• Title/Summary/Keyword: Dielectric materials

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Temperature-dependent dielectric relaxation in ITO/Alq3/Al organic light-emitting diodes

  • Ahn, Joonho;Kim, Tae Wan;Lee, Won Jae
    • Journal of Ceramic Processing Research
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    • 제13권spc2호
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    • pp.163-165
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    • 2012
  • Impedance spectroscopy informs electrical properties of materials as accumulated charges, contact status between electrode and organic materials. We carried out impedance spectroscopy of organic light-emitting diodes as ITO/Alq3(60 nm)/Al on temperatures from 10 K to 300 K. The result described Z'-Z" plot, cole-cole plot and dielectric relaxation time τ. Z'-Z" plot means that real and imaginary part of materials in organic and electrode by frequencies and temperature. Z' as real part of impedance by applied frequency depending on temperature shows the plateau in low frequency region as Rs+ Rp and over 100 kHz in high frequency region as Rs. Cole-cole plot shows resistance of materials in equivalent circuit of the device by temperatures. And equivalent circuit and dielectric relaxation could be accomplished by using the complex impedance analysis.

Dielectric Properties of Epoxy/Micro-sized Alumina Composite and of Epoxy/Micro-sized/Nano-sized Alumina Composite

  • Park, Jae-Jun
    • Transactions on Electrical and Electronic Materials
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    • 제16권6호
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    • pp.338-341
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    • 2015
  • Epoxy/micro-sized alumina composite was prepared, and the effects of alumina content on the dielectric properties were investigated in order to develop an insulation material for gas-insulated switchgears (GIS). Nano-sized alumina (average particle size: 30 nm) was also incorporated into the epoxy/micro-sized alumina composite. Dielectric tests were carried out in ASTM D 150, and capacitance (Cp) and dielectric loss (tanδ) were measured. The dielectric constant increased with increasing alumina content in the epoxy/micro-alumina system and the epoxy/micro-alumina/nano-alumina system. As 1,3-diglycidyl glyceryl ether (DGE) content increased, the dielectric constant decreased and dielectric loss increased. This ocurred as a result of the weak electric field enhancement due to homogeneous dispersion of micro- and nano-sized alumina particles in an epoxy composite.

Effect of the Front Dielectric Layer on the Efficacy of the Plasma Display Panel

  • Moon, Won-Seok;Oh, Jin-Mok;Seo, Byung-Hwa;Lee, Sung-Wook;Byun, Na-Mi;Cho, Yun-Hui;Ryu, Byung-Gil;Kim, Sung-Tae
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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    • pp.31-34
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    • 2009
  • We investigated the effect of relative dielectric constant of front dielectric layer on the efficacy of plasma display panel. Dielectric materials with relative dielectric constant of around 6 and 7 were developed. When the front dielectric layer had a low relative dielectric constant, power consumption decreased more than luminance did. And it led to efficacy enhancement. However, the minimum sustain voltage increased.

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투명 유전체 PbO-B$_2$O$_3$-${SiO_2}-{Al_2}{O_3}$의 물성 및 전극(ITO)과의 반응성 연구 (Characteristics of transparent dielectric in PbO-B$_2$O$_3$-${SiO_2}-{Al_2}{O_3}$ system and investigation of reaction between dielectric and electrode(ITO))

  • 이재열;홍경준;김덕남;김형순;허증수
    • 한국재료학회지
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    • 제11권4호
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    • pp.305-311
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    • 2001
  • PDP용 투명유전체 재료로 사용되는 $PbO-B_2O_3-SiO_2-Al_2O_3$계의 소성과정 중에서 투명전극 (ITO)과의 반응성 및 광학적, 열적, 전기적 특성을 조사하였다. 본 연구에서 유전체막.두께는 12$\mu\textrm{m}$으로, 온도는 550-58$0^{\circ}C$에서 소성한 후 여러 물성을 평가하였다 그 결과로, 유전체와 투명전극(ITO)의 반용에서, In 이온이 유전체층으로 확산이동하였으며, Sn 확산은 거의 발생하지 않았다. 선팽창계수, 유전상수, 유리전이온도,광 투과율은 유전체 조성의 PbO 양에 큰 영향을 받았다. PbO양 증가는 선팽창계수와 유전상수를 증가시킨 반면, 유리전이온도와 광 투과율온 저하시켰다. $Al_2O_3/B_2O_3$ 비가 증가함에 따라서는 선팽창계수는 감소, 유전상수는 증가, 광 투과율은 감소하였으며, 유리 전이점 변화는 거의 나타나지 않았다.

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Micorstructure and Microwave Dielectric Propertics of Ni-doped $(Zr_{0.8}Sn_{0.2})TiO_4$ Ceramics

  • Lee, Dal-Won;Sahn Nahm;Kim, Myong-Ho;Byun, Jae-Dong
    • The Korean Journal of Ceramics
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    • 제2권3호
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    • pp.162-166
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    • 1996
  • The effects of NiO addition on the microstructure and microwave dielectric properties of ($Zr_{08}Sn_{02}$)$TiO_4$ (ZST) were investigated. With the NiO addition, a higher density of ZST ceramics than 95% of the theoretical values has been obtained in the sintering temperature range of 1400 to 150$0^{\circ}C$. Energy dispersive X-ray spectrometry (EDS) analysis of sintered specimen shows the presence of second phase at grain boundaries, which is considered to be $NiTiO_3$. Dielectric constant of the specimen is found to increase linearly with density. Q-values and TC$_r$ decrease with increasing NiO content. The variation of dielectric properties with NiO content is discussed in terms of the second phase. The ZST ceramics with 0.25 wt% NiO showed ${\varepsilon}_{\gamma}$=38, Q=7000 at GHz and TC$\gamma$=-0.5 ppm/$^{\circ}C$, comparable with the values obtained by the previous investigations.

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Particle Size Effects on Microstructure Evolution and Microwave Dielectric Characteristics in $0.93MgTiO_3-0.07CaTiO_3$Ceramics

  • Lee, Jung-A;Kim, Jeong-Joo;Kim, Nam-Kyong;Cho, Sang-Hee;Hahn, Jin-Woo
    • The Korean Journal of Ceramics
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    • 제5권3호
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    • pp.260-264
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    • 1999
  • Effect of the particle size of $MgTiO_3$ and $CaTiO_3$ on the microstructural evolution during sintering of $0.93MgTiO_3-0.07CaTiO_3$ system was investigated. Microwave dielectric characteristics of the sintered ceramics were also measured. The microstructural evolutions were explained with an emphasis on the entrapping behavior of $CaTiO_3$ grain into the $MgTiO_3$ grain and were correlated with microwave dielectric characteristics. With an increasing particle size ratio between $CaTiO_3$and $MgTiO_3$, the fraction of entraped $CaTiO_3$ grains increased, which grain growth of $MgTiO_3$were concurrently accelerated due to decreasing drag force of its boundary migration. Besides, $CaTiO_3$-grain entrapment into the $MgTiO_3$grain interior led to decreaseing quality factor values.

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PE-CVD를 이용한 45nm이하급 저유전물질 DEMS(Diethoxymethylsiliane) 박막증착연구 (Thin Films Deposition Study Using Plasma Enhanced CVD with Low Dielectric Materials DEMS(diethoxymethlysiliane) below 45nm)

  • 강민구;김대희;김영철;서화일
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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    • pp.148-148
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    • 2008
  • Low-k dielectric materials are an alternative plan to improve the signal propagation delay, crosstalk, dynamic power consumption due to resistance and parasitic capacitance generated the decrease of device size. Now, various materials is studied for the next generation. Diethoxymethlysiliane (DEMS) precursor using this study has two ethoxy groups along with one methyl group attached to the silicon atoms. SiCOH thin films were deposited on p-type Si(100) substrate by Plasma Enhanced Chemical Vapor Deposition (PECVD) using DEMS. In this study, we studied the effect of oxygen($O_2$) flow rate for DEMS to characteristics of thin films. The characteristics of thin films deposited using DEMS and $O_2$ evaluated through refractive index, dielectric constant(k), surface roughness, I-V(MIM:Al / SiCOH / Ag), C-V(MIM), deposition rate.

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Densification and Dielectric Properties of Ba0.5Sr0.5TiO3-Glass Composites for LTCC Applications

  • Shin, Hyun-Ho;Byun, Tae-Hun;Yoon, Sang-Ok
    • 한국세라믹학회지
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    • 제49권1호
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    • pp.100-104
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    • 2012
  • Barium zincoborate (BZB) glass was added to $Ba_{0.5}Sr_{0.5}TiO_3$, and sintered at $875^{\circ}C$ for 2 h in air. When the BZB glass was added in quantities ranging from 15 to 20 wt%, the relative bulk density ranged from 93.1% to 94.2%, while the density decreased to roughly 81% thereafter up to 30 wt% glass addition. Quantitative XRD analysis showed that the $Ba_{0.5}Sr_{0.5}TiO_3$ filler was significantly dissolved into the BZB glass. However, no secondary phase was identified by XRD up to 30 wt% glass addition. The dielectric constant was about 130 to 140 at 1MHz up to 20 wt% BZB glass addition, while it decreased to about 60 thereafter, which may be ascribed to decreased density, partial dissolution of the $Ba_{0.5}Sr_{0.5}TiO_3$, and associated changes in the glass composition. The dielectric loss of the 20 wt% glass added specimen was 0.008.

Ni가 첨가된 $(Zr_{0.8}Sn_{0.2})$TiO$_4$세라믹스의 미세구조와 고주파유전성질 (Microstructure and Microwave Dielectric Properties of Ni-doped $(Zr_{0.8}Sn_{0.2})$TiO$_4$ Ceramics)

  • 이달원;남산;변재동;김명호
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1996년도 추계학술대회 논문집
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    • pp.59-62
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    • 1996
  • The effect of NiO addition on the microstructure and microwave dielectric properties of (Zr$_{0.8}$Sn$_{0.2}$)TiO$_4$(ZST) was investigated. With the NiO addition, a dense ZST body of density higher than 95% has been achieved in the sintering temperature range of 1400 to 150$0^{\circ}C$. Energy dispersive X-ray spectrometry (EDS) analysis of sintered specimen shows the presence of second phase at grain boundaries, which is considered to be NiTiO$_3$. Dielectric constant of the specimen is found to increase linearly with density. Q-values and TC$_{f}$decrease with increasing NiO content. The variation of dielectric properties with NiO content is discussed in term of the second phase. The ZST ceramics with small amount of additive gave $\varepsilon$$_{r}$=38, Q=7000 at 7 GHz and TC$_{f}$=-0.5 ppm/$^{\circ}C$, comparable with the values obtained by previous investigation.stigation.

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Silver-Tantalate-Niobate Thick Film의 유전 특성 연구 (A Study of the Dielectric Properties of the Silver-Tantalate-Niobate Thick Films)

  • 이규탁;윤석우;강이구;고중혁
    • 한국전기전자재료학회논문지
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    • 제23권7호
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    • pp.521-524
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    • 2010
  • Low loss perovskite niobates and tantalates have been placed on a short list of functional materials for future technologies. In this study, we fabricated Ag(Ta,Nb)$O_3$ thick films on the $Al_2O_3$ substrates by the screen printing method. The Ag(Ta,Nb)$O_3$ powders were fabricated by the mixed oxide method. The sintering temperature and time were $1150^{\circ}C$ and 2 hrs, respectively. The results of XRD analysis showed that the specimens employed in this study had the pesudo cubic structure. The dielectric permittivity and loss tangent of the films have been characterized from 1 kHz to 1 MHz. Also the dielectric permittivity and loss tangent were measured from 303 K to 393 K. The electrical properties of the film are also discussed.