• 제목/요약/키워드: Electron backscattering diffraction

검색결과 29건 처리시간 0.021초

High-Temperature Deformation Behavior of MnS in 1215MS Steel

  • Huang, Fei-Ya;Su, Yen-Hao Frank;Kuo, Jui-Chao
    • Metals and materials international
    • /
    • 제24권6호
    • /
    • pp.1333-1345
    • /
    • 2018
  • The effect of manganese sulfide (MnS) inclusions on the machinability of free-cutting steel is based on their morphology, size and distribution. Furthermore, the plasticity of MnS is high during the hot working caused different characterization of MnS. In this study, the deformation behavior of MnS in 1215MS steel after a thermomechanical process was investigated at 1323 K. The microstructures of MnS inclusions were characterized by optical microscopy, scanning electron microscopy, energy-dispersive spectrometry, and electron backscattering diffraction (EBSD). As the thickness reduction of the inclusions increased from 10 to 70%, their average aspect ratio increased from 1.20 to 2.39. In addition, the deformability of MnS inclusions was lower than that of the matrix. The possible slip systems of A, B, C, and D plane traces were (${\bar{1}}0{\bar{1}}$)[${\bar{1}}01$], ($10{\bar{1}}$)[101], (011)[$01{\bar{1}}$], and (110)[$1{\bar{1}}0$]. Furthermore, the EBSD measurements suggested that slip planes in MnS inclusions occur on {110} planes.

Texture Characteristics of TiN Film by Electron Backscatter Diffraction

  • Jeong, Bong-Yong
    • 대한금속재료학회지
    • /
    • 제50권12호
    • /
    • pp.867-871
    • /
    • 2012
  • The microstructure and texture of TiN coatings on a Ni-based super-alloy were characterized by the automated version of electron backscatter diffraction (EBSD), EBSD techniques were used to investigate the very fine TiN grain shape and crystal orientation. This study confirmed that EBSD techniques provide a very useful tool for characterization of coating materials. The TiN grains had a special texture, a {001}-fiber texture in the coating layer. It was also found that, in severe environments, the coating performance of equiaxial and randomly oriented TiN is superior to that with columnar structures.

마찰접합 된 STK400 Tube의 미세조직과 기계적 특성 평가 (Evaluation of the Microstructures and Mechanical Properties on Friction Welded STK400 Tube)

  • 김경우;송국현
    • 한국재료학회지
    • /
    • 제29권1호
    • /
    • pp.30-36
    • /
    • 2019
  • We evaluate the properties of friction welded STK400 steel tube in terms of the relationship between microstructures and mechanical properties. Friction welding is conducted at a rotation speed of 1,600 rpm and upset time of 3-7 sec for different thicknesses of STK 400 tubes. To analyse the grain boundary characteristic distributions(GBCDs) in the welded zone, electron backscattering diffraction(EBSD) method is introduced. The results show that a decrease in welding time (3 sec.) creates a notable increase grain refinement so that the average grain size decreases from $15.1{\mu}m$ in the base material to $4.5{\mu}m$ in the welded zone. These refined grains achieve significantly enhanced microhardness and a slightly higher yield and higher tensile strengths than those of the base material. In particular, all the tensile tested specimens experience a fracture aspect at the base material zone but not at the welded zone, which means a soundly welded state for all conditions.

SUS304합금의 마찰접합특성 평가 (Evaluation of the Friction Welding Properties on SUS304 Alloy)

  • 김영규;송국현;정준기;하태권
    • 소성∙가공
    • /
    • 제33권3호
    • /
    • pp.193-199
    • /
    • 2024
  • The friction welding characteristics of stainless steels, mainly used in energy and chemical plant industries due to its excellent corrosion resistance and high strength, was evaluated in this study. Friction welding was introduced and conducted at a rotation speed of 2,000 RPM, friction pressure of 30 MPa, burn-off length of 5 mm and upset pressure of 110 ~ 200 MPa on rod typed specimens. The grain boundary characteristics distributions such a grain size, shape, misorientation angle and kernel average misorientation of the welds were clarified by electron backscattering diffraction method. The application of friction welding on SUS304 alloy resulted in a significant refinement of the grain size in the weld zone (5.11 mm) compared to that of the base material (48.09 mm). The mechanical properties of the welds, on the other hand, appeared to be relatively low or similar to those of the base material, which were mainly caused by dislocation density in the initial material and grain refinement in the welds.

USE OF SINGLE PRECURORS FOR THE PREP ARATION OF SILICON CARBIDE FILMS

  • Lee, Kyunf-Won;Yu, Kyu-Sang;Kim, Yun-Soo
    • 한국표면공학회지
    • /
    • 제29권5호
    • /
    • pp.467-473
    • /
    • 1996
  • Heteroepitaxial growth of cubic silicon carbide films on Si(001) and Si(111) substrates at temperatures 900-$1000^{\circ}C$ has been achieved by high vacuum chemical vapor deposition using the single precursor 1, 3-disilabutane without carrying out the carbonization process of the substrate surfaces. The deposition temperature range is much lowered compared with conventiontional chemical vapor deposition where separate sources for silicon and carbon are employed. The deposition procedure is quite simple and safe. The qualities of the films were found to be very good judging from the results obtained by various characterization techniques including reflection high energy electron diffraction, X-ray diffraction, X-ray pole figure analysis, Rutherford backscattering spectrometry, Auger depth profiling, and transmission electron diffraction.

  • PDF

Three-Dimensional Automated Crystal Orientation and Phase Mapping Analysis of Epitaxially Grown Thin Film Interfaces by Using Transmission Electron Microscopy

  • Kim, Chang-Yeon;Lee, Ji-Hyun;Yoo, Seung Jo;Lee, Seok-Hoon;Kim, Jin-Gyu
    • Applied Microscopy
    • /
    • 제45권3호
    • /
    • pp.183-188
    • /
    • 2015
  • Due to the miniaturization of semiconductor devices, their crystal structure on the nanoscale must be analyzed. However, scanning electron microscope-electron backscatter diffraction (EBSD) has a limitation of resolution in nanoscale and high-resolution electron microscopy (HREM) can be used to analyze restrictive local structural information. In this study, three-dimensional (3D) automated crystal orientation and phase mapping using transmission electron microscopy (TEM) (3D TEM-EBSD) was used to identify the crystal structure relationship between an epitaxially grown CdS interfacial layer and a $Cu(In_xGa_{x-1})Se_2$ (CIGS) solar cell layer. The 3D TEM-EBSD technique clearly defined the crystal orientation and phase of the epitaxially grown layers, making it useful for establishing the growth mechanism of functional nano-materials.

강소성 가공된 Ni-30Cr 합금의 결정립 미세화와 기계적 물성 향상 (Grain Refinement and Mechanical Properties Improvement in a Severely Plastic Deformed Ni-30Cr Alloy)

  • 송국현;김한솔;김원용
    • 대한금속재료학회지
    • /
    • 제49권8호
    • /
    • pp.649-656
    • /
    • 2011
  • The present study evaluated the microstructures and mechanical properties of severely deformed Ni-30Cr alloys. Cross-roll rolling (CRR) process was introduced as a severe plastic deformation (SPD), and Ni-30Cr alloy sheets were cold rolled to 90% thickness reduction and subsequently annealed at $700^{\circ}C$ for 30 min to obtain the recrystallized microstructure. Electron back-scattering diffraction (EBSD) was introduced to analyze grain boundary character distributions (GBCDs). The application of CRR to the Ni-30Cr alloy was effective in enhancing the grain refinement through heat treatment; consequently, the average grain size was significantly refined from $33{\mu}m$ in the initial material to $0.6{\mu}m$. This grain refinement directly improved the mechanical properties, in which yield and tensile strengths significantly increased relative to those of the initial material. We systematically discuss the grain refinement and accompanying improvement of the mechanical properties, in terms of the effective strain imposed by CRR relative to conventional rolling (CR).

전자 후방 산란 분석기술과 결정소성 유한요소법을 이용한 전해 도금 구리 박막의 결정 방위에 따른 소성 변형 거동 해석 (Analysis of Plastic Deformation Behavior according to Crystal Orientation of Electrodeposited Cu Film Using Electron Backscatter Diffraction and Crystal Plasticity Finite Element Method)

  • 박현;신한균;김정한;이효종
    • 마이크로전자및패키징학회지
    • /
    • 제31권2호
    • /
    • pp.36-44
    • /
    • 2024
  • 구리 전해 도금 기술은 반도체 패키징 및 반도체, 이차 전지 등 다양한 마이크로 전자 산업 분야에서 구리 박막 또는 배선의 제조를 위해 사용되고 있으며, 각 응용처에서 요구하는 특성을 획득하기 위해 이들 구리 박막 또는 배선의 미세조직을 제어하고자 광범위한 연구가 이루어지고 있다. 본 연구에서는 기계적 물성이 우수한 이차 전지용 구리 박막을 제조하기 위해, 이차 전지 제조 공정 중 기계적 또는 열적 하중에 의한 박막의 소성 변형 시 박막을 구성하는 결정립들의 결정학적 이방성의 영향성을 조사하였다. 이를 위해, 상이한 집합조직이 발달한 2 종류의 10 ㎛ 두께 전해 도금 구리 박막에 대해 전자 후방 산란 (electron backscattering diffraction or EBSD) 기술을 이용하여 표면 또는 단면의 결정 방위 지도를 측정하였고, 이들을 초기 입력 정보로 한 결정소성 유한요소해석을 통해 1축 인장 변형에 따른 박막 내부의 국부적 변형 거동을 분석하였다. 이를 통해, 인장 변형률의 증가에 따른 박막 내 소성 변형 불균질성과 집합조직의 변화를 추적하였고, 불균질한 소성 변형을 일으키는 결정립의 결정 방위를 확인하였다.

Epitaxial Overlayers vs Alloy Formation at Aluminum-Transition Metal Interfaces

  • Smith, R.J.
    • 한국진공학회:학술대회논문집
    • /
    • 한국진공학회 1999년도 제17회 학술발표회 논문개요집
    • /
    • pp.29-29
    • /
    • 1999
  • The synthesis of layered structures on the nanometer scale has become essential for continued improvements in the operation of various electronic and magnetic devices. Abrupt metal-metal interfaces are desired for applications ranging from metallization in semiconductor devices to fabrication of magnetoresistive tunnel junctions for read heads on magnetic disk drives. In particular, characterizing the interface structure between various transition metals (TM) and aluminum is desirable. We have used the techniques of MeV ion backscattering and channeling (HEIS), x-ray photoemission (ZPS), x-ray photoelectron diffraction(XPD), low-energy ion scattering (LEIS), and low-energy electron diffraction(LEED), together with computer simulations using embedded atom potentials, to study solid-solid interface structure for thin films of Ni, Fe, Co, Pd, Ti, and Ag on Al(001), Al(110) and Al(111) surfaces. Considerations of lattice matching, surface energies, or compound formation energies alone do not adequately predict our result, We find that those metals with metallic radii smaller than Al(e.g. Ni, Fe, Co, Pd) tend to form alloys at the TM-Al interface, while those atoms with larger atomic radii(e.g. Ti, Ag) form epitaxial overlayers. Thus we are led to consider models in which the strain energy associated with alloy formation becomes a kinetic barrier to alloying. Furthermore, we observe the formation of metastable fcc Ti up to a critical thickness of 5 monolayers on Al(001) and Al(110). For Ag films we observe arbitrarily thick epitaxial growth exceeding 30 monolayers with some Al alloying at the interface, possible driven by interface strain relief. Typical examples of these interface structures will be discussed.

  • PDF

Effects of Sputter Parameters on Electrochromic Properties of Tungsten Oxide Thin Films Grown by RF Sputtering

  • Nah, Yoon-Chae
    • 한국재료학회지
    • /
    • 제21권12호
    • /
    • pp.703-707
    • /
    • 2011
  • The electrochromic properties of tungsten oxide films grown by RF sputtering were investigated. Among the sputter parameters, first the $Ar:O_2$ ratios were controlled with division into only an $O_2$ environment, 1:1 and 4:1. The structure of each film prepared by these conditions was studied by X-ray diffraction, X-ray photoelectron spectroscopy and Rutherford backscattering spectroscopy. The sputter-deposited tungsten oxide films had an amorphous structure regardless of the $Ar:O_2$ ratios. The chemical compositions, however, were different from each other. The stoichiometric structure and low-density film was obtained at higher $O_2$ contents. Electrochemical tests were performed by cyclic voltammetry and chronoamperometry at 0.05 M $H_2SO_4$ solutions. The current density and charge ratio was estimated during the continuous potential and pulse potential cycling at -0.5 V and 1.8 V, respectively. The film grown in a higher oxygen environment had a higher current density and a reversible charge reaction during intercalation and deintercalation. The in-situ transmittance tests were performed by He-Ne laser (633 nm). At higher oxygen contents, a big transmittance difference was observed but the response speed was too slow. This was likely caused by higher film resistivity. Furthermore, the effect of sputtering pressure was also investigated. The structure and surface morphology of each film was observed by X-ray diffraction and scanning electron microscopy. A rough surface was observed at higher sputtering pressure, and this affected the higher transmittance difference and coloration efficiency.