• 한국자기학회지
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• 제15권3호
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• pp.181-185
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• 2005

반응성 스퍼터링 방법으로 성장시킨 $Zn_{0.09}Cr_{0.01}O$ 묽은 자성반도체 박막의 구조와 전기 수송과 자기 특성에 미치는 Al 첨가 효과를 탐구하였다. Al이 첨가되지 않은 $Zn_{0.09}Cr_{0.01}O$ 박막은 반도체적인 수송 특성과 함께 미약한 강자성 특성을 보였다. Al을 첨가함으로써 n-형 나르개인 전자의 농도 증가와 더불어 금속성 수송 특성을 나타냈으며 포화자기화가 현저하게 증가하고 이력곡선이 뚜렷하게 나타나는 등 자기 특성의 격렬한 변화가 관찰되었다. 이 결과들은 Cr이 첨가된 ZnO에서 나르개에 의한 강자성 질서의 향상을 보여준다.

• 한국재료학회:학술대회논문집
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• 한국재료학회 2009년도 춘계학술발표대회
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• pp.28.1-28.1
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• 2009

The superior properties of ZnO such as high exciton binding energy, high thermal and chemical stability, low growth temperature and possibility of wet etching process in ZnO have great interest for applications ranging from optoelectronics to chemical sensor. Particularly, vertically well-aligned ZnO nanorods on large areas with good optical and structural properties are of special interest for the fabrication of electronic and optical nanodevices. Currently, low-dimensional ZnO is synthesized by metal-organic chemical vapor deposition (MOCVD), molecular beam epitaxy (MBE), thermal evaporation, and sol.gel growth. Recently, our group has been reported about achievement the growth of Ga-doped ZnO nanorods using ZnO seed layer on p-type Si substrate by RF magnetron sputtering system at high rf power and high growth temperature. However, the crystallinity of nanorods deteriorates due to lattice mismatch between nanorods and Si substrate. Also, in the growth of oxide using sputtering, the oxygen flow ratio relative to argon gas flow is an important growth parameter and significantly affects the structural properties. In this study, Phosphorus (P) doped ZnO nanorods were grown on c-sapphire substrates without seed layer by radio frequency magnetron sputtering with various argon/oxygen gas ratios. The layer change films into nanorods with decreasing oxygen partial pressure. The diameter and length of vertically well-aligned on the c-sapphire substrate are in the range of 51-103 nm and about 725 nm, respectively. The photoluminescence spectra of the nanorods are dominated by intense near band-edge emission with weak deep-level emission.

• 한국광학회지
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• 제9권4호
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• pp.221-226
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• 1998

$Er_2O_3$를 첨가한 $PbO-Bi_2O_3-Ga_2O_3$ 삼성분계 중금속 산화물 유리로부터 발생하는 $1.5\mu\textrm{m}$와 2.7$\mu\textrm{m}$ 등의 형광에 대하여 복사 천이율, 형광 수명, 흡수 및 유도 방출 단면적 등을 조사하였다. 중금속 산화물 유리의 낮은 포논 에너지($~500cm^{-1}$)로 인하여 기존 산화물 유리로부터 관찰할 수 없었던 형광들의 양자 효율이 크게 높아졌으며 방출 단면적도 증가하였다. 한편, 798 nm 여기광의 상향 전이를 통한 녹색과 적색의 형광이 방출됨을 확인하였고, 각 에너지 준위의 형광 수명을 이용하여 다중포논 완화(multiphonon relaxation)를 정량적으로 규명하였다. $Er^{3+}:^4S_{3/2}{\rightarrow}^4I_{15/2}$ 천이에 의한 녹색 형광은 기지 유리(host glass)의 밴드 갭(band gap)흡수에 의한 비복사 천이의 영향을 받으므로 이 형광의 양자 효율을 높이기 위해서는 유리를 불활성 기체 분위기에서 용융하거나 자외선쪽 투과단이 짧은 유리 망목 형성제(glass-vetwork former)가 첨가된 기지 조성을 선택하는 것이 바람직하다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.315-315
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• 2016

The hydrogenated amorphous silicon (a-Si:H) thin film solar cells using n/Al or n/Ag/Al back reflector have low short circuit current (Jsc) due to high absorption coefficients of Al or work function difference between n-layer and the metal. In this article, we utilized aluminum doped zinc oxide (AZO) to raise the internal reflectance for the improvement of short current density (Jsc) in a-Si:H thin film solar cells. It was found that there was a slight increase in the reflectance in the long wavelength range at the process temperature of 125oC due to improved crystalline quality of the AZO back reflector. The optical band gap (Eg) and work function were affected by the temperature and so did the internal reflectance. The increased internal reflectance within the solar cell resulted in Jsc of 14.94 mA/cm2 and the efficiency of 8.84%. Jsc for the cell without back reflector was 12.29 mA/cm2.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
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• pp.171.2-171.2
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• 2015

Nowadays, trivalent rare-earth ($RE^{3+}$) ions activated metal oxides have been proved to be excellent host materials due to their various applications. Facile wet-chemical technique have been considered as the best synthetic route due its intensive interest in the preparation of nanostructures. Europium ion doped lanthanum hydroxide ($La(OH)_3:Eu^{3+}$) phosphors were synthesized by the facile wet chemical method using the hexamethylenetetramine (HMTA) as a mediated surfactant. The thermal behavior for the $La(OH)_3:Eu^{3+}$ phosphors was investigated by thermogravimetric and differential thermal analysis method. The morphological studies were measured by scanning electron microscope and transmission electron microscope measurements, indicating three-dimensional (3D) flower-like $La(OH)_3:Eu^{3+}$ nanorod bundles. After subsequent annealing process, the lanthanum oxide ($La_2O_3:Eu^{3+}$) phosphor exhibited similar kind of morphology. The synthesized $La(OH)_3:Eu^{3+}$ and $La_2O_3:Eu^{3+}$ samples were characterized by X-ray powder diffraction and Fourier transform infrared spectroscopy. Furthermore, photoluminescence and cathodoluminescence properties were studied in details.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2004년도 Asia Display / IMID 04
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• pp.715-718
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• 2004

Substantially improved methods for the preparation of europium-doped yttrium oxide red phosphor with the inclusion of alkali metal halides having a general formula $(Y_{1-x}Eu_x)_2O_3$:MX where 0.025${\leq}$x${\leq}$0.2 and MX is alkali halide in the mole ratio 0.025 to 0.6, more preferably between 0.05 to 0.2 mole, are reported. Another series of the red phosphor materials with general formula $(Y_{1-x-y}Gd_xEu_y)_2O_3$:MX where 0.05${\leq}$x${\leq}$0.40 and 0.025${\leq}$y${\leq}$0.20 and MX is alkali halide in the mole ratio 0.025 to 0.5, more preferably between 0.1 to 0.2 mole, has also been presented. The inclusion of alkali halide greatly increase the luminance of the materials. The materials are very soft with fine particle size less than 100nm. The phosphorescent materials have good luminance in VUV region.

• 한국정보통신학회:학술대회논문집
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• 한국해양정보통신학회 2000년도 춘계종합학술대회
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• pp.470-473
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• 2000

지난 10여 년 동안 MOSFET는 전력감소, 도핑농도 증가, 캐리어 속도 증가를 위해서 많은 변화를 가져왔다. 이러한 변화를 받아들이기 위해서, 채널의 길이와 공급되어지는 전압이 감소해야만했으며, 그것으로 인해 소자가 더욱 작아지게 되었다. 그러므로 본 논문은 이러한 변화를 위해 채널의 길이와 전압에 의한 MOSFET 구조에서의 변화를 관찰하고, 드레인과 게이트 사이에서의 임팩트 이온화의 변화를 관찰하였다. 본 논문은 세 가지의 모델 즉, conventional MOSFET와 LDD(lightly doped drain) MOSFET, EPI MOSFET을 제시하였다. 게이트 길이는 0.15um, 0.075um을 사용하였고, 스케일링계수는 λ = 2를 사용하였다 스케일링방법은 Constant-Voltage 스케일링으로 하였고, TCAD를 사용하여, 스케일링에 의한 MOSFET의 특성과 임팩트 이온화, 전계를 비교 분석하였으며, 최적의 채널과 도필 농도에 대하여 분석하였다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2000년도 영호남학술대회 논문집
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• pp.307-310
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• 2000

Antimony doped tin oxide (ATO) thin films were deposited at room temperature by ion-beam sputter deposition (IBSD) technique in oxidizing atmosphere utilizing Sb and Sn metal targets. Effect of Sb doping concentration, film thickness and heat treatment on electrical and optical properties was investigated. The thickness of as-deposited films was controlled approximately to $1500{\AA}$ or $2000{\AA}$, and Sb concentration to 10.8 and 14.9 wt%, as determined by SEM and XPS analyses. Heat treatment was performed at the temperature from $400^{\circ}C$ to $600^{\circ}C$ in flowing $O_2$ or forming gas. The resulting ATO films showed widely changing electrical resistivity and optical transmittance values in the visible spectrum depending on the composition, thickness and firing condition.

• 한국진공학회:학술대회논문집
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• 한국진공학회 1999년도 제17회 학술발표회 논문개요집
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• pp.172-172
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• 1999

Perovskite Manganese Oxide has been intensively investigated since the discovery of the colossal magnetoresistive(CMR) effect. In this paper, we studied the effect of temperature dependence and various doping dependence of rare earth site ions of La0.7-xPrxCa0.3MnO3 series using Ultraviolet Photoelectron spectroscopy(UPS). They show unusual temperature dependent features and the doped rare earth ions seem to affect the electron-phonon coupling strongly. We found clear evidence of metal-insulator transition from the spectral density at the Fermi level. but the transition temperature is lower than that deduced from transport measurements. Also we found that the spectral features change as time goes on implying that the surface of these materials is somewhat unstable in the vacuum. We can conclude from these results that the surface oxygen atoms correlated to the hopping electrons can escape from the material into the vacuum and that the surface state of these material is different from the bulk state.

• JSTS:Journal of Semiconductor Technology and Science
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• 제6권2호
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• pp.106-113
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• 2006

Electrical properties of $Si_{0.88}Ge_{0.12}(C)$ p-MOSFETs have been exploited in an effort to investigate $Si_{0.88}Ge_{0.12}(C)$ channel structures designed especially to suppress diffusion of dopants during epitaxial growth and subsequent fabrication processes. The incorporation of 0.1 percent of carbon in $Si_{0.88}Ge_{0.12}$ channel layer could accomodate stress due to lattice mismatch and adjust bandgap energy slightly, but resulted in deteriorated current-voltage properties in a broad range of operation conditions with depressed gain, high subthreshold current level and many weak breakdown electric field in gateoxide. $Si_{0.88}Ge_{0.12}(C)$ channel structures with boron delta-doping represented increased conductance and feasible use of modulation doped device of $Si_{0.88}Ge_{0.12}(C)$ heterostructures.