• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.475-475
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• 2010

We have generated Ar plasma in dense plasma focus device with coaxial electrodes for extreme ultraviolet (EUV) lithography and investigated an emitted visible light for electro-optical plasma diagnostics. We have applied an input voltage 4.5 kV to the capacitor bank of 1.53 uF and the diode chamber has been filled with Ar gas of pressure 8 mTorr. The inner surface of the cylindrical cathode has been attatched by an acetal insulator. Also, the anode made of tin metal. If we assumed that the focused plasma regions satisfy the local thermodynamic equilibrium (LTE) conditions, the electron temperature and density of the coaxial plasma focus could be obtained by Stark broadening of optical emission spectroscopy (OES). The Lorentzian profile for emission lines of Ar I of 426.629 nm and Ar II of 487.99 nm were measured with a visible monochromator. And the electron density has been estimated by FWHM (Full Width Half Maximum) of its profile. To find the exact value of FWHM, we observed the instrument line broadening of the monochromator with a Hg-Ar reference lamp. The electron temperature has been calculated using the two relative electron density ratios of the Stark profiles. In case of electron density, it has been observed by the Stark broadening method. This experiment result shows the temporal behavior of the electron temperature and density characteristics for the focused plasma. The EUV emission signal whose wavelength is about 6 ~ 16 nm has been detected by using a photo-detector (AXUV-100 Zr/C, IRD). The result compared the electron temperature and density with the temporal EUV signal. The electron density and temperature were observed to be $10^{16}\;cm^{-3}$ and 20 ~ 30 eV, respectively.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.93-93
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• 2016

Large scale integrated circuits (LSIs) has been improved by the shrinkage of the circuit dimensions. The smaller chip sizes and increase in circuit density require the miniaturization of the line-width and space between metal interconnections. Therefore, an extreme precise control of the critical dimension and pattern profile is necessary to fabricate next generation nano-electronics devices. The pattern profile control of plasma etching with an accuracy of sub-nanometer must be achieved. To realize the etching process which achieves the problem, understanding of the etching mechanism and precise control of the process based on the real-time monitoring of internal plasma parameters such as etching species density, surface temperature of substrate, etc. are very important. For instance, it is known that the etched profiles of organic low dielectric (low-k) films are sensitive to the substrate temperature and density ratio of H and N atoms in the H2/N2 plasma [1]. In this study, we introduced a feedback control of actual substrate temperature and radical density ratio monitored in real time. And then the dependence of etch rates and profiles of organic films have been evaluated based on the substrate temperatures. In this study, organic low-k films were etched by a dual frequency capacitively coupled plasma employing the mixture of H2/N2 gases. A 100-MHz power was supplied to an upper electrode for plasma generation. The Si substrate was electrostatically chucked to a lower electrode biased by supplying a 2-MHz power. To investigate the effects of H and N radical on the etching profile of organic low-k films, absolute H and N atom densities were measured by vacuum ultraviolet absorption spectroscopy [2]. Moreover, using the optical fiber-type low-coherence interferometer [3], substrate temperature has been measured in real time during etching process. From the measurement results, the temperature raised rapidly just after plasma ignition and was gradually saturated. The temporal change of substrate temperature is a crucial issue to control of surface reactions of reactive species. Therefore, by the intervals of on-off of the plasma discharge, the substrate temperature was maintained within ${\pm}1.5^{\circ}C$ from the set value. As a result, the temperatures were kept within $3^{\circ}C$ during the etching process. Then, we etched organic films with line-and-space pattern using this system. The cross-sections of the organic films etched for 50 s with the substrate temperatures at $20^{\circ}C$ and $100^{\circ}C$ were observed by SEM. From the results, they were different in the sidewall profile. It suggests that the reactions on the sidewalls changed according to the substrate temperature. The precise substrate temperature control method with real-time temperature monitoring and intermittent plasma generation was suggested to contribute on realization of fine pattern etching.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.54 no.4
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• pp.154-160
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• 2005

We have investigated thermal properties showed by changing the content of carbon black which is the component parts of semiconductive shield in underground power transmission cable. Specimens were made of sheet with the nine of those for measurement. Density of specimens was measured by density meter, and then stress-strain of specimens was measured by TENSOMETER 2000. A speed of measurement was 200[mm/min], ranges of stress and strain were 400(Kgf/$cm^2$) and 600[$\%$]. In addition, tests of stress-strain were progressed by aging specimens at air oven. Finally surface profile was shown in order to looking for protrusion of specimens by using smoothness tester. Density was highly measured according to increasing the content of carbon black from this experimental result, and stress was decreased, while strain was increased according to increasing the content of carbon black. And stress-strain were decreased some after aging because of oxidation reaction of chemical defect. Lastly surface of specimens smoothed generally.

• Proceedings of the Korean Society of Propulsion Engineers Conference
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• 2005.11a
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• pp.469-474
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• 2005

Tn this study, the noll-destructive computed X-ray tomography was adopted to observe the density distribution of the needle-punched C-C composites nozzle throat. The density distribution of the C-C was evaluated within ${\pm}0.01g/cm^3$ with 98.74% confidence when the correction of the image and high signal-to-noise ratio were achieved by the optimization of the beam hardening, the electrical noise and the scattered X-ray. The density variation of the C/C with the computed tomography was in good agreement with the results obtained by the water immersion method and the observation with scanning electron microscope.

• Transactions of the Korean Society of Automotive Engineers
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• v.20 no.2
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• pp.85-89
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• 2012

This paper presents a study on the system identification of the in-situ output shaft torque measurement system using a non-contacting magneto-elastic torque transducer installed in a vehicle drivline. The frequency response (transfer) function (FRF) analysis is conducted to interpret the dynamic interaction between the output shaft torque and road side excitation due to the road roughness. In order to identify the frequency response function of vehicle driveline system, two power spectral density (PSD) functions of two random signals: the road roughness profile synthesized from the road roughness index equation and the stationary noise torque extracted from the original torque signal, are first estimated. System identification results show that the output torque signal can be affected by the dynamic characteristics of vehicle driveline systems, as well as the road roughness.

• Proceedings of the Materials Research Society of Korea Conference
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• 2012.05a
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• pp.81.2-81.2
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• 2012

To fabricate a metal mold for injection molding, hot-embossing and imprinting process, mechanical machining, electro discharge machining (EDM), electrochemical machining (ECM), laser process and wet etching ($FeCl_3$ process) have been widely used. However it is hard to get precise structure with these processes. Electrochemical etching has been also employed to fabricate a micro structure in metal mold. A through mask electrochemical micro machining (TMEMM) is one of the electrochemical etching processes which can obtain finely precise structure. In this process, many parameters such as current density, process time, temperature of electrolyte and distance between electrodes should be controlled. Therefore, it is difficult to predict the result because it has low reliability and reproducibility. To improve it, we investigated this process numerically and experimentally. To search the relation between processing parameters and the results, we used finite element simulation and the commercial finite element method (FEM) software ANSYS was used to analyze the electric field. In this study, it was supposed that the anodic dissolution process is predicted depending on the current density which is one of major parameters with finite element method. In experiment, we used stainless steel (SS304) substrate with various sized square and circular array patterns as an anode and copper (Cu) plate as a cathode. A mixture of $H_2SO_4$, $H_3PO_4$ and DIW was used as an electrolyte. After electrochemical etching process, we compared the results of experiment and simulation. As a result, we got the current distribution in the electrolyte and line profile of current density of the patterns from simulation. And etching profile and surface morphologies were characterized by 3D-profiler(${\mu}$-surf, Nanofocus, Germany) and FE-SEM(S-4800, Hitachi, Japan) measurement. From comparison of these data, it was confirmed that current distribution and line profile of the patterns from simulation are similar to surface morphology and etching profile of the sample from the process, respectively. Then we concluded that current density is more concentrated at the edge of pattern and the depth of etched area is proportional to current density.

• Journal of Biosystems Engineering
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• v.34 no.5
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• pp.382-389
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• 2009

An in-situ probe-based spectrophotometer has been developed. This system used two spectrometers to measure soil reflectance spectra from 450 nm to 2200 nm. It collects soil electrical conductivity (EC) and insertion force measurements in addition to the optical data. Six fields in Kansas were mapped with the VIS-NIR (visible-near infrared) probe module and sampled for calibration and validation. Results showed that VIS-NIR correlated well with carbon in all six fields, with RPD (the ratio of standard deviation to root mean square error of prediction) of 1.8 or better, RMSE of 0.14 to 0.22%, and $R^2$ of 0.69 to 0.89. From the investigation of carbon variability within the soil profile and by tillage practice, the 0-5 cm depth in a no-till field contained significantly higher levels of carbon than any other locations. Using the selected calibration model with the soil NIR probe data, a soil profile map of estimated carbon was produced, and it was found that estimated carbon values are highly correlated to the lab values. The array of sensors (VIS-NIR, electrical conductivity, insertion force) used in the probe allowed estimating bulk density, and three of the six fields were satisfactory. The VIS-NIR probe also showed the obtained spectra data were well correlated with nitrogen for all fields with RPD scores of 1.84 or better and coefficient of determination ($R^2$) of 0.7 or higher.

• Journal of Radiation Industry
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• v.5 no.4
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• pp.317-323
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• 2011

Radioisotopes have been widely used throughout industry to optimize processes, solve problems and improve product quality. A gamma scanning technique using radiation via sealed source (Co-60) was carried out in order to investigate vertical density profile of catalyst regenerator of RFCCU. Also through the radiotracer experiments, the flow characteristics of catalyst was measured. The catalyst samples were irradiated with neutron in HANARO reactor to produce lanthanum-140 to be used as radiotracer for tracing the catalyst itself in catalyst regenerator of RFCCU. The radiotracer was monitored around the catalyst regenerator using collimated NaI scintillation detectors. The results of the experiments were used to diagnose the performance of the RFCCU.

• Korean Journal of Remote Sensing
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• v.34 no.2_1
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• pp.191-201
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• 2018

In this present study, we, for the first time, retrieved total column of ozone ($O_3$) and tropospheric ozone vertical profile using the Optimal Estimation (OE) method based on the MAX-DOAS measurement at the Yonsei University in Seoul, Korea. The optical density fitting is carried out using the OE method to calculate ozone columns. The optical density between the MAX-DOAS data obtained by dividing the measured intensities for each viewing elevated angle by those at the zenith angle. The retrieved total columns of the ozone are 375.4 and 412.6 DU in the morning (08:13) and afternoon (17:55) on 23 May, 2017, respectively. In addition, under 10 km altitude, the $O_3$ vertical profile was retrieved with about 5% of retrieval uncertainty. However, above 10 km altitude, the $O_3$ vertical profile retrieval uncertainty was increased (>10%). The spectral fitting errors are 16.8% and 19.1% in the morning and afternoon, respectively. The method suggested in this present study can be useful to measure the total ozone column using the ground-based hyper-spectral UV sensors.

• Journal of the Korean Ceramic Society
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• v.34 no.7
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• pp.731-737
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• 1997

TixZr1-xC(0$0^{\circ}C$, 5.1 mm/sec respectively. The relative density, three point flexural strength, and the hardness of composites, which was sintered at 190$0^{\circ}C$ for 60 min by using hot-pressing under a pressure of 30 MPa, were 99%, 525 MPa and 24 GPa respectively.