• 한국정밀공학회지
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• 제20권12호
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• pp.42-47
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• 2003

The laser direct writing method has some advantages of being maskless, allowing rapid and inexpensive prototyping in comparison to conventional mask-based photolithography. In general, there are two kinds of laser direct writing methods such as the laser ablation method and the laser polymerization method. The laser polymerization method was studied fur manufacturing waveguide in this paper. It is important to reduce line width for image mode waveguides, so some investigations will be carried out in various conditions of process parameters such as laser power, writing speed, focusing height and optical properties of polymer. Experimentally, the optical waveguide was manufactured trapezoid shape. Through SEM the waveguide was 20 ${\mu}{\textrm}{m}$ width and 7.4 ${\mu}{\textrm}{m}$ height.

• 한국레이저가공학회지
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• 제8권1호
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• pp.9-18
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• 2005

The laser direct writing method using a UV Argon-ion laser is studied for fabrication of waveguide. The laser direct writing system is constructed with a vision camera, a xy-stage, a motion controller and the delivery components of a laser beam. The UV Argon-ion laser has wavelength range of $333.6\~363.8$ nm. A photo-active UV curable polymer for a planar light-wave circuit(PLC) of single mode is used. This polymer is irradiated by Argon-ion laser and developed by a solvent after a post-baking. The optimum laser direct writing condition is obtained experimentally by changing various process parameters such as laser power, writing speed and focal length. The propagation and coupling loss of a optical waveguide was measured as 1dB/cm and 0.6dB/cm, respectively. Also, the minimum width of waveguide of $100{\mu}m$(ZPLW-207) is obtained. Finally, the waveguides of line, bend and branch type are successfully fabricated.

• 한국레이저가공학회지
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• 제3권2호
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• pp.25-33
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• 2000

One of perspective direction of microfabrication is direct laser writing technology that allows to create metal, semiconductive and dielectric micropatterns on substrate surface. In this work, a two step method, the combination of seed forming process, in which metallic Al seed was selectively generated on AlN ceramic substrate by direct writing technique using a pulsed Nd : YAG laser and subsequent electroless Ni plating on the activated Al seed, was presented. The effects of laser parameters such as pulse energy, scanning speed and pulse frequency on shape of Alseed and conductor line after electroless Ni plating were investigated. The nature of the laser activated surface is analyzed from XPS data. The line width of this metallic Al and Ni is analyzed using SEM. As a results, Al seed line with 24㎛ width and 100㎛ isolated line space is obtained. Finally, laser direct writing can be applied in the field between thin and thick film technique in electronic industry.

• 한국소성가공학회:학술대회논문집
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• 한국소성가공학회 2003년도 추계학술대회논문집
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• pp.391-394
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• 2003

Laser direct writing process is developed 3rd harmonic Diode Pumped Solid State Laser with the near visible wavelength of 355 m sensitive polymer is irradiated by UV laser and developed using polymer solvent to obtain quasi-3D. It is important to reduce line width for image mode waveguides, so some investigations will be carried out in various conditions of process parameters such as laser power, writing speed, laser focus and optical properties of polymer. This process could be to fabricate a single mode waveguide without expensive mask projection method. Experimentally, the patterns of trapezoidal shape were manufactured into dimension of 8.4 mm width and 7.5 mm height. Propagation loss of straight waveguide measured 3 dB/cm at 1,550 nm.

• Journal of the Optical Society of Korea
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• 제18권6호
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• pp.762-765
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• 2014

We fabricated a periodically poled lithium niobate (PPLN) by direct laser-writing of a quasi-phase-matching (QPM) structure in photolithographic process. Because we do not need to prepare a photomask by electron-beam writing, the "maskless" process shortens the fabrication time and significantly reduces the cost. We evaluated the poling quality of the direct laser-written PPLN by measuring the diffraction noise from the surface relief pattern of the fabricated QPM grating and comparing the results to those from a conventional PPLN made with a photomask. The quality of the PPLN fabricated by direct laser-writing was shown to be equivalent to that fabricated by the conventional method.

• Design & Manufacturing
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• 제2권6호
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• pp.28-32
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• 2008

Polymer solar cells are a type of organic solar cell (also called plastic solar cell), or organic photovoltaic cell that produce electricity from sunlight using polymers. It is a relatively novel technology, they are being researched by universities, national laboratories and several companies around the world. In this paper, stamping mold of barrier ribs for polymer solar cells was manufactured by lithography and electroforming which can control the height of pattern and 80nl of barrier ribs was manufactured by using hot embossing.

• 한국분말재료학회지
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• 제17권5호
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• pp.390-398
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• 2010

Aqueous gold nanoparticle dispersion was synthesized by chemical reduction method using diethanolamine as reducing agent and polyethyleneimine as dispersion stabilizer. The synthesis conditions for the stable dispersion of the gold nanoparticle suspension were determined by changing the amount of the reducing agent and dispersant during the wet chemical synthesis procedures. The face centered cubic lattice structure of the gold nanoparticles was confirmed by using X-ray diffraction and the morphologies of the nanoparticles were observed by transmission electron microscope. The synthesized gold nanoparticle dispersion was concentrated by evaporating the dispersion medium at room temperature followed by the addition of ethyleneglycol as humectant for the increase of the elastic properties to obtain gold nanoparticle inks for direct ink writing process. The line patterns were obtained with the gold nanoparticle inks during the writing procedures and the morphologies of the fine patterns were observed by scanning electron microscope.

• 한국기계가공학회지
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• 제13권2호
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• pp.41-48
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• 2014

Direct writing(DW) is a method of patterning materials to a substrate directly, without a mask. It can use a variety of materials and be applied to various fields. Among DW systems, the flow-based type, using a syringe pump and nozzle, is simpler than other types. Furthermore, the range of materials is exceptionally wide. In additive processes, a three dimensional structure is made of stacking layer. Each layer is made of several lines. In this regard, good surface roughness of fabricated layers is essential to three dimensional fabrication. The surface roughness of any fabricated layer tends to change with the dispensing pattern. When multiple layers fabricated by a nozzle dispensing system are stacked, control of the nozzle position from the substrate is important in order to avoid interference between the nozzle and the fabricated layer. In this study, a fluid direct writing system for three dimensional structure fabrication was developed. Experimentsto control the position of the nozzle from substrate were conducted in order to examine the characteristics of the material used in this system.

• 한국레이저가공학회지
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• 제14권3호
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• pp.17-20
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• 2011

We fabricated a multi-layer diffraction grating inside fused silica glass by using a femtosecond laser direct writing method. The femtosecond laser with a wavelength of 515 nm, a pulse width of 250 fs, a repetition rate of 100 kHz, and an average output power of 6 W was used. Two layer diffraction grating with a grating period of $6{\mu}m$ was successfully fabricated with the layer gap of 0.5, 1, 2, 3, and $5{\mu}m$, respectively. Also, we investigated the diffraction pattern by illuminating a He-Ne laser beam. Finally, we demonstrated the diffraction grating with a grating period of $3{\mu}m$ by adjusting the gap of each layer with a grating period of $6{\mu}m$. Femtosecond laser direct writing technology of multi-layer has a potential to fabricate the diffraction grating with a grating period of below $1.5{\mu}m$.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2002년도 춘계학술대회 논문집
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• pp.503-507
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• 2002

Mask manufacturing is a high COC and COO process in developing of semiconductor devices, because of the mass production tool with high resolution. Direct writing has been thought to be one of the patterning method to cope with development or small-lot production of the device. This study focused on the development of the direct, mastless patterning process using stereolithography tool for the easy and convenient application to micro and miso scale products. Experiments are utilized by three dimensional CAD/CAM as a mask and photo-curable resin as a photo-resist in a conventional stereo-lithography apparatus. Results show that the resolution of the pattern was achieved about 300 micron because of complexity of SLA apparatus settings, inspite of 100 micro of inherent resolution. This paper concludes that photo resist and laser spot diameter should be adjusted to get finer patterns and the proposed method is significantly feasible to mastless and low cost patterning with micro and miso scale.