• 제목/요약/키워드: Electron-Beam

검색결과 2,207건 처리시간 0.041초

Beam 전자와 중성 Plasma 사이의 상호작용에 관한 2차원적 수치계산 (TWO DIMENSIONAL SIMULATION OF BEAM INJECTION INTO NEUTRAL PLASMA)

  • 선종호;민경욱
    • Journal of Astronomy and Space Sciences
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    • 제7권2호
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    • pp.113-123
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    • 1990
  • 전자 beam이 중성 plasma계에 들어왔을 때의 상호작용을 이차원 정전 model을 사용하여 수치계산을 한 결과 beam의 밀도변화에 따라 상호작용이 큰 변화를 보이는 것으로 나타났다. beam 전자의 밀도가 주변 전자의 밀도보다 낮을 때는 많은 양의 beam들이 주변 plasma와의 상호작용을 통해 위상공간에서 vortex 구조를 보이며 입사지역으로부터 멀리 진행할 수 있었던 반면 beam 전자들의 밀도가 높을 때는 대부분의 beam 전자들이 입사지역으로 되돌아오는 희귀전류를 형성하였다. 이 때 자기장의 게기에 따라 전자보다 훨씬 질랴이 큰 ion들이 가속될 수도 있으며 전자들의 전파와 상호작용의 양상이 크게 바뀔 수 있는 것으로 나타났다.

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Microscale BTS sculptured by electron beam

  • Choi, Haneul;Jeong, Young Woo;Chang, Hye Jung
    • Applied Microscopy
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    • 제49권
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    • pp.4.1-4.2
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    • 2019
  • We applied the advanced bitmap-assisted patterning function of focused ion beam to fabricate microscale sculpture of the 'BangTanSoNyeonDan' known as BTS members, the world-wide famous K-pop boyband. With the help of an electron microscope, you can carve your idols on your accessories at micro scale. Fun applications of electron microscopes are not limited to science.

Measurement of Ion-induced Secondary Electron Emission Yield of MgO Films by Pulsed Ion Beam Method

  • Lee, Sang-Kook;Kim, Jae-Hong;Lee, Ji-Hwa;Whang, Ki-Woong
    • Journal of Information Display
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    • 제3권1호
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    • pp.17-21
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    • 2002
  • Measurement of the ion-induced secondary electron emission coefficient (${\gamma}_i$) for insulating films is hampered by an unavoidable charging problem. Here, we demonstrate that a pulsed ion beam technique is a viable solution to the problem, allowing for accurate measurement of ${\gamma}_i$ for insulating materials. To test the feasibility of the pulsed ion beam method, the secondary electron emission coefficient from n-Si(100) is measured and compared with the result from the conventional continuous beam method. It is found that the ${\gamma}_i$ from n-Si(100) by the ion pulsed beam measured to be 0.34, which is the same as that obtained by continuous ion beam. However, for the 1000 A $SiO_2$ films thermally deposited on Si substrate, the measurement of ${\gamma}_i$ could be carred out by the pulsed ion method, even though the continuous beam method faced charging problem. Thus, the pulsed ion beam is regarded to be one of the most suitable methods for measuring secondary electron coefficient for the surface of insulator materials without experiencing charging problem. In this report, the dependence of ${\gamma}_i$ on the kinetic energy of $He^+$ is presented for 1000 ${\AA}$ $SiO_2$ films. And the secondary electron emission coefficient of 1000 ${\AA}$ MgO e-beam-evaporated on $SiO_2/Si$ is obtained using the pulsing method for $He^+$ and $Ar^+$ with energy ranging from 50 to 200 eV, and then compared with those from the conventional continuous method.

전자-빔 조사를 이용한 TiN 박막의 물성변화에 관한 연구 (A Study on the Properties of TiN Films by Using Electron Beam Irradiation)

  • 신창호;성영종;임성열;신기욱;정철우;김선광;김준호;유용주;김대일
    • 열처리공학회지
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    • 제23권1호
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    • pp.29-33
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    • 2010
  • Titanium nitride (TiN) films were deposited on the polycarbonate substrate by using radio frequency (RF) magnetron sputtering without intentional substrate heating. After deposition, the films were bombarded with intense electron beam for 20 minutes. The intense electron irradiation impacts on the crystalline, hardness and surface roughness of the TiN films. The films irradiated with an electron beam of 300 eV show the small grains on the surface, while as deposited TiN films did not showany grains on the surface. Also the surface harness evaluated with micro indenter was increased up to 18 Gpa at electron energy of 900 eV after electron beam irradiation. In addition, surface root mean square (RMS) roughness of the films irradiated with intense electron beam affected strongly. The films irradiated by electron beam with 900 eV have the lowest roughness of 1.2 nm in this study.

Secondary Electron Emission Characteristics of Functional Layer in AC-PDP

  • Son, Chang-Gil;Han, Young-Gyu;Kim, Yong-Hee;Cho, Byeong-Seong;Hong, Young-Jun;Song, Ki-Baek;Bae, Young-Joo;Kim, In-Tae;Choi, Eun-Ha
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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    • pp.736-739
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    • 2009
  • We have studied that the secondary electron emission characteristics of functional layers which have different kinds of MgO sub-micrometer size powder in AC-PDP. We used cathodoluminescence(CL) and gamma focused ion beam (${\gamma}$-FIB) system for measurement of secondary electron emission characteristics. Also we made 6 inch test panel which applied functional layers for evaluation of discharge characteristics.

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Electron Reflecting Layer with the WO3-ZnS:Cu.Al-PbO-SiO2 System Concerned in Doming Property of Shadow Mask in CRT

  • 김상문;조윤래
    • 한국세라믹학회지
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    • 제39권12호
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    • pp.1124-1127
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    • 2002
  • In this paper, we studied the effects of the electron reflection on shadow mask on which the electron reflecting materials with $WO_3-ZnS:Cu.Al-PbO-SiO_2$ system were screen-printed and we evaluated the variation of the electron beam mislanding in CRT. As a result, the green emitted spectra on the electron reflecting layer are observed due to the transformation of the electron energy, when the electron impacted on shadow mask. The beam mislanding is reduced about 40% in comperision with that of CRT made by the conventional method.

열전자형 주사전자현미경 결상특성의 수치해석 (Numerical Analysis for the Image Evaluation of a Thermionic SEM)

  • 정현우;박만진;김동환;장동영;박근
    • 한국공작기계학회논문집
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    • 제16권6호
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    • pp.153-158
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    • 2007
  • The present study covers numerical analysis of a thermionic scanning electron microscope(SEM) column. The SEM column contains an electron optical system in which electrons are emitted and moved to form a focused beam, and this generates secondary electrons from the specimen surfaces, eventually making an image. The electron optical system mainly consists of a thermionic electron gun as the beam source, the lens system, the electron control unit, and the vacuum unit. For a systematic design of the electron optical system, the beam trajectories are investigated through numerical analyses by tracing the ray path of the electron beams, and the quality of resulting image is evaluated from the analysis results.

고분자 표면의 전자빔 조사에 따른 젖음특성 고찰 (Investigation of Wetting Characteristics of Polymer Surfaces according to Electron Beam Irradiation)

  • 이현중;박근;김병남
    • 한국정밀공학회지
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    • 제33권1호
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    • pp.45-51
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    • 2016
  • The present study uses an electron beam (e-beam) to modify the wetting characteristics of thermoplastic polymer surfaces. A high energy e-beam irradiated various polymer surfaces (PET, PMMA, and PC), with variations in irradiation time and applied current. The water contact angles were measured on the e-beam irradiated surfaces in order to investigate the changes in the surface energy and the relevant wettability. Furthermore, XPS analyses were performed to investigate the chemical composition change in the e-beam irradiated surfaces; the results showed that the hydrophilic groups (C-O) increased after the electron beam irradiation. Also, water collection tests were performed for various polymer samples in order to investigate the effect of the surface energy on the ability of water collection, from which it can be seen that the irradiated surfaces revealed better water-collecting capability than pure polymer surfaces.

국부가열에 의한 Tension Mask 의 열변형 해석 및 전자빔의 오착 예측 (Analysis of Tension Mask Thermal Deformations under Localized Heating and Prediction of Electron Beam Landing Shifts)

  • 신운서;유세준;장보웅
    • 한국정밀공학회지
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    • 제16권8호
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    • pp.138-148
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    • 1999
  • Thermal deformations of tension mask under localized heating are analyzed using finite element method and electron beam landing shifts are predicted by the analysis results. In CRT, electron beam landing shifts due to thermal deformations of the tension mask make the color purity of screen worse. In order to get the final results of thermal deformations, firstly the tension processes of the mask and following welding processes between the tensional mask and rail must be analyzed sequentially. And then, nonlinear transient thermo-elastic finite element analysis is performed on every part inside CRT including tension mask, wherein thermal radiation is a main heat transfer mechanism. Because the tension mask has numerous slits, the effective thermal conductivity and effective and effective elastic modulus is calculated, and the tension mask is modeled as a shell without slits. From the displacement results of tension mask, electron beam landing shifts is calculated directly. Experiments are performed to confirm our analysis results. Temperature distributions and beam landing shifts of tension mask are measured and the results are in good agreement with those of analyses.

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