• 제목/요약/키워드: Detail removal

검색결과 90건 처리시간 0.021초

Accuracy of structural computation on simplified shape

  • Marin, P.
    • Structural Engineering and Mechanics
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    • 제35권2호
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    • pp.127-140
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    • 2010
  • This paper focuses on a number of criteria that enable controlling the influence of geometric simplification on the quality of finite element (FE) computations. To perform the mechanical simulation of a component, the corresponding geometric model typically needs to be simplified in accordance with hypotheses adopted regarding the component's mechanical behaviour. The method presented herein serves to compute an a posteriori indicator for the purpose of estimating the significance of each feature removal. This method can be used as part of an adaptive process of geometric simplification. If a shape detail removed during the shape simplification process proves to be influential on mechanical behaviour, the particular detail can then be reinserted into the simplified model, thus making it possible to readapt the initial simulation model. The fields of application for such a method are: static problems involving linear elastic behaviour, and linear thermal problems with stationary conduction.

A Mask-based Gaussian Noise Removal Algorithm in Spatial Space

  • Seo, Hyun-Soo;Kim, Nam-Ho
    • Journal of information and communication convergence engineering
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    • 제5권3호
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    • pp.259-264
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    • 2007
  • According to the development and wide use of broad band internet etc., diverse application technologies using large capacity data such as images have been progressed and in these systems, for accurate acquisition and precise applications of an original signal, the degradation phenomenon generated in the transmission process etc. should be removed. Noises have become known as the main cause of the degradation phenomenon and especially Gaussian noise represents characteristics occurring dependently in image signals and degrades detail information such as edge. In this paper, we removed Gaussian noise using a subdivided nonlinear function according to a threshold value and analyzed the histogram acquired from an edge image to establish a threshold value adaptively, and strengthened detail information of image by using the postprocessing. In simulation results, the proposed method represented excellent performance from comparison of MSE with existing methods.

A Study on Weld Bead Profile Measurement System for Use in Automatic Weld Bead Removal System

  • Lee, Jeong-Woo;Lee, Eun-Hyun
    • 제어로봇시스템학회:학술대회논문집
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    • 제어로봇시스템학회 1999년도 제14차 학술회의논문집
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    • pp.194-197
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    • 1999
  • Automatic weld bead removal system is consisted of bead removal tool, bead profile measurement system and tool motion control system. In this paper, design of weld bead profile measurement system which is used for automatic weld bead removal system is described. The system measures the weld bead position, normal vector of the auto-body and weld bead profile. The optical sensor with structured laser beam is used as a sensor and comparison of the sensor that can be used for this purpose is discussed in detail. The measurement process and the related software developed for this purpose are also described. A median filter, average filter and long line filters are used and their effects in bead profile measurement are discussed. The measurement system is integrated into automatic bead removal system and is used to remove weld bead in rear pillar of automotive body. The whole system operates well in automotive body assembly line and thus the system is proved to be good for this purpose.

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Analysis of Factors Impacting Atmospheric Pressure Plasma Polishing

  • Zhang, Ju-Fan;Wang, Bo;Dong, Shen
    • International Journal of Precision Engineering and Manufacturing
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    • 제9권2호
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    • pp.39-43
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    • 2008
  • Atmospheric pressure plasma polishing (APPP) is a noncontact precision machining technology that uses low temperature plasma chemical reactions to perform atom-scale material removal. APPP is a complicated process, which is affected by many factors. Through a preliminary theoretical analysis and simulation, we confirmed that some of the key factors are the radio frequency (RF) power, the working distance, and the gas ratio. We studied the influence of the RF power and gas ratio on the removal rate using atomic emission spectroscopy, and determined the removal profiles in actual operation using a commercial form talysurf. The experimental results agreed closely with the theoretical simulations and confirmed the effect of the working distance. Finally, we determined the element compositions of the machined surfaces under different gas ratios using X-ray photoelectron spectroscopy to study the influence of the gas ratio in more detail. We achieved a surface roughness of Ra 0.6 nm on silicon wafers with a peak removal rate of approximately 32 $mm^{3}$/min.

네오디뮴 영구자석을 이용한 컨베이어벨트 구동형 미세칩 포집장치의 성능 평가 (Performance Evaluation of Microchip Removal Device Rotating by Conveyor Belt with Neodymium Permanent Magnet)

  • 최성윤;왕준형;왕덕현
    • 한국기계가공학회지
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    • 제20권1호
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    • pp.103-109
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    • 2021
  • Fine chips generated by machining have an impact on machine failure and quality of machined products, it is necessary to remove the chips, so the microchip collection and removal device by rotating conveyor belt with neodymium permanent magnets was developed. In this research, to solve the problem for reducing the existing microchips in the tank, a micro-chip removal device by rotating conveyor belt with neodymium permanent magnets developed. In the development of micro-chip removal device, 3D CATIA modeling was used, and the flow analysis and the electromagnetic force analysis were performed with COMSOL Multiphysics program. To evaluate the performance of the prototypes produced, design of experiments (DOE) is used to obtain the effect of neodymium conveyor movement speed on chip removal for the ANOVA analysis of recovered powders. An experiment was conducted to investigate the effect of the conveyor feed rate on the chip removal performance in detail. As a result of the experiment, it was confirmed that the slower the feeding speed of the fine chip removing device, the more efficient the chip removal.

Redox Reaction Investigation of Graphene Nanoribbon

  • Yu, Young-Jun
    • Applied Science and Convergence Technology
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    • 제27권2호
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    • pp.35-37
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    • 2018
  • The redox reaction on graphene nanoribbon (GNR) field effect transistors(FET) has been studied. In detail, upon employing an electrolyte gating, we verified electron transport performance modulation of GNR FET by monitoring conductance variation under oxidation and reduction processes. The conductance enhancement of GNR via removal of PMMA residue on graphene surface during redox cycles was also observed.

Generalized Directional Morphological Filter Design for Noise Removal

  • Jinsung Oh;Heesoo Hwang;Changhoon Lee;Younam Kim
    • KIEE International Transaction on Systems and Control
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    • 제2D권2호
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    • pp.115-119
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    • 2002
  • In this paper we present a generalized directional morphological filtering algorithm for the removal of impulse noise, which is based on a combination of impulse noise detection and a weighted rank-order morphological filtering technique. For salt (or pepper) noise suppression, the generalized directional opening (or closing) filtering of the input signal is selectively used. The detection of impulse noise can be done by the geometrical difference of opening and closing filtering. Simulations show that this new filter has better detail feature preservation with effective noise reduction compared to other nonlinear filtering techniques.

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지형 렌더링을 위한 효율적인 자료 구조와 알고리즘 (Efficient Data Structures and Algorithms for Terrain Data Visualization)

  • 정문주;한정현
    • 정보처리학회논문지A
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    • 제9A권4호
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    • pp.581-588
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    • 2002
  • 대화적인 멀티미디어 시스템 구현에 있어, 실시간 가시화/시각화(visualization)는 중요한 기능을 한다. 된 논문은 실시간 지형 렌더링을 위한 효율적인 자료 구조와 알고리즘을 제안한다. 대개의 경우, 지형 데이터는 매우 방대한 크기를 가지고 있어서 있는 데이터를 그대로 실시간 렌더링하는 것은 불가능할 경우가 많다. 따라서 실시간 지형 렌더링에서는 LOD(Levels of Detail) 관리와 뷰 프러스텀 컬링이 핵심 사항이 된다. 본 논문은 계층적이면서도 간결한 지형 자료 구조, 신속한 뷰 프러스텀 컬링, 효율적인 LOD 구축 및 이에 기반한 렌더링 기법을 상세히 기술한다. 실험 결과, 제안된 기법은 일반 PC 사양에서 초당 22 프레임의 렌더링 속도를 보였다.

Microabrasion Techinique을 이용한 치아변색의 치료증례 (Treatment of Tooth Discoloration using Microabrasion Technique : Case Report)

  • 박미령;김종수;김용기
    • 대한소아치과학회지
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    • 제24권3호
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    • pp.511-517
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    • 1997
  • Tooth discoloration detracts from one's appearance and influences self-image and it is particularly true in children. Therefore, pediatric dentists are required to treat tooth discoloration manifested in children for the normal development of their psycosocial health. Three treatment modalities are currently availabler for the removal of a variety of intrinsic stains from vital teeth. These are enamel microabrasion technique using hydrochloric acid, office bleaching and home bleaching technique with carbamide. Microabrasion technique has several advantages over bleaching in that it is easy to accomplish and does not require multiple office visits or the expensive instruments and the color change seems to be permanent after treatment. The process relies on decalcification, a softening with HCl and then removal of the enamel containing the stain with rubbing. Due to the mechanism of stain removal, this method is indicated for the removal of superficial enamel stains or disc oloration only. We report four successfully treated cases by enamel microabrasion using 15% HCl and pumice. Entire clinical steps are described in detail with some discussions on the outcome.

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Removal of hexavalent chromium using modified pistachio shell

  • Parlayici-Karatas, S.;Pehlivan, E.
    • Advances in environmental research
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    • 제1권2호
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    • pp.167-179
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    • 2012
  • Pistachio shell (Pistacia vera) (PS), a low-cost material, has been utilized for the removal of the Cr(VI) ions after treatment with citric acid. Batch experimental steps were applied to obtain Cr(VI) ion adsorption details for the equilibrium between Cr(VI) and modified pistachio shell (MPS). The influences of contact time, pH, adsorbent dose and initial chromium concentration on the adsorption performance of MPS was investigated in detail. The results displayed that adsorption of Cr(VI) by MPS reached to equilibrium after 2 h and after that a little change of Cr(VI) removal efficiency was observed. The sorption percent is higher at lower pH and lower chromium concentration. Two possible mechanisms for reduction of Cr(VI) to Cr(III) can be suggested in Cr(VI) removal. In the first mechanism, Cr(VI) is reduced to Cr(III) by surface electron-donor groups of the adsorbent and the reduced Cr(III) forms complexes with adsorbent or remains in the solution. This Cr(III) is not adsorbed by adsorbent at pH 1.8. But in second mechanism, the adsorption-coupled reduction of Cr(VI) to Cr(III) occurred on the adsorbent sites. The equilibrium sorption capacity of Cr(VI) ion after 2 h was 64.35 mg/g for MPS.