• 한국해안해양공학회지
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• 제1권1호
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• pp.44-49
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• 1989

점성토의 퇴적현상에는 여러가지 물리화학적 인자가 작용하기 때문에 최근까지의 연구경향은 주로 현장관측이나 수리실험에 의존하고 있는 실정이다. 본 연구에서는 금강하구에서 채취한 시료를 사용하여 정성토의 침식 및 퇴적에 관한 개수로 실험을 하였다. 침식에 대한 실험에서는 여러가지 수리조건에서의 시간에 따른 부유농도 변화를 측정하여 침식률 및 침식계수를 구하여 침식에 대한 한계소류력을 결정하였으며, 퇴적에 대한 실험에서는 수리조건을 변화시키면서 각 소류력에 대한 평형농도를 결정하여 평형농도와 초기농도와의 비와 소류력과의 관계를 얻었다. 본 연구의 결과를 다른 자료와 비교 검토하여 정상적으로 유사한 경향을 나타내고 있음을 알 수 있었다.

• 한국세라믹학회지
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• 제34권8호
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• pp.811-816
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• 1997

SiO2-P2O5-B2O3 glass soot was fabricated by flame hydrolysis deposition and their properties by SEM, XRD, TGA-DSC were investigated., The mechanism of consolidation process of a glass soot as a function of consolidation temperature was analyzed by SEM observations. In the XRD patterns, the crystalline peaks which seem to be generated from B2O3 and BPO4 were observed. When the temperature of heat treatment exceeded 105$0^{\circ}C$, the non-crystalline state of SiO2-P2O5-B2O3 glass was observed. In the TGA-DSC curves, the evaporation of water molecule by a sudden endothermic reaction was observed at 128$^{\circ}C$ and a broad endothermic peak was seen in the temperature range of 40$0^{\circ}C$-95$0^{\circ}C$, without any weight loss. Finally, this peak was began to recover its baseline at 953$^{\circ}C$. This point is equal to the temperature at which the densification begins. Furthermore, we observed that the addition of dopants such as P2O5 and B2O3 decrease the onset of consolidation temperature till 95$0^{\circ}C$.

• 한국재료학회지
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• 제5권5호
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• pp.568-574
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• 1995

We investigated the effects of B-doping on the growth mechanism of ZnO films. The B-doped ZnO films, which were widely applied for transparent conducting electrode, were deposited by plasma enhanced chemcial vapor depostion(PECVD) using diethylzinc(DEZ), No.sub 2/. and B$_{2}$H$_{6}$. The deposition conditions were a sbustrate temperature of 30$0^{\circ}C$, an rf power of 200, and a chamber pressure of 1 torr. At the given depostion condition, the growth rate of B-doped ZnO thin films was higher than that of undoped ones, but didn't change even with further increasing B$_{2}$H$_{6}$ flow rate and the interplanar distance between(0002) planes was reduced as B atoms substituted Zn sites.s.

• 한국재료학회지
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• 제17권9호
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• pp.475-479
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• 2007

Pulsed laser deposition was utilized to grow MnS thin films on c-sapphire substrate using a KrF excimer laser at growth temperatures that ranged from room temperature to $700^{\circ}C$. The results of X-ray diffraction (XRD) and UV-visible spectroscopy were employed to investigate the structural and optical properties of the MnS films. While the growth rate decreased as $T_s$ increased, the overall quality of the film improved. The highest quality MnS film was obtained at $700^{\circ}C$. Variations in the $T_s$ resulted in the MnS films exhibiting different growth mechanisms. The oriented (200) rocksalt MnS film was grown at room temperature. In the case of higher $T_s,\;200{\sim}500^{\circ}C$, the films consisted of mixed phases of rocksalt and wurtzite. The main structure of the films was altered to (111) rocksalt when the temperature was increased to in excess of $600^{\circ}C$. This behavior may very well be the result of elements such as surface energy and atomic arrangement during the growth process. The optical band gap of the obtained ${\alpha}-MnS$ film was estimated to be 3.32 eV.

• 한국분말재료학회지
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• 제10권3호
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• pp.195-200
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• 2003

Ni coated $Al_2O_3$ composite was successfully Prepared by the electroless deposition Process. The average size of Ni particles coated on the $Al_2O_3$ matrix powder was about 20 nm. It was hard to find any reaction compound as an impurity at interface between $Al_2O_3$ and Ni particles after sintering. The characterization of microstructure crystal structure and fracture behavior of the sintered body were investigated using XRD, TEM and Victors hardness tester, and compared with those of the sintered $Al_2O_3$ monolithic body. Many dislocations were observed in the Ni phase due to the difference of thermal expansion coefficient between $Al_2O_3$ and Ni phase, and no observed microcracks at their $Al_2O_3$ and Ni interface. In the $Al_2O_3$/Ni composite, the main fracture mode showed a mixed fracture with intergranular and transgranuluar type having some ,surface roughness. The fracture toughness was slightly increased due to the plastic deformation mechanism of Ni phase in the $Al_2O_3$/Ni composite.

• 반도체디스플레이기술학회지
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• 제18권1호
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• pp.1-4
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• 2019

Reactive sputtering is widely used because of its high deposition rate and high step coverage. The deposition layer is often affected by target poisoning because the target conditions are changed, as well, by reactive gases during the initial stage of sputtering process. The reactive gas affects the deposition rate and process stability (target poisoning), and it also leads unintended oxide interlayer formation. Although the target poisoning mechanism has been well known, little attention has been paid on understanding the interlayer formation during the reactive sputtering. In this research, we studied the interlayer formation during the reactive sputtering. A DC magnetron sputtering process is carried out to deposit an aluminum oxide film on a silicon wafer. From the real-time process monitoring and material analysis, the target poisoning phenomena changes the reactive gas balance at the initial stage, and affects the interlayer formation during the reactive sputtering process.

• 한국수자원학회:학술대회논문집
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• 한국수자원학회 2022년도 학술발표회
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• pp.86-86
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• 2022

While estuarine dams can develop freshwater resources and block the salt intrusion, they can result in increased sediment deposition in the estuary. The mechanism of increased sediment deposition in an estuary with an estuary dam is not well understood. To fill this knowledge gap, 7 ADCP measurements of flow and suspended sediment concentration (SSC) were collected along-channel in an estuary with an estuarine dam over a neap-spring cycle. Flow and SSC were used to calculate the sediment flux and sediment flux gradients. The results indicated that the cumulative sediment fluxes at all stations were directed landward. The along-channel sediment flux gradient was negative, which indicated deposition along the channel. The landward mean-flow fluxes were dominant in the deep portion of the channel near the estuary mouth, whereas landward correlation fluxes were dominant in the shallow portion of the channel near the estuarine dam. The tides were the dominant forcing driving the sediment fluxes throughout the estuary.

• 한국표면공학회지
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• 제42권5호
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• pp.197-202
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• 2009

The electrodeposition in acidic aqueous electrolyte bath of cadmium telluride on gold electrodes has been studied by electrochemical analysis. Conventional cyclic voltammetry using potentiostat is considered as a reliable method to study electrochemical behavior of electrodeposition of CdTe. In this paper, the mechanism of CdTe deposition and its cyclic voltammetry were studied with the Te ion concentration, temperature, potential, and scan rate. We also investigated surface morphologies using FESEM and atomic composition of Cd and Te using EDS. Atomic composition of Cd and Te were varied with Te ion concentration in the electrolyte.

• 대한전자공학회논문지
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• 제26권8호
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• pp.1197-1202
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• 1989

In this study, physical properties of silicon dioxide film deposited on GaAs by photo excitation are evaluated using ellisometry, ESCA and AES. Under the pressure of 2-8 torr, silicon dioxide film is deposited on GaAs by photo excitation at 200\ulcorner using gas mixtures of SiH4 and N2O. The measured results show refractive index varies from 1.37 to 1.42 and stoichiometry from 1.97 to 2.09 with process pressure. The observed characteristics of deposition rate are divided into three different regions with process pressure and possible deposition mechanism are also discussed, qualitatively.

• Journal of the Optical Society of Korea
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• 제20권1호
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• pp.125-129
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• 2016

In this study, we have investigated a high-temperature AlN nucleation layer and AlGaN epilayers on c-plane sapphire substrate by low-pressure metal-organic chemical vapor deposition (LP-MOCVD). High resolution X-ray diffraction (HRXRD), atomic force microscopy (AFM), scanning electron microscope (SEM) and Raman scattering measurements have been exploited to study the crystal quality, surface morphology, and residual strain of the HT-AlN nucleation layer. These analyses reveal that the insertion of an LT-AlN nucleation layer can improve the crystal quality, smooth the surface morphology of the HT-AlN nucleation layer and further reduce the threading dislocation density of AlGaN epifilms. The mechanism of inserting an LT-AlN nucleation layer to enhance the optical properties of HT-AlN nucleation layer and AlGaN epifilm are discussed from the viewpoint of driving force of reaction in this paper.