• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.07b
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• pp.1184-1187
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• 2003

Electrochemical capacitors are becoming attractive energy storage systems particularly for applications involving high power requirements such as hybrid systems consisting of batteries and electrochemical capacitors for electric vehicle propulsion. A new type electric double layer capacitor (EDLC) was constructed by using carbon nanofibers (CNFs) and DAAQ(1,5-diaminoanthraquinone) electrode. Carbonaceous materials are found in variety forms such as graphite, diamond, carbon fibers etc. While all the carbon nanofibers include impurities such as amorphous carbon, nanoparticles, catalytic metals and incompletely grown carbons. We have eliminated of Ni particles and some carbonaceous particles in nitric acid. Nitric acid treated CNFs could be covered with very thin DAAQ oligomer from the results of CV and TG analyses and SEM images. DAAQ oligomer film exhibited a specific capacity as 45-50 Ah/kg in 4M $H_2SO_4$. We established Process Parameters of the technique for the formation of nano-structured materials. Furthermore, improved the capacitive properties of the nano structured CNFs electrodes using controlled solution chemistry. As a result, CNFs coated by DAAQ composite electrode showed relatively good electrochemical behaviors in acidic electrolyte system with respect to specific capacity and scan rate dependency.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.251-251
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• 2016

For several decades, industrial processes consume a huge amount of raw water for various objects that consequently results in the generation of large amounts of wastewater. Wastewaters are consisting of complex mixture of different inorganic and organic compounds and some of them can be toxic, hazardous and hard to degrade. These effluents are mainly treated by conventional technologies such are aerobic and anaerobic treatment and chemical coagulation. But, these processes are not suitable for eliminating all hazardous chemical compounds form wastewater and generate a large amount of toxic sludge. Therefore, other processes have been studied and applied together with these techniques to enhance purification results. These include photocatalysis, absorption, advanced oxidation processes, and ozonation, but also have their own drawbacks. In recent years, electrochemical techniques have received attention as wastewater treatment process that could be show higher purification results. Among them, boron doped diamond (BDD) attract attention as electrochemical electrode due to good chemical and electrochemical stability, long lifetime and wide potential window that necessary properties for anode electrode. So, there are many researches about high quality BDD on Nb, Ta, W and Si substrates, but, their application in effluents treatment is not suitable due to high cost of metal and low conductivity of Si. To solve these problems, Ti has been candidate as substrate in consideration of cost and property. But there are adhesion issues that must be overcome to apply Ti as BDD substrate. Al, Cu, Ti and Nb thin films were deposited on Ti substrate to improve adhesion between substrate and BDD thin film. In this paper, BDD films were deposited by hot filament chemical vapor deposition (HF-CVD) method. Prior to deposition, cleaning processes were conducted in acetone, ethanol, and isopropyl alcohol (IPA) using sonification machine for 7 min, respectively. And metal layer with the thickness of 200 nm were deposited by DC magnetron sputtering (DCMS). To analyze microstructure X-ray diffraction (XRD, Bruker gads) and field emission scanning electron microscopy (FE-SEM, Hitachi) were used. It is confirmed that metal layer was effective to adhesion property and improved electrode property. Electrochemical measurements were carried out in a three electrode electrochemical cell containing a 0.5 % H2SO4 in deionized water. As a result, it is confirmed that metal inter layer heavily effect on BDD property by improving adhesion property due to suppressing formation of titanium carbide.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.08a
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• pp.105-105
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• 2012

We have developed a photoemission-assisted plasma-enhanced chemical vapor deposition (PAPE-CVD) [1,2], in which photoelectrons emitting from the substrate surface irradiated with UV light ($h{\nu}$=7.2 eV) from a Xe excimer lamp are utilized as a trigger for generating DC discharge plasma as depicted in Fig. 1. As a result, photoemission-assisted plasma can appear just above the substrate surface with a limited interval between the substrate and the electrode (~10 mm), enabling us to suppress effectively the unintended deposition of soot on the chamber walls, to increase the deposition rate, and to decrease drastically the electric power consumption. In case of the deposition of DLC gate insulator films for the top-gate graphene channel FET, plasma discharge power is reduced down to as low as 0.01W, giving rise to decrease significantly the plasma-induced damage on the graphene channel [3]. In addition, DLC thickness can be precisely controlled in an atomic scale and dielectric constant is also changed from low ${\kappa}$ for the passivation layer to high ${\kappa}$ for the gate insulator. On the other hand, negative electron affinity (NEA) of a hydrogen-terminated diamond surface is attractive and of practical importance for PAPECVD, because the diamond surface under PAPE-CVD with H2-diluted (about 1%) CH4 gas is exposed to a lot of hydrogen radicals and therefore can perform as a high-efficiency electron emitter due to NEA. In fact, we observed a large change of discharge current between with and without hydrogen termination. It is noted that photoelectrons are emitted from the SiO2 (350 nm)/Si interface with 7.2-eV UV light, making it possible to grow few-layer graphene on the thick SiO2 surface with no transition layer of amorphous carbon by means of PAPE-CVD without any metal catalyst.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 1997.10a
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• pp.875-878
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• 1997

Electrical discharge machining is the method of using thermal energy by electrical discharge. Generally, if the material of workpiece has conductivity even though it is very hard material and complicated shape which are difficult to cut such as quenching steel, cemented carbide, diamond and conductive ceramics, the EDM is favorable one of possible machining processes. But, the process is necessarily required of finish cut and heat treatment because of slow cutting speed, no mirror surface, brittleness and crack due to the residual stress for manufactured goods.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.07b
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• pp.1220-1223
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• 2003

A new type electric double layer capacitor (EDLC) was constructed by using carbon nanofibers (CNFs) and DAAQ(1,5-diaminoanthraquinone) electrode. Carbonaceous materials are found in variety forms such as graphite, diamond, carbon fibers etc. While all the carbon nanofibers include impurities such as amorphous carbon, nanoparticles, catalytic metals and incompletely grown carbons. We have eliminated of Ni particles and some carbonaceous particles in nitric acid. Nitric acid treated CNFs could be covered with very thin DAAQ oligomer from the results of CV and TG analyses and SEM images. A crystalline supramolecular oligomer of 1,5-diaminoanthraquinone(DAAQ) was successfully prepared as a thin film by electrochemical oxidation from an acidic non-aqueous medium. DAAQ oligomer film exhibited a specific capacity as 45-50 Ah/kg in 4M $H_2SO_4$. Its electrochemical characteristics were investigated by cyclic voltammetry. And compared with different electrolyte of aqueous type. During ultrasonic irradiation CNFs was to disperse in 0.1M $H_2SO_4$. As a result, CNFs coated by DAAQ composite electrode showed relatively good electrochemical behaviors.

• Journal of Environmental Science International
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• v.20 no.10
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• pp.1273-1284
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• 2011

The aim of this research was to evaluate the performance of insoluble electrode for the purpose of degradation of Rhodamine B (RhB) and oxidants generation [N,N-Dimethyl-4-nitrosoaniline (RNO, indicator of OH radical), $O_3$, $H_2O_2$, free Cl, $ClO_2$)]. Methods: Four kinds of electrodes were used for comparison: DSA (dimensional stable anode; Pt and JP202 electrode), Pb and boron doping diamond (BDD) electrode. The effect of applied current (0.5~2.5 A), electrolyte type (NaCl, KCl and $Na_2SO_4$) and electrolyte concentration (0.5~3.5 g/L) on the RNO degradation were evaluated. Experimental results showed that the order of RhB removal efficiency lie in: JP202 > Pb > BDD ${\fallingdotseq}$ > Pt. However, when concerned the electric power on maintaining current of 1 A during electrolysis reaction, the order of RhB removal efficiency was changed: JP202 > Pt ${\fallingdotseq}$ Pb > BDD. The total generated oxidants ($H_2O_2$, $O_3$, free Cl, $ClO_2$) concentration of 4 electrodes was Pt (6.04 mg/W) > JP202 (4.81 mg/W) > Pb (3.61 mg/W) > BDD (1.54 mg/W), respectively. JP202 electrode was the best electrode among 4 electrodes from the point of view of performance and energy consumption. Regardless of the type of electrode, RNO removal of NaCl and KCl (chlorine type electrolyte) were higher than that of the $Na_2SO_4$ (sulfuric type electrolyte) RNO removal. Except BDD electrode, RhB degradation and creation tendency of oxidants such as $H_2O_2$, $O_3$, free Cl and $ClO_2$, found that do not match. RNO degradation tendency were considered a simple way to decide the method which is simple it will be able to determinate the electrode where the organic matter decomposition performance is superior. As the added NaCl concentration was increases, the of hydrogen peroxide and ozone concentration increases, and this was thought to increase the quantity of OH radical.

• Journal of the Semiconductor & Display Technology
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• v.19 no.4
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• pp.28-33
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• 2020

Plasma etching process employs high density plasma to create surface chemistry and physical reactions, by which to remove material. Plasma chamber includes silicon-based materials such as a focus ring and gas distribution plate. Focus ring needs to be replaced after a short period. For this reason, there is a need to find materials resistant to erosion by plasma. The developed chemical vapor deposition processing to produce silicon carbide parts with high purity has also supported its widespread use in the plasma etch process. Silicon carbide maintains mechanical strength at high temperature, it have been use to chamber parts for plasma. Recently, besides the structural aspects of silicon carbide, its electrical conductivity and possibly its enhanced life time under high density plasma with less generation of contamination particles are drawing attention for use in applications such as upper electrode or focus rings, which have been made of silicon for a long time. However, especially for high purity silicon carbide focus ring, which has usually been made by the chemical vapor deposition method, there has been no study about quality improvement. The goal of this study is to reduce surface roughness and depth of damage by diamond tool grit size and tool dressing of diamond tools for precise dimensional assurance of focus rings.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 1995.10a
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• pp.53-56
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• 1995

Electrolytic In-Process Dressing grinding technique which enables application of metal bond wheels with fine superabrasives in mirror surface grinding operations has developed. This paper provides charateristic evaluation of power supply supply that we developed and general charateristics of ELID grinding. The electric behaviors are compared each about two different electrode which has 1/4, 1/6 the area of entire wheel surface, and two different fluids which has 1:50, 1:30 the quantity of water was used to dillute grinding fluids. The results show that ELID grinding method is useful for mirror surface machining.

• Journal of Environmental Health Sciences
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• v.36 no.4
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• pp.313-322
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• 2010

The aim of this research was to apply experimental design methodology to optimization of conditions of electrochemical oxidation of Rhodamine B (RhB) and N, N-Dimethyl-4-nitrosoaniline (RNO, indicative of the OH radical). The reactions of electrochemical oxidation of RhB degradation were mathematically described as a function of the parameters of current ($X_1$), NaCl dosage ($X_2$) and pH ($X_3$) and modeled by the use of the central composite design. The application of response surface methodology (RSM) yielded the following regression equation, which is an empirical relationship between the removal efficiency of RhB and RNO and test variables in a coded unit: RhB removal efficiency (%) = $94.21+7.02X_1+10.94X_2-16.06X_3+3.70X_1X_3+9.05X_2X_3-{3.46X_1}^2-{4.67X_2}^2-{7.09X_3}^2$; RNO removal efficiency (%) = $54.78+13.33X_1+14.93X_2- 16.90X_3$. The model predictions agreed well with the experimentally observed result. Graphical response surface and contour plots were used to locate the optimum point. The estimated ridge of maximum response and optimal conditions for the RhB degradation using canonical analysis was 100.0%(current, 0.80 A; NaCl dosage, 2.97% and pH 6.37).

• Journal of the Optical Society of Korea
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• v.19 no.6
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• pp.705-710
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• 2015

The fabrication process of thin boron-doped nanocrystalline diamond (B-NCD) microelectrodes on fused silica single mode optical fiber cladding has been investigated. The B-NCD films were deposited on the fibers using Microwave Plasma Assisted Chemical Vapor Deposition (MW PA CVD) at glass substrate temperature of 475 ℃. We have obtained homogenous, continuous and polycrystalline surface morphology with high sp³ content in B-NCD films and mean grain size in the range of 100-250 nm. The films deposited on the glass reference samples exhibit high refractive index (n=2.05 at λ=550 nm) and low extinction coefficient. Furthermore, cyclic voltammograms (CV) were recorded to determine the electrochemical window and reaction reversibility at the B-NCD fiber-based electrode. CV measurements in aqueous media consisting of 5 mM K₃[Fe(CN)₆] in 0.5 M Na₂SO₄ demonstrated a width of the electrochemical window up to 1.03 V and relatively fast kinetics expressed by a redox peak splitting below 500 mV. Moreover, thanks to high-n B-NCD overlay, the coated fibers can be also used for enhancing the sensitivity of long-period gratings (LPGs) induced in the fiber. The LPG is capable of measuring variations in refractive index of the surrounding liquid by tracing the shift in resonance appearing in the transmitted spectrum. Possible combined CV and LPG-based measurements are discussed in this work.