• 제목/요약/키워드: Diamond film

검색결과 447건 처리시간 0.03초

MWCVD에 의한 다이아몬드 필름의 합성과 절삭 공구에의 응용 (Diamond Film Synthesis by MWCVD and Its Application to Cutting Tools)

  • 서문규;김윤수
    • 한국세라믹학회지
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    • 제30권11호
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    • pp.979-985
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    • 1993
  • Diamond films were synthesized using CH4-H2-Ar mixture gases by MWCVD, and cutting ability was tested after brazing them onto WC tools. Growth rates were in the range of 0.5~10${\mu}{\textrm}{m}$/hr depending on the deposition conditions, and diamond films with thickness of 100~300${\mu}{\textrm}{m}$ were obtained. Diamond tools brazed by RF induction method showed an enhanced cutting ability in the cutting test of Si single crystal rod.

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MPCVD를 이용한 다결정 다이아몬드 박막의 증착 및 물성 분석 (Characterization of polycrystalline diamond thin films deposited by using an MPCVD)

  • 이진복;박진석;류경선;권상직
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1998년도 하계학술대회 논문집 D
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    • pp.1330-1332
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    • 1998
  • Polycrystalline diamond films are deposited on a Si substrate by employing a 2.45 GHz $\mu$-wave plasma CVD system. Prior to depositing the diamond film, a DPR(diamond photo-resist) layer is coated to enhance the nucleation density. The growth rate of diamond films increases with the $\mu$-wave power and approaches to be about $1.5{\mu}m/hr$ at 1100 W. Structural properties of diamond films deposited are characterized from their SEM photographs, Raman spectra, and AFM surface images. Lager grain size, higher intensity of diamond peak, and smoother surface are observed for films deposited at a higher power. The possible mechanism on the diamond growth is also discussed to explain the experimental results.

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마이크로파 플라즈마 화학기상증착법에 의한 HOD 박막 성장 (Growth of Highly Oriented Diamond Films by Microwave Plasma Chemical Vapor Deposition)

  • 이광만;최치규
    • 반도체디스플레이기술학회지
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    • 제3권3호
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    • pp.45-50
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    • 2004
  • Highly oriented diamond (HOD) films in polycrystalline can be grown on the (100) silicon substrate by microwave plasma CVD. Bias enhanced nucleation (BEN) method was adopted for highly oriented diamond deposition with high nucleation density and uniformity. The substrate was biased up to -250[Vdc] and bias time required for forming a diamond film was varied up to 25 minutes. Diamond was deposited by using $\textrm{CH}_4$/CO and $H_2$ mixture gases by microwave plasma CVD. Nucleation density and degree of orientation of the diamond films were studied by SEM. Thermal conductivity of the diamond films was ∼5.27[W/cm.K] measured by $3\omega$ method.

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다결정 다이아몬드 필름의 신경종양세포(SH-SY5Y) 배양 특성 (Characteristic of neuroblastoma cell (SH-SY5Y) culture on the crystalline diamond film)

  • 남효근;오홍기;김대훈;김민혜;박혜빈;지광환;송광섭
    • 한국기계가공학회지
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    • 제12권4호
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    • pp.10-15
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    • 2013
  • In order to fabricate high sensitive and stable biosensors, we require the material with superior biocompatibility and physical-chemical stability. Many kinds of biomaterials have been evaluated to apply for bioindustry. Recently, carbon based diamond thin films have been focal pointed as bio-applications and their possibility has been evaluated. Diamond thin film has many advantages for electrochemical and biological applications, such as wide potential window (3.0-3.5V), low background current and chemical-physical stability. In this work, we have cultured neuroblastoma cell (SH-SY5Y) on the crystalline diamond films. We use MTT assay to evaluate the characteristic of cell culture on the substrates. As a result, neuroblastoma cell was cultured on the crystalline diamond film as similar as cell culture dish.

Diamond 박막 성장에 미치는 Si 표면 영향의 AES에 의한 연구 (A Study on the Effect of Si Surface on Diamond Film Growth by AES)

  • 이철로;신용현;임재영;정광화;천병선
    • 한국진공학회지
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    • 제2권2호
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    • pp.199-208
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    • 1993
  • Si 기판 표면상태 변화와 관련된 핵생성 자유에너지 증가에 따른 다이아몬드 박막성장 거동을 관찰하였다. 표면 염마조건 변화에 따른 3가지 기판(A-Si, B-Si, C-Si)위에 동일한 성장조건으로 다이아몬드를 성장하였으며, 이때 형상인자와 관련된 자유에너지 관계는 ${\Delta}G_{A-Si}<{\Delta}G_{B-Si}<{\Delta}G_{C-Si}$이다. AES, SEM, XRD, RHEED에 의해 각각의 박막 A, B, C를 조사한 결과, 핵생성 자유에너지가 가장 적은 A 박막은 (100) (110) 면이 지배적인 고품위 다이아몬드 박막이다. 자유에너지가 A에 비해 다소 적은 B 박막은 (111) 면이 지배적인 8면체 다이아몬드 박막이고, 자유에너지가 자장 적은 C 박막은 흑연이 많이 함유된 구상의 다이아몬드이다.

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나노급 다이아몬드 파우더에 ALD로 제조된 ZnO 박막 연구 (Microstructure of ZnO Thin Film on Nano-Scale Diamond Powder Using ALD)

  • 박종성;송오성
    • 한국진공학회지
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    • 제17권6호
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    • pp.538-543
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    • 2008
  • 나노급 다이아몬드는 최근 폭발법이나 증착법에 의한 신공정으로 100 nm 이하의 분말형태의 제조가 가능하다. 나노급 다이아몬드의 소결을 이용하면 이상적인 연마기기의 제작이 가능하다. 이러한 나노급 다이아몬드의 소결 공정에서 생기는 비이상적인 나노결정의 결정립성장과 다이아몬드 결합장애를 방지하기 위해서 나노급 무기물을 균일하게 코팅하는 공정개발이 필요하다. 본 연구에서는 나노급 다이아몬드의 소결 특성을 향상시키기 위해서 ALD(atomic layer deposition)을 이용하여 진공에서 $20{\sim}30\;nm$ 두께의 ZnO 박막을 코팅해 보았다. 나노급 다이아몬드 분말 전면에 경제적으로 ZnO ALD를 위해서 기존의 기계적 진동효과 또는 전용 fluidized bed reactor를 대치하여 새로이 20 mm 석영튜브 안에 다이아몬드 분말을 넣고 다공성 유리필터로 막은 후 펄스와 퍼지 공정시의 압력에 의한 다이아몬드의 부유를 이용한 변형된 fluidized bed 공정을 채용하였다. 다공성 유리필터로 양쪽이 막힌 석영튜브 안에 전구체 DEZn (diethylzinc : $C_4H_{10}Zn$)와 반응기체 $H_2O$를 사용하여 ZnO 박막을 캐니스터 온도 $10^{\circ}C$에서 원자층증착하였다. 공정 순서 및 반응물질 주입 시간은 DEZn pulse-0.1초, DEZn purge-20초, $H_2O$ pulse-0.1초, $H_2O$ purge-40초와 같이 설정하였으며, 이 네 단계를 1 cycle로 정의하여 100 cycle 반복 실시하였다. 다이아몬드 분말과 ZnO 박막이 증착된 다이아몬드 분말의 미세구조를 확인하기 위하여 투과전자현미경 (transmission electron microscope)을 이용하였다. TEM 측정결과, ALD 증착 전 나노급 다이아몬드 분말의 직경이 약 $70{\sim}120\;nm$이었고 사면체, 육면체 등의 다양한 형태를 보임을 확인하였다. ZnO 박막이 ALD코팅된 다이아몬드 분말의 직경은 약 $90{\sim}150\;nm$이었고, 다이아몬드 분말과 ZnO의 명암차이에 의해 약 $20{\sim}30\;nm$ 두께의 균일한 ZnO 박막이 다각형 형태의 다이아몬드 파우더 표면에 성공적으로 증착되었음을 확인하였다.

Measurement of the Thermal Conductivity of a Polycrystalline Diamond Thin Film via Light Source Thermal Analysis

  • Kim, Hojun;Kim, Daeyoon;Lee, Nagyeong;Lee, Yurim;Kim, Kwangbae;Song, Ohsung
    • 한국재료학회지
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    • 제31권12호
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    • pp.665-671
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    • 2021
  • A 1.8 ㎛ thick polycrystalline diamond (PCD) thin film layer is prepared on a Si(100) substrate using hot-filament chemical vapor deposition. Thereafter, its thermal conductivity is measured using the conventional laser flash analysis (LFA) method, a LaserPIT-M2 instrument, and the newly proposed light source thermal analysis (LSTA) method. The LSTA method measures the thermal conductivity of the prepared PCD thin film layer using an ultraviolet (UV) lamp with a wavelength of 395 nm as the heat source and a thermocouple installed at a specific distance. In addition, the microstructure and quality of the prepared PCD thin films are evaluated using an optical microscope, a field emission scanning electron microscope, and a micro-Raman spectroscope. The LFA, LaserPIT-M2, and LSTA determine the thermal conductivities of the PCD thin films, which are 1.7, 1430, and 213.43 W/(m·K), respectively, indicating that the LFA method and LaserPIT-M2 are prone to errors. Considering the grain size of PCD, we conclude that the LSTA method is the most reliable one for determining the thermal conductivity of the fabricated PCD thin film layers. Therefore, the proposed LSTA method presents significant potential for the accurate and reliable measurement of the thermal conductivity of PCD thin films.

직류 플라즈마 제트를 이용한 고속 다이아몬드 막 증착기술 (High-Speed Deposition of Diamond Films by DC Plasma Jet)

  • 김원규;황기웅
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1992년도 하계학술대회 논문집 B
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    • pp.949-951
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    • 1992
  • A low pressure DC plasma jet has been used to obtain diamond films from a mixture of $CH_4$ and $H_2$ with high deposition rate (>1$\mu\textrm{m}$/min). The effects of the deposition conditions such as torch geometry, substrate temperature, gas mixing ratio, chamber pressure, axial magnetic field on the diamond film properties such as morphology, purity, uniformity of the film and deposition rate, etc. have been examined with the aid of Scanning Electron Microscopy, X-Ray Diffraction, and Raman Spectroscopy. Both the growth rate and particle size increased rapidly for low methane concentrations but saturated and the morphology changed from octahedral to cubic structure when the concentration exceeded 1.0 %. Higher growth rates (>1.5${\mu}m$/min) can be obtained by applying an axial magnetic field to the DC plasma jet. Diamond obtained from the magnetized plasma jet also shows a sharp peak at 1332.5$cm^{-1}$ in the Raman Spectra and this result implies that higher growth rate with a good quality diamond films can he obtained by applying an external magnetic field to the plasma jet.

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DLC 박막을 이용한 Ion Beam 배향 TN 셀의 전기광학특성에 관한 연구 (A Study on Electro-Optical Characteristics of the Ion Beam Aligned TN Cell on the DLC Thin Film)

  • 황정연;조용민;노순준;이대규;백홍구;서대식
    • 한국전기전자재료학회논문지
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    • 제15권8호
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    • pp.726-730
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    • 2002
  • Electro-optical (EO) performances of the ion beam (IB) aligned twisted-nematic (TN)-liquid crystal display (LCD) with ion beam exposure on the new diamond-like carbon (DLC) thin film surface were investigated. A good voltage-transmittance (V-T) curve of the ion beam aligned TN-LCD with oblique ion beam exposure on the DLC thin film surface for 1 min was observed. Also, the fast response time of the ion beam aligned TN-LCD with oblique ion beam exposure on the DLC thin film surface for 1 min can be achieved. Finally, the residual DC voltage of the ion beam aligned TN-LCD on the DLC thin film surface is almost the same as that of the rubbing aligned TN-LCD on a polyimide (Pl) surface.