• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.23 no.4
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• pp.327-332
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• 2010

We report on the effect of PET substrate preheating on the characteristics of the flexible and transparent indium tin oxide (ITO) electrode grown by a specially designed roll-to-roll sputtering system for touch panel applications. It was found that electrical and optical properties of the roll-to-roll sputter grown ITO film were critically dependent on the preheating of the PET substrate. In addition, the roll-to-roll sputter-grown ITO film after post annealing test at $140^{\circ}C$ for 90 min showed stable electrical and optical properties. The low sheet resistance and high optical transmittance of the ITO film grown on the preheated PET substrate demonstrate that the preheating process before ITO sputtering is one of the effective way to improve the characteristics of ITO/PET film. Furthermore, the superior flexibility of the ITO electrode grown on the preheated PET substrate indicates that the preheating treatment is a promising technique to obtain robust ITO/PET sample for touch panel applications.

• Laser Solutions
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• v.17 no.4
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• pp.14-19
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• 2014

Laser beam was applied on the boundary of the polyurethane and biodegradable polyacetate polymers. The distributed laser passed through the polyurethane layer and heated the polyacetate layer, then the soften acetate was squeezed thorough the 1mm square slots of polyurethane for the mechanical joining. The surface roughness ranging between $0.28{\mu}m$ and $3.06{\mu}m$ had almost no effect on joining strength, but the optical properties of HD (High Definition) and UHD (Ultra High Definition) mode affected laser beam transmittance. The optimum laser power was found to be between 8watt and 10watt with 500mm/min of scanning speed. The joining boundary was characterized by optical and SEM analysis. Based on the experiment and characterization results, the laser energy was effective for the polymer joining and efficiency of joining.

• Korean Journal of Air-Conditioning and Refrigeration Engineering
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• v.25 no.3
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• pp.150-155
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• 2013

Usually, a window tends to have a lower thermal performance, than that of an ordinary wall. This study analyzes the enhancement of thermal performance of a window, when a Thermal Insulation Shutter is installed. The analyses were conducted at the laboratory, and with a full-scale mockup house, and the U-factor and heating load were examined. The laboratory results show that the U-factor increased by approximately 28%, when a Thermal Insulation Shutter was installed. The temperature difference was about $5^{\circ}C$, and this shows that the Thermal Insulation Shutter enhances the thermal performance of the window, when installed. The mockup house was used to calculate the heating load; the heating load was reduced by more than 41%, and shows that the installation of a Thermal Insulation Shutter is an effective way to reduce heating energy consumption.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2005.11a
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• pp.269-270
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• 2005

A hybrid passivation method using parylene and silicon dioxide combination layer for a flexible organic light emitting diode (FOLED) was applied on a polycarbonate substrate. A parylene coating by vapor polymerization method is a highly effective passivation process for the FOLED, and it applies all top surface and the edges of the FOLED device. In order to minimize the permeation of moisture and oxygen from the top surface of the device, an additional layer of silicon dioxide was deposited over the parylene coated layer. It was found that the water vapor transmittance rate (WVTR) of parylene (15 m-in-thickness) / SiO2 (0.3$\mu$m-in-thickness) combination layers deposited on polycarbonate film was decreased under the value of 10-3 g/m2day. The FOLED with the hybrid passivation showed remarkably longer lifetime characteristics in the ambient conditions than the non-passivated FOLED. The lifetime of the passivated FOLED was 400 hours and it was more than ten times over the lifetime of the convectional non-passivated FOLED.

• Journal of the Korean Solar Energy Society
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• v.22 no.4
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• pp.44-50
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• 2002

Photosynthesis of plants is effective in the range of 550 to 700 nm of the wavelength of solar irradiation. If the conversion of ultraviolet to the above mentioned region is possible, the photosynthesizing ability is expected to be enhanced. $Eu^{3+}$ doped soda-lime bulk and $TiO_2-SiO_2$ sol-gel coated glasses were prepared and their spectroscopic properties were studied. The absorption and emission spectra for the specimens were measured with the changes of wavelength and Eu ion concentration in the range of the wavelength of 300 to 700nm. The transmittance intensity of visible light through the bulk glass and the coated one was unchanged with the addition of Eu element. The emission spectrum intensity of $Eu^{3+}$ was found to be the maximum at 618 nm which is a transition of $^5DO{\rightarrow}^7F_2$. Additionally, it was shown that the intensity was linearly increased up to 10% of the Eu concentration.

• Transactions on Electrical and Electronic Materials
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• v.17 no.1
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• pp.18-20
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• 2016

Transparent and conducting IGZO thin films were deposited by RF magnetron sputtering on thin Cu coated glass substrates to investigate the effect of a Cu buffer layer on the structural, optical, and electrical film properties. Although X-ray diffraction (XRD) analysis revealed that both the IGZO single layer and IGZO/Cu bi-layered films were in the amorphous phase, the IGZO/Cu films showed a lower resistivity of 5.7×10⁻⁴ Ωcm due to the increased mobility and high carrier concentration. The decreased optical transmittance of the IGZO/Cu films was also attributed to a one order of magnitude higher carrier concentration than the IGZO films. From the observed results, the thin Cu layer is postulated to be an effective buffer film that can enhance the opto-electrical performance of the IGZO films in transparent thin film transistors.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.06a
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• pp.395-395
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• 2007

We report on the fabrication of soluble pentacene-based thin-film transistors (TFTs) that consist of $NiO_x$, poly-vinyl phenol (PVP), and Ni for the source-drain (SID) electrodes, gate dielectric, and gate electrode, respectively. The $NiO_x$ SID electrodes of which the work function is well matched to that of soluble pentacene are deposited on a soluble pentacenechannel by sputter deposited of NiO powder and show a moderately low but still effective transmittance of ~65% in the visible range along with a good sheet resistance of ${\sim}40{\Omega}/{\square}$. The maximum saturation current of our soluble pentacene-based TFT is about $15{\mu}A$ at a gate bias of -40showing a high field effect mobility of $0.06cm^2/Vs$ in the dark, and the on/off current ratio of our TFT is about $10^4$. It is concluded that jointly adopting $NiO_x$ for the S/D electrodes and PVP for gate dielectric realizes a high-quality soluble pentacene-based TFT.

• Nuclear Engineering and Technology
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• v.53 no.4
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• pp.1323-1330
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• 2021

This work reported the radiation shielding characteristic of the bismuth titanium vanadium sodium tellurite glass system. The density of the specially-developed glass samples was increased from 2.21 to 4.01 g/cm³ with the addition of Bi₂O₃, despite the fact the molar volume is decease within 85.43-54.79 cm³/mol. The WinXcom program was used to approximate the effect of Bi₂O₃ on the gamma radiation shielding parameters of bismuth titanium vanadium sodium tellurite glasses. The ㎛ values decrease with the increase of Bi₂O₃ concentration. The computed data shows that the glass sample with 20 mol.% of Bi₂O₃ content has the greatest radiation attenuation performance in comparison to other selected glasses. The Bi₂O₃-TiO₂-V₂O₅-Na₂O-TeO₂ glass system shows excellent neutron shielding material with high long-term light transmittance and discharge resistance and could be potentially used as transparent radiation-resistant shielding glass applications.

• Journal of the Korean Society for Heat Treatment
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• v.36 no.4
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• pp.193-197
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• 2023

Transparent and conducting titanium (Ti) doped indium oxide (TIO) thin films were deposited on the poly-imide (PI) substrate with radio frequency magnetron sputtering and then electron irradiation was conducted on the TIO film's surface to investigate the effect electron irradiation on the crystallization and opto-electrical properties of the films. All x-ray diffraction (XRD) pattern showed two diffraction peaks of the In₂O₂ (431) and (444) planes with regardless of the electron beam irradiation energy. In the AFM analysis, the surface roughness of as deposited films was 3.29 nm, while the films electron irradiated at 700 eV, show a lower RMS roughness of 2.62 nm. In this study, the FOM of as deposited TIO films is 6.82 × 10^-3 Ω^-1, while the films electron irradiated at 500 eV show the higher FOM value of 1.0 × 10^-2 Ω^-1. Thus, it is concluded that the post-deposition electron beam irradiation at 500 eV is the one of effective methods of crystallization and enhancement of opto-electrical performance of TIO thin film deposited on the PI substrate.

• Journal of Surface Science and Engineering
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• v.46 no.3
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• pp.99-104
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• 2013

The simple and cost-effective microfabrication method of photosensitive glass (PSG) using metal patterning and blank exposure was proposed. Conventional photolithography for micromachining of PSG needs a costly quartz mask which has high transmittance as an optical property. However, in this study the process was improved through the combination of micro-patterned Ti thin film and blank UV exposure without quartz mask. The effect of UV exposure time as well as the DHF etching condition was investigated. UV exposure test was performed within the range from 3 min to 9 min. The color and etch result of PSG exposed for 5 min were the most clear and effective to etch more precisely, respectively. The etching results of PSG in diluted hydrofluoric acid (DHF) with a concentration of 5, 10, 15 vol% were compared. The effect on the side etch was insignificant while the etch rate was proportional as the concentration increased. 10 vol% DHF results not only high etch rate of 75 ${\mu}m/min$ also lower side etch value after PSG etching. This method facilitates the microfabrication of PSG with various patterns and high aspect ratio for applying to advanced applications.