• 제목/요약/키워드: E-beam

검색결과 1,953건 처리시간 0.035초

ZEUS Co. Ltd

  • 강신국
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2000년도 제18회 학술발표회 논문개요집
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    • pp.50-50
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    • 2000
  • 당사는 1970년 제우스 콤 상사로부터 출발하여 1988년 12우러 주식회사 제우스로 법인 전환한 후 현재 한국반도체 산업협회 및 회원으로 등록 활동하고 있다. 이번 발표에서는 회사에 대한 소개와 함께 취급품목을 설명하고자 한다. 취급품목은 Ion beam sources(CSC), E-beam evaporator & E-beam source(Temescal), Residual Gas Analyzer(SPECTRA), Cryopump & Waterpump(CTI-Cryogenics), Thickness Monitor & Controller, Electrical Feedthrough, RTP system, Thin Film Analyzer, PECVD, RIE 등이다.

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전자빔 공정에 의한 Pentachlorophenol 분해 (Pentachlorophenol(PCP) Decomposition by the Electron-beam Process)

  • 권중근;김종오;권범근
    • 한국지반환경공학회 논문집
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    • 제13권7호
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    • pp.49-54
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    • 2012
  • 본 연구에서는 전자빔(E-beam) 공정을 이용한 펜타클로로페놀(Pentachlorophenol, PCP)의 분해 특성을 조사하였다. 이를 위해 주어진 반응시간(0.6 s) 동안 생성될 수 있는 각종 반응성 화학종의 농도를 예측하였으며, PCP 분해에 미치는 pH와 과산화수소의 영향 및 이에 따른 G-value 등을 조사하였다. 실험결과, 전자빔공정에서 PCP의 분해는 pH의 영향을 받지 않았다. 1mM 이하의 과산화수소의 주입은 PCP 분해를 촉진시킬 수 있으나 그 이상의 과산화수소의 주입은 오히려 PCP의 분해를 감소시키거나 부산물의 형성을 유도할 것으로 관찰되었다. 특히, 옥살산과 미확인된 유기염소 성분의 농도를 증가시키는 것으로 나타났다. 그래서 전자빔공정에서 수산화라디칼의 발생원으로써 적절한 농도의 과산화수소 주입이 고려되어야 할 것으로 생각된다.

전자빔이 조사된 활성탄소섬유 기반 가스센서의 일산화질소 감지 특성 (Nitric Oxide Sensing Property of Gas Sensor Based on Activated Carbon Fiber Radiated by Electron-beam)

  • 이상민;정민정;이경민;이영석
    • 공업화학
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    • 제28권3호
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    • pp.299-305
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    • 2017
  • 활성탄소섬유가 전사선 조사에 의해 표면 개질되었고, NO가스 감지 능력에 미치는 영향을 살펴보기 위하여 이를 가스센서 전극으로 이용하였다. XPS 분석결과는 전자선에 의하여 표면처리된 활성탄소섬유의 산소 성분이 감소하였으며 표면의 $sp^2$ 결합탄소가 증가한 것을 보여주었다. 이러한 결과는 전자빔 조사에 따른 활성탄소섬유 표면의 구조적 변형때문으로 사료된다. 100 kGy의 전자빔이 조사된 활성탄소섬유 전극의 NO가스 민감도는 약 4%에서 약 8%로 크게 증가하였고, 그 감지 시간 또한 약 360 s에서 120 s로 의미 있게 향상되었다. 이러한 결과는 활성탄소섬유의 전자빔 조사에 의하여 $sp^2$ 탄소 결합의 증가때문에 기인한 것으로, 이는 NO가스 센싱에 대한 전극저항 변화에 상당히 영향을 주었다.

Influences of degradation in MgO protective layer and phosphors on ion-induced secondary electron emission coefficient and static margins in alternating current plasma display panels

  • Jeong, H.S.;Lim, J.E.;Park, W.B.;Jung, K.B.;Choi, E.H.
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2004년도 Asia Display / IMID 04
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    • pp.518-521
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    • 2004
  • The degradation characteristics of MgO protective layer and phosphors have been investigated in terms of the ion-induced secondary electron emission coefficient ${\gamma}$ and static margin of discharge voltages, respectively, in this experiment. The ion-induced secondary electron emission coefficients ${\gamma}$ for the degraded MgO protective layer and phosphors have been studied by ${\gamma}$ -focused ion beam system. The energy of Ne+ ions used is from 80 eV to 200 eV in this experiment. The degraded MgO and phosphor layers are found to have higher ${\gamma}$ than that of normal ones without degradations or aged one. Also, the static margin of discharge voltages for test panels with degraded MgO protective layer and phosphors been found to be seriously decreased in comparison with those of normal ones without degradations.

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Change in Water Contact Angle of Carbon Contaminated TiO2 Surfaces by High-energy Electron Beam

  • Kim, Kwang-Dae;Tai, Wei Sheng;Kim, Young-Dok;Cho, Sang-Jin;Bae, In-Seob;Boo, Jin-Hyo;Lee, Byung-Cheol;Yang, Ki-Ho;Pack, Ok-Kyung
    • Bulletin of the Korean Chemical Society
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    • 제30권5호
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    • pp.1067-1070
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    • 2009
  • We studied change in water contact angle on $TiO_2$ surfaces upon high-energy electron-beam treatment. Depending on conditions of e-beam exposures, surface OH-content could be increased or decreased. In contrast, water contact angle continuously decreased with increasing e-beam exposure and energy, i.e. change in the water contact angle cannot be rationalized in terms of the overall change in the surfacestructure of carbon-contaminated $TiO_2$. In the C 1s spectra, we found that the C-O and C=O contents gradually increased with increasing e-beam energy, suggesting that the change in the surface structure of carbon layers can be important for understanding of the wettability change. Our results imply that the degree of oxidation of carbon impurity layers on oxide surfaces should be considered, in order to fully understand the change in the oxide surface wettability.

Improved interfacial stress analysis of a plated beam

  • Hao, Sheng-Wang;Liu, Yan;Liu, Xiao-Dan
    • Structural Engineering and Mechanics
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    • 제44권6호
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    • pp.815-837
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    • 2012
  • A plated beam is strengthened by bonding a thin plate to the tension face; it often fails because of premature debonding of the thin plate from the original beam in a brittle manner. A sound understanding of the mechanism of such debonding failure is very important for the effective use of this strengthening technique. This paper presents an improved analytical solution for interfacial stresses that incorporates multiple loading conditions simultaneously, including prestress, mechanical and thermal loads, and the effects of adherend shear deformations and curvature mismatches between the beam and the plate. Simply supported beams bonded with a thin prestressing plate and subjected to both mechanical and thermal loading were considered in the present work. The effects of the curvature mismatch and adherend shear deformations of the beam and plate were investigated and compared. The main mechanisms affecting the distribution of interfacial stresses were analyzed. Both the normal and shear stresses were found to be significantly influenced by the coupled effects of the elastic moduli with the ratios $E_a/E_b$ and $E_a/E_p$.

PAN 전구체 섬유의 안정화시 전자선 전류의 영향 (Effect of Electron Beam Currents on Stabilization of Polyacrlonitrile Precursor Fiber)

  • 신혜경;전준표;김현빈;강필현
    • 방사선산업학회지
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    • 제5권1호
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    • pp.41-46
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    • 2011
  • Polyacrylonitrile (PAN) fibers are the most widely used precursor of the materials for carbon fibers. The conventional process of carbon fibers from PAN precursor fiber includes two step; stabilization at low temperature and carbonization at high temperature. Compared to thermal stabilization, the stabilization process by electron beam (E-beam) irradiation is a advanced and brief method. However, a stabilization by E-beam irradiation was required a high dose (over 5,000 kGy) and spend over 1.5 hr (1.14 MeV, 1 mA). In the present work the main goal is exploring a quick stabilization process by cotrolling E-beam currents. The effect of various E-beam currents on stabilization of PAN precursor fiber was studied by gel fraction test, thermo gravimertic analysis (TGA), differential scanning calorimetry (DSC), tensile strength, and scanning electron microscopy (SEM) images.

마이크로 전자빔 시스템을 위한 전자광학렌즈의 제작에 의한 나노 패턴 형성 (Nano-scale pattern delineation by fabrication of electron-optical lens for micro E-beam system)

  • 이용재;박정영;전국진;국양
    • 전자공학회논문지D
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    • 제35D권9호
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    • pp.42-47
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    • 1998
  • 현재의 전자빔 묘화의 한계를 극복할 수 있는 마이크로 전자빔 시스템의 전자 광학 렌즈를 제작하였고 전자빔 묘화실험을 통하여 이를 검증하였다. 마이크로머시닝기술을 이용하여 실리콘 전극을 제작하고 이를 양극 접합을 통해 조립하여 다층 전극의 전자 광학 렌즈를 제작하였다. 완성된 전자 광학 소자를 초고진공 챔버에 장착하여, STM(Scanning Tunneling Microscope) 팁에서 방출된 전자빔의 focusing 특성을 관찰하였으며 전자를 집속하여 리소그라피를 수행하였다. E-beam 감광막은 PMMA(Poly-methylmethacrylate)를 사용하였고 0.13㎛의 패턴을 형성시킬 수 있었다.

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2차원 자가 보정 알고리즘에서의 불확도 전파 (Error propagation in 2-D self-calibration algorithm)

  • 유승봉;김승우
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2003년도 춘계학술대회 논문집
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    • pp.434-437
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    • 2003
  • Evaluation or the patterning accuracy of e-beam lithography machines requires a high precision inspection system that is capable of measuring the true xy-locations of fiducial marks generated by the e-beam machine under test. Fiducial marks are fabricated on a single photo mask over the entire working area in the form of equally spaced two-dimensional grids. In performing the evaluation, the principles of self-calibration enable to determine the deviations of fiducial marks from their nominal xy-locations precisely, not being affected by the motion errors of the inspection system itself. It is. however, the fact that only repeatable motion errors can be eliminated, while random motion errors encountered in probing the locations of fiducial marks are not removed. Even worse, a random error occurring from the measurement of a single mark propagates and affects in determining locations of other marks, which phenomenon in fact limits the ultimate calibration accuracy of e-beam machines. In this paper, we describe an uncertainty analysis that has been made to investigate how random errors affect the final result of self-calibration of e-beam machines when one uses an optical inspection system equipped with high-resolution microscope objectives and a precision xy-stages. The guide of uncertainty analysis recommended by the International Organization for Standardization is faithfully followed along with necessary sensitivity analysis. The uncertainty analysis reveals that among the dominant components of the patterning accuracy of e-beam lithography, the rotationally symmetrical component is most significantly affected by random errors, whose propagation becomes more severe in a cascading manner as the number of fiducial marks increases

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E-beam 증착에 의해 제작된 Al-Mg 코팅층의 특성 (Properties of Al-Mg Films Fabricated by E-beam deposition)

  • 정재훈;양지훈;박혜선;송민아;정재인
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2013년도 춘계학술대회 논문집
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    • pp.64-64
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    • 2013
  • 아연(Zn)을 대체할 수 있는 물질계 인 알루미늄(Al)과 마그네슘(Mg)을 본 연구에서는 E-beam 증착을 이용하여 냉연강판 위에 코팅하고 열처리를 실시하여 전자현미경 및 X-선 회절분석을 이용한 코팅층의 특성 분석 및 염수분무시험을 통해 내식성을 평가하였다.

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