• Title/Summary/Keyword: Deposition flux

Search Result 248, Processing Time 0.03 seconds

Mercury Research and Management in Korea (국내 수은 연구 동향 및 관리 현황)

  • Jurng, Jong-Soo;Shim, Shang-Gyoo
    • Journal of Korean Society for Atmospheric Environment
    • /
    • v.25 no.2
    • /
    • pp.99-107
    • /
    • 2009
  • This paper reviews the current status of mercury research on exposure and contamination, mercury emissions, emission limits and control technologies, long-range transport and deposition research, and mercury management policy in Korea. According to a monitoring of the Ministry of Environment and the Ministry of Health and Welfare, blood mercury levels among Koreans are $5{\sim}8$ times higher than those of U.S. and Germany. The most dominant source of exposure to mercury is through dietary intake. Emissions of mercury from coal-fired power plants are estimated 8.93 ton/year in 2004. Emissions of mercury from other important sources, such as waste incineration, steel and cement manufacturing and non-ferrous metal smelting operations are to be further investigated. A study on long-range transport of mercury suggests that the dry deposition flux over the Yellow Sea was much greater than those for other oceans. As a whole, the amounts of wet depositions of nitrogen and sulfur were 1.9 and 1.5 times larger than the amounts of dry depositions in each species, respectively. Substantial influence from China caused by high emissions in East China and westerly wind was possibly suggested. However, the influence from nitrogen emission in Korea was also confirmed. Korean Government has already adopted stringent emission limits on mercury for incinerators and boilers in 2005. However, emission limits for coal-fired power plants and non-ferrous metal smelters are rather relaxed. As the above mentioned two sources can be two most important sources of mercury emissions, control strategy for those sources are to be considered.

Synthesis of Graphene on Hexagonal Boron Nitride by Low Pressure Chemical Vapor

  • Han, Jae-Hyun;Yeo, Jong-Souk
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2012.08a
    • /
    • pp.391-392
    • /
    • 2012
  • Graphene is a perfectly two-dimensional (2D) atomic crystal which consists of sp2 bonded carbon atoms like a honeycomb lattice. With its unique structure, graphene provides outstanding electrical, mechanical, and optical properties, thus enabling wide variety of applications including a strong potential to extend the technology beyond the conventional Si based electronic materials. Currently, the widespread application for electrostatically switchable devices is limited by its characteristic of zero-energy gap and complex process in its synthesis. Several groups have investigated nanoribbon, strained, or nanomeshed graphenes to induce a band gap. Among various techniques to synthesize graphene, chemical vapor deposition (CVD) is suited to make relatively large scale growth of graphene layers. Direct growth of graphene on hexagonal boron nitride (h-BN) using CVD has gained much attention as the atomically smooth surface, relatively small lattice mismatch (~1.7%) of h-BN provides good quality graphene with high mobility. In addition, induced band gap of graphene on h-BN has been demonstrated to a meaningful value about ~0.5 eV.[1] In this paper, we report the synthesis of grpahene / h-BN bilayer in a chemical vapor deposition (CVD) process by controlling the gas flux ratio and deposition rate with temperature. The h-BN (99.99%) substrate, pure Ar as carrier gas, and $CH_4$ are used to grow graphene. The number of graphene layer grown on the h-BN tends to be proportional to growth time and $CH_4$ gas flow rate. Epitaxially grown graphene on h-BN are characterized by scanning electron microscopy, atomic force microscopy, and Raman spectroscopy.

  • PDF

Transport Properties of $MgB_2$ Films Grown by Hybrid Physical Chemical Vapor Deposition Method (HPCVD 방법으로 성장된 $MgB_2$ 박막의 수송 특성)

  • Kim, Hye-Young;Hwang, Tae-Jong;Kim, D.H.;Seong, Won-Kyung;Kang, W.N.
    • Progress in Superconductivity
    • /
    • v.9 no.1
    • /
    • pp.5-10
    • /
    • 2007
  • We prepared four different $MgB_2$ films on $Al_2O_3$ by hybrid physical chemical vapor deposition method with thicknesses ranging from $0.65\;{\mu}m$ to $1.2\;{\mu}m$. X-ray diffraction patterns confirm that all the $MgB_2$ films are c-axis oriented perpendicular to $Al_2O_3$ substrates. The superconducting onset temperature of $MgB_2$ films were between 39.39K and 40.72K. The residual resistivity ratio of the $MgB_2$ films was in the range between 3.13 and 37.3. We measured the angle dependence of critical current density ($J_c$) and resistivity, and determined the upper critical field ($H_{c2}$) from the temperature dependence of the resistivity curves. The anisotropy ratios defined as the ratio of the $H_{c2}$ parallel to the ab-plane to that perpendicular to the ab-plane were in the range of 2.13 to 4.5 and were increased as the temperature was decreased. Some samples showed increase of $J_c$ and decrease of resistivity when a magnetic field in applied parallel to the c-axis. We interpret this angle dependence in terms of enhanced flux pinning due to columnar growth of $MgB_2$ along the c-axis.

  • PDF

Analysis of Debris Flow Disaster Area according to Location Change of Check Dam using Kanako-2D (Kanako-2D를 이용한 사방댐 위치 변화에 따른 토석류 피해지 분석)

  • Kim, Young Hwan;Jun, Kye-Won
    • Journal of the Korean Society of Safety
    • /
    • v.33 no.1
    • /
    • pp.128-134
    • /
    • 2018
  • With the increase in frequency of typhoons and heavy rains following the climate change, the scale of damage from the calamities in the mountainous areas has been growing larger and larger, which is different from the past. For the case of Korea where 64% of land is consisted of the mountainous areas, establishment of the check dams has been drastically increased after 2000 in order to reduce the damages from the debris flow. However, due to the lack of data on scale, location and kind of check dams established for reducing the damages in debris flow, the measures to prevent damages based on experience and subjective basis have to be relied on. Under this study, the high-precision DEM data was structured by using the terrestrial LiDAR in the Jecheon area where the debris flow damage occurred in July 2009. And, from the numerical models of the debris flow, Kanako-2D that is available to reflect the erosion and deposition action was applied to install the erosion control facilities (water channel, check dam) and analyzed the effect of reducing the debris flow shown in the downstream.After installing the erosion control facilities, most of debris flow moves along the water channel to reduce the area to expand the debris flow, and after installing the check dam, the flow depth and flux of the debris flow were reduced along with the erosion. However, as a result of analyzing the diffusion area, flow depth, erosion and deposition volume of the debris flow generated from the deposition part after modifying the location of the check dams with the damages occurring on private residences and agricultural land located on the upstream area, the highest reduction effect was shown when the check dam is installed in the maximal discharge points.

The superconductivity and pinning properties of Y2O3-doped GdBa2Cu3O7-δ films prepared by pulsed laser deposition

  • Oh, Won-Jae;Park, Insung;Yoo, Sang-Im
    • Progress in Superconductivity and Cryogenics
    • /
    • v.20 no.4
    • /
    • pp.41-45
    • /
    • 2018
  • We have investigated the effect of $Y_2O_3$ nanoparticles on the pinning properties of $Y_2O_3$-doped $GdBa_2Cu_3O_{7-{\delta}}$ (GdBCO) films. Both undoped and $Y_2O_3$-doped GdBCO films were grown on $CeO_2$-buffered MgO (100) single crystal substrates by pulsed laser deposition (PLD) using KrF (${\lambda}=248nm$) laser. The $Y_2O_3$ doping contents were controlled up to ~ 2.5 area% by varying the internal angles of $Y_2O_3$ sectors put on the top surface of GdBCO target. Compared with the $Gd_2O_3$-doped GdBCO films previously reported by our group [1], the $Y_2O_3$-doped GdBCO films exhibited less severe critical temperature ($T_c$) drop and thus slightly enhanced critical current densities ($J_c$) and pinning force densities ($F_p$) at 65 K for the applied field parallel to the c-axis of the GdBCO matrix (B//c) with increasing the doping content. Below 40 K, the in-field $J_c$ and $F_p$ values of all $Y_2O_3$-doped GdBCO films exhibited higher than those of undoped GdBCO film, suggesting that $Y_2O_3$ inclusions might act as effective pinning centers.

The Effect of the Addition of BZO Nanopowder in the YBCO PLD Targets on the Flux Pinning Properties of BZO-YBCO Thin Film (YBCO PLD 타겟에 BZO 나노분말 첨가에 따른 PLD-YBCO 박막의 자속고정 효과)

  • Song, K.J.;Ko, R.K.;Lee, Y.S.;Park, Y.M.;Yang, J.S.;Kim, H.S.;Ha, H.S.;Ha, D.W.;Kim, S.W.;Oh, S.S.;Kim, D.J.;Park, C.;Yoo, S.I.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2005.11a
    • /
    • pp.20-21
    • /
    • 2005
  • [ $BaZrO_3$ ], nanopowder was added to YBCO powder to make ($BazrO_3)_x(YBCO)_{(100-x)mol.-%}$ ($BZO_x$-YBCO) ($0{\leq}x{\leq}10$) composite targets fur pulsed laser deposition of superconducting layer in order to investigate the effect of the addition of BZO nanopowder in the YBCO target on the flux pinning properties of $BZO_x$-YBCO thin films. All the $BZO_x$-YBCO thin films were grown on single crystal STO substrate under similar conditions in the PLD chamber. The effect of YBCO targets doped with BZO on the flux pinning properties of $BZO_x$-YBCO thin films has been investigated comparatively. The isothermal magnetizations M(H) of the films were measured at temperatures between 5 and 80 K in fields up to 5 T, employing a PPMS. The optimal amount of BZO nanopowders in $BZO_x$-YBCO thin films to obtain the strongest flux pinning effects at high magnetic fields is about 6 mol.-%.

  • PDF

Deposition Optimization and Bonding Strength of AuSn Solder Film (AuSn 솔더 박막의 스퍼터 증착 최적화와 접합강도에 관한 연구)

  • Kim, D.J.;Lee, T.Y.;Lee, H.K.;Kim, G.N.;Lee, J.W.
    • Journal of the Microelectronics and Packaging Society
    • /
    • v.14 no.2 s.43
    • /
    • pp.49-57
    • /
    • 2007
  • Au-Sn solder alloy were deposited in multilayer and co-sputtered film by rf-magnetron sputter and the composition control and analysis were studied. For the alloy deposition condition, each components of Au or Sn were deposited separately. On the basis of pure Sn and Au deposition, the deposition condition for Au-Sn solder alloy were set up. As variables, the substrate temperature, the rf-power, and the thickness ratio were used for the optimum composition. For multilayer solder alloy, the roughness and the composition of solder alloy were controlled more accurately at the higher substrate temperature. In contrast, for co-sputtered solder, the substrate temperature influenced little to the composition, but the composition could be controlled easily by rf-power. In addition, the co-sputtered solder film mostly consisted of intermetallic compound, which formed during deposition. The compound were confirmed by XRD. Without flux during bonding of solder alloy film on leadframe, the adhesion strength were measured. The maximum shear stress was $330(N/mm^2)$ for multilayer solder with Au 10wt% and $460(N/mm^2)$ for co-sputtered solder with Au 5wt%.

  • PDF

Development of an Improved Numerical Methodology for Design and Modification of Large Area Plasma Processing Chamber

  • Kim, Ho-Jun;Lee, Seung-Mu;Won, Je-Hyeong
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2014.02a
    • /
    • pp.221-221
    • /
    • 2014
  • The present work proposes an improved numerical simulator for design and modification of large area capacitively coupled plasma (CCP) processing chamber. CCP, as notoriously well-known, demands the tremendously huge computational cost for carrying out transient analyses in realistic multi-dimensional models, because electron dissociations take place in a much smaller time scale (${\Delta}t{\approx}10-8{\sim}10-10$) than time scale of those happened between neutrals (${\Delta}t{\approx}10-1{\sim}10-3$), due to the rf drive frequencies of external electric field. And also, for spatial discretization of electron flux (Je), exponential scheme such as Scharfetter-Gummel method needs to be used in order to alleviate the numerical stiffness and resolve exponential change of spatial distribution of electron temperature (Te) and electron number density (Ne) in the vicinity of electrodes. Due to such computational intractability, it is prohibited to simulate CCP deposition in a three-dimension within acceptable calculation runtimes (<24 h). Under the situation where process conditions require thickness non-uniformity below 5%, however, detailed flow features of reactive gases induced from three-dimensional geometric effects such as gas distribution through the perforated plates (showerhead) should be considered. Without considering plasma chemistry, we therefore simulated flow, temperature and species fields in three-dimensional geometry first, and then, based on that data, boundary conditions of two-dimensional plasma discharge model are set. In the particular case of SiH4-NH3-N2-He CCP discharge to produce deposition of SiNxHy thin film, a cylindrical showerhead electrode reactor was studied by numerical modeling of mass, momentum and energy transports for charged particles in an axi-symmetric geometry. By solving transport equations of electron and radicals simultaneously, we observed that the way how source gases are consumed in the non-isothermal flow field and such consequences on active species production were outlined as playing the leading parts in the processes. As an example of application of the model for the prediction of the deposited thickness uniformity in a 300 mm wafer plasma processing chamber, the results were compared with the experimentally measured deposition profiles along the radius of the wafer varying inter-electrode gap. The simulation results were in good agreement with experimental data.

  • PDF

Effects of Feed Protein Quality on the Protein Metabolism of Growing Pigs - Using a Simulation Model - (성장기 돼지의 단백질대사에 사료단백질의 질이 미치는 영향 -수치모델을 사용하여-)

  • 이옥희
    • Journal of the Korean Society of Food Science and Nutrition
    • /
    • v.26 no.4
    • /
    • pp.704-713
    • /
    • 1997
  • This study was conducted to describe qualitatively the protein metabolism of pigs during growth depending on the feed protein quality and to describe quantitatively amino acids requirements, using a simulation model. The used model has a non-linear structure. In the used model, the protein utilization system of a pig, which is in the non-steady-state, is described with 15 flux equations and 11 differential equations and is composed with two compartments. Protein deposition(g/day) of pigs on the 30th, 60th, 90th, and 120th day of feeding duration with three-quality protein, beginning with body weight 20kg, were calculated according to the empirical model, PAF(the product of amino acid functions) of Menke, and was used as object function for the simulation. The mean of relative difference between the simulated protein deposition and PAF calculated values, lied in a range of 8.8%. The simulated protein deposition showed different behavior according to feed protein quality. In the high-quality protein, it showed paraboloidal form with extending growth simulation up to 150eh day. So the maximum of protein deposition was acquired on the 105th day of simulate growth time and then it decreased fast. In the low-quality protein, this form of protein deposition in the course of simulated growth did not appear until 150th day. The simulated protein mass also showed a difference in accordance with feed protein quality. The difference was small on the 30th day of simulated growth, but with duration of the simulated growth it was larger. On the 150th day the simulated protein deposition of high quality protein was 1.5 times higher as compared to the low-quality protein. The simulated protein synthesis and break-down rates(g/day) in the whole body showed a parallel behavior in the course of growth, according to feed protein quality. It was found that the improvement of feed protein quality increased protein deposition in the whole body through a increase of both protein synthesis and breakdown during growth. Also protein deposition efficiency, which was calculated from simulated protein deposition and protein synthesis, showed a difference in dependence on the protein qualify of feed protein. The protein deposition efficiency was higher in pigs fed with high quality protein, especially at the simulation time 30th day. But this phenomena disappeared with growth, so on the 150th day of growth, the protein deposition of the high feed protein quality was lowest among the three different quality of feed protein. The simulated total requirement of the 10 essential amino acids for the growth of pigs was 28.1(g/100g protein), similar to NRC. The requirement of lysine was 4.2(g/100g protein).

  • PDF

Void Defects in Composite Titanium Disilicide Process (복합 티타늄실리사이드 공정에서 발생한 공극 생성 연구)

  • Cheong, Seong-Hwee;Song, Oh-Sung
    • Korean Journal of Materials Research
    • /
    • v.12 no.11
    • /
    • pp.883-888
    • /
    • 2002
  • We investigated the void formation in composite-titanium silicide($TiSi_2$) process. We varied the process conditions of polycrystalline/amorphous silicon substrate, composite $TiSi_2$ deposition temperature, and silicidation annealing temperature. We report that the main reason for void formation is the mass transport flux discrepancy of amorphous silicon substrate and titanium in composite layer. Sheet resistance in composite $TiSi_2$ without patterns is mainly affected by silicidation rapid thermal annealing (RTA) temperature. In addition, sheet resistance does not depend on the void defect density. Sheet resistance with sub-0.5 $\mu\textrm{m}$ patterns increase abnormally above $850^{\circ}C$ due to agglomeration. Our results imply that $sub-750^{\circ}C$ annealing is appropriate for sub 0.5 $\mu\textrm{m}$ composite X$sub-750_2$ process.