• 제목/요약/키워드: Diffraction grating

검색결과 245건 처리시간 0.025초

오목 거울 측정용 위상천이 회절격자 간섭계 (Phase-shifting diffraction grating interferometer for testing concave mirrors)

  • 황태준;김승우
    • 한국광학회지
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    • 제14권4호
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    • pp.392-398
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    • 2003
  • 구면 거울을 정밀하고 정확하게 측정할 수 있는 위상천이 회절격자 간섭계를 제시한다. 간섭계는 하나의 회절격자를 이용하여 간섭계의 기준광과 측정광을 분할하고, 다시 결합시켜 간섭무늬를 생성시키고 위상천이 시키는 간단한 구조로 설계되었다. 광원으로부터의 광을 큰 수치구경인 고정도의 집속렌즈의 초점에 위치한 회절격자 위에 집속하여 반사회절된 파면을 기준파면과 측정파면으로 사용한다 부가적인 기준면이 없이 회절격자 위의 매우 작은 영역이 기준면을 대신하므로 시스템 오차가 작다. 광섬유 형태의 공초점현미경 구조를 광원과 집속렌즈 사이에 설치하여 집속렌즈와 회절격자사이의 정렬오차를 최소화 하였다. 회절격자를 광축에 수직한 방향으로 이송함으로써 기준파면과 측정파면사이에 상대적인 위상천이를 일으켜서 일련의 위상천이된 간섭무늬를 쉽게 획득할 수 있다. 간섭계를 제작하고, 결상렌즈와 CCD를 이용해서 얻은 위상천이된 대상구면 거울의 간섭무늬들을 해석하여 전체적인 간섭계 시스템의 성능을 평가해 보았다.

기록빔의 편광상태에 따른 $AS_{40}Se_{15}S_{35}Ge_{10}$ 박막에서 홀로그래피 회절격자형성 특성 (Characteristics of Holographic Diffraction Grating Formation on $AS_{40}Se_{15}S_{35}Ge_{10}$ Thin Film with the Polarization State of Recording Beam)

  • 박정일;정홍배
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제55권9호
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    • pp.423-428
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    • 2006
  • We have been carried out the two-beam interference method to form the diffraction grating on chalcogenide $AS_{40}Se_{15}S_{35}Ge_{10}$ thin films for Holography Data Storage (HDS). In the present work, we have been formed holographic diffraction gratings using He-Ne laser (632.8nm) under different Polarization state combinations (intensity polarization holography, phase polarization holography). It was obtained the diffraction grating efficiency by 11st order intensity and investigated the formed grating structure using Atomic Force Microscopy (AFM). As the results, it is shown that the diffraction efficiency of (P: P) polarized recording was maximum 2.4% and we found that its value was rather higher than that of other-polarized recordings. From the results, it is confirmed that the efficient holographic grating formation on amorphous chalcogenide $AS_{40}Se_{15}S_{35}Ge_{10}$ films depend on both the spatial variation of intensity and the polarization state of the incident field pattern.

Symmetry Exploitation of Diffraction Gratings to Enhance the Spectral Resolution

  • Lee, Eun-Seong;Lee, Jae-Yong
    • Journal of the Optical Society of Korea
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    • 제15권3호
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    • pp.216-221
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    • 2011
  • A diffraction grating is a highly symmetric optical element with a physical structure that is invariant under translational spatial movements. The translational symmetry is reflected in the fields that are diffracted from the grating. Here, we introduce a plane-parallel mirror pair onto the grating, which translates the fields through double reflections, and we describe a method of exploiting the symmetry to enhance the spectral resolution of a diffraction grating beyond the limit that is set by the number of grooves. The mirror pair creates another virtual grating beside the original one, effectively doubling the number of grooves. Addition of more mirror pairs can further increase the effective number of grooves despite the increased complexity and difficulty of experimental implementation. We experimentally demonstrate the spectral linewidth reduction by a factor of four in a neon fluorescence spectrum. Even though the geometrical restriction on the mirror deployment limits our method to a certain range of the whole spectrum, as a practical application example, a bulky spectrometer that is nearly empty inside can be made compact without sacrificing the resolution.

AsGeSeS(10,20,40,80nm) 박막에서의 홀로그래픽 격자 형성 (Holographic grating formation in AsGeSeS(10,20,40,80nm) thin films)

  • 이기남;여철호;김종빈;이영종;정홍배
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 춘계학술대회 논문집 디스플레이 광소자분야
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    • pp.119-122
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    • 2004
  • This paper discovers that we form holographic grating in AsGeSeS thin film. Holographic grating is not developed in the length of 10,20,40nm, while it is formed in the thin film of 80nm though it shows very low diffraction efficiency. On the contrary, holographic grating is established in every thin film of Ag(10nm)/AsGeSeS(10,20,40,80nm). Lattice in 10,20 nm thin film builds up, and immediately disappears. In the case of 40nm thin film, even if holographic grating is made up, it seems to have a low diffraction efficiency. Apart from 10,20,40nm, it shows the highest diffraction efficiency in the thin film of 80nm.

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2-Dimensional Holographic Grating Formation in Chalcogenide Thin Films

  • Lee, Jung-Tae;Yeo, Choel-Ho;Chung, Hong-Bay
    • Transactions on Electrical and Electronic Materials
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    • 제5권1호
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    • pp.34-37
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    • 2004
  • Amorphous chalcogenide thin films, especially a-(Se, S) based films, exhibit a number of photo-induced phenomena. In this study, we make the As$\_$40/Ge$\_$10/Se$\_$15/S$\_$35//Ag thin film and then we measure the holographic diffraction efficiency according to thickness of Ag. And we form the two-dimensional holographic grating. At first, we formed one-dimensional grating and then we form two-dimensional grating by rotate the sample. We found out the most suitable thickness of Ag and in case of As$\_$40/Ge$\_$10/Se$\_$15/S$\_$35//Ag(600${\AA}$), the diffraction efficiency was more higher than other samples. The holographic grating was formed by He-Ne laser(λ=632.8nm). The intensity of incident beam was 2.5mW and incident angle was 20$^{\circ}$. We confirm. the two-dimensional holographic grating by the pattern of diffracted beam and AFM(Atomic Force Microscope) image. We perform the etching process using by 0.26N NaOH in order to confirm clearly two-dimensional grating.

DPSS laser에 의한 비정질 칼코게나이드 박막의 홀로그래픽 격자형성 (Holographic Grating Formation of Chalcogenid Thin Films By the DPSS laser)

  • 구용운;남기현;정홍배
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2008년도 제39회 하계학술대회
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    • pp.1440-1441
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    • 2008
  • In this paper, we investigated the diffraction grating efficiency on AsSeS and Ag-doped amorphous chalcogenide Ag/AsSeS thin film for used to volume hologram. The Chalcogenide film thickness was 0.5um and Ag thin film was varied from 10nm and 20nm. Diffraction efficiency was obtained from (P:P) polarized Diode Pumped Solid State laser(DPSS, 532.0nm: 200mW) beam on AsSeS and Ag/AsSeS thin films. As a results, diffraction grating was not formed at AsSeS thin film but at Ag-doped AsSeS thin film, diffraction grating was formed well compare with the former.

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회절 격자 표식을 이용한 강체의 다자유도 변위 측정 (Multi-Degree-of-Freedom Displacement Measurement of a Rigid Body Using a Diffraction Grating as a Cooperative Target)

  • 김종안;배의원;김경찬;김수현;곽윤근
    • 대한기계학회:학술대회논문집
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    • 대한기계학회 2000년도 춘계학술대회논문집A
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    • pp.415-419
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    • 2000
  • Multi-degree-of-freedom (MDOF) displacement measurement Is needed In many application fields: precision machine control, precision assembly, vibration analysis, and so on. This paper presents a new MDOF displacement measurement method using a laser diode (LD), two position-sensitive detectors (PSDs), and a conventional diffraction grating. It utilizes typical features of a diffraction grating to obtain the information of MDOF displacement. MDOF displacement is calculated from the independent coordinate values of the diffracted ray spots on the PSDs. Forward and inverse kinematic problems were solved to compute the MDOF displacement of a rigid body. Experimental results show maximum absolute errors of less than ${\pm}10$ micrometers in translation and ${\pm}30$ arcsecs in rotation.

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튜닝가능한 역반구형의 브래그 그레이팅 센서 (A tunable inverse-hemisphere-shaped Bragg grating sensor)

  • 류윤하;김경식
    • 정보저장시스템학회논문집
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    • 제9권2호
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    • pp.48-50
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    • 2013
  • 본 연구에서는 소프트 리소그래피를 이용하여 주기 튜닝이 가능한 PDMS 그레이팅을 제작하고, 그레이팅을 톨루엔에 담궈 주기를 늘리며 회절파장의 변화를 관찰하였다. 주기가 커짐에 따라 회절파장이 긴 파장 쪽으로 변화하였다. 본 장치는 여러 가지 용매에 대한 화학 센서로 응용이 가능할 것이다.

광 회절계를 이용한 격자 피치 표준 시편의 측정 및 불확도 해석 (Measurement of Grating Pitch Standards using Optical Diffractometry and Uncertainty Analysis)

  • 김종안;김재완;박병천;강주식;엄태봉
    • 한국정밀공학회지
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    • 제23권8호
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    • pp.72-79
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    • 2006
  • We measured grating pitch standards using optical diffractometry and analyzed measurement uncertainty. Grating pitch standards have been used widely as a magnification standard for a scanning electron microscope (SEM) and a scanning probe microscope (SPM). Thus, to establish the meter-traceability in nano-metrology using SPM and SEM, it is important to certify grating pitch standards accurately. The optical diffractometer consists of two laser sources, argon ion laser (488 nm) and He-Cd laser (325 nm), optics to make an incident beam, a precision rotary table and a quadrant photo-diode to detect the position of diffraction beam. The precision rotary table incorporates a calibrated angle encoder, enabling the precise and accurate measurement of diffraction angle. Applying the measured diffraction angle to the grating equation, the mean pitch of grating specimen can be obtained very accurately. The pitch and orthogonality of two-dimensional grating pitch standards were measured, and the measurement uncertainty was analyzed according to the Guide to the Expression of Uncertainty in Measurement. The expanded uncertainties (k = 2) in pitch measurement were less than 0.015 nm and 0.03 nm for the specimen with the nominal pitch of 300 nm and 1000 nm. In the case of orthogonality measurement, the expanded uncertainties were less than $0.006^{\circ}$. In the pitch measurement, the main uncertainty source was the variation of measured pitch values according to the diffraction order. The measurement results show that the optical diffractometry can be used as an effective calibration tool for grating pitch standards.

DPSS Laser에 의한 AsGeSeS,Ag/AsGeSeS 와 AsGeSeS/Ag/AsGeSeS 박막의 홀로그래픽 데이터 격자형성 (Holographic Data Grating Formation of AsGeSeS Single layer, Ag/AsGeSeS double layer And AsGeSeS/Ag/AsGeSeS Muti-layer Thin Films with the DPSS Laser)

  • 구용운;구상모;조원주;정홍배
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2006년도 추계학술대회 논문집 전기물성,응용부문
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    • pp.55-56
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    • 2006
  • We investigated the diffraction grating efficiency by the DPSS laser beam wavelength to improve the diffraction efficiency on AsGeSeS & Ag/ AsGeSeS thin film. Diffraction efficiency was obtained from DPSS(532nm)(P:P)polarized laser beam on AsGeSeS, Ag/ AsGeSeS and AsGeSeS/Ag/AsGeSeS thin films. As a result, for the laser beam intensity, 0.24 mW, single AsGeSeS thin film shows the highest value of 0.161% diffraction efficiency at 300 s and for 2.4 mW, it was recorded with the fastest speed of 50 s, which the diffraction grating forming speed is faster than that of 0.24 mW beam. Ag/ AsGeSeS and AsGeSeS/ Ag/ AsGeSeS multi-layered thin film also show the faster grating forming speed at 2.4 mW and higher value of diffraction efficiency at 0.24 mW.

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