• 제목/요약/키워드: Deposit thickness

검색결과 160건 처리시간 0.026초

집속 아르곤 이온 레이저 빔을 이용한 레이저 유도 직접 구리 패터닝 (Laser-Induced Direct Copper Patterning Using Focused $Ar^+$ Laser Beam)

  • 이홍규;이경철;안민영;이천
    • 한국전기전자재료학회논문지
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    • 제13권11호
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    • pp.969-975
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    • 2000
  • Laser direct writing of micro-patterned copper lines has been achieved by pyrolytic decomposition of copper formate films (Cu(HCOO)$_2$.4$H_2O$), as a metallo-organic precursor, using a focused CW Ar$^{+}$ laser beam (λ=514nm) on PCB boards and glass substrates. The linewidth and thickness of the lines wee investigated as a functin of laser power and scan speed. The profiles of the lines were measured by scanning electron microscope (SEM), surface profiler ($\alpha$-step) and atomic force measured by scanning electron microscope (SEM), surface profiler ($\alpha$-step) and atomic force microscopy (AFM). The electrical resistivities of the patterned lines were also investigated as a function of laser parameters using probe station and semiconductor analyzer. We compared resistivities of the patterned copper lines with these of the Cu bulk. Resistivities decreased due to changes in morphology and porosity of the deposit, which were about 3.8 $\mu$$\Omega$cm and 12$\mu$$\Omega$cm on PCB and glass substrates after annealing at 30$0^{\circ}C$ for 5 minutes.s.

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Load/Unload 시 AE 와 전기저항을 이용한 슬라이더-디스크 충돌측정에 관한 연구 (Measurement of the Slider-Disk Contact during Load/Unload process with AE and Electrical Resistance)

  • 김석환;이용현;임수철;박경수;박노철;박영필
    • 정보저장시스템학회논문집
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    • 제3권4호
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    • pp.160-166
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    • 2007
  • In this paper, the measured electrical resistance method is proposed to analyze the ramp-tab contact during the load/unload (L/UL) process. Since this method supplies the voltage change due to the resistance change, we can easily and conveniently identify the ramp-tab contact from the acoustic emission (AE) signal. At first, we carefully deposit the conductive material on the surface of the conventional ramp by sputtering method. The ratio frequency (RF) magnetron co-sputtering system is applied to accomplish the deposited double-layers on the ramp surface. One layer is the stainless steel for the conductive layer and the other is the titanium layer for the cohesive function between the ramp surface and the stainless steel layer. In order to guarantee the stiffness and damping properties of the original ramp, the deposited conductive layer is intended to have very thin thickness. After integration the proposed ramp device into the L/UL system and networking the electrical resistance circuit, the L/UL performance is experimentally evaluated by comparing the measured electrical resistance signal and AE signal.

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ECR-MOCVD에 의해 연성 고분자 기판에 제조된 구리막의 균일도에 전극의 형태가 미치는 영향 (Effects of electrode configurations on uniformity of copper films on flexible polymer substrate prepared by ECR-MOCVD)

  • 전법주;이중기
    • 한국군사과학기술학회지
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    • 제7권1호
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    • pp.34-46
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    • 2004
  • Copper films were prepared by using ECR-MOCVD(Electron Cyclotron Resonance Metal Organic Chemical Vapor Deposition) coupled with a DC bias system. The DC bias is connected to the electrode which placed 1∼3cm above the polymer substrate. The pulse electrical field around the electrode attracts the positive charged copper ions generated from the dissociation of copper precursor, $Cu(hfac)_2$, under ECR plasma. Condensation of supersaturated copper ions in the space between the electrode and substrate, makes it possible to deposit copper film on the polymer substrate even at room temperature. In this study, optimization of the electrode configuration was carried out in order to obtain the uniform films. The uniformity of the deposited films were closely related to the parameters of electrode geometry such as electrode shape, thickness, grid size and the spacing between electrodes. The most uniform copper film was observed with the electrode that enabled uniform electrical field distribution across the whole dimension of electrode.

$N_2$ 가스 Flow에 의한 LPCVD 방법으로 증착된 다결정 실리콘 박막의 산소농도 저하 (Reduction of Oxygen Concentration in the LPCVD Polysilicon Films Deposited by $N_2$ Gas-Flow Method)

  • 안승중;정민호
    • 한국재료학회지
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    • 제9권3호
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    • pp.269-273
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    • 1999
  • 일반적으로 LPCVD 방법에 의한 다결정 실리콘 박막은 $SiH_4$가스를 열분해하여 증착한다. 본 실험에서는 다결정 실리콘 박막속에 포함된 산소농도를 낮추기 위하여 실리콘 웨이퍼를 반응로 안으로 장착할 때, 20slm의 $N_2$가스를 반응로의 위에서부터 아래로 flow하였으며 박막의 산소농도를 측정하기 위하여 두께가 $1000\AA$인 박막을 증착한 다음 SIMS로 분석한 결과 반응로의 hatch에 있는 짧은 injector를 통하여 20slm의 $N_2$가스를 flow한 경우보다 박막의 산소농도가 ~30배 정도 낮아짐을 알 수 있었다. 긴 injector를 사용하여 증착된 박막의 두께 균일도, particle 및 Rs를 측정하여 박막증착의 재현성이 있음을 평가하였다.

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무전해 코발트계 석출막에 미치는 기판의 영향 (Effect of Substrate on Electroless Co-Base Deposited Films)

  • 한창석;천창환;한승오
    • 한국재료학회지
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    • 제19권6호
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    • pp.319-324
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    • 2009
  • The deposition behavior and structural and magnetic properties of electroless Co-B and Co-Fe-B deposits, as well as the amorphous ribbon substrates, were investigated. These Co-based alloy deposits exhibited characteristic polycrystalline structures and surface morphology and magnetic properties that were dependent on the type of amorphous substrates. The catalytic activity sequence of the amorphous ribbon electrodes for anodic oxidation of DMAB was estimated from the current density-potential curve in the anodic partial electrolytic bath that did not contain the metal ions. Both the deposition rate and potential in the initial region were obtained in order of the catalytic activity, depending on the alloy compositions of the substrates. The deposition rate linearly varied against the deposition time. The initial deposition potential may have also determined the structural and magnetic properties of the deposit based on the thickness of ${\mu}m$ order. Furthermore, a basic study of the electroless deposition processes on an amorphous ribbon substrate has been carried out in connection with the structural and magnetic properties of the deposits.

A study on surface wave dispersion due to the effect of soft layer in layered media

  • Roy, Narayan;Jakka, Ravi S.;Wason, H.R.
    • Geomechanics and Engineering
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    • 제13권5호
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    • pp.775-791
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    • 2017
  • Surface wave techniques are widely used as non-invasive method for geotechnical site characterization. Field surface wave data are collected and analyzed using different processing techniques to generate the dispersion curves, which are further used to extract the shear wave velocity profile by inverse problem solution. Characteristics of a dispersion curve depend on the subsurface layering information of a vertically heterogeneous medium. Sometimes soft layer can be found between two stiff layers in the vertically heterogeneous media, and it can affect the wave propagation dramatically. Now most of the surface wave techniques use the fundamental mode Rayleigh wave propagation during the inversion, but this may not be the actual scenario when a soft layer is present in a vertically layered medium. This paper presents a detailed and comprehensive study using finite element method to examine the effect of soft layers which sometimes get trapped between two high velocity layers. Determination of the presence of a soft layer is quite important for proper mechanical characterization of a soil deposit. Present analysis shows that the thickness and position of the trapped soft layer highly influence the dispersion of Rayleigh waves while the higher modes also contribute in the resulting wave propagation.

One Step Electrodeposition of Copper Zinc Tin Sulfide Using Sodium Thiocyanate as Complexing Agent

  • Sani, Rabiya;Manivannan, R.;Victoria, S. Noyel
    • Journal of Electrochemical Science and Technology
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    • 제9권4호
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    • pp.308-319
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    • 2018
  • Single step electrodeposition of $Cu_2ZnSnS_4$ (CZTS) for solar cell applications was studied using an aqueous thiocyanate based electrolyte. The sodium thiocyanate complexing agent was found to decrease the difference in the deposition potential of the elements. X-ray diffraction analysis of the samples indicates the formation of kesterite phase CZTS. UV-vis studies reveal the band gap of the deposits to be in the range of 1.2 - 1.5 eV. The thickness of the deposit was found to decrease with increase in pH of the electrolyte. Nearly stoichiometric composition was obtained for CZTS films coated at pH 2 and 2.5. I-V characterization of the film with indium tin oxide (ITO) substrate in the presence and the absence of light source indicate that the resistance decrease significantly in the presence of light indicating suitability of the deposits for solar cell applications. Results of electrochemical impedance spectroscopic studies reveal that the cathodic process for sulfur reduction is the slowest among all the elements.

전류제어가 가능한 AIP-PVD법으로 증착된 TiMoN 코팅층 특성평가 (Characteristic Evaluation of TiMoN Coating Layer Deposited by Current Control available AIP-PVD Method)

  • 신현정;김동배;김성철;김남수
    • 열처리공학회지
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    • 제32권5호
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    • pp.224-229
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    • 2019
  • PVD coating is a technology that can be applied to various industries, and is widely used for processing molds and machinery, improving performance of core parts, and extending the life. Therefore, there is a need for a research on a device and a process technology that can adjust the performance to suit each application. In this study, a PVD coating device with ion density control was used to deposit a coating layer on SKD 11, a cold die steel, with magnetron currents of 1 A, 2 A, 3 A at arc currents of 80 A, 100 A, 130 A. It examined the mechanical properties for each condition. Increasing the arc current and magnetron current could improve the thickness, adhesion, and hardness of the coating layer. Especially, When the magnetron current was high, it suppressed the droplets that could be generated by the high arc current, showing excellent surface uniformity and adhesion of the coating layer.

이온빔 스퍼터링으로 증착한 IZTO 박막의 결정화 거동과 전기적 특성 분석 (Crystallization Behavior and Electrical Properties of IZTO Thin Films Fabricated by Ion-Beam Sputtering)

  • 박지운;박양규;이희영
    • 한국전기전자재료학회논문지
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    • 제34권2호
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    • pp.99-104
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    • 2021
  • Ion-beam sputtering (IBS) was used to deposit semiconducting IZTO (indium zinc tin oxide) thin films onto heavily-doped Si substrates using a sintered ceramic target with the nominal composition In0.4Zn0.5Sn0.1O1.5, which could work as a channel layer for oxide TFT (oxide thin film transistor) devices. The crystallization behavior and electrical properties were examined for the films in terms of deposition parameters, i.e. target tilt angle and substrate temperature during deposition. The thickness uniformity of the films were examined using a stylus profilometer. The observed difference in electrical properties was not related to the degree of crystallization but to the deposition temperature which affected charge carrier concentration (n), electrical resistivity (ρ), sheet resistance (Rs), and Hall mobility (μH) values of the films.

준설매립지반의 자중압밀을 고려한 2차원 축대칭 비선형 유한변형 압밀 모델 (2-D Axisymmetric Non-linear Finite Strain Consolidation Model Considering Self-weight Consolidation of Dredged Soil)

  • 곽태훈;이동섭;임지희;티모시 스탁;최은석;최항석
    • 한국지반공학회논문집
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    • 제28권8호
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    • pp.5-19
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    • 2012
  • 준설매립지반 설계시 압밀 소요시간 단축을 위해 연직배수공법와 선행재하공법등의 연약지반 개량공법을 주로 적용한다. 준설매립지반의 자중에 의한 압밀이 완료되기까지는 많은 시간이 소요되므로 공사비 절감, 공기단축의 이유로 연약지반 개량공법은 일반적으로 자중압밀 도중 적용된다. 본 논문에서는 준설매립지반에서 연직방향으로 자중압밀이 진행되는 도중 연직배수재 타설에 의해 방사방향의 흐름이 추가로 발생하는 경우의 압밀거동 예측을 위하여 자중압밀을 고려한 2차원 축대칭 비선형 유한변형 압밀 지배방정식과 이를 적용하기 위한 수치모델(Axi-Selcon)을 개발하였다. Axi-Selcon의 검증과 자중압밀 도중 연직배수재가 타설된 준설매립지반을 모사하기 위해 일련의 실내시험을 수행하였다. 이를 위해 연직배수재가 타설된 준설매립지반을 모사하는 대형자중압밀 시험기를 고안하였다. 모델의 추가적인 검증을 위하여 기존에 제안된 간편 해석법을 적용한 결과와 Axi-Selcon의 해석결과와 비교하였다. 마지막으로, Axi-Selcon을 적용하여 가상의 대심도 준설매립지반의 거동을 예측하였다. 이와 같은 일련의 모델 검증과정을 통해 본 논문에서 개발된 Axi-Selcon은 자중압밀 도중 연직배수재 타설과 선행재하공법이 적용될 경우에 대한 초연약 준설매립지반의 압밀 거동을 적절히 예측할 수 있음을 보였다.