New Approaches for Overcoming Current Issues of Plasma Sputtering Process During Organic-electronics Device Fabrication: Plasma Damage Free and Room Temperature Process for High Quality Metal Oxide Thin Film
-
- Proceedings of the Korean Vacuum Society Conference
- /
- 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
- /
- pp.100-101
- /
- 2012