• 제목/요약/키워드: Diamond Thin Films

검색결과 204건 처리시간 0.025초

Development of a Photoemission-assisted Plasma-enhanced CVD Process and Its Application to Synthesis of Carbon Thin Films: Diamond, Graphite, Graphene and Diamond-like Carbon

  • Takakuwa, Yuji
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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    • pp.105-105
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    • 2012
  • We have developed a photoemission-assisted plasma-enhanced chemical vapor deposition (PAPE-CVD) [1,2], in which photoelectrons emitting from the substrate surface irradiated with UV light ($h{\nu}$=7.2 eV) from a Xe excimer lamp are utilized as a trigger for generating DC discharge plasma as depicted in Fig. 1. As a result, photoemission-assisted plasma can appear just above the substrate surface with a limited interval between the substrate and the electrode (~10 mm), enabling us to suppress effectively the unintended deposition of soot on the chamber walls, to increase the deposition rate, and to decrease drastically the electric power consumption. In case of the deposition of DLC gate insulator films for the top-gate graphene channel FET, plasma discharge power is reduced down to as low as 0.01W, giving rise to decrease significantly the plasma-induced damage on the graphene channel [3]. In addition, DLC thickness can be precisely controlled in an atomic scale and dielectric constant is also changed from low ${\kappa}$ for the passivation layer to high ${\kappa}$ for the gate insulator. On the other hand, negative electron affinity (NEA) of a hydrogen-terminated diamond surface is attractive and of practical importance for PAPECVD, because the diamond surface under PAPE-CVD with H2-diluted (about 1%) CH4 gas is exposed to a lot of hydrogen radicals and therefore can perform as a high-efficiency electron emitter due to NEA. In fact, we observed a large change of discharge current between with and without hydrogen termination. It is noted that photoelectrons are emitted from the SiO2 (350 nm)/Si interface with 7.2-eV UV light, making it possible to grow few-layer graphene on the thick SiO2 surface with no transition layer of amorphous carbon by means of PAPE-CVD without any metal catalyst.

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붕소가 도핑된 다이아몬드전극을 이용한 폐수처리특성 (Characteristic of wastewater treatment using Boron-doped Diamond Electrode)

  • 이은주;영장 태명;등도 소;박수길
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.2
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    • pp.795-798
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    • 2003
  • Toxic organics are of great environmental concern primarily because they are toxic to mammals and birds, and are relatively soluble in water to contaminate surface water and groundwater. In this study, the decomposition of phenol, a widely used organic, in aqueous solutions by Boron doped diamond(BDD) electrode was examined. Thin, Boron-doped conducting diamond films are expected to be excellent electrodes for industrial electrolysis. Boron-doped diamond (BDD) were used as anode for generating ozone gas by electrolysis of acid solution. In this work. we have studied ozone generating system using BDD electrode. In order to determine the ozone generation properties of diamond electrode, experimental conditions, electrolyte concentration, temperature, flow rate and reaction time were varied diversely. As a result, we could confirm that ozone gas was generated successfully and the performance of diamond electrode was stable for electrolyte while $PbO_2$ electrode was disintegrated. Actually we are found that ozone amount increased by lowering the temperature of electrolyte. Decomposition of phenol concentration in the reaction solution by photolytic ozonation( $UV/O_3$) was analyzed by HPLC epuipped with a UV detector.

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DLC 박막의 전기전도성, 투과율 및 가스베리어 특성에 관한 연구 (Study on Electrical Conductivity, Transmittance and Gas Barrier Properties of DLC Thin Films)

  • 박새봄;김치환;김태규
    • 열처리공학회지
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    • 제31권4호
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    • pp.187-193
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    • 2018
  • In this study, the electrical conductivity, transmittance and gas barrier properties of diamond-like carbon (DLC) thin films were studied. DLC is an insulator, and has transmittance and oxygen gas barrier properties varying depending on the thickness of the thin film. Recently, many researchers have been trying to apply DLC properties to specific industrial conditions. The DLC thin films were deposited by PECVD (Plasma Enhanced Chemical Vapor Deposition) process. The doping gas was used for the DLC film to have electrical conductivity, and the optimum conditions of transmittance and gas barrier properties were established by adjusting the gas ratio and DLC thickness. In order to improve the electrical conductivity of the DLC thin film, $N_2$ doping gas was used for $CH_4$ or $C_2H_2$ gas. Then, a heat treatment process was performed for 30 minutes in a box furnace set at $200^{\circ}C$. The lowest sheet resistance value of the DLC film was found to be $18.11k{\Omega}/cm^2$. On the other hand, the maximum transmittance of the DLC film deposited on the PET substrate was 98.8%, and the minimum oxygen transmission rate (OTR) of the DLC film of $C_2H_2$ gas was 0.83.

Novel Alignment Layers for Ion Beam Method and the Orientations of Liquid Crystal

  • Ahn, Han-Jin;Kim, Kyung-Chan;Kim, Jong-Bok;Baik, Hong-Koo;Park, Chang-Joon;Hwang, Jeoung-Yeon;Seo, Dae-Shik
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2004년도 Asia Display / IMID 04
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    • pp.1155-1158
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    • 2004
  • Various inorganic alignment layers of nematic liquid crystal (NLC) molecules were investigated. Ar ion beam (IB) irradiation was utilized for alignment method and homogenous and homeotropic orientations with tilt angle were obtained on the suitable inorganic thin films. Proper doping materials were added to diamond-like carbon (DLC) films. In the case of homogeneous alignment, nitrogen doping affected the increase of pretilt angle, while the fluorine bonding in the DLC films was induced the tilted homeotropic alignment cause its extreme hydrophobic property. These results showed that ion beam irradiation method could be applied to the various alignment mode of NLC such as IPS, TN and MVA.

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Investigation of Physicochemical Properties of Mo Carbide Utilizing Electron Spectroscopy

  • Jeong, Eunkang;Park, Juyun;Kang, Yong-Cheol
    • 통합자연과학논문집
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    • 제13권3호
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    • pp.87-91
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    • 2020
  • Molybdenum carbide (MoCx) thin films (TFs) were deposited by reactive radio frequency (rf) magnetron co-sputtering in high vacuum chamber. We compared the properties of MoCx thin films as the rf power changed on C target. The result of alpha step measurement showed that the thickness of the MoCx TFs varied from163.3 to 194.86 nm as C power was increased from 160 to 200 W. The crystallinity of MoCx such as b-Mo2C, Mo2C, and diamond like carbon (DLC) structures were observed by XRD. The oxidation states of Mo and C were determined using high resolution XPS spectra of Mo 3d and C 1s were deconvoluted. Molybdenum was consisted of Mo, Mo4+, and Mo6+ species. And C was deconvoluted to C-Mo, C, C-O, and C=O species.

플라즈마 CVD 법을 이용한 대면적 균일한 비정질 탄소 막 증착 (Large-area Uniform Deposition of Amorphous Hydrogenated Carbon Films using a Plasma CVD Method)

  • 윤상민;양성채
    • 한국전기전자재료학회논문지
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    • 제22권5호
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    • pp.411-414
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    • 2009
  • It has been investigated for the film uniformity and deposition rate of a-C:H films on glass substrate and polymeric materials in the presence of the modulated crossed magnetic field. We used Plasma CVD, i.e, using a crossed electromagnetic field, for uniform depositing thin film. The optimum discharge condition has been discussed for the gas pressure, the magnetic flux density and the distance between substrate and electrodes, As a result, it is found that the optimum discharge conditions are $CH_4$ concentration $CH_4$=10 %, modulated magnetic flux density B=48 Gauss, pressure P=100 mTorr, discharge power supply voltage V=l kV under these experimental conditions. By using these experimental condition, it is possible to prepare the most uniform film extends over about 160 mm of the film width. In this study, we deposited a-C:H thin film on glass substrate, and have a plan that using this condition, study depositing a-C:H thin film on polymeric substrate in next studies.

DLC박막을 코팅한 초경공구의 Al합금에 대한 절삭성능 향상 (Improvement of Cutting Performance of DLC Coated WC against Al Alloy)

  • 이규용
    • 동력기계공학회지
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    • 제12권3호
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    • pp.66-71
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    • 2008
  • Diamond-like-carbon (DLC) coatings could be good candidates as solid lubricants for cutting tools in dry machining of aluminum alloy. In this work, DLC thin films were produced as a friction reduction coating for WC-Co insert tip using the plasma immersion ion beam deposition (PIIED) technique. DLC coatings were also coated on $Al_2O_3$ specimens and high temperature wear tested up to $400^{\circ}C$ in dry air to observe the survivability of the DLC coating in simulated severe cutting conditions using a pin-on-disc tribotester with Hertzian contact stress of 1.3GPa. It showed reduced friction coefficients of minimum 0.02 up to $400^{\circ}C$. And cutting performance of DLC coated WC-Co insert tips to Al 6061 alloy were conducted in a high speed machining center. The main problems of built-up edge formation in aluminum machining are drastically reduced with improved surface roughness. The improvements were mainly related to the low friction coefficient of DLC to Al alloy and the anti-adhesion of Al alloy to WE due to the inertness of DLC.

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The preparation of ultra hard nitrogenated DLC film by $N_2^+$ implantation

  • Olofinjana, A.O.;Chen, Z.;Bell, J.M.
    • 한국윤활학회:학술대회논문집
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    • 한국윤활학회 2002년도 proceedings of the second asia international conference on tribology
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    • pp.165-166
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    • 2002
  • Hydrogen free diamond like carbon (DLC) films were prepared on steel substrates by using a single ion beam in a configuration that allowed sputtering of a graphite target and at the same time allowed to impact the substrate at a grazing angle. The DLC films so prepared have improved properties with increased disorder and with modest hardness that is slightly higher than previously reported values. We have studied the effects of $N_2^+$ ions implantation on such films. It is found that the implantations of nitrogen ions into DLC films lead to chemical modifications that allowed N atoms to be incorporated into the carbon network to produce a nitrogenated DLC. Nano-indentation experiments indicated that the nitrogenated films have consistently higher hardnesses ranging from 30 to 45GPa, which represents a considerable increase in surface hardness, compared with non-nitrogenated precursor films. The investigations by XPS and Raman spectroscopy suggests that the $N_2^+$ implanted DLCs had undergone both chemical and structural modifications through the incorporation of N atoms and the increased ratio of $sp^3/sp^2$ type bonding. The observed high hardness was therefore attributable to these structural and chemical modifications. This result has implication for the preparation of super hard wear resistant films required for tribological functions in devices.

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Effect of Doping Si in DLC Thin Films Growth on Their Mechanical Properties

  • 김대영;박민석;진인태
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.369.2-369.2
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    • 2014
  • Diamond-like Carbon(DLC) films doping Si were deposited by linear ion source(LIS)-physical vapor deposition method on Si wafer. We have studied the effects of Si content on friction and wear properties of DLC films and the characteristics of the films were investigated using Nano-indentation, Micro raman spectroscopy, Field Emission-Scanning Electron Microscope (FM-SEM) and X-ray Photoelectron Spectroscopy (XPS). The films has been various low-friction and low-stress by varying the flow rates of silane gas. Under the about 2% of Si doping is very suitable for improving the adhesion of films and reducing internal stress while maintaining the surfaces hardness of DLC films. Linear ion source (LIS)를 사용하여 Si wafer위에 Si 이온이 첨가된 DLC 박막을 증착하였다. 참가된Si 이온의 양에 따라 DLC 박막에 미치는 영향을 분석하기 위하여 마찰 계수 및 경도를 비교하였고, Micro raman spectroscopy, Field Emission-Scanning Electron Microscope (FM-SEM) and X-ray Photoelectron Spectroscopy (XPS)를 통하여 표면 상태를 분석하였다. 천체 주입된 가스량의 약 2%까지 Si 이온 주입이 늘어날수록 DLC 박막의 마찰계수는 낮아졌고, 경도는 Si 이온이 주입되지 않았을 경우와 비슷한 값(약 20~23 GPa)을 가졌다. 2% 이상의 주입량에서는 마찰계수는 주입량이 늘어날수록 높아졌으며 경도는 떨어지는 경향을 보였다. 이는 Si이온이 2%이하로 첨가되었을 경우, DLC 박막의 생성시 탄소 이온들의 결합 Stress를 줄여 마찰계수가 줄어든다고 볼 수 있으며, 그 양이 2%이상이 되면 오히려 불순물로 작용하여 DLC 박막의 Stress는 급격히 증가하고 마찰계수도 높아짐을 알 수 있다.

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PECVD를 이용한 DLC 박막의 표면 마모 특성 향상을 위한 플루오린 첨가의 영향 (Effect of fluorine gas addition for improvement of surface wear property of DLC thin film deposited by using PECVD)

  • 박현준;김준형;문경일
    • 한국표면공학회지
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    • 제54권6호
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    • pp.357-364
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    • 2021
  • In this study, DLC films deposited by PECVD were evaluated to the properties of super-hydrophobic by CF4 treatment. The structure of DLC films were confirmed by Raman Spectra whether or not mixed sp3 (like diamond) peak and sp2 (like graphite) peak. And the hydrogen contents in the DLC films (F-DLC) were measured by RBS analysis. In addition, DLC films were analyzed by scratch test for adhesion, nano-indentation for hardness and tribo-meter of Ball-on-disc type for friction coefficient. In the result of analysis, DLC films had traditional structure regardless of variation of hardness at constant conditions. Also adhesion of DLC film was increased as higher material hardness. Otherwise, friction coefficient was increased as lower material hardness. The DLC films were treated by CF4 plasma treatment to enhance the properties of super-hydrophobic. And the DLC films were measured by ESEM(Enviromental Scanning Electron Microscope) for water condensation.