• Title/Summary/Keyword: Electrode Structure

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A study on the characteristic test of the grounding electrodes used in distribution lines (배전용 접지전극의 전극별.공중별 특성시험에 관한 연구)

  • Park, Sang-Man;Park, Jae-Duck;Kang, Moon-Ho;Choi, Jong-Kee;Park, Young-Keun;Shim, Keun-Bo
    • Proceedings of the KIEE Conference
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    • 2005.05b
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    • pp.54-56
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    • 2005
  • On the overhead distribution lines, we generally use a copper rod as a grounding electrode. It is a economical metallic structure. Recently, many new electrodes have been developed and used in the distribution system of KEPCO. Before using new grounding electrode. we need to measure the performance of each electrode for comparative analysis. This report describes the characteristic test of the grounding electrodes used in KEPCO.

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Development of Nano Convergence Films Using a Roll-to-Roll Coating System

  • Hwang, Joong Kook;Chang, Sang-Mok;Shin, Hoon-Kyu
    • Transactions on Electrical and Electronic Materials
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    • v.17 no.3
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    • pp.168-171
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    • 2016
  • There has been growing interest and rapid development in transparent electrode films, which are flexible and light and used in mobile, simple information, and electronic devices, and based on recent advancements in nano technology, information technology, and display technology. In particular, studies on developing such films with both high conductivity and high transmittance of visible rays are highly in demand for commercialization. In this study, transparent electrode films were developed for IT using micro patterns that show sheet resistance less than 10 Ω/□, adhesive strength more than 98%, and light transmittance more than 90%. The results of applying a surface emission gradient minimization (Honey Comb) technology to the films was the verification of the sheet resistance, adhesive strength, and light transmittance satisfying the target level of this study through Imprinting and Remolding processes.

Development of New LTPS Process

  • Yi, Chung;Park, Kyung-Min;Choi, Pil-Mo;Kim, Ung-Sik;Kim, Dong-Byum;Kim, Chi-Woo
    • 한국정보디스플레이학회:학술대회논문집
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    • 2004.08a
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    • pp.1024-1026
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    • 2004
  • We have developed the five mask $PMOS^1$ and the six mask CMOS process architecture for poly-Si TFT. In order to have a competitive process with that for a-Si TFT, the simple co-planar electrode structure whose data line electrode and pixel electrode are on the same plane was adopted. In addition, RGB + White four color $technology^2$ were applied to achieve high aperture ratio and transmittance. Using the aforementioned process architecture and four color technology, 2.0 inch qCIF transmissive micro-reflectance (TMR) device was successfully fabricated.

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