• 제목/요약/키워드: Deposition flux

검색결과 248건 처리시간 0.024초

SOLID STATE CESIUM ION BEAM SPUTTER DEPOSITION

  • Baik, Bong-Koo;Choi, Dong-Jun;Han, Dong-Won;Kim, Yong-Hwan;Kim, Seong-In
    • 한국표면공학회지
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    • 제29권5호
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    • pp.474-477
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    • 1996
  • The solid state cesium ion beam sputter deposition system has been developed for negative carbon ion beam deposition. The negative carbon ion beams are effectively produced by cesium ion bombardment. The C-ion beam current and deposition energy can be independently controlled for the deposition of a-D films. This system is very compact, reliable and high flux without any gas discharge or plasma and has been successfully used in the studies of the ion beam deposited amorphous diamond(a-D)

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Drained End Shield Effects on Heat Deposition Rate Distribution in CANDU 6 Reactor End Shield Structure

  • Jin, Yung-Kwon;Kim, Kyo-Youn;Hwang, Hae-Ryong
    • Nuclear Engineering and Technology
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    • 제26권4호
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    • pp.570-577
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    • 1994
  • The loss of water in the carbon steel balls and water region of the end shield for CANDU 6 reactor could lead to significant temperature gradient through the end shield structure which amy result in the excessive deformation. With an assumed end shield drained scenario, the heat deposition rates were calculated through the end shield associated with the central fuel channel during full power operation as an initial step to thermal stress analysis. The drained case was compared with that of water present normal case in therms of heat deposition rater and the total heating throughout the end shield regions. The compared results show that the heat deposition and the total heating remain almost the same between the two cases. It was found that the change of volume integrated flux in the end shield regions due to the loss of water contribute a negligible effect on the heat deposition in this region.

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기계 부품 재제조를 위한 DED 공정 조건에 따른 적층 및 잔류응력 특성 분석 (Investigation into the Effects of Process Parameters of DED Process on Deposition and Residual Stress Characteristics for Remanufacturing of Mechanical Parts)

  • 김단아;이광규;안동규
    • 소성∙가공
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    • 제30권3호
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    • pp.109-118
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    • 2021
  • Recently, there has been an increased interest in the remanufacturing of mechanical parts using metal additive manufacturing processes in regards to resource recycling and carbon neutrality. DED (directed energy deposition) process can create desired metallic shapes on both even and uneven substrate via line-by-line deposition. Hence, DED process is very useful for the repair, retrofit and remanufacturing of mechanical parts with irregular damages. The objective of the current paper is to investigate the effects DED process parameters, including the effects of power and the scan speed of the laser, on deposition and residual stress characteristics for remanufacturing of mechanical parts using experiments and finite element analyses (FEAs). AISI 1045 is used as the substrate material and the feeding powder. The characteristic dimensions of the bead shape and the heat affected zone (HAZ) for different deposition conditions are obtained from the experimental results. Efficiencies of the heat flux model for different deposition conditions are estimated by the comparison of the results of FEAs with those of experiments in terms of the width and the depth of HAZ. In addition, the influence of the process parameters on residual stress distributions in the vicinity of the deposited region is investigated using the results of FEAs. Finally, a suitable deposition condition is predicted in regards to the bead formation and the residual stress.

나노유체의 풀비등 임계열유속에 대한 실험적 연구 (Experimental Investigations on Pool Boiling CHE of Nano-Fluids)

  • 김형대;김무환
    • 대한기계학회논문집B
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    • 제31권11호
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    • pp.949-956
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    • 2007
  • Pool boiling critical heat flux (CHF) of nanofluids with oxide nanoparticles of $TiO_2$ or $Al_2O_3$ was experimentally investigated under atmospheric pressure. The results showed that a dispersion of oxide nanoparticles significantly enhances the CHF over that of pure water. Moreover it was found that nanoparticles were seriously deposited on the heater surface during pool boiling of nanofluids. CHF of pure water on a nanoparticle-deposited surface, which is produced during the boiling of nanofluids, was not less than that of nanofluids. The result reveals that the CHF enhancement of nanofluids is absolutely attributed to modification of the heater surface by the nanoparticle deposition. Then, the nanoparticle-deposited surface was characterized with parameters closely related to pool boiling CHF, such as surface roughness, contact angle, and capillary wicking. Finally, reason of the CHF enhancement of nanofluids is discussed based on the changes of the parameters.

THE EFFECT OF MICRO/NANOSCALE STRUCTURES ON CHF ENHANCEMENT

  • Ahn, Ho-Seon;Kim, Moo-Hwan
    • Nuclear Engineering and Technology
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    • 제43권3호
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    • pp.205-216
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    • 2011
  • Recently, many research studies have investigated the enormous critical heat flux (CHF) enhancement caused by nanofluids during pool boiling and flow boiling. One of the main reasons for this enhancement is nanoparticle deposition on the heated surface. However, in real applications, nanofluids create many problems when used as working fluids because of sedimentation and aggregation. Therefore, artificial surfaces on silicon and metal have been developed to create an effect similar to that of nanoparticle deposition. These modified surfaces have proved capable of greatly increasing the CHF during pool boiling, and good results have also been observed during flow boiling. In this study, we demonstrate that the wetting ability of a surface, i.e., wettability, and the liquid spreading ability (hydrophilic surface property), are key parameters for increasing the CHF during both pool and flow boiling. We also demonstrate that when the fuel surface in nuclear power plants is modified in a similar manner, it has the same effect, producing a large CHF enhancement.

신경망을 이용한 SiN 박막 표면거칠기에의 이온에너지 영향 모델링 (Neural Network Modeling of Ion Energy Impact on Surface Roughness of SiN Thin Films)

  • 김병환;이주공
    • 한국표면공학회지
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    • 제43권3호
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    • pp.159-164
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    • 2010
  • Surface roughness of deposited or etched film strongly depends on ion bombardment. Relationships between ion bombardment variables and surface roughness are too complicated to model analytically. To overcome this, an empirical neural network model was constructed and applied to a deposition process of silicon nitride (SiN) films. The films were deposited by using a pulsed plasma enhanced chemical vapor deposition system in $SiH_4$-$NH_4$ plasma. Radio frequency source power and duty ratio were varied in the range of 200-800 W and 40-100%. A total of 20 experiments were conducted. A non-invasive ion energy analyzer was used to collect ion energy distribution. The diagnostic variables examined include high (or) low ion energy and high (or low) ion energy flux. Mean surface roughness was measured by using atomic force microscopy. A neural network model relating the diagnostic variables to the surface roughness was constructed and its prediction performance was optimized by using a genetic algorithm. The optimized model yielded an improved performance of about 58% over statistical regression model. The model revealed very interesting features useful for optimization of surface roughness. This includes a reduction in surface roughness either by an increase in ion energy flux at lower ion energy or by an increase in higher ion energy at lower ion energy flux.

부산지역 강하먼지와 불용성 성분의 침적량에 관한 연구 (A Study on Bulk Deposition Flux of Dustfall and Insoluble Components in Pusan, Korea)

  • 김유근;박종길;문덕환;황용식
    • 한국환경과학회지
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    • 제10권3호
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    • pp.209-216
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    • 2001
  • Dustfall particles were collected by the modified American dust jar (wide inlet bottle type) at 6 sampling sites in Pusan area from March, 1999 to February, 2000. Thirteen chemical species (Al, Ca, Cd, Cr, Cu, Fe, K, Mg, Mn, Ni, Pb, Si, and Zn) were analyzed by AAS and ICP. The purposes of this study were to estimate qualitatively various bulk deposition flux of dustfall and insoluble components by applying regional and seasonal distribution. Dustfall amount of regional variations were found in order of coastal zone, industrial zone, commercial zone, agricultural zone and residential zone, and seasonal total dustfall had higher concentrations during spring for 6.741 ton/${km}^2$/season, lower concentrations during summer for 1.989 ton/${km}^2$/season, and annual total concentration was 17.742 ton/${km}^2$/year. The regional distributions of enrichment factor show well-defined anthropogenic metals (Cd, Cu, Pb, and Zn) at industrial and agricultural zone, and contribution rate of soil particles were found in order of summer, fall, winter and spring. Factor loading effects of chemical composition of dustfall were found in order of road traffic emission source and combustion processed source, industrial activity source, soil source and marine source.

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Ion Flux Assisted PECVD of SiON Films Using Plasma Parameters and Their Characterization of High Rate Deposition and Barrier Properties

  • Lee, Joon-S.;Jin, Su-B.;Choi, Yoon-S.;Choi, In-S.;Han, Jeon-G.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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    • pp.236-236
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    • 2011
  • Silicon oxynitride (SiON) was deposited for gas barrier film on polyethylene terephthalate (PET) using octamethylycyclodisiloxane (Si4O4C8H24, OMCTS) precursor by plasma enhanced chemical vapor deposition (PECVD) at low temperature. The ion flux and substrate temperature were measured by oscilloscope and thermometer. The chemical bonding structure and barrier property of films were characterized by Fourier transform infrared (FT-IR) spectroscopy and the water vapor transmission rate (WVTR), respectively. The deposition rate of films increases with RF bias and nitrogen dilution due to increase of dissociated precursor and nitrogen ion incident to the substrate. In addition, we confirmed that the increase of nitrogen dilution and RF bias reduced WVTR of films. Because, on the basis of FT-IR analysis, the increase of the nitrogen gas flow rate and RF bias caused the increase of the C=N stretching vibration resulting in the decrease of macro and nano defects.

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Formation of $Y_{2}O_{3}$ nanodots on substrate surface using the rf-sputtering method

  • Chang, K.C.;Yoo, J.M.;Kim, Y.K.;Wang, X.L.;Dou, S.X.
    • 한국초전도ㆍ저온공학회논문지
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    • 제10권4호
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    • pp.6-8
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    • 2008
  • $Y_{2}O_{3}$ nanodots have been deposited on top of the substrate surface using rf-sputtering method. This approach was adopted to be able to modulate the substrate surface with nanodots used as a seed for the flux pinning sites in the superconducting films. The nanodot density of $Y_{2}O_{3}$ was controlled mainly using the deposition time, rf-power, and substrate temperature. $Y_{2}O_{3}$ nanodots with ${\sim}\;50\;nm$ in diameter and ${\sim}\;3\;nm$ in height were obtained at rf-sputtering time of about 15 seconds using 400 watts of rf-power and $630^{\circ}C$ of substrate temperature. As deposition time increased up to about 30 seconds, the interconnected islands of $Y_{2}O_{3}$ nanodots formed, which can be clearly observed with AFM surface image. The substrate surface was covered entirely with $Y_{2}O_{3}$ layer above the deposition time of 60 seconds. The modulated surface morphologies and cross section analysis of deposited $Y_{2}O_{3}$ nanodots at various experimental conditions have been examined using AFM and discussed with respect to the flux pinning sites for the practical application.

Oxygen Ion Beam Deposition 법을 이용한 저온 ITO film에 Oxygen radical(O)이 미치는 영향에 대한 연구

  • 김정식;배정운;김형종;정창현;이내응;염근영
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2000년도 제18회 학술발표회 논문개요집
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    • pp.117-117
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    • 2000
  • 높은 광학적 투과성과 전기전도성을 갖는 ITO film은 solar cell같은 optoelectronic device나 휴대용 소형 TV, flat panel display 등의 투명전극으로 그 응용 분야가 광범위하여 많은 연구가 수행되어져 왔다. 기판으로서 유리를 사용할 때 생기는 활용범위 제한을 극복하고자 최근 유기물 위에 증착이 가능한 저온 증착방법에 대한 연구가 활발히 이루어지고 있다. 그 가운데 이온빔과 같은 energetic한 beam을 이용한 박막의 제조는 기판을 플라즈마 발생지역으로부터 분리시켜 이온빔의 flux 및 에너지, 입사각 등의 자유로운 조절을 통해 상온에서도 우수한 성질의 박막형성 가능성이 제시되어 지고 있다. ITO박막을 형성하는 방법 중 스프레이법이나 CVD법과 같은 화학적 증착방법은 증착시 350-50$0^{\circ}C$의 고온이 필요하고 현재 가장 많이 응용되어 지고 있는 sputter법은 15$0^{\circ}C$정도의 가열이 필요하므로 앞으로 응용가능성이 매우 커서 많은 연구가 진행중인 플라스틱과 아크릴 같은 flexible 한 기판위 증착에 적용이 불가능하다. 본 실험에서는 IBAD(Ion Beam Assisted Deposition)법을 이용하여 저온 ITO film을 유리와 유기막위에 증착하는 연구를 수행하였다. 유기막위에 증착된 ITO는 보다 가볍고 충격에 강하고 유리에 못지 않은 투과성을 가지고 있으나 현재 film의 quality 향상에 대한 요구가 증대되어 지고 있는 실정이다. 따라서, 본 실험에서는 dual oxygen ion gun의 조건변화에 따른 ITO film의 특성변화를 관찰하였다. 고정된 증?율에 한 개 ion gun에 ion flux를 고정시킨 후 또 다른 ion gun에서 발생하는 oxygen radical의 영향을 조사하였으며 oxygen radical의 rf power에 따른 변화는 OES(Optical emission spectroscopy)를 사용하였다. 너무 적은 oxygen ion beam flux나 oxygen radical은 film의 전도도 및 투과도를 저하시켰고 반면 너무 과도한 flux의 증가 시는 전도도는 감소하였고 투과도는 증가하는 경향을 보였다. 기판에 도달하는 oxygen ion flux는 faraday cup을 이용하여 측정하였으며 증착된 ITO film은 XPS, UV-spectrometer, 4-point probe를 이용하여 분석하였다.

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