• Journal of radiological science and technology
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• v.21 no.2
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• pp.36-42
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• 1998

Treatment of a large diseased area with electron often requires the use of two or more adjoining fields. In such cases, not only electron beam divergence and lateral scattering but also fields overlapping and separation may lead to significant dose inhomogeneities(${\pm}20%$) at the region of junction of fields. In this study, we made Acrylic Electron Wedges to improve dose inhomogeneities(${\pm}5%$) in these junction areas and to apply it to clinical practices. All measurements were made using 6, 9, 12, 16, 20 MeV Electron beams from a linear accelerator for a $10{\times}10\;cm$ field at 100cm of SSD. Adding a 1 mm sheet of acryl gradually from 1 mm to 15 mm acquires central axis depth dose beam profile and isodose curves in water phantom. As a result, for all energies, the practical range was reduced by approximately the same distance according to the acryl insert, e.g. a 1 mm thick acryl insert reduces the practical range by approximately 1 mm. For every mm thickness of acryl inserted, the beam energy was reduced to approximately 0.2 MeV. These effects were almost Independent of beam energy and field size. The use of Acrylic Electron Wedges produced a small increase(less than 3%) in the surface dose and a small increase(less than 1%) in X-ray contamination. For acryl inserts, thickness of 3 mm or greater, the penumbra width increased nearly linear for all energies and isodose curves near the beam edge were nearly parallel with the incident beam direction at the point of penumbra width($35\;mm{\sim}40\;mm$). We decide heel thickness and angle of the wedge at this point. These data provide the information necessary to design Acrylic Electron Wedge which can be used to improve dose uniformity at electron field junctions and it will be effectively applied to clinical practices.

• The Journal of Korean Society for Radiation Therapy
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• v.10 no.1
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• pp.60-68
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• 1998

Treatment of a large diseased area with electron often requires the use of two or more adjoining fields. In such cases, not only electron beam divergence and lateral scattering but also fields overlapping and separation may lead to significant dose inhomogeneities(${\pm}20\%$) at the field junction area. In this study, we made Acrylic Electron Wedges to improve dose homogeneities(${\pm}5\%$) in these junction areas and considered application it to clinical practices. All measurements were made using 6, 9, 12, 16, 20MeV Electron beams from a linear accelerator for a $10{\times}10cm$ field at 100cm SSD. Adding a 1 mm sheet of acryl gradually from 1 mm to 15 mm, We acquired central axis depth dose beam profile and isodose curves in water phantom. As a result, for all energies, the practical range was reduced by approximately the same distance as the thickness of the acryl insert, e.g. a 1 mm thick acryl insert reduce the practical range by approximately 1 mm. For every mm thickness of acryl inserted, the beam energy was reduced by approximately 0.2MeV. These effects were almost independent of beam energy and field size. The use of Acrylic Electron Wedges produced a small increase $(less\;than\;3\%)\;in\;the\;surface\;dose\;and\;a\;small\;Increase(less\;than\;1\%)$ in X-ray contamination. For acryl inserts, thickness of 3 mm or greater, the penumbra width increased nearly linear for all energies and isodose curves near the beam edge were nearly parallel with the incident beam direction, and penumbra width was $35\;mm{\sim}40\;mm$. We decide heel thickness and angle of the wedge at this point. These data provide the information necessary to design Acrylic Electron Wedge which can be use to improve dose uniformity at electron field junctions and it will be effectively applicated in clinical practices.

• Proceedings of the KIEE Conference
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• 2003.10a
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• pp.204-206
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• 2003

Electron beam generator of cold cathode type has been developed for industrial application, for example, waste water cleaning, flue gas cleaning, and pasteurization etc. The operational principle is based on the emission of secondary electrons from cold cathode when ions in the plasma hit the cathode, which are accelerated toward exit window by the gradient of an electric potential. The characteristics of secondary electron emission are studied by comparing total cathode current with ion current.

• 한국정보디스플레이학회:학술대회논문집
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• 2005.07b
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• pp.1203-1206
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• 2005

Electron temperature and plasma density in coplanar alternating-current plasma display panels (AC-PDP's) have been experimentally investigated in accordance with discharge time by a micro-probe in this experiment. The resolution of a step mortor to move in micro-Langmuir probe is 10um.[1-3] The used gas in this experiment is He-Ne-Xe (4%) mixure gas. And sustain voltage is 320V which is above of firing voltage for degradation. The electron temperature and plasma density can be obtained from current-voltage (I-V) characteristics of micro Langmuir probe, in which negative to positive bias voltage was applied to the probe. And Efficiency is calculated by formula related discharge power and light emission. Those experiments operated as various discharge time ($0{\sim}72$ Hours). As a result of this experiment, Electron Temperature was increased from 2eV to 5eV after discharge running time of 20 hours and saturates beyond 20 hours. The plasma density is inversely proportional to the square root of electron temperature. So the plasma density was decreased from $1.8{\times}10^{12}cm^{-3}$ to $8{\times}10^{11}cm^{-3}$ at above discharge running time. And the Efficiency was reduced to 70% at 60hours of discharge running time.

• Journal of the Korean Institute of Telematics and Electronics D
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• v.35D no.9
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• pp.42-47
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• 1998

We have fabricated electron-optical lens for micro E-beam system that can overcome the limitation of current E-beam lithography. Our electron-optical lens consists of multiple silicon electrodes which were fabricated by micromachining technology and assembled by anodic bonding. The assembled system was installed in UHV chamber to observe the emission characteristics of focused electrons by the electro-optical lens. We used STM(Scanning Tunneling Microscope) tip for electron source. By performing lithography with the focused electrons with PMMA(poly-methylmethacrylate) as E-beam resist. We could draw 0.13${\mu}{\textrm}{m}$ nano-scale lines.

• Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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• v.13 no.3
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• pp.40-47
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• 1999

We have established a pulsed low-energy large-aIXTture electron beam(LELAEB) generation system with an energy of 2OO[keV], current of 1[A], pulse repetition rate of 200[Hz], and several tens of ${\mu}s$ pulse width. The system is characterized by a cold cathode that is simpler than the hot cathode. Electron beam does not need to be scanned over target objects because of large beam aIXTture of $300[\textrm{cm}^2]$. Electron source is secondary electrons that are generated when the ions from the glow discharge collide on the cathode surface. In this paper, We report about the design and manufacture of LELAEB generation system based on the theoretical analysis in order to study lXlssibility of increasing the efficiency of IELAEB accelerator. We also report on the possibility of large aperture beam current generation and the current density uniformity based on the experiIrental results.esults.

• Bulletin of the Society of Naval Architects of Korea
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• v.20 no.2
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• pp.51-59
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• 1983

The versatile practical use of electron beam welding which is very high energy density is still in early stage, but in the special welding field, the welding process is used in manufactured goods. The investigation for electron beam welding up to the present was almost achieved not for the mechanical properties of welded joint but for the process itself. On this investigation, the fatigue strength, crack propergation phenomena and hardness of weld metal and heat affected zone of partially penetrated welded joint of HT80 steel by electron beam welding was accomplished. The tensile fatigue strength in weld line direction of the joint was about $25kg/mm^2$. There still appeared spikes on the tips of penetration, and the crack initiated at the tips of spikes not from the roots. The hardness of the weld metal was higher than it of base metal because of production of martensite by rapid cooling.

• Journal of Electrical Engineering and Technology
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• v.9 no.3
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• pp.984-990
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• 2014

Polymers are the most commonly used di-electrics because of their reliability, availability, ease of fabrication and cost. The commercial and industrial demand for advanced polymeric materials which are capable of being used in harsh environment is need of the hour. The study of the effect of electron beam irradiation on polymeric materials is an area of rapidly increasing interest. This paper discusses the resultant beneficial effects of electron beam irradiation on the SiR-EPDM blend having 50:50 composition. The changes in mechanical and electrical properties of SiR-EPDM blend which are exposed to three different doses of electron beam radiation namely 5 Mrad, 15 Mrad and 25 Mrad are presented. The irradiated blends are analyzed for their electro-mechanical and physico chemical properties. The electrical changes induced by irradiation are investigated by arc resistance, surface resistivity and volume resistivity measurements as per ASTM standards. The mechanical changes are observed by the measurement of tensile strength and elongation at break. Physico chemical investigation has been done using the FTIR, in order to investigate the irradiation induced chemical changes.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.06a
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• pp.378-378
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• 2007

In this study, liquid crystal (LC) aligning capabilities for homeotropic alignment on the $ZrO_x$ thin film by electron beam evaporation method were investigated. Also, the control of pretilt angles and thermal stabilities of the NLC treated on $ZrO_x$ thin film were investigated. The uniform LC alignment on the $ZrO_x$ thin film surfaces and good thermal stabilities with electron beam evaporation can be achieved. It is considerated that the LC alignment on the $ZrO_x$ thin film by electron beam evaporation is attributed to elastic interaction between LC molecules and micro-grooves at the $ZrO_x$ thin film surface created by evaporation. In addition, it can be achieved the good electro-optical (EO) properties of the VA-LCD on $ZrO_x$ thin film layer with. oblique electron beam evaporation.

• Journal of Radiation Protection and Research
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• v.26 no.3
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• pp.333-335
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• 2001

The 2 GeV electron linac, the injector of the Pohang Light Source, was used as a photo-neutron source for radiation shielding research. The operational beam parameters are the nominal electron intensity of $0.5\;{\sim}5\;nC/sec$, the repetition rate of 10 Hz, and the beam pulse length of 1.0 nsec. One electron beam line was modified in order to install the target systems for producing pulsed photo-neutrons. The neutron spectrum and intensity were investigated by the time-of-flight technique. The reliable maximum energy of the measured neutrons was about 500 MeV. The number of neutrons above 20 MeV produced by one 1 GeV electron in a thick Pb target was about $6.45{\times}10^{-4}/sr$ at 90 degrees to the beam axis. The status of the photo-neutron source and the application research are presented.