• Safety and Health at Work
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• v.12 no.2
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• pp.238-243
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• 2021

Objectives: The aim of this study was to provide baseline data for the assessment of exposure to indium and to prevent adverse health effects among workers engaged in the electronics and related industries in Republic of Korea. Methods: Total (n = 369) and respirable (n = 384) indium concentrations were monitored using personal air sampling in workers at the following 19 workplaces: six sputtering target manufacturing companies, four manufacturing companies of panel displays, two companies engaged in cleaning of sputtering components, two companies dedicated to the cleaning of sputtering target, and five indium recycling companies. Results: The level of exposure to total indium ranged from 0.9 to 609.3 ㎍/m³ for the sputtering target companies; from 0.2 to 2,782.0 ㎍/m³ for the panel display companies and from 0.5 to 2,089.9 ㎍/m³ for the indium recycling companies. The level of exposure to respirable indium was in the range of 0.02 to 448.6 ㎍/m³ for the sputtering target companies; 0.01 to 419.5 ㎍/m³ for the panel display companies; and 0.5 to 436.3 ㎍/m³ for the indium recycling companies. The indium recycling companies had the most samples exceeding the exposure standard for indium, followed by sputtering target companies and panel display companies. Conclusions: The main finding from this exposure assessment is that many workers who handle indium compounds in the electronics industry are exposed to indium levels that exceed the exposure standards for indium. Hence, it is necessary to continuously monitor the indium exposure of this workforce and take measures to reduce its exposure levels.

• Journal of the Semiconductor & Display Technology
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• v.14 no.1
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• pp.67-71
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• 2015

Pulse electroplating was studied to form nanocrystal structure effectively by changing plating current density and duty cycle. When both of plating current density and duty cycle were decreased from $100mA/cm^2$ and 70% to $50mA/cm^2$ and 30%, the P content in the Ni matrix was increased almost up to the composition of $Ni_3P$ compound and the grain growth after annealing was retarded as well. The as-plated hardness values ranging from 660 to 753 HV are mainly based on the formation of nanocrystal structure. On the other hand, the post-anneal hardness values ranging from 898 to 1045 HV, which are comparable to the hardness of hard Cr, are coming from how competition worked between the precipitation of $Ni_3P$ and the grain coarsening. According to the ANOVA and regression analysis, the plating current density showed more strong effect on nanocrystal size and film hardness than the duty cycle.

• 한국경영정보학회:학술대회논문집
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• 2008.06a
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• pp.585-589
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• 2008

LCD (Liquid Crystal Display)는 디지털 기기의 주요 구성 요소이며, 모든 크기의 FPD (Flat Panel Display) 시장에서 지배적인 시장점유율을 보인다. 그러나 많은 전문가들은 LCD 산업이 수년 내에 OLED (Organic Light Emitting Diodes), 3차원 디스플레이, 플렉서블 디스플레이와 같은 차세대 디스플레이 기술의 강력한 도전에 직면할 것이라고 예상한다. 이러한 경쟁환경에서 LCD 산업이 살아남기 위한 방안으로 본 연구에서는 LCD 산업의 경쟁력의 원천을 밝혀내고, 이를 극대화하는 전략적 방향을 제시한다. 이를 위해 먼저 LCD 산업구조와 가치사슬을 분석하여 LCD 산업의 경쟁력을 제고하기 위한 기본적인 전략적 대안을 개발한다. 이 단계에서 얻어진 통찰력을 바탕으로, 인과지도(causal loop diagram)와 시스템 다이나믹스 (system dynamics) 방법론을 활용하여 기존의 LCD 산업구조에서 판매량, 시장점유율 및 이익 등의 핵심 지표에 가장 큰 영향을 미치는 구조적 특징을 규명한다. 또한, 여기서의 다이나믹스 모형을 바탕으로, LCD 제조업자의 관점에서 프로세스 역량을 극대화할 수 있는 전략적 대안을 모색한다.

• Journal of the Semiconductor & Display Technology
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• v.12 no.4
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• pp.15-20
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• 2013

Nanoimprint lithography (NIL) is the next generation photolithography process in which the photoresist is dispensed onto the substrate in its liquid form and then imprinted and cured into a desired pattern instead of using traditional optical system. There have been considerable attentions on NIL due to its potential abilities that enable cost-effective and high-throughput nanofabrication to the display device and semiconductor industry. In this paper, a pressure vessel type imprinting system was used to imprint patterns with two type pressure values (25 bar, 30 bar) and two type pressure keeping times (5 min, 10 min). The height of transferred pattern and the thickness of residual layer were measured and effects of pressurization conditions - pressure and pressure keeping time - on the pattern transfer in thermal NIL were investigated.

• Journal of the Semiconductor & Display Technology
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• v.10 no.4
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• pp.89-94
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• 2011

In recent years there have been considerable attentions on nanoimprint lithography (NIL) by the display device and semiconductor industry due to its potential abilities that enable cost-effective and high-throughput nanofabrication. A major disadvantage of thermal NIL is the thermal cycle, that is, heating over glass transition temperature and then cooling below it, which requires a significant amount of processing time and limits the throughput. One of the methods to overcome this disadvantage is to improve the cooling performance in NIL process. In this paper, a numerical analysis model of cooling system in thermal NIL was development by CAD/CAE program and the performance of the cooling system was analyzed by the model. The calculated temperatures of nanoimprint device were verified by the measurements. By using the analysis model, the case that the cooling material is replaced by liquid nitrogen is investigated.

• 한국정보디스플레이학회:학술대회논문집
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• 2009.10a
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• pp.1590-1592
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• 2009

The ubiquitous nature of large area TFT-LCD televisions are truly one of the major success stories of consumer electronic products for the $21^{st}$ century. It is the industry's ability to lower prices over the years that have made TFT-LCD television an affordable option for the majority of consumers. TFT-LCD equipment manufacturers have played a major role these cost reduction efforts. Increasing requirements for high process quality like for eg UHD panels need to be met simultaneously with the demand of an highly productive and reliable equipment. AKT provides an excellent PVD product by improving performance and cost of ownership (CoO) for Gen8.5 and beyond.

• Journal of the Semiconductor & Display Technology
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• v.12 no.2
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• pp.93-98
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• 2013

Nanoimprint lithography (NIL) is a next generation technology for fabrication of micrometer and nanometer scale patterns. There have been considerable attentions on NIL due to its potential abilities that enable cost-effective and high-throughput nanofabrication to the display device and semiconductor industry. To successfully imprint a nanosized pattern with the thermal NIL, the process conditions such as temperature and pressure should be appropriately selected. This starts with a clear understanding of polymer material behavior during the thermal NIL process. In this paper, a filling process of the polymer resist into nanometer scale cavities during the thermal NIL at the temperature range, where the polymer resist shows the viscoelastic behaviors with consideration of stress relaxation effect of the polymer. In the simulation, the filling process and the residual layer formation are numerically investigated. And the effects of pressure and temperature on NIL process, specially the residual layer formation are discussed.

• Journal of the Semiconductor & Display Technology
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• v.16 no.4
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• pp.68-74
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• 2017

Nanoimprint lithography (NIL) is a next generation technology for fabrication of micrometer and nanometer scale patterns. There have been considerable attentions on NIL due to its potential abilities that enable cost-effective and high-throughput nanofabrication to the display device and semiconductor industry. Up to now there have been a lot of researches on thermal NIL, but most of them have been focused on polymer deformation in the molding process and there are very few studies on the cooling and demolding process. In this paper a cooling process of the polymer resist in thermal NIL is analyzed with finite element method. The modeling of cooling process for mold, polymer resist and substrate is developed. And the cooling process is numerically investigated with the effects of imprinting temperature and residual layer thickness of polymer resist on stress distribution of the polymer resist. The results show that the lower imprinting temperature, the higher the maximum von Mises stress and that the thicker the residual layer, the greater maximum von Mises stress.

• Journal of Digital Convergence
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• v.10 no.9
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• pp.159-164
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• 2012

Although the display industry plays an important role in the entire Korean economy, few empirical research has analyzed the efficiency of display companies. The purpose of this paper is to measure and analyze efficiency of korean listed display firms using DEA(Data Envelopment Analysis) models. We evaluate the CCR and BCC efficiency in DEA models and the return to scale of the Korean listed display companies. The benchmarking companies and efficiency value for the display companies with inefficiency are also provided to improve their efficiency. We analyzed the 44 listed companies consisted of 7 listed on KOSPI and 37 listed on KOSDAQ at the end of 2010. The analysis results show six companies whose values of CCR are 1, and fourteen firms whose values of BCC efficiency are 1. In additions, the six companies have the scalability efficiency. Eventually the efficiency analysis can provide the valuable information for inefficient companies to find benchmarking companies and to improve their efficiency.

• Fashion & Textile Research Journal
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• v.17 no.4
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• pp.501-512
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• 2015

This study was to consider and analyze of fashion window display design at Printemps department store in Paris, France which has tried continuously space presentations through the sensibility and differentiated strategy. The framework for analysis of this study was established by related precedent studies. Data collection was done by searching related specialty publications and website of Printemps department store, and the results of this study were drawn through qualitative analysis of experts' group. The results are as follows. Printemps department store set up presentation types of fashion window display design's themes that have been developed by the method of display presentation such as symbolic, ambience, surrealistic, realistic, and information. The most frequently used presentation development techniques applied in windows' VP of Printemps were the 'transferal of daily space', 'transferal of unexpected space', 'exaggeration of animal & plant', and 'descriptive narrative scene.' In addition, the display theme components such as the materials that can be easily accessible in everyday life, unique directing props, the memory or childhood, the image of animal or plant, and lighting etc. We found that the major colors of window display design at Printemps department store were purple, blue and black during the period from 2009 to 2014.