• Title/Summary/Keyword: Doping density

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Effects of fission product doping on the structure, electronic structure, mechanical and thermodynamic properties of uranium monocarbide: A first-principles study

  • Ru-Ting Liang;Tao Bo;Wan-Qiu Yin;Chang-Ming Nie;Lei Zhang;Zhi-Fang Chai;Wei-Qun Shi
    • Nuclear Engineering and Technology
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    • v.55 no.7
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    • pp.2556-2566
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    • 2023
  • A first-principle approach within the framework of density functional theory was employed to study the effect of vacancy defects and fission products (FPs) doping on the mechanical, electronic, and thermodynamic properties of uranium monocarbide (UC). Firstly, the calculated vacancy formation energies confirm that the C vacancy is more stable than the U vacancy. The solution energies indicate that FPs prefer to occupying in U site rather than in C site. Zr, Mo, Th, and Pu atoms tend to directly replace U atom and dissolve into the UC lattice. Besides, the results of the mechanical properties show that U vacancy reduces the compressive and deformation resistance of UC while C vacancy has little effect. The doping of all FPs except He has a repairing effect on the mechanical properties of U1-xC. In addition, significant modifications are observed in the phonon dispersion curves and partial phonon density of states (PhDOS) of UC1-x, ZrxU1-xC, MoxU1-xC, and RhxU1-xC, including narrow frequency gaps and overlapping phonon modes, which increase the phonon scattering and lead to deterioration of thermal expansion coefficient (αV) and heat capacity (Cp) of UC predicted by the quasi harmonic approximation (QHA) method.

A Study on the Magnetic Properties of Ceramics Superconductors for Simpllified Testing System (간소화 시스템적용을 위한 자기특성)

  • Lee, Sang-Heon
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.61 no.2
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    • pp.339-341
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    • 2012
  • The high Tc superconductor of YBCO system with the nominal composition of precursor was prepared from mixed powders of $Y_2O_3$, $BaCO_3$, CuO and $TiO_2$ by the thermal pyrolysis method. The effect of $TiO_2$ doping to Y based ceramics superconductors fabricated by the thermal pyrolysis reaction, to investigate the effect of the dopant on the superconductivity. The voltage appearing across the field-cooled HTS sample increased with external magnetic field. The improvement of critical current property as well as the mechanical property is important for the application. The improvement of the critical current can be achieved by forming the nano size defect working as a flux pining center inside the superconductor. We simply added $TiO_2$ to starting materials to dope $TiO_2$ and observed an increase in the trapped field and the critical current density up to at least 5 wt % $TiO_2$. The $TiO_2$ was converted to fine $BaTiO_3$ particles which were trapped in YBCO matrix during the sintering process. We observed a peak effect of Jc that can be attributed to $TiO_2$ doping and results suggest that introducing a proper amount of pinning centers can significantly enhance current density.

Two-dimensional modelling of uniformly doped silicene with aluminium and its electronic properties

  • Chuan, M.W.;Wong, K.L.;Hamzah, A.;Rusli, S.;Alias, N.E.;Lim, C.S.;Tan, M.L.P.
    • Advances in nano research
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    • v.9 no.2
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    • pp.105-112
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    • 2020
  • Silicene is a two-dimensional (2D) derivative of silicon (Si) arranged in honeycomb lattice. It is predicted to be compatible with the present fabrication technology. However, its gapless properties (neglecting the spin-orbiting effect) hinders its application as digital switching devices. Thus, a suitable band gap engineering technique is required. In the present work, the band structure and density of states of uniformly doped silicene are obtained using the nearest neighbour tight-binding (NNTB) model. The results show that uniform substitutional doping using aluminium (Al) has successfully induced band gap in silicene. The band structures of the presented model are in good agreement with published results in terms of the valence band and conduction band. The band gap values extracted from the presented models are 0.39 eV and 0.78 eV for uniformly doped silicene with Al at the doping concentration of 12.5% and 25% respectively. The results show that the engineered band gap values are within the range for electronic switching applications. The conclusions of this study envisage that the uniformly doped silicene with Al can be further explored and applied in the future nanoelectronic devices.

Preparation of Ce0.8Gd0.2O1.9 Powder Using CeO2 Powder and Gd Precipitation and Effect of CoO doping on Sintering

  • Sim, Soo-Man
    • Journal of the Korean Ceramic Society
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    • v.52 no.6
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    • pp.521-526
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    • 2015
  • $Ce_{0.8}Gd_{0.2}O_{1.9}$(GDC20) powder was prepared from a mixture of submicron-sized $CeO_2$ powder and Gd precipitates using ammonium carbonate $((NH_4)_2CO_3)$ as a precipitant. The mixture was calcined at $700^{\circ}C$ for 4 h followed by ball-milling that resulted in the GDC powder with an average particle size of $0.46{\mu}m$. The powder had a very uniform particle size distribution with particle sizes ranging from $0.3{\mu}m$ to $1{\mu}m$. Sintering of undoped GDC samples did not show a relative density of 99.2% until the temperature was increased to $1500^{\circ}C$, whereas GDC samples doped with 5 mol% CoO exhibited a significant densification at lower temperature reaching a relative density of 97.6% at $1100^{\circ}C$ and of 98.8% at $1200^{\circ}C$.

Dielectric and Electric Properties of Nb Doped PZT Thin Films by Sol-gel Technique (솔-젤법으로 제조한 PZT 박막의 Nb 첨가에 따른 유전 및 전기적 특성)

  • 김창욱;김병호
    • Journal of the Korean Ceramic Society
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    • v.33 no.10
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    • pp.1101-1108
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    • 1996
  • No-doped PZT thin films have been fabricated on Pt/Ti/SiO2/Si substrate using Sol-Gel technique. A fast annealing metho (three times of intermediate and final annealing) was used for the preparation of multi-coated 1800$\AA$ thick Nb-doped PZT thin films. As Nb doping percent was increased leakage current was lowered approximately 2 order but dielectic properties were degraded due to the appearance of pyrochlore phase and domain pinning. Futhermore the increase of the final annealing temperature up to 74$0^{\circ}C$lowered the pyrochlore phase content resulting in enhancing the dielectric properties of the Nb doped films. The 3%-Nb doped PZT thin films with 5% excess Pb showed a capacitance density of 24.04 fF/${\mu}{\textrm}{m}$2 a dielectric loss of 0.13 a switchable polarization of 15.84 $\mu$C/cm2 and a coercive field of 32.7 kV/cm respectively. The leakage current density of the film was as low as 1.47$\times$10-7 A/cm2 at the applied voltage of 1.5 V.

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Impact ionization rate of the highly-doped AlGaAs/GaAs quantum well (고준위 도핑된 AlGaAs/GaAs 양자 우물의 충돌 이온화율)

  • 윤기정;황성범;송정근;홍창희
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.33A no.4
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    • pp.121-128
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    • 1996
  • The impact ionization rate of thethighly-doped AlGaAs/GaAs quantum well structure is calculated, which is an important parameter ot design theinfrared detector APD and the novel neural device. In conjunction with ensemble monte carlo method and quantum mechanical treatment, we analyze the effects of the parameters of quantum well structure on the impact ionization rate. Since the number of the occupied subbands increases while the energy of the subbands decreases as the width of quantum well increases, the impact ionization rate increases in the range of th esmall well width but gradually the increament slows down and is finally saturated. Due to the effect of the energy of the injected electrons into the quantum well and the tunneling through the barrier, the impact ionization rate increases for the range of the small barrier width and decreases for the range of the large barrier width. Thus, there exists a barrier width to maximize the impact ionzation rate for a mole fraction x, and the barrier width moves to the larger vaue as the mole fraction x increases. The impact ionization rate is much more sensitive to the variation of the doping density than that of the other quantum well parameters. We found that there is a limit of the doping density to confine the electronics in the quantum well effectively.

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Densification and Grain Growth Behavior of MgO and TiO2-doped Alumina (MgO 및 TiO2가 첨가된 알루미나의 치밀화와 입성장 거동)

  • Lee, Jung-A;Kim, Jeong-Joo
    • Journal of the Korean Ceramic Society
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    • v.39 no.11
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    • pp.1083-1089
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    • 2002
  • Densification and grain growth behavior of MgO and -doped alumina ceramics were investigated. MgO was found to inhibit grain growth and to promote densification, but acted to promote grain growth more than densification. The density which showed the maximum shrinkage rate was investigated in the plot of shrinkage rate versus density. The data suggests that the maximum shrinkage rate separates the two kinetic regimes, below the density of maximum shrinkage, the regime associated with densification and above the maxima, the regime associated with the grain growth. The plot exhibits a maximum which shifts to higher temperatures with MgO doping and to lower with doping.

Evaluation of Slip and Strength of Nitrogen doped P/P- Epitaxial Silicon Wafers (질소 도핑된 P/P- Epitaxial Silicon Wafer의 Slip 및 강도 평가)

  • Choi Eun-Suck;Bae So-Ik
    • Korean Journal of Materials Research
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    • v.15 no.5
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    • pp.313-317
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    • 2005
  • The relation between bulk microdefect (BMD) and mechanical strength of $P/P^-$ epitaxial silicon wafers (Epitaxial wafer) as a function of nitrogen concentrations was studied. After 2 step anneal$(800^{\circ}C/4hrs+1000^{\circ}C/16hrs)$, BMD was not observed in nitrogen undoped epitaxial silicon wafer while BMD existed and increased up to $3.83\times10^5\;ea/cm^2$ by addition of $1.04\times10^{14}\;atoms/cm^3$ nitrogen doping. The slip occurred for nitrogen undoped and low level nitrogen doped epitaxial wafers. However, there was no slip occurrence above $7.37\times10^{13}\;atoms/cm^3$ nitrogen doped epitaxial wafer. Mechanical strength was improved from 40 to 57 MPa as nitrogen concentrations were increased. Therefore, the nitrogen doping in silicon wafer plays an important role to improve BMD density, slip occurrence and mechanical strength of the epitaxial silicon wafers.

Achieving Robust N-type Nitrogen-doped Graphene Via a Binary-doping Approach

  • Kim, Hyo Seok;Kim, Han Seul;Kim, Seong Sik;Kim, Yong Hoon
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.192.2-192.2
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    • 2014
  • Among various dopant candidates, nitrogen (N) atoms are considered as the most effective dopants to improve the diverse properties of graphene. Unfortunately, recent experimental and theoretical studies have revealed that different N-doped graphene (NGR) conformations can result in both p- and n-type characters depending on the bonding nature of N atoms (substitutional, pyridinic, pyrrolic, and nitrilic). To overcome this obstacle in achieving reliable graphene doping, we have carried out density functional theory calculations and explored the feasibility of converting p-type NGRs into n-type by introducing additional dopant candidates atoms (B, C, O, F, Al, Si, P, S, and Cl). Evaluating the relative formation energies of various binary-doped NGRs and the change in their electronic structure, we conclude that B and P atoms are promising candidates to achieve robust n-type NGRs. The origin of such p- to n-type change is analyzed based on the crystal orbital Hamiltonian population analysis. Implications of our findings in the context of electronic and energy device applications will be also discussed.

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Dielectric properties of $BaTiO_3$ system Ceramics Doped with $Al_{2}O_{3}$ ($BaTiO_3$계 세라믹의 $Al_{2}O_{3}$ 첨가에 따른 유전 특성)

  • Heo, Young-Sik;Lee, Won-Sub;Lee, Sung-Gap
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.11b
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    • pp.402-405
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    • 2001
  • $(Ba_{0.6-x}Sr_{0.4}Ca_{x})TiO_{3}$ (x=0.10, 0.15, 0.20) ceramics were fabricated by the mixed-oxide method and their stuctural and dielectric properties were investigated with variation of composition ratio and an amount of $Al_{2}O_{3}$ (0.5, 1.0, 1.5. 2.0, 3.0 wt%) doping content. As a result of the X-ray diffraction BSCT specimens showed dense and homogeneous structure without presence of the second phase. The sintered density was decreased with increase an $Al_{2}O_{3}$ doping content. The Curie temperature and relative dielectric constant at room temperature were decreased with increasing an amount of $Al_{2}O_{3}$ doping content. The dielectric loss is minimum for BSCT doped with 1.5wt% $Al_{2}O_{3}$ content. The tunability was decreased with increasing an Ca content and is about 4.2% for BSCT(50/40/10) doped with 2.0wt% $Al_{2}O_{3}$ content.

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