• Title/Summary/Keyword: Deep UV Laser

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Nanoscale Patterning Using Femtosecond Laser and Self-assembled Monolayers (SAMs) (펨토초레이저와 자기조립박막을 이용한 나노스케일 패터닝)

  • Chang, Won-Seok;Choi, Moo-Jin;Kim, Jae-Gu;Cho, Sung-Hak;Whang, Kyung-Hyun
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.28 no.9
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    • pp.1270-1275
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    • 2004
  • Standard positive photoresist techniques were adapted to generate nano-scale patterns of gold substrate using self-assembled monolayers (SAMs) and femtosecond laser. SAMs formed by the adsorption of alkanethiols onto gold substrate are employed as very thin photoresists, Alkanethiolates formed by the adsorption of alkanethiols are oxidized on exposure to UV light in the presence of air to alkylsulfonates. Specifically, it is known that deep UV light of wavelength less than 200nm is necessary for oxidation to occur. In this study, ultrafast laser of wavelength 800nm and pulse width 200fs is applied for photolithography. Results show that ultrafast laser of visible range wavelength can replace deep UV laser source for photo patterning using thin organic films. Femtosecond laser coupled near-field scanning optical microscopy facilitates not only the patterning of surface chemical structure, but also the creation of three-dimensional nano-scale structures by combination with suitable etching methods.

Fabrication of micro structure mold using SLS Rapid Prototyping (SLS형 쾌속조형기를 이용한 미세구조 몰드 제작)

  • 유홍진;김동학;장석원;김태완
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.5 no.2
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    • pp.186-190
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    • 2004
  • By this time, a mold with nano size pattern was produced using a fabrication of X-ray lithography method and in a m icro size's case it was produced using fabrication of Deep UV lithography. In this paper, we produced mold with 400 $\mu{m}$depth pattern using a new technology of SLS(Selective Laser Sintering) Rapid Prototyping method. In addition to enhance strength and thermal stability, we produced Ni structure with a thickness of 300 $\mu{m}$ on a surface of mold using electro forming method.

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Four Spherical Mirror Stepper Optics for Deep UV Micro-Lithography (Deep UV 마이크로 리소그라피용 Stepper를 위한 4구면 반사경계)

  • 조영민;이상수;박성찬
    • Korean Journal of Optics and Photonics
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    • v.2 no.4
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    • pp.186-192
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    • 1991
  • For the micro-lithography using a excimer laser beam $(\lambda\leq0.248$\mu\textrm{m})$. a mirror system consisting of four spherical surfaces with reductlon magnification 5X is designed. Initially the aplanat, flat field and the distortion free condition of the system are analytically investigated within Seidel 3rd order aberrations. And the computer-aided optimization technique has been employed for the further improved performance of the system. The final system has N.A. of 0.15 and image field diameter 3.3 mm, and has the diffraction-limited performance for KrF eximer laser beam.

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The Design and Test of the Stand-off Surface Chemical Contaminant Detection System based on Raman Spectroscopy (비접촉식 지표면 화학 오염 탐지용 라만 분광시스템 설계 및 성능확인)

  • Koh, Young Jin
    • Journal of the Korea Institute of Military Science and Technology
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    • v.22 no.3
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    • pp.433-440
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    • 2019
  • In order to detect toxic chemical spread on field ground, we developed stand-off Raman spectrometer system which employed a deep UV laser. In this paper, the design and specification of various components in the spectrometer system are described. Some results when the detection system was tested on the outdoor roads are shown, which may help researching stand-off chemical detectors based on Raman spectroscopy.

Laser Drilling of High-Density Through Glass Vias (TGVs) for 2.5D and 3D Packaging

  • Delmdahl, Ralph;Paetzel, Rainer
    • Journal of the Microelectronics and Packaging Society
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    • v.21 no.2
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    • pp.53-57
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    • 2014
  • Thin glass (< 100 microns) is a promising material from which advanced interposers for high density electrical interconnects for 2.5D chip packaging can be produced. But thin glass is extremely brittle, so mechanical micromachining to create through glass vias (TGVs) is particularly challenging. In this article we show how laser processing using deep UV excimer lasers at a wavelength of 193 nm provides a viable solution capable of drilling dense patterns of TGVs with high hole counts. Based on mask illumination, this method supports parallel drilling of up over 1,000 through vias in 30 to $100{\mu}m$ thin glass sheets. (We also briefly discuss that ultrafast lasers are an excellent alternative for laser drilling of TGVs at lower pattern densities.) We present data showing that this process can deliver the requisite hole quality and can readily achieve future-proof TGV diameters as small $10{\mu}m$ together with a corresponding reduction in pitch size.

Recent Trends of the Material Processing Technology with Laser - ICALEO 2014 Review - (레이저를 이용한 소재가공기술 동향 - ICALEO 2014를 중심으로 -)

  • Lee, Mokyoung
    • Journal of Welding and Joining
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    • v.33 no.4
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    • pp.7-16
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    • 2015
  • New lasers such as high power, high brightness and short wavelength laser are using diverse industry. Also new technologies are developing actively to solve various issues such as spattering, process monitoring, deep penetration and key-hole stability. ICALEO is the international congress where recent technology for laser material processing and laser system are present. At 2014, it was held at San Diego in USA and more than 260 papers were presented from 28 country. The effect of the laser beam shape such as Gaussian like and top-hat was investigated on acoustic emission signal and pore formation in welding. Inline penetration depth was measured with ICI(Inline Coherent Imaging) technique and the data was verified with real time X-ray image on laser welding. The laser welding performance at low pressure environment was evaluated for the thick plate alloy steel. UV laser was used to weld various metals such as Cu, Aluminum, steel and stainless steel. The effect of the wavelength of the laser on the formation of the wave at the wall of the key-hole front and the absorptivity was investigated.

Optical Properties of ZnO Thin Films deposited by Pulsed Laser Deposition (PLD 법을 이용해 제작한 ZnO 박막의 광학적 특성)

  • Kang, Seong-Jun;Joung, Yang-Hee;Yoon, Yung-Sup
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.44 no.5
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    • pp.15-20
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    • 2007
  • We fabricated ZnO thin films on quartz substrate using pulsed laser deposition method and investigated structural and optical properties of ZnO thin films with various substrate temperatures. Regardless of the substrate temperature variation, all ZnO thin films had grown to (002) and the thin film deposited at 400 $^{\circ}C$ exhibited an excellent crystallinity having 0.24$^{\circ}$ of Full-Width-Half-Maximum (FWHM). In the result of photoluminescence property, UV and deep-level emission peaks were observed in all ZnO films and the emission peaks were changed with various substrate temperatures. An highest UV emission was exhibited on the specimen deposited at 400 $^{\circ}C$ and the FWHM of UV peak was 14 nm. The optical transmittance was about 85 % in visible region regardless of the substrate temperature. The comparison result of the bandgap energies obtained from optical transmittance and UV emission centers, the two values were about the same. From these results, it is found that UV emission center has close relationship with near band edge emission of ZnO thin film.

A Study of frequency tunable Ti:sapphire laser for UV lidar (UV 라이다용 주파수 가변 Ti:sapphire 레이저에 관한 연구)

  • Yi, Yong-Woo
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2002.11a
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    • pp.656-661
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    • 2002
  • Multipass Ti:sapphire amplifier for the light source of lidar was developed in an angular-multiplexing, and the characteristics of output energy and spectrum was investigated. In the two-stage multipass amplifier, we obtained the maximum output energy of 42 mJ, the amplification gain of 21 dB and the output efficiency of 26% on the wavelength of 790 nm. In the tuning range of 715~930nm the spectral linewidth is 0.05 $cm^{-1}$ /. The conversion efficiencies of 35% for SHG at 780 m and 13% for THG at 390 nm are obtained respectively. The continuous tunabilities of 240~306 m UV region and 360~460 nm in deep-blue region could be achieved.

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Plasmon Assisted Deep-ultraviolet Pulse Generation from Amorphous Silicon Dioxide in Nano-aperture

  • Lee, Hyunsu;Ahn, Heesang;Kim, Kyujung;Kim, Seungchul
    • Current Optics and Photonics
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    • v.2 no.4
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    • pp.361-367
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    • 2018
  • Ultrafast deep-ultraviolet (DUV) pulse generation from the subwavelength aperture of a plasmonic waveguide was investigated. The plasmonic nanofocusing of near-infrared (NIR) pulses was exploited to enhance DUV photoemission of surface third harmonic generation (STHG) at the amorphous $SiO_2$ dielectric. The generated DUV pulses which are successfully made from a nano-aperture using 10 fs NIR pulses have a spectral bandwidth of 13 nm at a carrier wavelength of 266 nm. This method is applicable for tip-based ultrafast UV laser spectroscopy of nanostructures or biomolecules

Deep UV Raman Spectroscopic Study for the Standoff Detection of Chemical Warfare Agents from the Agent-Contaminated Ground Surface (지표면 화학작용제 비접촉 탐지를 위한 단자외선 라만분광법 연구)

  • Choi, Sun-Kyung;Jeong, Young-Su;Lee, Jae Hwan;Ha, Yeon-Chul
    • Journal of the Korea Institute of Military Science and Technology
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    • v.18 no.5
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    • pp.612-620
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    • 2015
  • Short-range detection of chemical agents deposited on ground surface using a standoff Raman system employing a pulsed laser at 248 nm is described. Mounted in a vehicle such as an NBC reconnaissance vehicle, the system is protected against toxic chemicals. As most chemicals including chemical warfare agents have unique Raman spectra, the spectra can be used for detecting toxic chemicals contaminated on the ground. This article describes the design of the Raman spectroscopic system and its performance on several chemicals contaminated on asphalt, concrete, sand, etc.