• Title/Summary/Keyword: Electron Flow

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Reduction of Common Mode Voltage in Asymmetrical Dual Inverter Configuration Using Discontinuous Modulating Signal Based PWM Technique

  • Reddy, M. Harsha Vardhan;Reddy, T. Bramhananda;Reddy, B. Ravindranath;Suryakalavathi, M.
    • Journal of Power Electronics
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    • v.15 no.6
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    • pp.1524-1532
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    • 2015
  • Conventional space vector pulse width modulation based asymmetrical dual inverter configuration produces high common mode voltage (CMV) variations. This CMV causes the flow of common mode current, which adversely affects the motor bearings and electromagnetic interference of nearby electronic systems. In this study, a simple and generalized carrier based pulse width modulation (PWM) technique is proposed for dual inverter configuration. This simple approach generates various continuous and discontinuous modulating signals based PWM algorithms. With the application of the discontinuous modulating signal based PWM algorithm to the asymmetrical dual inverter configuration, the CMV can be reduced with a slightly improved quality of output voltage. The performance of the continuous and discontinuous modulating signals based PWM algorithms is explored through both theoretical and experimental studies. Results show that the discontinuous modulating signal based PWM algorithm efficiently reduces the CMV and switching losses.

A Study on the Characteristics of High Pressure DC Glow Discharge with a Narrow Gap (좁은 간격의 고압 DC 글로우 방전에서의 방전물성에 관한 연구)

  • Park, Jae-Seong;Jeong, Heui-Seob;Shin, Buhm-Jae;Whang, Ki-Woong
    • Proceedings of the KIEE Conference
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    • 1995.11a
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    • pp.435-437
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    • 1995
  • It is important to understand tile behaviours of tile high pressure DC glow discharge with a micro gap inside a pixel of the plasmas display panel. We prepared a narrow gap discharge system and have measured electron temperature and density by means of double probe methods in high pressure which was between 100torr and 200torr. And the electrode gap was 7mm. When the pressure varied from 100torr to 200torr, the negative glow was created at a distance less than 1mm from the cathode. And the length of the faraday dark space decreased from 8mm to 5mm. Hence probe measurements was mainly, performed in the region of the Faraday dark space. The dependence of electron temperature and density on the pressure and current density was same with that of the general flow discharge, i.e. as the pressure increased the electron temperature decreased and the density increased. But the spatial electron density distribution in the Faraday dark space was highly distorted because of the effect of high pressure.

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- Invited Review - Hydrogen production and hydrogen utilization in the rumen: key to mitigating enteric methane production

  • Roderick I. Mackie;Hyewon Kim;Na Kyung Kim;Isaac Cann
    • Animal Bioscience
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    • v.37 no.2_spc
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    • pp.323-336
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    • 2024
  • Molecular hydrogen (H2) and formate (HCOO-) are metabolic end products of many primary fermenters in the rumen ecosystem. Both play a vital role in fermentation where they are electron sinks for individual microbes in an anaerobic environment that lacks external electron acceptors. If H2 and/or formate accumulate within the rumen, the ability of primary fermenters to regenerate electron carriers may be inhibited and microbial metabolism and growth disrupted. Consequently, H2- and/or formate-consuming microbes such as methanogens and possibly homoacetogens play a key role in maintaining the metabolic efficiency of primary fermenters. There is increasing interest in identifying approaches to manipulate the rumen ecosystem for the benefit of the host and the environment. As H2 and formate are important mediators of interspecies interactions, an understanding of their production and utilization could be a significant starting point for the development of successful interventions aimed at redirecting electron flow and reducing methane emissions. We conclude by discussing in brief ruminant methane mitigation approaches as a model to help understand the fate of H2 and formate in the rumen ecosystem.

Measurement of Plasma Parameters (Te and Ne) and Reactive Oxygen Species in Nonthermal Bioplasma Operating at Atmospheric Pressure

  • Choi, Eun Ha;Kim, Yong Hee;Kwon, Gi Chung;Choi, Jin Joo;Cho, Guang Sup;Uhm, Han Sup;Kim, Doyoung;Han, Yong Gyu;Suanpoot, Pradoong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.141-141
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    • 2013
  • We have generated the needle-typed nonthermal plasma jet by using an Ar gas flow at atmospheric pressure. Diagnostics of electron temperature anddensity is critical factors in optimization of the atmospheric plasma jet source in accordance with the gas flow rate. We have investigated the electron temperature and density of plasma jet by selecting the four metastable Ar emission lines based on the atmospheric collisional radiative model and radial profile characteristics of current density, respectively. The averaged electron temperature and electron density for this plasma jet are found to be ~1.6 eV and ~$3.2{\times}10^{12}cm^{-3}$, respectively, in this experiment. The densities of OH radical species inside the various bio-solutions are found to be higher by about 4~9 times than those on the surface when the argon bioplasma jet has been bombarded onto the bio-solution surface. The densities of the OH radicalspecies inside the DI water, DMEM, and PBS are measured to be about $4.3{\times}10^{16}cm^{-3}$, $2.2{\times}10^{16}cm^{-3}$, and $2.1{\times}10^{16}cm^{-3}$, respectively, at 2 mm downstream from the surface under optimized Ar gas flow 250 sccm.

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Effect of Substrate Temperature and O2 Introduction With ITO Deposition by Electron Beam Evaporation on Polycyclic Olefin Polymer (전자빔으로 폴리사이클릭 올레핀 기판에 ITO 증착시 기판온도 및 산소 도입의 영향)

  • Ahn, Hee-Jun;Ha, KiRyong
    • Applied Chemistry for Engineering
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    • v.16 no.6
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    • pp.742-748
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    • 2005
  • Transparent conductive indium-tin oxide (ITO) films are widely used as transparent electrodes for flat panel displays. Many of the ITO films for practical use have been prepared by magnetron sputtering, chemical vapor deposition, electron beam evaporation, etc. An oxide target composed of 10 wt% $SnO_2$ and 90 wt% $In_2O_3$ has been deposited onto polycyclic olefin polymer (POP) substrate by electron beam evaporation. POP has a higher glass transition temperature ($Tg=330^{\circ}C$) than other conventional polymers. In this study, the effects of substrate temperature and the $O_2$ introduction flow rate were investigated in terms of physical, electrical and optical properties of deposited ITO films. We investigated the effects of processing variables such as substrate temperature and the oxygen introduction flow rate. The best electrical and optical properties of deposited ITO films obtained from this study were electrical resistivity value of ${\rho}=1.78{\times}10^{-3}{\Omega}{\cdot}cm$ and optical transmittance of about 85% at 8 sccm (Standard Cubic Centimeter per Minute) $O_2$ introduction flow rate, $5{\AA}/sec$ deposition rate, $1000{\AA}$ deposited ITO thickness and $200^{\circ}C$ substrate temperature.

Properties of Nitrogen and Aluminum Codoped ZnO Thin Films Grown by Radio-frequency Magnetron Sputtering (라디오파 마그네트론 스퍼터링으로 성장한 질소와 알루미늄 도핑된 ZnO 박막의 특성)

  • Cho, Shin-Ho;Cho, Seon-Woog
    • Journal of Surface Science and Engineering
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    • v.41 no.4
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    • pp.129-133
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    • 2008
  • Nitrogen and aluminum codoped ZnO(NAZO) thin films were grown on glass substrates with changing the nitrogen flow ratio by radio-frequency magnetron sputtering. The structural, optical, and electrical properties of the NAZO films were investigated. The surface morphologies and the structural properties of the thin films were analyzed by using the X-ray diffraction and scanning electron microscopy. The NAZO thin film, deposited at nitrogen flow ratio of 0%, showed a strongly c-axis preferred orientation and the lowest resistivity of $3.2{\times}10^{-3}{\Omega}cm$. The intensity of ZnO(002) diffraction peak was decreased gradually with increasing the nitrogen flow ratio. The optical properties of the films were measured by UV-VIS spectrophotometer and the optical transmittances for all the samples were found to be an average 90% in the visible range. Based on the transmittance value, the optical bandgap energy for the NAZO thin film deposited at nitrogen flow ratio of 0% was determined to be 3.46 eV. As for the electrical properties, the carrier concentration and the hall mobility were decreased, but the electrical resistivity was increased as the nitrogen flow ratio was increased.

Investigation of Liquid Droplet Impingement Erosion Corrosion based on the Flow Rate of Anodized 5083-H321 Al Alloy in Seawater (경질양극산화된 5083-H321 알루미늄 합금의 해수 내 액적충격침식부식 손상 연구)

  • Shin, Dong-Ho;Kim, Seong-Jong
    • Corrosion Science and Technology
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    • v.19 no.6
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    • pp.310-317
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    • 2020
  • This study investigated the damage to the specimen due to liquid droplet impingement erosion corrosion, which improved the corrosion resistance and durability via hard anodization of 5083-H321 aluminum alloy, which is widely used for small ships and marine structures. The experiment combined liquid droplet impingement erosion and electrochemical equipment with the flow rates in natural seawater solution. Subsequently, Tafel extrapolation of polarization curves was performed to evaluate damage due to the liquid droplet impingement erosion corrosion. The damaged surface was observed using a 3D microscope and a scanning electron microscope. The degree of pitting damage was measured using the Image J program, and the surface hardness was measured using the micro-Vickers hardness tester. The corrosion current density, area, depth, and ratio of the damaged areas increased with the increase in flow rate. The grain size of the damaged area at a flow rate of 20 m s-1 showed fewer and minor differences in height, and a smooth curved shape. The hardness of the damaged surface tended to decrease with increase in flow rate.

IN-VITRO CHARACTERIZATION OF THE THROMBOTIC POTENTIAL OF WHOLE BLOOD USING AN IMPEDANCE METHOD

  • Granaderos, Carlo;Park, Joong-Chun;Pak, Bock-Choon;Kim, Cheol-Sang;Cho, Young-I
    • Proceedings of the KSME Conference
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    • 2007.05b
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    • pp.2785-2790
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    • 2007
  • This study presents an impedance method of in-vitro characterization of the thrombotic potential of whole blood. Whole blood samples of 0.2 cc were put into a micro-cell with embedded three electrodes immediately after venepuncture at $37^{\circ}C$. Anti-coagulated blood samples were also collected for hematocrit and blood viscosity analyses. The rate of change of electron flow was measured, which indicates the inverse of the thrombotic potential. A sudden decrease in the rate of change of electron flow was observed at a time equal to approximately 110 seconds. This sudden decrease was significantly delayed in anti-coagulated samples. After the sudden decrease, the rate continued to decrease, reaching a minimum value in unadulterated samples while the change in the rate in the anti-coagulated ones was found rather moderate. Based on these preliminary findings, the present method may be of used as a new tool for the diagnosis of the thrombotic potential of whole blood.

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Comparison between Ionospheric and plasmaspheric TECs measured from JASON satellite: plasmaspheric flux

  • Lee, Han-Byul;Jee, Geon-Hwa;Kim, Yong-Ha;Chung, Jong-Kyun
    • Bulletin of the Korean Space Science Society
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    • 2011.04a
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    • pp.27.3-27.3
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    • 2011
  • The plasmasphere is filled with the ions and electron transported mostly from the mid-latitude ionosphere. In the topside ionosphere where the $O^+$ ions are still major ions, the $O^+$ ions are in chemical equilibrium with the $H^+$ ions and exchange their charges with each other's parent atoms with similar rates in both reactions. During the day, the newly produced $H^+$ ions flow upward to fill the plasmasphere while they flow downward and contribute to the maintenance of the ionospheric density at night under the geomagnetically quiet condition. The ionosphere and plasmasphere are coupled by these plasma fluxes and therefore strongly affect each other. In order to study these coupling we utilized the plasma density measurements from JASON satellite. This satellite measures vertical total electron content (TEC) from the ground to the satellite orbit (about 1336 km) and slant TEC from the satellite orbit to much higher GPS satellites by using the on-board dual-frequency altimeter and GPS receiver, respectively. The former measurement can represent the ionospheric TEC while the latter can represent the plasmaspheric TEC in the equatorial region. We compared these data with different seasons, solar activities and local times, and the results will be presented.

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High Electrical Current Stressing Effects on the Failure Mechanisms of Austudbumps/ACFFlip Chip Joints (고전류 스트레싱이 금스터드 범프를 이용한 ACF 플립칩 파괴 기구에 미치는 영향)

  • Kim Hyeong Jun;Gwon Un Seong;Baek Gyeong Uk
    • Proceedings of the International Microelectronics And Packaging Society Conference
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    • 2003.11a
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    • pp.195-202
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    • 2003
  • In this study, failure mechanisms of Au stud bumps/ACF flip chip joints were investigated underhigh current stressing condition. For the determination of allowable currents, I-V tests were performed on flip chip joints, and applied currents were measured as high as almost 4.2Amps $(4.42\times10^4\;Amp/cm^2)$. Degradation of flip chip joints was observed by in-situ monitoring of Au stud bumps-Al pads contact resistance. All failures, defined at infinite resistance, occurred at upward electron flow (from PCB pads to chip pads) applied bumps (UEB). However, failure did not occur at downward electron flow applied bumps (DEB). Only several $m\Omega$ contact resistance increased because of Au-Al intermetallic compound (IMC) growth. This polarity effect of Au stud bumps was different from that of solder bumps, and the mechanism was investigated by the calculation of chemical and electrical atomic flux. According to SEM and EDS results, major IMC phase was $Au_5Al_2$, and crack propagated along the interface between Au stud bump and IMC resulting in electrical failures at UEB. Therefore. failure mechanisms at Au stud bump/ACF flip chip Joint undo high current density condition are: 1) crack propagation, accompanied with Au-Al IMC growth. reduces contact area resulting in contact resistance increase; and 2) the polarity effect, depending on the direction of electrons. induces and accelerates the interfacial failure at UEBs.

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