• Title/Summary/Keyword: E-beam

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Toxicity Assessment and Decomposition Characteristics of Triclosan in an E-beam Irradiation Process (전자빔 공정을 적용한 Triclosan의 제거특성 및 독성평가)

  • Chang, Taebum;Chang, Soonwoong;Lee, Sijin;Cho, Ilhyoung
    • Journal of the Korean GEO-environmental Society
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    • v.13 no.3
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    • pp.5-11
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    • 2012
  • The abjective of this study was to study the degradation behavior and acute toxicity assessment of Triclosan and acute toxicity under E-beam irradiation. The experiments were conducted to investigate the efficts of the degradation efficiency in the initial concentration of Triclosan and the irradiation capacity of E-beam and the degree of mineralization based on a change of scavenger gas. The biological toxicity test by using on green algae, Pseudokirchneriella Subcapitata was conducted to lead the reducing toxicity. Degradation efficiency of Triclosan was improved when E-beam irradiation intensity was higher. Additionally, the % of TOC removal in each Radical scavenger gas was increased as the follows orders: $N_2O$ > $O_2$ > $N_2$, The toxicity test showed that the toxicity effect after 4 days(96hrs) was decreased by increase of E-beam irradiation intensity.

Fabrication of High Aspect Ratio 100nm-scale Nickel Stamper Using E-beam Lithography for the Injection molding of Nano Grating Patterns (전자빔과 무반사층이 없는 크롬 마스크를 이용한 나노그레이팅 사출성형용 고종횡비 100nm 급 니켈 스템퍼의 제작)

  • Seo, Young-Ho;Choi, Doo-Sun;Lee, Joon-Hyoung;Je, Tae-Jin;Whang, Kyung-Hyun
    • Proceedings of the KSME Conference
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    • 2004.04a
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    • pp.978-982
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    • 2004
  • We present high aspect ratio 100nm-scale nickel stamper using e-beam lithography process and Cr/Qz mask for the injection molding process of nano grating patterns. Conventional photolithography blank mask (CrON/Cr/Qz) consists of quartz substrate, Cr layer of UV protection and CrON of anti-reflection layer. We have used Cr/Qz blank mask without anti-reflection layer of CrON which is non-conductive material and ebeam lithography process in order to simplify the nickel electroplating process. In nickel electroplating process, we have used Cr layer of UV protection as seed layer of nickel electroplating. Fabrication conditions of photolithography mask using e-beam lithography are optimized with respect to CrON/Cr/Qz blank mask. In this paper, we have optimized e-beam lithography process using Cr/Qz blank mask and fabricated nickel stamper using Cr seed layer. CrON/Cr/Qz blank mask and Cr/Qz blank mask require optimal e-beam dosage of $10.0{\mu}C/cm^2$ and $8.5{\mu}C/cm^2$, respectively. Finally, we have fabricated $116nm{\pm}6nm-width$ and $240nm{\pm}20nm-height$ nickel grating stamper for the injection molding pattern.

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Decomposition Characteristics of 1,4-dioxane in an E-beam Process and Toxicity Assessment (전자빔 공정을 적용한 1,4-dioxane의 제거특성 및 독성평가)

  • Hwang, Haeyoung;Chang, Soonwoong
    • Journal of the Korean GEO-environmental Society
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    • v.12 no.2
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    • pp.63-68
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    • 2011
  • The aim of this study was 1,4-dioxane's degradation efficiency and toxicity test applying E-beam. The experiments were shows that the degradation efficiency in the initial concentration of 1,4-dioxane and the irradiation capacity of E-beam and the degree of mineralization based on a change of scavenger gas. The biological toxicity test by using on of green algae, Pseudokirchneriella Subcapitata was conducted to lead the reducing toxicity. Degradation efficiency of 1,4-dioxane was improved when E-beam irradiation intensity was higher and the efficiency of TOC removal using Radical scavenger gas was increased by $N_2O$, $O_2$ and $N_2$ in order. In 4 days(96hrs), toxicity test results indicated that toxicity effect was decreased by increase of E-beam irradiation intensity.

The Effects of Negative Carbon Ion Beam Energy on the Properties of DLC Film

  • Choi, Bi-Kong;Choi, Dae-Han;Kim, Yu-Sung;Jang, Ho-Sung;Lee, Jin-Hee;Yoon, Ki-Sung;Chun, Hui-Gon;You, Young-Zoo;Kim, Dae-Il
    • Journal of the Korean institute of surface engineering
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    • v.39 no.3
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    • pp.105-109
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    • 2006
  • The effects of negative carbon ion beam energy on the bonding configuration, hardness and surface roughness of DLC film prepared by a direct metal ion beam deposition system were investigated. As the negative carbon ion beam energy increased from 25 to 150 eV, the $sp^3$ fraction of DLC films was increased from 32 to 67%, while the surface roughness was decreased. The films prepared at 150 eV showed the more flat surface morphology of the film than that of the film prepared under another ion beam energy conditions. Surface roughness of DLC film varied from 0.62 to 0.22 nm with depositing carbon ion beam energy. Surface nano-hardness increased from 12 to 57 Gpa when increasing the negative carbon ion beam energy from 25 to 150 eV, and then decreased when increasing the ion beam energy from 150 to 200 eV.

Investigation of LC Alignment Using Ion-beam and Overcoat Layer (이온빔 에너지와 유기절연막 사용에 의한 액정 배향 연구)

  • Kim, Byoung-Yong;Park, Hong-Gyu;Lee, Kang-Min;Oh, Byeong-Yun;Kang, Dong-Hun;Han, Jin-Woo;Kim, Young-Hwan;Han, Jeong-Min;Kim, Jong-Hwan;Seo, Dae-Shik
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.11a
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    • pp.370-370
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    • 2007
  • The liquid crystal (LC) aligning capabilities treated on the Organic overcoat thin film surfaces by ion beam irradiation and rubbing method was successfully studied for the first time. The Organic overcoat layer was coated by spin-coating. In order to characterize the LC alignment, the microscope, pretilt angle, thermal stress, and atomic force microscopy (AFM) image was used. The good LC aligning capabilities treated on the Organic overcoat thin film surfaces with ion beam exposure of $45^{\circ}$ above ion beam energy density of 1200 eV can be achieved. But, the alignment of defect of NLC on the Organicovercoat surface at low energy density of 600 eV was measured. The pretilt angle of NLC on the Organic overcoat thin film surface with ion beam exposure of $45^{\circ}$ for 1 min at energy density of 1800eV was measured about 1.13 degree. But, low pretilt angles of NLC on the Organic overcoat thin film surface with ion beam exposure at energy density of 600, 1200, 2400, and 3000 eV was measured. Also, the pretilt angle of NLC on the rubbed Organic overcoat thin film surfaces was measured about 0.04 degrees. Finally, the good thermal stability of LC alignment on the Organic overcoat thin film surface with ion beam exposure of $45^{\circ}$ for 1 min can be measured.

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Multiple Electron Beam Lithography for High Throughput (생산성 향상을 위한 멀티빔 리소그라피)

  • Choi, Sang-Kook;Yi, Cheon-Hee
    • Korean Journal of Optics and Photonics
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    • v.16 no.3
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    • pp.235-238
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    • 2005
  • A Multiple electron beam lithography system with arrayed microcolumns has been developed for high throughput applications. The small size of the microcolumn opens the possibility for arrayed operation on a scale commensurate. The arrayed microcolumns based on of Single Column Module (SCM) concept has been fabricated and successfully demonstrated. Low energy microcolumn lithography has been operated in the energy range from 250 eV to 300 eV for the generation of nano patterns. Probe beam current at the sample was measured about >1 nA at a total beam current of $0.5\;{\mu}A$ and a working distance of $\~1\;mm$. The magnitude of probe beam current is strong enough for the low energy lithography. The thin layers of PMMA resist have been employed. The results of nano-patterning by low energy microcolumn lithography will be discussed.

Fabrication of High Aspect Ratio 100nm-Scale Nickel Stamper Using E-Beam Writing based on Chrome/Quartz Mask Without Anti-Reflection Layer for Injection Molding of Optical Grating Patterns (광학 그레이팅의 사출성형제작을 위한 전자빔과 무반사 코팅층이 없는 크롬/퀄츠 마스크를 이용한 고종횡비 100nm 급 니켈 스탬퍼의 제작)

  • Seo, Young-Ho;Choi, Doo-Sun;Lee, Joon-Hyoung;Je, Tae-Jin;Whang, Kyung-Hyun
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.28 no.11
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    • pp.1794-1798
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    • 2004
  • We present a fabrication method of high aspect ratio 100nm-scale nickel stamper using e-beam writing for the injection molding of optical grating patterns. Conventional nickel stamper is fabricated by nickel electroplating process which is followed by seed layer deposition. In this paper, we have used chrome coated blank mask without anti-reflection layer of CrON in order to simplified electroplating process. In experimental study, we have optimized electron-beam dosage for 100nm-scale optical grating patterns with 2.5-aspect ratio, and fabricated nickel stamper using above grating patterns as PR mold. Fabricated nickel stamper have showed height of 240$\pm$20nm and width of 116$\pm$6nm.

Measurement of secondary electron emission coefficient(${\gamma}$) with oblique low energy ion and work function ${\phi}_{\omega}$ of theMgO thin film in AC-PDPs

  • Park, W.B.;Lim, J.Y.;Oh, J.S.;Jeong, H.S.;Jung, K.B.;Jeon, W.;Cho, G.S.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2004.08a
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    • pp.507-510
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    • 2004
  • Oblique ion-induced secondary electron emission coefficient(${\gamma}$) with low energy ..and work function ${\phi}_{\omega}$(${\theta}$ = 0 and ${\theta}$ = 20) of the MgO thin film in AC-PDPs has been measured by ${\gamma}$-FIB system. The MgO thin film has been deposited from sintered material under electron beam evaporation method. The energy of $He^+$ ions used has been ranged from 50eV to 150eV. Oblique ion beam has been chosen to be 10 degree, 20 degree and 30 degree. It is found that the higher secondary electron emission coefficient(${\gamma}$) has been achieved by the higher oblique ion beam up to inclination angle of 30 degree than the perpendicular incident ion beam.

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Synthesis of TiO2 nanoparticles induced by electron beam irradiation and their electrochemical performance as anode materials for Li-ion batteries

  • Ahn, Ja-Hwa;Eom, Ji-Yong;Kim, Jong-Huy;Kim, Hye Won;Lee, Byung Cheol;Kim, Sung-Soo
    • Journal of Electrochemical Science and Technology
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    • v.6 no.3
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    • pp.75-80
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    • 2015
  • We introduce a new synthesis method to prepare small TiO2 nanoparticles with a narrow particle size distribution, which is achieved by electron beam (E-beam) irradiation. The effects of E-beam irradiation on the synthesis of TiO2 nanoparticles and the electrochemical performance of TiO2 nanoparticles as alternative anode materials for Li-ion batteries are investigated. The TiO2 nanoparticles induced by E-beam irradiation present better cycling performance and rate capability than the TiO2 nanoparticles synthesized by normal hydrolysis reaction. The better electrochemical performance is attributed to small particle size and narrow particle size distribution, resulting in the large surface area that provides innumerable reaction sites and short diffusion length for Li+ through TiO2 nanoparticles.

Study on the Characteristics of Electron Beam Dependent with the Structure of Wiggler in the Miniaturized Free Electron Laser Module (초소형 자유전자레이저 모듈에 있어서 위글러 구조에 따른 전자빔 특성 연구)

  • Kim, Young-Chul;Ahn, Seong-Joon;Kim, Dae-Wook;Kim, Ho-Seob;Ahn, Seung-Joon
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.12 no.3
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    • pp.1319-1326
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    • 2011
  • We have investigated the characteristics of the electron beam (e-beam) in the miniaturized free electron laser module by using the commercial 3D simulation tool OPERA. The e-beam was made parallel before entering the slit-type wiggler by the negative bias applied to the central electrode of the electron lens. With respect to the different structures of the wiggler, we obtained the inner distributions of the electrical potential and the electric field, which was, in turn, used to calculate the trajectory of the e-beam in the wiggler.