• Title/Summary/Keyword: Electrode interface

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Direct Imaging of Polarization-induced Charge Distribution and Domain Switching using TEM

  • O, Sang-Ho
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.08a
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    • pp.99-99
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    • 2013
  • In this talk, I will present two research works in progress, which are: i) mapping of piezoelectric polarization and associated charge density distribution in the heteroepitaxial InGaN/GaN multi-quantum well (MQW) structure of a light emitting diode (LED) by using inline electron holography and ii) in-situ observation of the polarization switching process of an ferroelectric Pb(Zr1-x,Tix)O3 (PZT) thin film capacitor under an applied electric field in transmission electron microscope (TEM). In the first part, I will show that strain as well as total charge density distributions can be mapped quantitatively across all the functional layers constituting a LED, including n-type GaN, InGaN/GaN MQWs, and p-type GaN with sub-nm spatial resolution (~0.8 nm) by using inline electron holography. The experimentally obtained strain maps were verified by comparison with finite element method simulations and confirmed that not only InGaN QWs (2.5 nm in thickness) but also GaN QBs (10 nm in thickness) in the MQW structure are strained complementary to accommodate the lattice misfit strain. Because of this complementary strain of GaN QBs, the strain gradient and also (piezoelectric) polarization gradient across the MQW changes more steeply than expected, resulting in more polarization charge density at the MQW interfaces than the typically expected value from the spontaneous polarization mismatch alone. By quantitative and comparative analysis of the total charge density map with the polarization charge map, we can clarify what extent of the polarization charges are compensated by the electrons supplied from the n-doped GaN QBs. Comparison with the simulated energy band diagrams with various screening parameters show that only 60% of the net polarization charges are compensated by the electrons from the GaN QBs, which results in the internal field of ~2.0 MV cm-1 across each pair of GaN/InGaN of the MQW structure. In the second part of my talk, I will present in-situ observations of the polarization switching process of a planar Ni/PZT/SrRuO3 capacitor using TEM. We observed the preferential, but asymmetric, nucleation and forward growth of switched c-domains at the PZT/electrode interfaces arising from the built-in electric field beneath each interface. The subsequent sideways growth was inhibited by the depolarization field due to the imperfect charge compensation at the counter electrode and preexisting a-domain walls, leading to asymmetric switching. It was found that the preexisting a-domains split into fine a- and c-domains constituting a $90^{\circ}$ stripe domain pattern during the $180^{\circ}$ polarization switching process, revealing that these domains also actively participated in the out-of-plane polarization switching. The real-time observations uncovered the origin of the switching asymmetry and further clarified the importance of charged domain walls and the interfaces with electrodes in the ferroelectric switching processes.

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Electrochemical Properties of Carbon Felt Electrode for Vanadium Redox Flow Batteries by Liquid Ammonia Treatment (암모니아수 처리에 따른 바나듐 레독스 흐름전지용 탄소펠트 전극의 전기화학적 특성)

  • Kim, Yesol;Cho, Seho;Park, Se-Kook;Jeon, Jae-Deok;Lee, Young-Seak
    • Applied Chemistry for Engineering
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    • v.25 no.3
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    • pp.292-299
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    • 2014
  • In this study, nitrogen doped carbon felt (CFt) is prepared using thermal oxidation and liquid phase ammonia treatment to improve the efficiency for vanadium redox flow batteries (VRFB). The electrochemical properties of prepared CFt electrodes are investigated using cyclic voltammetry (CV) and charge/discharge test. The XPS result shows that the increase of liquid phase ammonia treatment temperature leads to the increased nitrogen functional group on the CFt surface. Redox reaction characteristics using CV reveal that the liquid phase ammonia treated CFt electrodes are more reversible than the thermally oxidized CFt. When CFt is treated by the liquid phase ammonia at $300^{\circ}C$, VRFB cell energy efficiency, voltage efficiency, and current efficiency are increased about 6.93%, 1.0%, and 4.5%, respectively, compared to those of the thermally oxidized CFt. These results are because nitrogen functional groups on CFt help to improve the electrochemical properties of redox reaction between electrode and electrolyte interface.

Solid Electrolyte Composed of Poly(vinyl alcohol) and Oligo(3,4-ethylenedioxythiophene) Having a Crosslinked Structure (가교 구조를 갖는 poly(vinyl alcohol)과 oligo(3,4-ethylenedioxy-thiophene)으로 이루어진 고체 전해질)

  • Gyo Jun Song;Min Su Kim;Nam-Ju Jo
    • Applied Chemistry for Engineering
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    • v.35 no.4
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    • pp.303-308
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    • 2024
  • Currently, lithium secondary batteries have been used as medium- or large-sized energy sources such as electric vehicles and energy storage system (ESS) due to their high energy and eco-friendly characteristics. Currently commercialized lithium secondary batteries do not fully meet the demands for high energy density and safety. Many studies on solid electrolytes are being conducted to satisfy these requirements. In order to commercialize a solid electrolyte, it is important to supplement the low ion conductivity and high interface resistance with an electrode compared to the organic liquid electrolyte. Therefore, in this study, oligo(3,4-ethylenedioxythiophene (EDOT)) is added to poly(vinyl alcohol) (PVA), which is a polymer matrix with ion conductivity and sticky characteristics, to decrease the interfacial resistance with the same type of polythiophene (PTh)-based electrode. In addition, the addition of porous silicon dioxide (SiO2) filler improves lithium salt dissociation ability and increases ionic conductivity. And the electrochemical stability of the solid electrolyte, which has been lowered due to additives, is improved by introducing a cross-linked structure using boric acid (BA).

The Relation between the Phase-Shift Profile for the Intermediate Frequencies and the Langmuir Adsorption Isotherm (중간주파수에서 위상이동 변화와 Langmuir흡착등온식 사이의 관계)

  • Chun Jang Ho;Mun Kyeong Hyeon;Cho Chong Dug
    • Journal of the Korean Electrochemical Society
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    • v.3 no.1
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    • pp.25-30
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    • 2000
  • The relation between the phase-shift profile for the intermediate frequencies and the Langmuir adsorption isotherm at the poly-$Pt/0.1\;M\;H_2SO_4$ aqueous electrolyte interface has been studied using ac impedance measurements, i.e., the phase-shift methods. The suggested interfacial equivalent circuit consists of the serial connection of the electrolyte resistance ($R_S$), the faradaic resistance $(R_F)$ and the equivalent circuit element $(C_P)$ of the adsorption pseudocapacitance $(C_\varphi)$. The delayed phase shift $(\varphi)$ depends on both the cathode potential (E) and frequency (f), and is given by $\varphi=-tan^{-1}[1/2{\pi}f(R_s+R_F)C_p]$. The phase-shift profile $(\varphi\;vs.\;E)$ for the intermediate frequency (ca. 6Hz) can be used as an experimental method to determine the Langmuir adsorption isotherm (9 vs. E). The equilibrium constant (K) for H adsorption and the standard free energy $({\Delta}G_{ads})$ of H adsorption at the poly-$Pt/0.1\;M\;H_2SO_4$ electrolyte interface are $1.8\times10^{-4}\;and\;21.4kJ/mol$, respectively. The H adsorption is attributed to the over-potentially deposited hydrogen (OPD H).

EEG-based Subjects' Response Time Detection for Brain-Computer-Interface (뇌-컴퓨터-인터페이스를 위한 EEG 기반의 피험자 반응시간 감지)

  • 신승철;류창수;송윤선;남승훈
    • Journal of KIISE:Software and Applications
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    • v.29 no.11
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    • pp.837-850
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    • 2002
  • In this paper, we propose an EEG-based response time prediction method during a yes/no cognitive decision task. In the experimental task, a subject goes through responding of visual stimulus, understanding the given problem, controlling hand motions, and hitting a key. Considering the subject's varying brain activities, we model subjects' mental states with defining CT (cut time), ST (selection time), and RP (repeated period). Based on the assumption between ST and RT in the mental model, we predict subjects' response time by detection of selection time. To recognize the subjects' selection time ST, we extract 3 types of feature from the filtered brain waves at frequency bands of $\alpha$, $\beta$, ${\gamma}$ waves in 4 electrode pairs combined by spatial relationships. From the extracted features, we construct specific rules for each subject and meta rules including common factors in all subjects. Applying the ST detection rules to 8 subjects gives 83% success rates and also shows that the subjects will hit a key in 0.73 seconds after ST detected. To validate the detection rules and parameters, we test the rules for 2 subjects among 8 and discuss about the experimental results. We expect that the proposed detection method can be a basic technology for brain-computer-interface by combining with left/right hand movement or yes/no discrimination methods.

The Langmuir Adsorption Isotherms of the Electroadsorbed Hydrogens at the Single Crystal Pt(100)/Aqueous Electrolyte Interfaces (단결정 Pt(100)/수용액 계면에서 전가흡착된 수소의 Langmuir흡착등온식)

  • Chun Jang Ho;Jeon Sang Kyoo
    • Journal of the Korean Electrochemical Society
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    • v.4 no.1
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    • pp.14-20
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    • 2001
  • The Langmuir adsorption isotherms of the under-potentially deposited hydrogen (UPD H) and the over-potentially deposited hydrogen (OPD H) at the single crystal Pt(100)/0.5 M $H_2SO_4$ and 0.5 M LiOH aqueous electrolyte interfaces have been studied using the phase-shift method. The phase-shift profile $({-\varphi}\;vs.\;E)$ for the optimum intermediate frequency can be used as a useful method to estimate the Langmuir adsorption isotherm $(\theta\;vs.\;E)$ at the interfaces. The equilibrium constant (K) for the OPD H and the standard free energy $({\Delta}G_{ads})$ of the OPD H at the Pt(100)/0.5M $H_2SO_4$ aqueous electrolyte interface are $1.5\times10^{-4}$ and 21.8 kJ/mol, respectively. At the Pt(100)/0.5 LiOH aqueous electrolyte interface, K transits from 1.9(UPD H) to $6.8\times10^{-6}$(OPD H) depending on the cathode potential (E) and vice versa. Similarly, ${\Delta}G_{ads}$ transits -1.6 kJ/mol (UPD H) to 29.5 kJ/mol (OPD H) depending on E and vice versa. The transition of K and ${\Delta}G_{ads}$ is attributed to the two distinct adsorption sites of the UPD H and OPD H on the Pt(100) surface. The UPD H and the OPD H at the Pt(100) interfaces are the independent processes depending on the H adsorption sites rather than the sequential processes for the cathodic $H_2$ evolution reactions.

Improving Charge Injection Characteristics and Electrical Performances of Polymer Field-Effect Transistors by Selective Surface Energy Control of Electrode-Contacted Substrate (에폭시 개질 한 다관능 아크릴레이트를 포함하는 충격 저항성이 향상된 불포화폴리에스터 SMC (Sheet Molding Compound) 소재제조 및 그의 물성연구)

  • Jang, Jeong Beom;Kim, Taehee;Kim, Hye Jin;Lee, Wonjoo;Seo, Bongkuk;Kim, Yongsung;Kim, Changyoon;Lim, Choong-Sun
    • Journal of Adhesion and Interface
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    • v.21 no.3
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    • pp.101-106
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    • 2020
  • In this study, epoxy-modified acrylate was synthesized. The synthesized acrylate was added to the composition for sheet molding compound (SMC) in the range of 5 phr to 15 phr. The prepared SMC prepreg was molded at high temperature and pressure to produce a glass fiber reinforced composite. Physical properties such as tensile and impact strength of the composite were measured, respectively. Experimental data show that the composite with 5 phr of synthesized acrylate has 20% improved tensile strength and 12% improved impact strength than that of the reference sample.

The Fabrication of MOS Capacitor composed of $HfO_2$/Hf Gate Dielectric prepared by Atomic Layer Deposition (ALD 방법으로 증착된 $HfO_2$/Hf 박막을 게이트 절연막으로 사용한 MOS 커패시터 제조)

  • Lee, Dae-Gab;Do, Seung-Woo;Lee, Jae-Sung;Lee, Yong-Hyun
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.44 no.5
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    • pp.8-14
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    • 2007
  • In this paper, $HfO_2$/Hf stacked film has been applied as the gate dielectric in MOS devices. The $HfO_2$ thin film was deposited on p-type (100) silicon wafers by atomic layer deposition (ALD) using TEMAHf and $O_3$ as precursors. Prior to the deposition of the $HfO_2$ film, a thin Hf metal layer was deposited as an intermediate layer. Round-type MOS capacitors have been fabricated on Si substrates with 2000${\AA}$-thick Al or Pt top electrode. The prepared film showed the stoichiometric components. At the $HfO_2$/Si interface, both Hf-Si and Hf-Si-O bonds were observed, instead of Si-O bond. The sandwiched Hf metal layer suppressed the growing of $SiO_x$ layer so that $HfSi_xO_y$ layer was achieved. It seems that the intermediate Hf metal layer has a benefit for the enhancement of electric characteristics of gate dielectric in $HfO_2$/Si structure.

Prevention of P-i Interface Contamination Using In-situ Plasma Process in Single-chamber VHF-PECVD Process for a-Si:H Solar Cells

  • Han, Seung-Hee;Jeon, Jun-Hong;Choi, Jin-Young;Park, Won-Woong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.204-205
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    • 2011
  • In thin film silicon solar cells, p-i-n structure is adopted instead of p/n junction structure as in wafer-based Si solar cells. PECVD is a most widely used thin film deposition process for a-Si:H or ${\mu}c$-Si:H solar cells. For best performance of thin film silicon solar cell, the dopant profiles at p/i and i/n interfaces need to be as sharp as possible. The sharpness of dopant profiles can easily achieved when using multi-chamber PECVD equipment, in which each layer is deposited in separate chamber. However, in a single-chamber PECVD system, doped and intrinsic layers are deposited in one plasma chamber, which inevitably impedes sharp dopant profiles at the interfaces due to the contamination from previous deposition process. The cross-contamination between layers is a serious drawback of a single-chamber PECVD system in spite of the advantage of lower initial investment cost for the equipment. In order to resolve the cross-contamination problem in single-chamber PECVD systems, flushing method of the chamber with NH3 gas or water vapor after doped layer deposition process has been used. In this study, a new plasma process to solve the cross-contamination problem in a single-chamber PECVD system was suggested. A single-chamber VHF-PECVD system was used for superstrate type p-i-n a-Si:H solar cell manufacturing on Asahi-type U FTO glass. A 80 MHz and 20 watts of pulsed RF power was applied to the parallel plate RF cathode at the frequency of 10 kHz and 80% duty ratio. A mixture gas of Ar, H2 and SiH4 was used for i-layer deposition and the deposition pressure was 0.4 Torr. For p and n layer deposition, B2H6 and PH3 was used as doping gas, respectively. The deposition temperature was $250^{\circ}C$ and the total p-i-n layer thickness was about $3500{\AA}$. In order to remove the deposited B inside of the vacuum chamber during p-layer deposition, a high pulsed RF power of about 80 W was applied right after p-layer deposition without SiH4 gas, which is followed by i-layer and n-layer deposition. Finally, Ag was deposited as top electrode. The best initial solar cell efficiency of 9.5 % for test cell area of 0.2 $cm^2$ could be achieved by applying the in-situ plasma cleaning method. The dependence on RF power and treatment time was investigated along with the SIMS analysis of the p-i interface for boron profiles.

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Optical Diagnostics of Nanopowder Processed in Liquid Plasmas

  • Bratescu, M.A.;Saito, N.;Takai, O.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.17-18
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    • 2011
  • Plasma in liquid phase has attracted great attention in the last few years by the wide domain of applications in material processing, decomposition of organic and inorganic chemical compounds and sterilization of water. The plasma in liquid is characterized by three main regions which interact each - other during the plasma operation: the liquid phase, which supply the plasma gas phase with various chemical compounds and ions, the plasma in the gas phase at atmospheric pressure and the interface between these two regions. The most complex region, but extremely interesting from the fundamental, chemical and physical processes which occur here, is the boundary between the liquid phase and the plasma gas phase. In our laboratory, plasma in liquid which behaves as a glow discharge type, is generated by using a bipolar pulsed power supply, with variable pulse width, in the range of 0.5~10 ${\mu}s$ and 10 to 30 kHz repetition rate. Plasma in water and other different solutions was characterized by electrical and optical measurements. Strong emissions of OH and H radicals dominate the optical spectra. Generally water with 500 ${\mu}S/cm$ conductivity has a breakdown voltage around 2 kV, depending on the pulse width and the repetition rate of the power supply. The characteristics of the plasma initiated in ultrapure water between pairs of different materials used for electrodes (W and Ta) were investigated by the time-resolved optical emission and the broad-band absorption spectroscopy. The deexcitation processes of the reactive species formed in the water plasma depend on the electrode material, but have been independent on the polarity of the applied voltage pulses. Recently, Coherent anti-Stokes Raman Spectroscopy method was employed to investigate the chemistry in the liquid phase and at the interface between the gas and the liquid phases of the solution plasma system. The use of the solution plasma allows rapid fabrication of the metal nanoparticles without being necessary the addition of different reducing agents, because plasma in the liquid phase provides a reaction field with a highly excited energy radicals. We successfully synthesized gold nanoparticles using a glow discharge in aqueous solution. Nanoparticles with an average size of less than 10 nm were obtained using chlorauric acid solutions as the metal source. Carbon/Pt hybrid nanostructures have been obtained by treating carbon balls, synthesized in a CVD chamber, with hexachloro- platinum acid in a solution plasma system. The solution plasma was successfully used to remove the template remained after the mesoporous silica synthesis. Surface functionalization of the carbon structures and the silica surface with different chemical groups and nanoparticles, was also performed by processing these materials in the liquid plasma.

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