• 제목/요약/키워드: Dielectric capacitor

검색결과 447건 처리시간 0.028초

환형띠 조각면을 이용한 원형 축전기의 수치해석 (Numerical Analysis of a Round Disk Capacitor Using Annular Patch Subdomains)

  • 구본희;김채영
    • 대한전자공학회논문지
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    • 제27권6호
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    • pp.843-850
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    • 1990
  • A numerical method is presented for determining the static charge distribution and the capacitance of a round disk capacitor. In the employed numerical scheme annular patch subdomains are introduced to reduce the matrix size and to mprove the accuracy of the numerical calculations. The method of moments is utilized to calculate the charge distribution, and the capacitance and equipotential lines are also found from the numerically computed charge distributions. To show the validity of the results the proposed method is applied to the round disk and the dielectric filled capacitor.

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A Novel Inter-Digital Tunable Capacitor for Low-Operation Voltage Applications

  • Lee, Young Chul
    • 한국정보통신학회:학술대회논문집
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    • 한국정보통신학회 2012년도 추계학술대회
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    • pp.586-589
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    • 2012
  • In this paper, a tunable capacitor like an interdigital one is presented for low-voltage applications. In order to reduce operation voltage by enhancing fringing electric fields, two finger-patterned electrodes are vertically separated by employing a multi-layer thin film dielectric of a para-/ferro-/para-electrics without spacing between electrodes. The proposed tunable capacitor was fabricated on a quartz wafer and its characteristics are analyzed in terms of effective capacitance and tunability with a function of applied voltages, compared to the conventional interdigital capacitor (IDC). At 8V and 2 GHz, the proposed tunable capacitor shows the tunability of 18 % that is 10.3 % higher than that of the compared one.

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Hafnium Oxide Layer Based Metal-Oxide-Semiconductor (MOS) Capacitors with Annealing Temperature Variation

  • 이나영;최병덕
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.318.1-318.1
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    • 2016
  • Hafnium Oxide (HfOx) has been attracted as a promising gate dielectric for replacing SiO2 in gate stack applications. In this paper, Metal-Oxide-Semiconductor (MOS) capacitor with solution processed HfO2 high-k material as a dielectric were fabricated. The solvent using $HfOCl2{\cdot}8H2O$ dissolve in 2-Methoxy ethanol was prepared at 0.3M. The HfOx layers were deposited on p-type silicon substrate by spin-coating at $250^{\circ}C$ for 5 minutes on a hot plate and repeated the same cycle for 5 times, followed by annealing process at 350, 450 and $550^{\circ}C$ for 2 hours. When the annealing temperature was increased from 350 to $550^{\circ}C$, capacitance value was increased from 337 to 367 pF. That was resulted from the higher temperature of HfOx which have more crystallization phase, therefore dielectric constant (k) was increased from 11 to 12. It leads to the formation of dense HfOx film and improve the ability of the insulator layer. We confirm that HfOx layer have a good performance for dielectric layer in MOS capacitors.

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Zirconium Titanate 세라믹 유전체에서 $Ta_2O_{5}$ 첨가가 유전특성에 미치는 영향 (The Influence of $Ta_2O_{5}$ Addition on Dielectric Characteristics of Zirconium Titanate Ceramics)

  • 이석진;이창화;이상석;최태구
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1992년도 춘계학술대회 논문집
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    • pp.129-132
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    • 1992
  • Rutile was among the first dielectric materials used. However, rutile exhibits a very high temperature coefficient of capacitance (about -750[ppm/$^{\circ}C$]) which resticts its practical application. Since this first use of titania, other materials have also been studied with the object of decreasing the temperature dependence whilst retaining favorable dielectric loss, Q, and relative permittivity. The temperature coefficient of temperature compensation capacitor is +100~750[ppm/$^{\circ}C$], dielectric constant 10~150. Low loss ceramics with dielectric constants in the 10~150 range also found application. Recently, their applications are extended in EMI filter and dielectric materials for microwave. There temperature coefficient of dielectric materials approaches 0[ppm/$^{\circ}C$]. The dielectric preperties of zirconia titanate ceramics prepared by addition of $Ta_2O_{5}$ were investigated.

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임베디드 커패시터의 응용을 위해 CCL 기판 위에 평가된 BMN 박막의 특성 (The Properties of $Bi_2Mg_{2/3}Nb_{4/3}O_7$ Thin Films Deposited on Copper Clad Laminates For Embedded Capacitor)

  • 김혜원;안준구;안경찬;윤순길
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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    • pp.45-45
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    • 2007
  • Capacitors among the embedded passive components are most widely studied because they are the major components in terms of size and number and hard to embed compared with resistors and inductors due to the more complicated structure. To fabricate a capacitor-embedded PCB for in-line process, it is essential to adopt a low temperature process (<$200^{\circ}C$). However, high dielectric materials such as ferroelectrics show a low permittivity and a high dielectric loss when they are processed at low temperatures. To solve these contradicting problems, we studied BMN materials as a candidate for dielectric capacitors. processed at PCB-compatible temperatures. The morphologies of BMN thin films were investigated by AFM and SEM equipment. The electric properties (C-F, I-V) of Pt/BMN/Cu/polymer were evaluated using an impedance analysis (HP 4194A) and semiconductor parameter analyzer (HP4156A). $Bi_2Mg_{2/3}Nb_{4/3}O_7$(BMN) thin films deposited on copper clad laminate substrates by sputtering system as a function of Ar/$O_2$ flow rate at room temperature showed smooth surface morphologies having root mean square roughness of approximately 5.0 nm. 200-nm-thick films deposited at RT exhibit a dielectric constant of 40, a capacitance density of approximately $150\;nF/cm^2$, and breakdown voltage above 6 V. The crystallinity of the BMN thin films was studied by TEM and XRD. BMN thin film capacitors are expected to be promising candidates as embedded capacitors for printed circuit board (PCB).

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투명전자소자를 위한 HfO2계 투명 MIM 커패시터 특성연구 (Characteristics of Transparent Mim Capacitor using HfO2 System for Transparent Electronic Device)

  • 조영제;이지면;곽준섭
    • 한국진공학회지
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    • 제18권1호
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    • pp.30-36
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    • 2009
  • 투명 전자소자의 고유전 $HfO_2$ 절연막을 개발하기 위하여, ITO/$HfO_2$/ITO 금속-절연체-금속 (Metal-Insulator-Metal, MIM) 커패시터 구조를 형성한후 $HfO_2$ 박막의 두께에 따른 전기적, 광학적, 구조적 특성의 변화를 연구하였다. $HfO_2$ 박막의 두께가 50 nm에서 300 nm로 증가함에 따라 유전상수는 20에서 10이하로 감소하였으나, $HfO_2$ 두께가 증가함에 따라 누설전류는 감소하여 200 nm 이상의 두께에서는 $2.7{\times}10^{-12}\;A/cm^2$ 이하의 낮은 누설전류 특성을 나타내었다. ITO/$HfO_2$/ITO MIM 커패시터의 $HfO_2$ 박막의 두께가 50 nm에서 300 nm로 증가함에 따라 투과율은 감소하였으나 300 nm 두께에서도 가시광선 영역에서 80% 이상의 투과율을 나타내어 우수한 투과도 특성을 나타내었다.

Humidity Sensor Using an Air Capacitor

  • Choi, Jin Moon;Kim, Tae Wan
    • Transactions on Electrical and Electronic Materials
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    • 제14권4호
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    • pp.182-186
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    • 2013
  • We studied the possibility that an air capacitor can be used as a humidity sensor by measuring capacitance change. In order to investigate the possibility, the change of capacitance of an air capacitor due to moisture in air was first considered theoretically, and was then experimentally verified. The capacitance was measured by an LCR impedance meter with a 100-kHz and 1-V ac. The results revealed that the changes in the experimentally measured capacitances were greater than those in the theoretically calculated values. Based on this fact, we knew that an air capacitor could be used as part of a humidity sensing device. We expect the humidity sensor with an air capacitor has characteristics of fast response time, high reliability, and high durability compared with other conventional methods.

C0G 온도계수 특성을 가지는 고압용 적층 칩 캐패시티의 유전 및 내전압 특성 (Dielectric Breakdown Voltage and Dielectric Properties of High Voltage Mutilayer Ceramic Capacitor with C0G Temperature Coefficient Characteristics)

  • 윤중락;우병철;정태석
    • 한국전기전자재료학회논문지
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    • 제21권2호
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    • pp.137-143
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    • 2008
  • High voltage MLCCs with C0G temperature coefficient characteristics could apply DC-DC invertor were investigated for its dielectric properties. Also we manufactured MLCC through various process and studied the characteristics of dielectric break down voltage [BDV] and dielectric property as the variation of thickness in the green sheet and how to pattern the internal electrode. As the thickness of green sheet is increase, the dielectric BDV per unit thickness is decreased. But as the pattern of internal electrodes were floated we could manufacture the high voltage MLCC maintained its dielectric BDV a unit.

Electrical Properties of BaTiO3-based 0603/0.1µF/0.3mm Ceramics Decoupling Capacitor for Embedding in the PCB of 10G RF Transceiver Module

  • Park, Hwa-sun;Na, Youngil;Choi, Ho Joon;Suh, Su-jeong;Baek, Dong-Hyun;Yoon, Jung-Rag
    • Journal of Electrical Engineering and Technology
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    • 제13권4호
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    • pp.1638-1643
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    • 2018
  • Multi-layer ceramic capacitors as decoupling capacitor were fabricated by dielectric composition with a high dielectric constant. The fabricated decoupling capacitors were embedded in the PCB of the 10G RF transceiver module and evaluated for the characteristics of electrical noise by the level of AC input voltage. In order to further improve the electrical properties of the $BaTiO_3$ based composite, glass frit, MgO, $Y_2O_3$, $Mn_3O$, $V_2O_5$, $BaCO_3$, $SiO_2$, and $Al_2O_3$ were used as additives. The electrical properties of the composites were determined by various amounts of additives and optimum sintering temperature. As a result of the optimized composite, it was possible to obtain a density of $5.77g/cm^3$, a dielectric constant of 1994, and an insulation resistance of $2.91{\times}10^{12}{\Omega}$ at an additive content of 5wt% and a sintering temperature of $1250^{\circ}C$. After forming a $2.5{\mu}m$ green sheet using the doctor blade method, a total of 77 layers were laminated and sintered at $1180^{\circ}C$. A decoupling capacitor with a size of $0.6mm(W){\times}0.3mm(L){\times}0.3mm(T)$ (width, length and thickness, respectively) and a capacitance of 100 nF was embedded using a PCB process for the 10G RF Transceiver modules. In the range of AC input voltage 400mmV @ 500kHz to 2200mV @ 900kHz, the embedded 10G RF Transceiver modules evaluated that it has better electrical performance than the non-embedded modules.

실험계획법을 적용한 X7R 적층 칩 커패시터의 희토류(Y2O3, Er2O3) 첨가에 따른 전기적 특성 (The Electrical Properties of Mutilayer Chip Capacitor with X7R by Addition of Rare-Earth Ions (Y2O3, Er2O3) using Design of Experiments)

  • 윤중락;문환;이헌용
    • 한국전기전자재료학회논문지
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    • 제23권3호
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    • pp.216-221
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    • 2010
  • Employing statistical design of experiments, the difference in doping behaviors of rare-earth ions and their effects on the dielectric property and microstructure of $BaTiO_3$-MgO-$MnO_2$-($Ba_{0.4}Ca_{0.6}$) $SiO_3-Re_2O_3$ (Re = $Y_2O_3$, $Er_2O_3$) system were investigated. Through the statistical analysis we have found that the amount of $Re_2O_3$ are significantly affecting on the dielectric properties. The $Re_2O_3$ improved the dielectric constant, dielectric loss and R*C constant, so the appropriate contents of $Y_2O_3$ and $Er_2O_3$ were 0.8 ~ 1.2 mol% and 0.8 ~ 1.3 mol%, respectively. The MLCC(mutilayer chip capacitor) with $2.0{\times}1.2{\times}1.2mm$ size and 475 nF was also suited for X7R with the above composition. It showed that the dielectric constant and RC constant were 2,839 and 3,675 ${\Omega}F$, respectively in the sintering condition at $1250^{\circ}C$ in $Po_2$ $10^{-7}$ Mpa.