• Proceedings of the Korean Institute of Surface Engineering Conference
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• 1999.10a
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• pp.60-61
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• 1999

• 한국정보디스플레이학회:학술대회논문집
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• 2007.08b
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• pp.1611-1614
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• 2007

This paper is concerned on design of organic flow deposition system and development of the deposition process for pentacene thin film by OFD and on electrical characteristics of pentacene films deposited by it. OFD will overcome vacuum thermal evaporator's limits and it will provide a large-scale mass, uniform and good electrical performance.

• 한국정보디스플레이학회:학술대회논문집
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• 2005.07a
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• pp.668-672
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• 2005

Doosan DND, OLED manufacturing equipment maker, has developed the largest deposition system to produce $730{\times}920mm$ size AMOLED devices for the first time in the world. It is necessary for producing 40" AMOLED panels to develop the large-scaled vacuum technologies including ICP plasma, stretching glass chuck, organic deposition, metal deposition and hybrid encapsulation processes.

• Proceedings of the Korean Society Of Semiconductor Equipment Technology
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• 2006.05a
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• pp.135-138
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• 2006

OLEDs are attractive because of possible application in display with low operating voltage, low power consumption, self-emission and capability of multicolor emission by the selection of emissive material. We investigated the effects of deposition rate on the electrical characteristics, physical characteristics and optical characteristics of OLEDs in the ITO(indium-tin-oxide)/N,N'-diphenyl-N,N'-bis(3-methyphenyl)-1,1'-biphenyl-4,4'-diamine(TPD)/tris(8-hydroxyquinoline)aluminum($Alq_3$)/Al device. We measured current density, luminous flux and luminance characteristics of devices with varying deposition rates of TPD and $Alq_3$. It has been found that optimal deposition rate of TPD and $Alq_3$ were respectively $1.5{\AA}/s$ from the device structure. An AFM measurement results, surface roughness of the deposited film was the lowest when deposition rate was $1.5{\AA}/s$.

• Proceedings of the Korean Society Of Semiconductor Equipment Technology
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• 2003.05a
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• pp.106-111
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• 2003

Tantalum nitride(TaN) films were deposited by atomic layer deposition(ALD) and plasma assisted atomic layer deposition(PAALD). The deposition of the TaN thin film has been performed using pentakis (ethylmethlyamino) tantalum (PEMAT) and ammonia($NH_3$) as precursors at temperature of $250^{\circ}C$, where the temperature was proven to be ALD window for TaN deposition from our previous experiments. The PAALD deposited TaN film shows better physical properties than thermal ALD deposited TaN film, due to its higher density$(~11.59 g/\textrm{cm}^3$) and lower carbon(~ 3 atomic %) and oxygen(~ 4 atomic %) concentration of impurities.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.11a
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• pp.548-550
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• 2002

본 장치는 다층막 스퍼터링 증착장치로써 박막을 증착시키는데 용이하게 설계하는 것이 목적이며, 박막두께가 균일하게 증착되고 진공조 내부의 압력을 일정하게 제어가 가능하고 배기시스템은 스퍼터실과 증착실의 진공배기를 공용으로 구조를 설계하여 장치의 스퍼터링 증착조건에 적합하도록 연구실험용으로 설계되어졌다.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.21 no.5
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• pp.28-38
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• 2020

Semiconductor deposition equipment is an important example of Complex Products and Systems (CoPS) and requires in-depth understanding of user requirements. For this reason, we analyzed and compared users' and producers' perspectives on the quality attributes of semiconductor deposition equipment using the Kano model. The results show that the patterns of users' perspectives were different from those of producers. Out of 22 level-2 quality attributes, producers evaluated all 22 attributes as attractive qualities, but users evaluated only 6 as "attractive," 10 as "indifferent," 2 as "must have," and 4 as "other." Although all quality attributes were attractive for producers, only those related to reliability were attractive or must-have qualities, and all others were "indifferent." This result implies that the perspectives on quality attributes may be different between users and producers, and producers should revise their perspectives and strategies. In addition, the results support the characteristics of CoPS suggested by literature implying that performance is more important than economies of scale and cost reduction. It is suggested that producers of semiconductor deposition equipment strategize their approaches to users by considering the characteristics of CoPS.

• Journal of the Korean Society of Industry Convergence
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• v.25 no.4_2
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• pp.699-706
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• 2022

In this study, Directed energy deposition (DED) among additive manufacturing is applied to repair damaged spindle key parts of planner miller. The material of the spindle key is SCM415, and the P21 Powder is used. In order to find the optimal deposition conditions for DED equipment, a single-line deposition experiment is conducted to analysis five parameters. The laser power affects the width, and the height is a parameter affected by coaxial gas and powder gas. In addition, laser power, powder feed rate, coaxial gas, and powder gas are parameters that affect dilution. Otimal deposition is that 400 W of laser power, 4.0 g/min of powder feed rate, 6.5 L/min of coaxial gas, 3.0 L/min of powder gas and 4.5 L/min of shield gas. By setting the optimum conditions, a uniform deposition cross section in the form of an ellipse can be obtained. Damage recovery process of spindle key consists of 3D shape design of the base and deposition parts, deposition path creation and deposition process, and post-processing. The hardness of deposited area with P21 powder on the SCM415 spindle key is 336 HV for the surface of the deposition, 260 HV for the boundary area, and 165 HV for the base material.

• Journal of the Semiconductor & Display Technology
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• v.18 no.4
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• pp.92-95
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• 2019

Automation control and the data for control of industrial equipment for the diagnosis and prediction is a key to success in the 4th industrial revolution. It increases process efficiency and productivity through data collection, realtime monitoring, and the data analysis. However, university and research environment are still suffering from logging the data in manual way, and we occasionally loss the equipment data logging due to the lack of automatic data logging system. State variable presents the current condition of the equipment operation which is closely related to process result, and it is valuable to monitor and analyze the data for the equipment health monitoring. In this paper, we demonstrate the collection of equipment state variable data via programmable logic controller (PLC) and the visualization of the collected data over the Web access supervisory control and data acquisition (SCADA). Test vehicle for the implementation of the suggested SCADA system is a relay switched physical vapor deposition system in the university environment.

• Journal of the Semiconductor & Display Technology
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• v.7 no.2
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• pp.63-67
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• 2008

The MgO protective layer plays an important role in plasma display panels (PDPs). Our previous work demonstrated that the properties of MgO thin film could be improved, which were deposited by ion beam assisted deposition (IBAD). However arc discharge always occurs during the IBAD process. To avoid this problem, oxygen neutral beam assisted deposition (NBAD) is used to deposit MgO thin films in this paper. The energy of the oxygen neutral beam was used as the parameter to control the deposition. The experimental results showed that the oxygen neutral beam energy was effective in determining in F/$F^+$ centers, crystal orientation, surface morphology of the MgO thin film, and the discharge characteristics of AC PDP. The lowest firing voltage $(V_f)$ and the highest secondary electron emission coefficient $(\gamma)$ were obtained when the neutral beam energy was 300 eV.