• Current Optics and Photonics
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• v.2 no.4
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• pp.361-367
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• 2018

Ultrafast deep-ultraviolet (DUV) pulse generation from the subwavelength aperture of a plasmonic waveguide was investigated. The plasmonic nanofocusing of near-infrared (NIR) pulses was exploited to enhance DUV photoemission of surface third harmonic generation (STHG) at the amorphous $SiO_2$ dielectric. The generated DUV pulses which are successfully made from a nano-aperture using 10 fs NIR pulses have a spectral bandwidth of 13 nm at a carrier wavelength of 266 nm. This method is applicable for tip-based ultrafast UV laser spectroscopy of nanostructures or biomolecules

• Journal of the Korean Physical Society
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• v.73 no.12
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• pp.1879-1883
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• 2018

We analyzed the deep-trap states of GaN/InGaN ultraviolet light-emitting diodes (UV LEDs) before and after electrical stress. After electrical stress, the light output power dropped by 5.5%, and the forward leakage current was increased. The optical degradation mechanism could be explained based on the space-charge-limited conduction (SCLC) theory. Specifically, for the reference UV LED (before stress), two sets of deep-level states which were located 0.26 and 0.52 eV below the conduction band edge were present, one with a density of $2.41{\times}10^{16}$ and the other with a density of $3.91{\times}10^{16}cm^{-3}$. However, after maximum electrical stress, three sets of deep-level states, with respective densities of $1.82{\times}10^{16}$, $2.32{\times}10^{16}cm^{-3}$, $5.31{\times}10^{16}cm^{-3}$ were found to locate at 0.21, 0.24, and 0.50 eV below the conduction band. This finding shows that the SCLC theory is useful for understanding the degradation mechanism associated with defect generation in UV LEDs.

• The Bulletin of The Korean Astronomical Society
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• v.32 no.1
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• pp.99.1-99.1
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• 2007

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.28 no.5
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• pp.277-284
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• 2015

The humans are under attack involving the hazardous environment and pathogen/biotoxin aerosol that is realistic concerned. A portable, fast, reliable, and cheap Pathogen and Biotoxin Aerosol threat Detection(PBAD) trigger is an important technology for detect-to-protect and detect-to-treat system because the man-made biological terror is a fast and lethal infection. The ultraviolet C(UVC) wavelengths light source is key issue for PBAD that is sensitive because of strong fluorescence cross section from fluorescent amino acids in proteins such as tryptophan and tyrosine. The UVC-light emitting diode(LED) is emerging light source technology as alternative to laser or lamps as they offer several advantages. This paper discussed about the design consideration of UVC-LED for the PBAD system. The UVC-LED and PBAD technology, currently available or in development, are also discussed.

• Korean Journal of Optics and Photonics
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• v.4 no.3
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• pp.252-259
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• 1993

A holosymmetric four-mirror system with unit magnification is designed for use in the micro-lithography using a deep ultraviolet wavelength of $0.248 {\mu}m$(KrF excimer laser line). In the holosymmetric system all orders of coma and distortion are zero. By applying this principle to the 4-spherical mirror system, we have obtained only one exact solution for the unit magnification holosymmetric four-spherical mirror system with all zero third order aberrations. For correction of the residual higher order aberrations of the system, aspherization is introduced keeping the holosymmetric properties. We have obtained near diffraction-limited performance for the wavelength of 0.248 pm within N.A. of 0.33 and image field diameter of 7.6 mm.

• Electronics and Telecommunications Trends
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• v.13 no.5 s.53
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• pp.38-52
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• 1998

Phase-shifting masks (PSM), optical proximity correction (OPC), off-axis illumination (OAI), annular illumination (AI)의 리소그래피 분해능 향상 기법과 deep ultraviolet photoresist의 개발 및 리소그래피의 최근 기술 동향을 요약 소개한다. DUV 리소그래피의 대안으로 관심을 끌고 있는 scattering with angular limitation projection electron-beam lithography (SCALPEL), extreme ultraviolet lithography (EUVL), X-ray lithography (XRL), ion projection lithography (IPL) 등의 새로운 리소그래피 기술들의 기본 원리와 최근 기술 동향도 소개하였다. 리소그래피는 반도체 공정에 있어서 가장 중요한 부분을 차지하기 때문에 리소그래피의 최근 기술 동향을 검토해 봄으로써 국내 리소그래피 장비 산업의 기술 개발을 위한 방향 설정에 도움이 될 것으로 생각한다.

• Journal of the Society of Disaster Information
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• v.17 no.2
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• pp.195-205
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• 2021

Purpose: The ultraviolet reflectance and transmittance of coastal building materials are one of the important factors of ultraviolet radiation in and out of coastal building. In this research, the ultraviolet spectral reflectance of many kinds of building materials was measured. Also, the relationships with the lightness, roughness, and chromaticity, which are surface characteristics, were reviewed and suggested. Method: In this study, according to the CIE classification, the ultraviolet region was defined as short-wavelength region UV-C(10nm~280nm), medium-wavelength region UV-B (280-315 nm), and long-wavelength region UV-A (315-400nm), and the visible light region was defined as (400nm~780nm). Spectrophotometer was used to continuously measure the reflectance from the ultraviolet region to the visible light region. Results: From the measurement results, the ultraviolet reflectance on Wood was shown to be about Visible 55-68%, UV-A^* 7-12%, and UV-B 4-5%. Wall tiles are about Visible18-40%, UV-A^* 8-20%, and UV-B^* 7-8%. That on concrete was shown to be about Visible 37%, UV-A^* 28%, and UV-B^*19%. Conclusion: The ultraviolet reflectance can be estimated by visible reflectance. Also, it is important to select a variety of materials according to the application when blocking UV.

• The Bulletin of The Korean Astronomical Society
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• v.44 no.2
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• pp.42.3-42.3
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• 2019

We translate Solar Dynamics Observatory/Atmospheric Imaging Assembly (AIA) ultraviolet (UV) multi-channel images into another UV single-channel image using a deep learning algorithm based on conditional generative adversarial networks (cGANs). The base input channel, which has the highest correlation coefficient (CC) between UV channels of AIA, is 193 Å. To complement this channel, we choose two channels, 1600 and 304 Å, which represent upper photosphere and chromosphere, respectively. Input channels for three models are single (193 Å), dual (193+1600 Å), and triple (193+1600+304 Å), respectively. Quantitative comparisons are made for test data sets. Main results from this study are as follows. First, the single model successfully produce other coronal channel images but less successful for chromospheric channel (304 Å) and much less successful for two photospheric channels (1600 and 1700 Å). Second, the dual model shows a noticeable improvement of the CC between the model outputs and Ground truths for 1700 Å. Third, the triple model can generate all other channel images with relatively high CCs larger than 0.89. Our results show a possibility that if three channels from photosphere, chromosphere, and corona are selected, other multi-channel images could be generated by deep learning. We expect that this investigation will be a complementary tool to choose a few UV channels for future solar small and/or deep space missions.

• Korean Journal of Materials Research
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• v.11 no.4
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• pp.319-323
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• 2001

In order to investigate the effect of thickness on the properties of ZnO thin films, a series of films having different thickness were deposited on (0001) sapphire by using pulsed laser deposition(PLD). SEM and XRD analyses showed that, as the film thickness increases, the grain size increased and the crystallinity improved. Room-temperature PL spectra also exhibited that the intensities of both ultraviolet and deep level emission Peaks increased as the film thickness increased. Hall measurements at room- temperature revealed that, as the film thickness changes from 400 to 4000 , the carrier concentration of the film showed sharp decrease, which that of thicker film gradually saturated. Therefore, it is concluded that the strain due to the lattice mismatch between substrate and film is fully relaxed around the thickness of 4000 .

• The Bulletin of The Korean Astronomical Society
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• v.46 no.1
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• pp.42.2-43
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• 2021

We address a question of what are three main channels that can best translate other channels in ultraviolet (UV) and extreme UV (EUV) observations. For this, we compare the image translations among the nine channels of the Atmospheric Imaging Assembly on the Solar Dynamics Observatory using a deep learning model based on conditional generative adversarial networks. In this study, we develop 170 deep learning models: 72 models for single-channel input, 56 models for double-channel input, and 42 models for triple-channel input. All models have a single-channel output. Then we evaluate the model results by pixel-to-pixel correlation coefficients (CCs) within the solar disk. Major results from this study are as follows. First, the model with 131 Å shows the best performance (average CC = 0.84) among single-channel models. Second, the model with 131 and 1600 Å shows the best translation (average CC = 0.95) among double-channel models. Third, among the triple-channel models with the highest average CC (0.97), the model with 131, 1600, and 304 Å is suggested in that the minimum CC (0.96) is the highest. Interestingly they are representative coronal, photospheric, and chromospheric lines, respectively. Our results may be used as a secondary perspective in addition to primary scientific purposes in selecting a few channels of an UV/EUV imaging instrument for future solar satellite missions.