• 한국전기전자재료학회논문지
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• 제15권10호
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• pp.838-843
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• 2002

Chemical mechanical polishing(CMP) process has been widely used to planarize dielectric layers, which can be applied to the integrated circuits for deep sub-micron technology. The reverse moat etch process has been used for the shallow trench isolation(STI)-chemical mechanical polishing(CMP) process with conventional low selectivity slurries. Thus, the process became more complex, and the defects were seriously increased. In this paper, we studied the direct STI-CMP process without reverse moat etch step using high selectivity slurry(HSS). As our experimental results show, it was possible to achieve a global planarization without the complicated reverse moat process, the STI-CMP process could be dramatically simplified, and the defect level was reduced. Therefore the throughput, yield, and stability in the ULSI semiconductor device fabrication could be greatly improved.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2000년도 제18회 학술발표회 논문개요집
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• pp.112-112
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• 2000

직접 천이형 물질인 GaN는 그 연구가 활발히 진행되어 청색 발광 및 레이저 다이오드 구현을 이룩하였고, 열적인 안정성이 뛰어나 고온, 고출력 소자용으로도 주목받을 뿐 아니라, piezoelectric, acoustioptic modulators와 negative electron affinity devices와 같은 소자개발도 유망하다. 그러나 이렇게 다양한 응용과 물리적 특성에도 불구하고 깊은 준위의 불순물에 대한 문제는 해결되지 않은 상태이다. 많은 연구에도 불구하고 GaN에 존재하는 불순물의 성격과 그것들이 전도대에 미치는 영향에 관해서는 잘 이해되지 않고 있다. 본 연구에서는 MBE로 성장된 undoped GaN 박막의 깊은 준위에 대한 연구를 위하여 TSC 장치를 이용하여 GaN 깊은 준위를 분석하였다. TSC 실험은 77K에서 400K 사이 온도의 전류 변화를 관찰하였으며 깊은 준위의 활성화 에너지 및 포획 단면적 그리고 방출 진동수를 구하기 위하여 Initial rise method, Peak shape method, Heating rate method, Peak temperature method 등을 이용하였다. 또한 trap의 origin을 밝히기 위해서 수소화를 한후에 TSC 측정을 해보았다.

• Current Photovoltaic Research
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• 제1권2호
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• pp.115-121
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• 2013

ZnO film has been used for CIGS solar cells as a buffer layer as itself or by doping Mg and Sn; ZnO film also has been used as a transparent conducting layer by doping Al or B for solar cells. Since ZnO itself is a host material for many applications it is necessary to understand the electrical and optical properties of ZnO film itself with various preparation conditions. We prepared ZnO films by converting ZnS precursor into ZnO film by thermal annealing. ZnO film was formed at low temperature as low as $500^{\circ}C$ by annealing a ZnS precursor layer in air. In the air annealing, the electrical resistivity decreased monotonically with increasing annealing temperature; the intensity of the green photoluminescence at 505 nm increased up to $750^{\circ}C$ annealing. The electrical resistivity further decreased and the intensity of green emission also increased in reducing atmospheres. The results suggest that deep-level defects originated by oxygen vacancy enhanced green emission, which reduce light transmittance and enhance the recombination of electrons in conduction band and holes in valence. More oxidizing environment is necessary to obtain defect-free ZnO film for higher transparency.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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• pp.248-248
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• 2011

ZnO was grown on a Au-catalyzed Si(100) substrate by using a simple vapor phase transport (VPT) with a mixture of zinc oxide and graphite powders. The ZnO grown at 800$^{\circ}C$ had a soccer ball structure with diameters of <500 nm. The ZnO soccer ball structure was, for the first time, observed in this work. The optical properties of the ZnO soccer balls were investigated by photoluminescence (PL). In the room-temperature (RT) PL of the ZnO soccer balls, a strong near-band-edge emission (NBE) and a weak deep-level emission were observed at 3.25 and 2.47 eV (green emission), respectively. The weak deep-level emission (DLE) at around 2.47 eV (green emission) is caused by impurities and structural defects. The FWHM of the NBE peak from the ZnO soccer balls was 110 meV. In addition, the PL intensity ratio of the NBE to DLE was about 4. The temperature-dependent PL was also carried out to investigate the mechanism governing the quenching behavior of the PL spectra.

• Transactions on Electrical and Electronic Materials
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• 제2권4호
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• pp.24-29
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• 2001

GaN films were grown for various Mg doping concentrations in metal-organic chemical vapor deposition. Below the Mg concentration of 10$^{19}$ ㎤, the thermally annealed sample shows the compensated phase to n-type GaN in Hall measurement. In the MB concentration of 4$\times$10$^{19}$ ㎤ corresponding to the hole carrier concentration of 2.6$\times$1$^{19}$ ㎤ there exists a photoluminescence center of the donor and the acceptor pair transition of the 3.28-eV band. This center is correlated with the defects for a shallow donor of the $V_{Ga}$ and for an acceptor of $Mg_{Ga}$ . The acceptor level shows the binding energy of 0.2-0.25 eV, which was observed by the photon energy of the photocurrent signal of 3.02-3.31 eV. Above the Mg concentration of 4$\times$10$^{19}$ ㎤, both the Mg doping level and Mg concentration were saturated and there Is a photoluminescence center of a deep donor and an acceptor pair transition of the 2.76-eV blue band.

• 한국진공학회지
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• 제19권3호
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• pp.199-205
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• 2010

수열합성법(hydrothermal) 방식으로 성장한 ZnO 기판에 고에너지의 전자빔을 조사시킨 후 쇼트키(Schottky)다이오드를 제작하여 결함상태와 전기적 특성 변화를 조사하였다. 1 MeV 및 2 MeV 전자빔으로 $1{\times}10^{16}$ electrons/$cm^2$ dose로 기판의 Zn 면에 조사하였다. 1 MeV 전자빔이 조사된 시료에서는 표면에 전자빔 유도결함을 형성시켜 누설전류를 증가시켰고, 2 MeV 전자빔의 경우는 오히려 다이오드 누설절류 감소와 on/off 특성을 향상시키는 것으로 나타났다. 이들 시료에 대한 DLTS (deep level transient spectroscopy) 측정결과 전자빔 조사에 따른 전기적 물성변화는 활성화에너지와 포획단면적이 각각 $E_c$-0.33 eV 및 $2.97{\times}10^{15}\;cm^{-2}$인 O-vacancy가 주된 연관성을 보였으며, 활성화에너지 $E_v$+0.8 eV인 결함상태도 새롭게 완성되었다.

• Journal of Periodontal and Implant Science
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• 제28권2호
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• pp.249-264
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• 1998

The present study evaluates the effects of calcium sulfate and DFDB on alveolar bone regeneration and cementum formation and connective tissue adhesion in intrabony angulated 1 wall defects of dogs. Four millimeter-deep angulated one-wall intrabony defects were surgically created in the mesial & distal aspects of premolars and with flap operaion alone(control group), with calcium sulfate(experimental group 1), with composit graft of 50% calcium sulfate and 50% DFDB(experimental group 2), with DFDB alone(experimental group 3). Histologic analysis following 8 weeks of healing revealed the following results: 1. The lengths of connective tissue adhesion was $1.05{\pm}0.48mm$ in the control, $1.30{\pm}0.67mm$ in the test group I, $0.97{\pm}0.22mm$ in the test group II and $0.93{\pm}0.15mm$ in the test group III. There was no statistical significance between control and all experimental groups. 2. Changes in alveolar bone level was $0.97{\pm}0.27mm$ in the control group, $1.45{\pm}0.42mm$ in the test group I, $2.00{\pm}0.33mm$ in the test group II, $1.88{\pm}0.34mm$ in the test group III. There was no statistically significant difference between control and experimental group I. There was a statistically significant difference between the control and experimental group II,III.(p<0.05). There was no statistically significant difference between all experimental group. 3. Cementum formation was $1.13{\pm}0.17mm$ in the control, $1.78{\pm}0.31mm$ in the test group I, $2.17{\pm}0.38mm$ in the test group II, $2.15{\pm}0.47mm$ in the test group III with statistically significant differences between control group and all experimental group(P<0.05). There was no statistically significant differences between all experimental group. These results suggest that the use of composit graft of 50% calcium sulfate and 50% DFDB and DFDB alone in angulated 1 wall intrabony defects has little effects on connective tissue adhesion, but has significant effects on new bone and new cementum formations.

• 한국지반공학회논문집
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• 제24권10호
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• pp.71-81
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• 2008

토압, 지하수위 상승, 집중호우, 구조적 결함 등 여러 요인들로 인해 발생한 흙막이 벽체의 변위는 배면지반에 변위를 발생시키고, 과다한 지반의 변위로 인해 발생한 구조물의 부등침하는 구조물의 파손이나 파괴를 일으킨다. 이러한 경우, 벽체와 구조물의 보강대책이 강구되어야 한다. 최근 이러한 문제를 최소화하거나, 억제하기 위한 보강대책 중 하나는 마이크로 파일을 이용하는 방법이다. 본 연구는 벽체의 변위로 인해 발생할 인접구조물의 부등침하를 억제시키기 위해 설치한 마이크로 파일의 보강효과의 경향을 파악하고자 실시한 모형실험을 다루고 있다. 실험결과, 마이크로 파일의 설치길이는 2B(B:기초 폭), 간격은 2D(D:파일직경)로 설치하는 경우가 가장 발생한 침하율이 작았다. 또한 이 경우(L=2B, s=2D), 구조물에서 이격거리 0.1B 이내에서 지표면에 수직방향으로 설치할 때가 침하율이 가장 작게 발생하는 것으로 나타났다.

• 전자공학회논문지A
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• 제31A권9호
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• pp.96-103
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• 1994

The GaAs epilayer was grown at low temperature (LT. 250.deg. C) by molecular beam epitaxy. The properties of the LTT GaAs, before and after Rapid Thermal Annealing(RTA), were analyzed by Reflection of High Energy Electron Diffraction (RHEED), Double Crystal X-ray(DCX), Raman spectroscopy, PL and Photo-Induced Current Transient Spectroscopy (PICTS). The LT GaAs before RTA, was analyzed by RHEED and DCX, with a result of an improved surface morphology under a relatively As-rich(As/Ga ratio :28) condition, and of an increased lattics parameter of 1.1 1.7% in comparison with a GaAs substrate. However DCX and Raman spectroscopy revealed that the expanded lattics parameter and the crystallinity of LT GaAs could be recovered after RTA. On the other hand, PL spectra indicated that LT GaAs after RTA showed low optical sensitivity unlike High Temperature(HT) GaAs, and that its surface morphology and crystallinity were corresponded with those of HT GaAs. Finally PICTS spectra proved the fact that low sensitivity of LT GaAs was due to the deep level defects (Ec-0.85eV) which were strogly formed by raising RTA temperature to 750.deg. C.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2012년도 추계총회 및 학술대회 논문집
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• pp.131-133
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• 2012

The photoluminescence (PT) properties of Al-doped ZnO thin films grown by the sol-gel dip-coating method have been investigated. At 12 K, nine distinct PL peaks were observed at 2.037, 2.592, 2.832, 3.027, 3.177, 3.216, 3.260, 3.303, and 3.354 eV. The deep-level emissions (2.037, 2.592, 2.832, and 3.027 eV) were attributed to native defects. The near-band-edge (NBE) emission peaks at 3.354, 3.303, 3.260, 3.216, and 3.177 eV were attributed to the emission of the neutral-donor-bound excitons (D0X), two-electron satellite (TES), free-to-neutral-acceptors (e,A0), donor-acceptor pairs (DAP), and second-order longitudinal optical (2LO) phonon replicas of the TES (TES-2LO), respectively. According to Haynes' empirical rule, we calculated the energy of a free exciton (FX) to be 3.374 eV. The thermal activation energy for D0X in the nanocrystalline ZnO thin film was found to be ~25 meV, corresponding to the thermal dissociation energy required for D0X transitions.