• Title/Summary/Keyword: E-beam process

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Linear Ion Beam Applications for Roll-to-Roll Metal Thin Film Coatings on PET Substrates

  • Lee, Seunghun;Kim, Do-Geun
    • Applied Science and Convergence Technology
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    • v.24 no.5
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    • pp.162-166
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    • 2015
  • Linear ion beams have been introduced for the ion beam treatments of flexible substrates in roll-to-roll web coating systems. Anode layer linear ion sources (300 mm width) were used to make the linear ion beams. Oxygen ion beams having an ion energy from 200 eV to 800 eV used for the adhesion improvement of Cu thin films on PET substrates. The Cu thin films deposited by a conventional magnetron sputtering on the oxygen ion beam treated PET substrates showed Class 5 adhesion defined by ASTM D3359-97 (tape test). Argon ion beams with 1~3 keV used for the ion beam sputtering deposition process, which aims to control the initial layer before the magnetron sputtering deposition. When the discharge power of the linear ion source is 1.2 kW, static deposition rate of Cu and Ni were 7.4 and $3.5{\AA}/sec$, respectively.

A Study on the Etching Effect and the Capacitance of Aluminum Oxide Thin Film by Oxygen Ion Beam (산소 이온 빔에 의한 산화 알루미늄 박막의 식각 효과 및 정전 용량 특성에 관한 연구)

  • Cho, E.S.;Kwon, S.J.
    • Journal of the Korean Vacuum Society
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    • v.22 no.1
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    • pp.26-30
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    • 2013
  • For the realization of high-k insulator, aluminum oxide ($Al_2O_3$) was deposited by using an oxygen ion beam assisted deposition (IBAD) during e-beam evaporation. From the thickness of the $Al_2O_3$ layer evaporated with IBAD process, it was possible to investigate the etching effect of ion beam at higher energies during e-beam evaporation. It was also possible to obtain a higher capacitance as a result of IBAD in spite of the reduced thickness of $Al_2O_3$.

Decay Process of Charge Distribution in E-Beam Irradiated Polymers (E-빔 조사된 폴리머의 전하 분포의 축퇴 과정)

  • Yun, Ju-Ho;Choi, Yong-Sung;Lee, Kyung-Sup
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.11a
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    • pp.329-330
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    • 2007
  • Decay processes of accumulated charge in e-beam irradiated polymers during elevating temperature are observed using pulsed electro-acoustic measurement system. Since the polymeric materials have many superior properties such as light-weight, good mechanical strength, high flexibility and low cost, they are inevitable materials for spacecrafts. In space environment, however, the polymers sometimes have serious damage by irradiation of high energy charged particles. When the polymers of the spacecraft are irradiated by high energy charged particles, some of injected charges accumulate and remain for long time in the bulk of the polymers. Since the bulk charges sometimes cause the degradation or breakdown of the materials, the investigation of the charging and the decay processes in polymeric materials under change of temperature is important to decide an adequate material for the spacecrafts. By measuring the charge behavior in e-beam irradiated polymer, such as polyimide or polystyrene, it is found that the various accumulation and decay patterns are observed in each material. The results seem to be useful and be helpful to progress in the reliability of the polymers for the spacecraft.

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Toxicity Assessment and Decomposition Characteristics of Triclosan in an E-beam Irradiation Process (전자빔 공정을 적용한 Triclosan의 제거특성 및 독성평가)

  • Chang, Taebum;Chang, Soonwoong;Lee, Sijin;Cho, Ilhyoung
    • Journal of the Korean GEO-environmental Society
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    • v.13 no.3
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    • pp.5-11
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    • 2012
  • The abjective of this study was to study the degradation behavior and acute toxicity assessment of Triclosan and acute toxicity under E-beam irradiation. The experiments were conducted to investigate the efficts of the degradation efficiency in the initial concentration of Triclosan and the irradiation capacity of E-beam and the degree of mineralization based on a change of scavenger gas. The biological toxicity test by using on green algae, Pseudokirchneriella Subcapitata was conducted to lead the reducing toxicity. Degradation efficiency of Triclosan was improved when E-beam irradiation intensity was higher. Additionally, the % of TOC removal in each Radical scavenger gas was increased as the follows orders: $N_2O$ > $O_2$ > $N_2$, The toxicity test showed that the toxicity effect after 4 days(96hrs) was decreased by increase of E-beam irradiation intensity.

Decomposition Characteristics of 1,4-dioxane in an E-beam Process and Toxicity Assessment (전자빔 공정을 적용한 1,4-dioxane의 제거특성 및 독성평가)

  • Hwang, Haeyoung;Chang, Soonwoong
    • Journal of the Korean GEO-environmental Society
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    • v.12 no.2
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    • pp.63-68
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    • 2011
  • The aim of this study was 1,4-dioxane's degradation efficiency and toxicity test applying E-beam. The experiments were shows that the degradation efficiency in the initial concentration of 1,4-dioxane and the irradiation capacity of E-beam and the degree of mineralization based on a change of scavenger gas. The biological toxicity test by using on of green algae, Pseudokirchneriella Subcapitata was conducted to lead the reducing toxicity. Degradation efficiency of 1,4-dioxane was improved when E-beam irradiation intensity was higher and the efficiency of TOC removal using Radical scavenger gas was increased by $N_2O$, $O_2$ and $N_2$ in order. In 4 days(96hrs), toxicity test results indicated that toxicity effect was decreased by increase of E-beam irradiation intensity.

Development of Manufacturing Technology for Bumper Back Beam with Sandwich Plate (샌드위치판재를 적용한 자동차 범퍼 빔 개발)

  • Kim, D.K.;Ryu, J.S.;Park, S.E.;Lee, K.H.;Kim, K.H.;Lee, M.Y.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2009.05a
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    • pp.199-202
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    • 2009
  • In roll forming process, a sheet metal is continuously progressively formed into a product with required cross-section and longitudinal shape, such as a circular tube with required diameter, wall-thickness and straightness, by passing through a series of forming rolls in arranged in tandem. Tn this process, each pair of forming rolls installed in a forming machine play a particular role in making up the required cross-section and longitudinal shape of the product. In recent years, that process is often applied to the bumper rail in the automotive industries. In this study, a optimal Front Bumper Beam manufacturing technology, model deign and proper roll-pass sequences can be suggested by forming number of roll-pass and bending angle. And also effects of the process parameters on the final shape formed by roll forming defects were evaluated.

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Effect of the Off-axis distance of the Electron Emitting Source in Micro-column (마이크로 칼럼의 전자 방출원 위치 오차의 영향)

  • Lee, Eung-Ki
    • Journal of the Semiconductor & Display Technology
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    • v.9 no.1
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    • pp.17-21
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    • 2010
  • Currently miniaturized electron-optical columns find their way into electron beam lithography systems. For better lithography process, it is required to make smaller spot size and longer working distance. But, the micro-columns of the multi-beam lithography system suffer from chromatic and spherical aberration, even when the electron beam is exactly on the symmetric axis of the micro-column. The off-axis error of the electron emitting source is expected to become worse with increasing off-axis distance of the focusing spot. Especially the electron beams far from the system optical axis have a non-negligible asymmetric intensity distribution in the micro-column. In this paper, the effect of the off-axis e-beam source is analyzed. To analyze this effect is to introduce a micro-column model of which the e-beam emitting source is aligned with the center of the electron beam by shifting them perpendicular to the system optical axis. The presented solution can be used to analysis the performance of the multi-electron-beam system. The performance parameters, such as the working distances and the focusing position are obtained by the computational simulations as a function of the off-axis distance of the emitting source.

InGaAs Nano-HEMT Devices for Millimeter-wave MMICs

  • Kim, Sung-Won;Kim, Dae-Hyun;Yeon, Seong-Jin;Seo, Kwang-Seok
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.6 no.3
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    • pp.162-168
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    • 2006
  • To fabricate nanometer scale InGaAs HEMTs, we have successfully developed various novel nano-patterning techniques, including sidewall-gate process and e-beam resist flowing method. The sidewall-gate process was developed to lessen the final line length, by means of the sequential procedure of dielectric re-deposition and etch-back. The e-beam resist flowing was effective to obtain fine line length, simply by applying thermal excitation to the semiconductor so that the achievable final line could be reduced by the dimension of the laterally migrated e-beam resist profile. Applying these methods to the device fabrication, we were able to succeed in making 30nm $In_{0.7}Ga_{0.3}As$ HEMTs with excellent $f_T$ of 426GHz. Based on nanometer scale InGaAs HEMT technology, several high performance millimeter-wave integrated circuits have been successfully fabricated, including 77GHz MMIC chipsets for automotive radar application.