxides such as $NiCr_2O_4$ and $Ni(Al, Cr)_2O_4$ during cyclic oxidation. It was observed that the spalling of ceramic coatings took place primarily within the NiCrAlY bond coat oxidation products or at the interface between the bond coat oxidation products and zirconia based ceramic coating or the bond coat. It was also observed that the fracture within these oxidation products occurred with the formation of $Ni(Cr, Al)_2O_4$ spinel or Cr/Ni rich oxides. It was therefore concluded that the formation of these oxides was a life-limiting event for the thermal barrier coatings.

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