• Title/Summary/Keyword: Diamond-like carbon(a-C:H)

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Optical and Mechanical Properties of Diamond-like Carbon Film with Variation of Carbon Ratio (탄소비율에 따른 Diamond-like Carbon Film의 광학적 및 기계적 특성)

  • Yun, Deok-Yong;Park, Yong-Seob;Choi, Won-Seok;Hong, Byung-You
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.21 no.9
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    • pp.808-811
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    • 2008
  • Optical and mechanical properties of diamond-like carbon (DLC) films synthesized by RF plasma enhanced chemical vapor deposition were investigated as a function the C/H ratio in gas mixture. The C/H ratio was varied from 6 to 10 %, adjusting the amount of $CH_4$ and $H_2$ as the source gas. The optical and mechanical properties of DLC films were characterized by UV spectrometer, Ellipsometer and Nano-indenter. The change of the C/H ratio during synthesis of DLC films had many effects on the growth rate, transmittance, refractive index and hardness. The growth rate of the films increased exponentially with the increase in C/H ratio. The hardness of the films showed the tendency to improve with increasing C/H ratio, whereas the transmittance decreased. The refractive index was varied from 2.03 to 2.17, and these refractive indexes close to 2.0 indicates that it can be applied to Si-based solar cell.

Property Variation of Diamond-like Carbon Thin Film According to the Annealing Temperature (열처리에 따른 Diamond-like Carbon (DLC) 박막의 특성변화)

  • Park, Ch.S.;Koo, K.H.;Park, H.H.
    • Journal of the Microelectronics and Packaging Society
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    • v.18 no.1
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    • pp.49-53
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    • 2011
  • Diamond-like carbon (DLC) films is a metastable form of amorphous carbon containing a significant fraction of Sp3 bond. DLC films have been characterized by a range of attractive mechanical, chemical, tribological, as well as optical and electrical properties. In this study DLC films were prepared by the RF magnetron sputter system on $SiO_2$ substrates using graphite target. The effects of the post annealing temperature on the Property variation of the DLC films were examined. The DLC films were annealed at temperatures ranging from 300 to $500^{\circ}C$ using rapid thermal process equipment in vacuum. The variation of electrical property and surface morphology as a function of annealing treatment was investigated by using a Hall Effect measurement and atomic force microscopy. Raman and X-ray photoelectron spectroscopy analyses revealed a structural change in the DLC films.

Tribological Properties of Annealed Diamond-like Carbon Film Synthesized by RF PECVD Method

  • Choi, Won-Seok
    • Transactions on Electrical and Electronic Materials
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    • v.7 no.3
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    • pp.118-122
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    • 2006
  • Diamond-like carbon (DLC) films were prepared on silicon substrates by the RF PECVD (Plasma Enhanced Chemical Vapor Deposition) method using methane $(CH_4)$ and hydrogen $(H_2)$ gas. We examined the effects of the post annealing temperature on the tribological properties of the DLC films using friction force microscopy (FFM). The films were annealed at various temperatures ranging from 300 to $900^{\circ}C$ in steps of $200^{\circ}C$ using RTA equipment in nitrogen ambient. The thickness of the film was observed by scanning electron microscopy (SEM) and surface profile analysis. The surface morphology and surface energy of the films were examined using atomic force microscopy and contact angle measurement, respectively. The hardness of the DLC film was measured as a function of the post annealing temperature using a nano-indenter. The tribological characteristics were investigated by atomic force microscopy in FFM mode.

Characterization of Diamond-like Carbon Films Prepared by Magnetron Plasma Chemical Vapor Deposition

  • Soung Young Kim;Jai Sung Lee;Jin Seok Park
    • The Korean Journal of Ceramics
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    • v.4 no.1
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    • pp.20-24
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    • 1998
  • Thin films of diamond-like carbon(DLC) can be successfully deposited by using a magnetron plasma chemical vapor deposition (CVD) method with an rf(13.56 MHz) plasma of $C_dH_8$. Plasma characteristics are analyzed as a function of the magnetic field. As the magnetic field increases, both electron temperature ($T_e$) and density ($n_e$)increase, but the negative dc self-bias voltage (-$V_{ab}$) decreases, irrespective of gas pressures in the range of 1~7 mTorr. High deposition rates have been obtained even at low gas pressures, which may be attributed to the increased mean free path of electrons in the magentron plasma. Effects of rf power and additive gas on the structural properties of DLC films aer also examined by using various technique namely, TED(transmissio electron diffraction) microanalysis, FTIR, and Raman spectroscopies.

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Structural Variation of Diamond-like Carbon Thin Film According to the Annealing Temperature (열처리온도에 따른 다이아몬드상 카본박막의 구조적 특성변화)

  • Choi Won-Seok;Park Mun-Gi;Hong Byung-You
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.19 no.8
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    • pp.701-706
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    • 2006
  • In addition to its similarity to genuine diamond film, diamond-like carbon (DLC) film has many advantages, including its wide band gap and variable refractive index. In this study, DLC films were prepared by the RF PECVD (Plasma Enhanced Chemical Vapor Deposition) method on silicon substrates using methane $(CH_4)$ and hydrogen $(H_2)$ gas. We examined the effects of the post annealing temperature on the structural variation of the DLC films. The films were annealed at temperatures ranging from 300 to $900^{\circ}C$ in steps of $200^{\circ}C$ using RTA equipment in nitrogen ambient. The thickness of the film and interface between film and substrate were observed by surface profiler, field emission scanning electron microscopy (FESEM), high resolution transmission electron microscopy (HRTEM), respectively. Raman and X-ray photoelectron spectroscopy (XPS) analysis showed that DLC films were graphitized ($I_D/I_G$, G-peak position and $sp^2/sp^3$ increased) ratio at higher annealing temperature. The variation of surface as a function of annealing treatment was verified by a AFM and contact angle method.

PECVD 증착조건 변화에 따른 a-C;H 박막의 구조 변화

  • 조영옥;노옥환;윤원주;이정근;최영철;이영희;최용각;유수창
    • Proceedings of the Korean Vacuum Society Conference
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    • 2000.02a
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    • pp.93-93
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    • 2000
  • 수소화된 비정질 탄소(a-C:H)는 그 증착 조건에 따라서 여러 가지 다른 구조와 특성을 갖게 되며, 특히 DLC(diamond-like carbon) 및 CNT(Carbon nanotube)는 FED (field emission display) 개발 면에서 중요하게 연구되고 있다. 우리는 a-C:H 박막을 PECVD (plasma-enhanced chemical vapor deposition) 방법으로 증착하고 CH4 가스를 사용하였고 기판 온도는 상온-32$0^{\circ}C$ 사이에서 변화되었다. 기판은 Corning 1737 glass, quartz, Si, Ni 등을 사용하였다. 증착 압력과 R.F. power는 각각 0.1-1 Torr 와 12-60w 사이에서 변화되었다. ESR 측정은 X-band(주파수 약 9 GHz)에서 그리고 상온에서 행해졌다. 상온에서의 스핀밀도는 약한-표준피치(weak-pitch standard) 스펙트럼과 비교하여 얻을 수 있었다. 그리고 a-C:H 박막의 구조는 He-Ne laser(파장 632.8 nm)를 이용하는 micro-Raman spectroscopy로 분석하였다. 증착조건에 따른 스핀밀도의 변화 및 Raman 스펙트럼에서의 D-peak, G-peak의 위치 및 반치록, I(D)/I(G) 등을 조사하였다. 증착된 a-C:H 박막은 R.F.power가 증가할수록 대체로 스핀밀도가 증가하였으며, Raman 스펙트럼에서의 I(D)/I(G) 비율은 대체로 감소하였다. 증착된 박막들은 polymer-like Carbon으로 추정되었으며, 스핀밀도가 증가할수록 대체적으로 흑연 구조 영역이 증가됨을 알 수 있었다. 또한 glass나 Si 기판에 비해 Ni 기판위에서 polymer-like Carbon 구조는 향상되는 경향을 보였다.

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A Study on the Optical Properties of Diamod-Like Carbon Film (Diamond-Like Carbon 박막의 광학적 특성에 관한 연구)

  • 권도현;박성계;남승의;김형준
    • Journal of the Korean Vacuum Society
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    • v.10 no.2
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    • pp.194-200
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    • 2001
  • In this study, the optical properties of diamond-like carbon(DLC) films, which was synthesized by 13.56 MHz rf plasma enhanced chemical vapor deposition system(PECVD), were investigated. We observed the variation of the transmittance and optical band gap with respect to deposition condition. The change of the transmittance and optical band gap of the DLC films were investigated as a function of RF power, working pressure, and additional gas. The optical band gap decreased with the increase of RF power and working pressure. We could verify the bond structures change of DLC films by observing the content of hydrogen using FT-IR spectroscopy. And the addition of hydrogen and nitrogen decreased the optical band gap by the breakage of C-H bond of DLC films during the deposition.

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Study of Residual Stress Control for Thickening to Hydrogen Free-DLC Films (무수소 DLC막의 후막화를 위한 잔류응력 제어 연구)

  • Kim, Jong-Guk;Gang, Yong-Jin;Kim, Gi-Taek;Kim, Dong-Sik;Ryu, Ho-Jun;Jang, Yeong-Jun
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2016.11a
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    • pp.101-101
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    • 2016
  • DLC(Diamond Like Carbon)막은 그 물성의 다양함으로 인하여 산업기계, 금형, 공구, 광학 및 수송기기의 파워셀 부품등 많은 산업분야에 활용되고 있다. 일반적으로 DLC막은 증착에 사용되는 카본의 원료에 따라 크게 두 가지로 나눌 수 있는데, 이는 탄화 수소계 가스(CxHy)를 사용하여 증착된 a-C:H(amorphous Hydro-Carbon)과 고체 카본을 사용하는 a-C(amorphous Carbon)이다. 또한 a-C 중 진공 아크 공법으로 제작된 막(ta-C : tetrahedral amorphous-Carbon)은 다이아몬드 성분인 sp3의 분률이 높아, 그 경도는 40 - 85 GPa 이상이며, 무수소화로 500도 이상의 고온에서도 그 물성의 변화가 적어 그 활용도가 높아지고 있다. 하지만 높은 경도와 더불어 막의 잔류응력이 높아 3 um 이상 후막화하는 것은 어렵다. 이는 높은 잔류응력으로 인한 막의 증착시, 막 자체가 파손되거나, 기판과 막사이의 계면 밀착력이 약하여 박리되거나, 또는 높은 밀착력으로 인하여 모재가 파손되는 등 다양한 문제를 발생한다. 본 연구에서는 이 고경도 무수소 DLC막(ta-C)의 후막화하는 방안으로 주요 코팅 변수와 잔류응력과의 관계를 에너지 관점에서 파악하고 이를 활용 잔류응력을 제어하여 할 수 있는 방법을 제시하고자 한다.

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Influence of counter-bodies on the tribological behavior of diamond-like carbon coatings (상대 마찰재에 따른 DLC 코팅의 트라이볼로지적 특성평가)

  • Lee Dong Choon;Yi Jin-Woo;Kim Seock Sam
    • Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference
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    • 2003.11a
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    • pp.360-367
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    • 2003
  • Diamond-like carbon(DLC) films are considerable research interest because of their widespread applications as protective coatings in areas such as optical windows, magnetic storage disks, car parts, biomedical coatings and as micro-electromechanical devices(MEMs). DLC films were deposited on WC-Co by PECVD using Ar, $C_2H_4$ gas. Tribological tests were conducted using a ball-on-disk type tribometer in dry air. Three kinds of counter-bodies balls were used. The counter-bodies balls are SM45C, SUJ2 and $ZrO_2$(3.17mm in diameter). Wear rate of the samples were calculated after measuring the worn-out volume of the wear track. As results wear test, the higher hardness of counter-bodies, friction coefficient low. As result of XPS estimation, wear debris generated as an oxide lower the friction coefficient.

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A Diamond-like Film Formation from (CH$_4$ + H$_2$) Gas Mixture with the LPCVD Apparatus (LPCVD 장치를 이용한 메탄과 수소 혼합기체로부터 다이아몬드 박막의 제조)

  • Kim Sang Kyun;Choy Jin-Ho;Choo Kwng Yul
    • Journal of the Korean Chemical Society
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    • v.34 no.5
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    • pp.396-403
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    • 1990
  • We describe how to design and construct a LPCVD (Low Pressure Chemical Vapor Deposition) apparatus which can be applicable to the study of reaction mechanism in general CVD experiments. With this apparatus we have attempted to make diamond like carbon films on the p-type (111) Si wafer from (H$_2$ + CH$_4$) gas mixtures. Two different methods have been tried to get products. (1)The experiment was carried out in the reactor with two different inlet gas tubes. One coated with phosphoric acid was used for supplying microwave discharged hydrogen gas stream, and methane has been passed through the other tube without the microwave discharge. In this method we got only amorphous carbon cluster products. (2) The gas mixture (H$_2$ + CH$_4$) has been passed through the discharge tube with the Si wafer located in and/or near the microwave plasma. In this case diamond-like carbon products could be obtained.

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