• Title/Summary/Keyword: Electron emission

검색결과 2,160건 처리시간 0.031초

Measurement of electron temperature and density using Stark broadening of the coaxial focused plasma for extreme ultraviolet (EUV) lithography

  • Lee, Sung-Hee;Hong, Young-June;Choi, Eun-Ha
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2009년도 제38회 동계학술대회 초록집
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    • pp.475-475
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    • 2010
  • We have generated Ar plasma in dense plasma focus device with coaxial electrodes for extreme ultraviolet (EUV) lithography and investigated an emitted visible light for electro-optical plasma diagnostics. We have applied an input voltage 4.5 kV to the capacitor bank of 1.53 uF and the diode chamber has been filled with Ar gas of pressure 8 mTorr. The inner surface of the cylindrical cathode has been attatched by an acetal insulator. Also, the anode made of tin metal. If we assumed that the focused plasma regions satisfy the local thermodynamic equilibrium (LTE) conditions, the electron temperature and density of the coaxial plasma focus could be obtained by Stark broadening of optical emission spectroscopy (OES). The Lorentzian profile for emission lines of Ar I of 426.629 nm and Ar II of 487.99 nm were measured with a visible monochromator. And the electron density has been estimated by FWHM (Full Width Half Maximum) of its profile. To find the exact value of FWHM, we observed the instrument line broadening of the monochromator with a Hg-Ar reference lamp. The electron temperature has been calculated using the two relative electron density ratios of the Stark profiles. In case of electron density, it has been observed by the Stark broadening method. This experiment result shows the temporal behavior of the electron temperature and density characteristics for the focused plasma. The EUV emission signal whose wavelength is about 6 ~ 16 nm has been detected by using a photo-detector (AXUV-100 Zr/C, IRD). The result compared the electron temperature and density with the temporal EUV signal. The electron density and temperature were observed to be $10^{16}\;cm^{-3}$ and 20 ~ 30 eV, respectively.

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유리화 비정형 탄소의 전계방출 거동 (Characterization of field emission behavior from vitreous carbon)

  • 안상혁;이광렬;은광용
    • 한국진공학회지
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    • 제9권2호
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    • pp.122-129
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    • 2000
  • Mo이 코팅된 유리기판 상에 전기영동법으로 도포된 유리화 비정형 탄소분말의 전계방출 특성을 조사하였다. 탄소의 $sp^2$결합만으로 이루어진 유리화 비정형 탄소는 전계방출을 얻기 위한 초기화 공정 없이도 규칙적인 전계방출 거동을 보이고 있었다. 전자의 방출이 시작되는 임계전장의 크기는 3에서 4 MV/m 구간의 값을 가지고 있었으며, Fowler-Nordheim plot로부터 평가된 effective work function은 약 0.06 eV였다. 전류전압거동의 반복측정에 의해 관찰된 바와 같이 전계방출의 안정성 면에서 유리화 비정형 탄소는 Si tip보다 우수하였으며, 도포된 전체면적에서 전면발광의 가능성을 확인할 수 있었다. 이러한 결과는 탄소계 물질에서 관찰되는 전계방출이 탄소의 $sp^3$결합과 밀접하게 관련되어 있지 않으며, 전자가음극물질의 표면으로 이동하는데 필요한 전기전도성, 혹은 기판과 음극물질 계면에서의 전자이동 등이 전계방출의 거동을 결정하는 중요한 요인임을 보여주고 있다.

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Relationship between Secondary Electron Emissions and Film Thickness of Hydrogenated Amorphous Silicon

  • Yang, Sung-Chae;Chu, Byung-Yoon;Ko, Seok-Cheol;Han, Byoung-Sung
    • KIEE International Transactions on Electrophysics and Applications
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    • 제4C권4호
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    • pp.185-189
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    • 2004
  • The temporal variation of a secondary electron emission coefficient (${\gamma}$ coefficient) of hydrogenated amorphous silicon (a-Si:H) was investigated in a dc silane plasma. Estimated ${\gamma}$ coefficients have a value of 2.73 ${\times}$ 10$^{-2}$ on the pure aluminum electrode and 1.5 ${\times}$ 10$^{-3}$ after 2 hours deposition of -Si:H thin films on a cathode. It showed an abrupt decrease for about 30 minutes before saturation. The variation of the ${\gamma}$ coefficient was estimated as a function of the thin film thickness, and the film thickness was about 80 nm after 30 minutes deposition time. These results are compared with the results of a computer simulation for ion penetration into a cathode.

Switch-on Phenomena and Field Emission from Single-Walled Carbon Nanotubes Embedded in Glass

  • Daradkeh, Samer I.;Mousa, Marwan S.
    • Applied Microscopy
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    • 제47권3호
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    • pp.86-94
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    • 2017
  • In this study, we will describe a new design of carbon nanotubes tip. Single-walled carbon nanotubes produced using high-pressure CO over Fe particles (HiPCO) at CNI, Houston, TX used in this study. These tips were manufactured by employing a drawing technique using glass puller. Field electron microscopies with tips (cathode) to screen (Anode) separation of ~10 mm was used to characterize the electron emitters. The system was evacuated down to base pressure of (${\sim}10^{-8}$ mbar) when baked at up to (${\sim}200^{\circ}C$) over night. An electron field emission patterns, as well as current versus voltage characteristics and Fowler-Nordheim plots, are discussed.

Actinometry를 이용한 Ta 미세 패턴 식각 특성에 관한 연구 (Study on the Etching Characteristics of Fine Ta patterns by Actinometry Method)

  • 김상훈;안진호
    • 마이크로전자및패키징학회지
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    • 제7권4호
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    • pp.43-47
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    • 2000
  • Electron cyclotron resonance플라즈마 식자 장비를 이용하여 순수 chlorine플라즈마로 Ta박 막의 식각 특성에 관해 조사하였다. Ta박막의 시각 기구를 연구하기 위해 Optical emission actinometry (OEA)를 사용하였고 OEA조사를 통하여 최적의 공정 조건을 얻었다. 이것에 기초하여 2단계 식각을 수행하였고 마이크로 로딩 철상을 성공적으로 제어하면서 0.15 $\mu\textrm{m}$ L & S 의 우수한 단면을 얻었다.

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Ion Induced Secondary Electron Emission of MgO with Patterned Gold Line Charge Neutralization

  • Lee, Jong-Wan;Lee, Kie-Young;Kim, Hong-Gyu;Ahn, Joon-Hyung;Jung, Won-Joon;Yoon, Sean-J;Byungdu Oh
    • Journal of Korean Vacuum Science & Technology
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    • 제5권1호
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    • pp.7-10
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    • 2001
  • Ion induced secondary electron emission coefficients γ of protecting layers of an AC plasma display panel(AC-PDP) have been measured. In order to solve the surface charging effect during the measurement at insulating samples like MgO, a new method with the patterned gold line charge neutralization has been introduced. The measurement was performed at the samples, MgO and MgO+MgF$_2$, which showed a great difference in the firing voltage between the two protecting layers. The γ value has been compared with the firing voltage Vf of the AC-PDP with the same protecting layer. Correct relationship between γ and Vf has been observed. Thus, the patterned gold line method has been proven to be successful for the measurement of the secondary electron emission yield at insulator sample surfaces.

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초소형 질량 분석기를 위한 이온 발생기의 열전자 방출 시험 (Hot Electron Emission Test of an Ion Source for a Micro Mass Spectrometer)

  • 운현중;김정훈;박태규;양상식;정광우
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제50권8호
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    • pp.419-422
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    • 2001
  • This paper presents the principle and fabrication of a novel micro mass spectrometer and emission test of hot electron for ionization. A micro mass spectrometer consists of a micro ion source and a micro ion separator. The micro ion source consists of a hot filament and grid electrodes. Electrons emitted from a hot filament are to ionize some sample molecules. The ions are accelerated to an ion detector by an electric field. Mass can be analyzed by using the time of fight depending on the mass-to-charge ratio. The current of hot electron emission from the hot filament is measured for various input voltages.

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Control of secondary electron emission coefficient with microstructural change of polycrystalline MgO films

  • Yu, Hak-Ki;Lee, Jong-Lam;Park, Eung-Chul;Kim, Jae-Sung;Ryu, Jae-Hwa
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2008년도 International Meeting on Information Display
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    • pp.1445-1447
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    • 2008
  • Micro crystal structure of polycrystalline MgO film is controlled by adjusting the energy of particles arrived at the substrate during deposition. The change of crystal structure affects on the total area of (200) surface where the oxygen vacancies are formed easily, resulting in the change of secondary electron emission (SEE) coefficient($\gamma$).

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Electron Emission Properties of CNT Arrays Grown with MIcro Molding In Capillary (MIMIC) Assisted Process

  • Lim, Han-Eol;Ryu, Je-Hwang;Lim, Joon-Won;Son, Byoung-Taek;Lee, Yi-Sang;Jang, Jin;Park, Kyu-Chang
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2008년도 International Meeting on Information Display
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    • pp.1535-1538
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    • 2008
  • Carbon nanotube arrays were fabricated using micro molding in capillary (MIMIC) process. Patterns remained on the surface in the pattern complementary to that present in the mold. CNTs were selectively grown on the MIMIC patterned sites with a triode PECVD. And turn on field for $10\;{\mu}A/cm^2$ electron emission current was $2.2\;V/{\mu}m$ turn on field.

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Characteristics of $12CaO\;7Al_2O_3$ Electride as Electron Emission Layer for PDP

  • Choi, Hak-Nyun;Kim, Yong-Seog
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.II
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    • pp.836-837
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    • 2005
  • In order to enhance discharge efficiency of Plasma Display Panel (PDP), we used an electride as electron emission layer for PDP during PDP discharge process. As the electride used in this study, $12CaO7Al_2O_3$, has low work function, it is expected to yield high electron emission during glow discharge process. $12CaO7Al_2O_3$ powder was synthesized from $CaCO_3$ and $Al(OH)_3$ powder and Ca treated for realization of electride characteristics. The $12CaO7Al_2O_3$ powder was coated on the surface of dielectric layer of PDP and discharge characteristics of electride material were evaluated.

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