• Applied Microscopy
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• v.45 no.2
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• pp.101-105
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• 2015

Numerous digital image analysis techniques have been developed with regard to transmission electron microscopy (TEM) with the help of programming. DigitalMicrograph (DM, Gatan Inc., USA), which is installed on most TEMs as operational software, includes a script language to develop customized software for image analysis. Based on the DM script language, this work provides a script source listing for quantitative strain measurements based on a geometric phase analysis.

• Journal of Powder Materials
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• v.24 no.4
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• pp.285-291
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• 2017

We propose a custom analysis technique for the dark field (DF) image based on transmission electron microscopy (TEM). The custom analysis technique is developed based on the $DigitalMicrograph^{(R)}$ (DM) script language embedded in the Gatan digital microscopy software, which is used as the operational software for most TEM instruments. The developed software automatically scans an electron beam across a TEM sample and records a series of electron diffraction patterns. The recorded electron diffraction patterns provide DF and ADF images based on digital image processing. An experimental electron diffraction pattern is recorded from a IrMn polycrystal consisting of fine nanograins in order to test the proposed software. We demonstrate that the developed image processing technique well resolves nanograins of ~ 5 nm in diameter.

• Applied Microscopy
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• v.51
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• pp.10.1-10.9
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• 2021

We investigate the sensitivity of symmetry quantification algorithms based on the profile R-factor (R_p) and the normalized cross-correlation (NCC) coefficient (γ). A DM (Digital Micrograph^©) script embedded in the Gatan digital microscopy software is used to develop the symmetry quantification program. Using the Bloch method, a variety of CBED patterns are simulated and used to investigate the sensitivity of symmetry quantification algorithms. The quantification results show that two symmetry quantification coefficients are significantly sensitive to structural changes even for small strain values of < 1%.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2014.11a
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• pp.176-177
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• 2014

The new algorithm was proposed to quantify symmetry recorded in convergent beam electron diffraction (CBED) patterns and symmetry mapping. The proposed algorithm is based on the normalized cross-correlation coefficient (${\gamma}$) for quantifying the amount of symmetry in a CBED pattern. The quantification and mapping procedures are automatically controlled by the script implemented in Gatan Digital Micrograph$^{(c)}$. We apply the quantitative CBED measurement to a strained Si sample to test the sensitivity to defects.