• Title/Summary/Keyword: ECR

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Comparison analysis of superconducting solenoid magnet systems for ECR ion source based on the evolution strategy optimization

  • Wei, Shaoqing;Lee, Sangjin
    • Progress in Superconductivity and Cryogenics
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    • v.17 no.2
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    • pp.36-40
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    • 2015
  • Electron cyclotron resonance (ECR) ion source is an essential component of heavy-ion accelerator. For a given design, the intensities of the highly charged ion beams extracted from the source can be increased by enlarging the physical volume of ECR zone [1]. Several models for ECR ion source were and will be constructed depending on their operating conditions [2-4]. In this paper three simulation models with 3, 4 and 6 solenoid system were built, but it's not considered anything else except the number of coils. Two groups of optimization analysis are presented, and the evolution strategy (ES) is adopted as an optimization tool which is a technique based on the ideas of mutation, adaptation and annealing [5]. In this research, the volume of ECR zone was calculated approximately, and optimized designs for ECR solenoid magnet system were presented. Firstly it is better to make the volume of ECR zone large to increase the intensity of ion beam under the specific confinement field conditions. At the same time the total volume of superconducting solenoids must be decreased to save material. By considering the volume of ECR zone and the total length of solenoids in each model with different number of coils, the 6 solenoid system represented the highest coil performance. By the way, a certain case, ECR zone volume itself can be essential than the cost. So the maximum ECR zone volume for each solenoid magnet system was calculated respectively with the same size of the plasma chamber and the total magnet space. By comparing the volume of ECR zone, the 6 solenoid system can be also made with the maximum ECR zone volume.

Spectrophotometric Determination of Scandium(III) with Eriochrome Cyanine R in the Presence of Cetyltrimethylammonium bromide (Cetyltrimethylammonium bromide에서 Eriochrome Cyanine R에 의한 스칸듐(III)의 분광광도법 정량)

  • Cha, Ki-Won;Park, Chan-Il;Kim, Jong-Whon
    • Analytical Science and Technology
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    • v.9 no.2
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    • pp.139-144
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    • 1996
  • The spectrophotometric determination method of scandium with eriochrome cyanine R(ECR) and the composition ratio of the complex were investigated in the presence of surfactants. The absorbance increase and red shift of maximum adsorption wavelength of Sc(III)-ECR complex were observed in cetyltrimethylammonium bromide (CTMAB), but those changes were not observed in the sodium dodecyl sulfate(SDS) and Triton X-100. A volume of 5ml of $1{\times}10^{-3}M$ ECR and 10ml of $2{\times}10^{-4}M$ CTMAB are necessary for the determination of $1{\times}10^{-7}{\sim}3.0{\times}10^{-6}M$ Sc(III) at pH 6.5. The apparent molar absorption coefficient of the Sc(III)-ECR-CTMAB, temary complex at 610nm is $5.6{\times}10^5mol^{-1}cm^{-1}L$ and its detection limit is $1.0{\times}10^{-7}M$. The binary complex composition of Sc(III)-ECR is 1:2 and the ternary complex composition of Sc(III)-ECR-CTMAB is 1:3:1.

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ECR plasma pretreatment for Ru nucleation enhancement on the TiN film (Ru 핵생성에 대한 ECR plasma 전처리 세정의 효과)

  • 엄태종;신경철;최균석;이종무
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2003.03a
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    • pp.120-120
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    • 2003
  • MOCVD법으로 TiN 표면에 Ru을 증착함에 있어서 Ru의 핵생성을 고양시키기 위한 ECR plasma 전처리 세정이 필요하다. 본 연구에서는 Ru 증착시 ECR $H_2O$$_2$, AE Plasma 전처리 세정 효과를 SEM, AES, XRD로 분석하였다. Ru의 핵생성은 ECR H$_2$, Ar Plasma의 노출시간이 증가할수록 향상된 반면, ECR $O_2$ plasma의 경우 노출시간이 증가할수록 핵생성 효과는 감소하였다. H$_2$ plasma 내의 H$_2$ion은 Ti와 NH$_3$를 형성하기 위해서 TiN과 반응하여 TiN을 Ti로 개질 시켰으며, Ar plasma 전처리 세정하는 동안 Ar plasma 내의 Ar ion은 TiN 또는 TiON 표면의 질소와 산소원자를 제거하는 효과를 나타내었다. 그 결과 TiN 표면상에서도 Ru의 핵생성이 쉽게 이루어졌으며 H$_2$, Ar ECR Plasma 전처리 세정에서 RU 핵생성이 향상되는 결과를 얻었다. 세 종류의 plasma중에서 Ar ECR plasma로 전처리 세정한 경우에 가장 높은 Ru 핵생성 밀도를 얻을 수 있었다.

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Construction of an Electron Cyclotron Resonance Plasma Apparatus (ECR 플라즈마 장치의 제작)

  • 오수기;정근모
    • Journal of the Korean Vacuum Society
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    • v.1 no.1
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    • pp.32-36
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    • 1992
  • An ECR plasma apparatus is designed and constructed. The gradient of magnetic field in microwave cavity was adjusted to provide an ECR plasma stream by electro magnetic lenz system. Employing a yoke arround the electro magnets, the magnetic field intensity was increased by 50% with the same electric current. Characteristics of the ECR plasma discharged in the apparatus were investigated by Langmuir probe method. The variations of electron temperature and electron density along chamber axis were analysed.

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ECR device impedance matching circuit design (ECR장치의 임피던스 매칭회로 설계)

  • KIM, Sung-Wan;KIM, Chang-Sun
    • Proceedings of the KIPE Conference
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    • 2012.07a
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    • pp.445-446
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    • 2012
  • Recently the interest in wireless power transfer have been studied. ECR (Electromagnetic Coupled Resonance) device, depending on the size of the frequency characteristics of the structure, increasing in volume and larger volume of wireless power transmission device to make use of ECR is a big barrier. So to solve this problem for ECR device miniaturization and high efficiency has been actively studied. In this paper, the size of the device for ECR IM (Impedance Matching) by applying a one-turn coil circuit, remove the device in the form of ECR Network Analyzer measured by removing the one-turn coil has demonstrated the possibility of the device in the form of ECR.

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Experimental Research of an ECR Heating with R-wave in a Helicon Plasma Source

  • Ku, Dong-Jin;An, C.Y.;Park, Min;Kim, S.H.;Wang, S.J.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.274-274
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    • 2012
  • We have researched on controlling an electron temperature and a plasma collision frequency to study the effect of collisions on helicon plasmas. So, we have designed and constructed an electron cyclotron resonance (ECR) heating system in the helicon device as an auxiliary heating source. Since then, we have tried to optimize experimental designs such as a magnetic field configuration for ECR heating and 2.45GHz microwave launching system for its power transfer to the plasma effectively, and have characterized plasma parameters using a Langmuir probe. For improving an efficiency of the ECR heating with R-wave in the helicon plasma, we would understand an effect of R-wave propagation with ECR heating in the helicon plasma, because the efficiency of ECR heating with R-wave depends on some factors such as electron temperature, electron density, and magnetic field gradient. Firstly, we calculate the effect of R-wave propagation into the ECR zone in the plasma with those factors. We modify the magnetic field configuration and this system for the effective ECR heating in the plasma. Finally, after optimizing this system, the plasma parameters such as electron temperature and electron density are characterized by a RF compensated Langmuir probe.

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Manufacturing and characterization of ECR-PECVD system (ECR-PECVD 장치의 제작과 특성)

  • 손영호;정우철;정재인;박노길;황도원;김인수;배인호
    • Journal of the Korean Vacuum Society
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    • v.9 no.1
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    • pp.7-15
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    • 2000
  • An ECR-PECVD system with the characteristics of high ionization rat다 ability of plasma processing in a wide pressure range and deposition at low temperature was manufactured and characterized for the deposition of thin films. The system consists of a vacuum chamber, sample stage, vacuum gauge, vacuum pump, gas injection part, vacuum sealing valve, ECR source and a control part. The control of system is carried out by the microprocessor and the ROM program. We have investigated the vacuum characteristics of ECR-PECVD system, and also have diagnosed the characteristics of ECR microwave plasma by using the Langmuir probe. From the data of system and plasma characterization, we could confirmed the stability of pressure in the vacuum chamber according to the variation of gas flow rate and the effect of ion bombardment by the negative DC self bias voltage. The plasma density was increased with the increase of gas flow rate and ECR power. On the other hand, it was decreased with the increase of horizontal radius and distance between ECR source and probe. The calculated plasma densities were in the range of 49.7\times10^{11}\sim3.7\times10^{12}\textrm{cm}^{-3}$. It is also expected that we can estimate the thickness uniformity of film fabricated by the ECR-PECVD system from the distribution of the plasma density.

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Nucleation Enhancing Effect of Different ECR Plasmas Pretreatment in the RUO2 Film Growth by MOCVD (ECR플라즈마 전처리가 RuO2 MOCVD시 핵생성에 끼치는 효과)

  • Eom, Taejong;Park, Yunkyu;Lee, Chongmu
    • Journal of the Korean Ceramic Society
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    • v.42 no.2 s.273
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    • pp.94-98
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    • 2005
  • $RuO_2$ is widely studied as a lower electrode material for high dielectric capacitors in DRAM (Dynamic Random Access Memories) and FRAM (Ferroelectric Random Access Memories). In this study, the effects of hydrogen, oxygen, and argon Electron Cyclotron Resonance (ECR) plasma pretreatments on deposited by Metal Organic Chemical Vapor Deposition (MOCVD) $RuO_2$ nucleation was investigated using X-Ray Diffraction (XRD), Scanning Electron Microscopy (SEM), and Atomic Force Microscopy (AFM) analyses. Argon ECR plasma pretreatment was found to offer the highest $RuO_2$ nucleation density among these three pretreatments. The mechanism through which $RuO_2$ nucleation is enhanced by ECR plasma pretreatment may be that the argon or the hydrogen ECR plasma removes nitrogen and oxygen atoms at the TiN film surface so that the underlying TiN film surface is changed to Ti-rich TiN.

Effects of Curculiginis Rhizoma on anti-thrombotic activity (선모(仙茅) 열수(熱水) 추출물(抽出物)의 항혈전(抗血栓) 효능 연구)

  • Roh, Seong-Soo
    • The Korea Journal of Herbology
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    • v.26 no.4
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    • pp.125-132
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    • 2011
  • Objectives : An aim of study is to investigate effects of curculiginis rhizoma in vitro (factor Xa (FXa) inhibitor assay, prothrombinase assay, prothrombin time (PT) assay, activated partial thromboplastin time (aPTT) assay) and in vivo experiment (blood clotting time, thromboxane B2 content assay in serum and weight of thrombus by AV-shunt rat model). Methods : We gained a human serum and used serum in vitro study such as factor X activity (FXa) inhibition, prothrombinase inhibition, prothrombin time (PT) and activated partial thromboplastin time. Fifteen SD rats were divided into three groups (intact control group and two experimental group treated with extract of Curculiginis Rhizoma(ECR)). Rats were orally administrated DW (intact control group), 600 mg/kg concertration of ECR and 200 mg/kg concertration of ECR. After one hour, we anesthetized rats and made arteriovenous (AV) shunt rat models to study weights of thrombus, took a hole blood to study content of thromboxane B2 and blood clotting time. Results : In vitro, ECR increased a inhibitory activity of FXa, prothrombinase and aPTT compared than intact control group. Especially ECR made significant increase of FXa and prothrombinase inhibitory activity (p<0.05, p<0.01). And PT were increased in ECR control group compared with intact control group. In vivo, a blood clotting time of experiment group treated with ECR 600 mg/kg were significantly increased compared with that of intact control group (p<0.05) and content of thromboxane B2 was significantly decreased in group treated with ECR 600 mg/kg in seum. The weight of thrombus were significantly reduced in group treated with ECR 600 mg/kg compared with intact control group (p<0.05). But in vivo experiment study, those of group treated with ECR 200 mg/kg were reduced compared with those of intact control group without statistical significance. Conclusions : ECR has a antithromboic activity in internal course with inhibitory activity of FXa and prothrombinase in vitro, it required to research more study for effective compounds.

A Study on the Characteristics of Aluminum Oxide Thin Films Prepared by ECR-PECVD (ECR-플라즈마 화학 증착된 알루미늄 산화막 연구)

  • 이재균;전병혁;이원종
    • Journal of the Korean Ceramic Society
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    • v.31 no.6
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    • pp.601-608
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    • 1994
  • Aluminum oxide thin films were deposited on p-type(100) silicon substrates by electron cyclotron resonance plasma enhanced CVD(ECR-PECVD) using TMA[Al(CH3)3] and oxygen as reactant gases at 16$0^{\circ}C$ or lower temperatures. The aluminum oxide films deposited by ECR-PECVD have the amorphous structure with the refractive index of 1.62~1.64 and the O/Al ratio of 1.6~1.7. Oxygen flow rate necessary for the stable deposition of the aluminum oxide films increases as the deposition temperature increases. It was found from the OES analysis that the ECR plasma had les cooling effect by introducing the TMA reactant gas in comparison with the RF plasma. The properties of aluminum oxide films prepared by ECR-PECVD were compared with those prepared by RF-PECVD. The ECR-PECVD aluminum oxide films have the higher refractive indices, the lower contents of impurities (H and C) and the stronger wet etch resistance than those deposited by RF-PECVD.

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