• 제목/요약/키워드: DPSS laser

검색결과 52건 처리시간 0.031초

서로 다른 빔에 의한 AsSeS 박막의 홀로그래픽 데이터 격자형성 (Holographic Grating Formation of AsSeS Thin Films with the Incident Beam Wavelength)

  • 김재훈;신기준;김현구;구상모;정홍배
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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    • pp.445-446
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    • 2008
  • In this paper, we investigated the diffraction grating efficiency on Ag-doped amorphous chalcogenide Ag/AsSeS thin film for used to volume hologram. The film thickness was 2 um and diffraction efficiency was obtained from He-Ne (632.8nm) and DPSS(532nm) (P:P) polarized laser beam on Ag/AsSeS thin films. As a result, for the films, the maximum grating diffraction efficiency using He-Ne laser(632nm) is 0.15%[2000sec]. And then The recording speed of DPSS laser was about 40s which of batter than He-Ne lasers.

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Ag 두께의 변화에 따른 chalcogenide layer의 회절효율 특성

  • 남기현;정홍배
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2009년도 추계학술대회 논문집
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    • pp.197-197
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    • 2009
  • We have investigated the holographic grating formation on Ag-doped amorphous chalcogenide AsGeSeS thin films with Ag thickness. Holographic gratings have been formed using Diode Pumped Solid State laser (DPSS, 532.0nm) under [P:P] polarized the intensity polarization holography. The diffraction efficiency was obtained by +1st order intensity.

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DPSS Laser에 의한 As40Ge10Se15S35, Ag/As40Ge10Se15S35와 As40Ge10Se15S35/Ag/As40/Ge10Se15S35박막의 홀로그래픽 데이터 격자형성 (Holographic Data Grating Formation of As40Ge10Se15S35 Single Layer, Ag/As40Ge10Se15S35 Double Layer and As40Ge10Se15S35/Ag/As40/Ge10Se15S35 Multi-layer Thin Films with the DPSS Laser)

  • 구용운;정홍배
    • 한국전기전자재료학회논문지
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    • 제20권3호
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    • pp.240-244
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    • 2007
  • We investigated the diffraction grating efficiency by the Diode Pumped Solid State(DPSS 532 nm) laser beam wavelength to improve the diffraction efficiency on $As_{40}Ge_{10}Se_{15}S_{35},\;Ag/As_{40}Ge_{10}Se_{15}S_{35}$ and $As_{40}Ge_{10}Se_{15}S_{35}/Ag/As_{40}Ge_{10}Se_{15}S_{35}$ thin film. Diffraction efficiency was obtained from DPSS laser, used (P:P)polarized laser beam on each thin films. As a result, for the laser beam intensity in $0.24mW/cm^2$, single $As_{40}Ge_{10}Se_{15}S_{35}$ thin film shows the highest value of 0.161% diffraction efficiency at 300 s and for laser beam intensity in $2.4mW/cm^2$, it was recorded with the fastest speed of 50 s(0.013%), which the diffraction grating forming speed is faster than that of $0.24mW/cm^2$ beam. $Ag/As_{40}Ge_{10}Se_{15}S_{35}$ double layer and $As_{40}Ge_{10}Se_{15}S_{35}/Ag/As_{40}Ge_{10}Se_{15}S_{35}$ multi-layered thin film also show the faster grating forming speed at $2.4mW/cm^2$ and higher value of diffraction efficiency at $0.24mW/cm^2$.

Nd:YAG 레이저를 이용한 Flipchip 접합 (Flip-chip Bonding Using Nd:YAG Laser)

  • 송춘삼;지현식;김종형;김주현;김주한
    • 한국공작기계학회논문집
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    • 제17권1호
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    • pp.120-125
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    • 2008
  • A flip-chip bonding system using DPSS(Diode Pumped Solid State) Nd:YAG laser(wavelength : 1064nm) which shows a good quality in fine pitch bonding is developed. This laser bonder can transfer beam energy to the solder directly and melt it without any physical contact by scanning a bare chip. By using a laser source to heat up the solder balls directly, it can reduce heat loss and any defects such as bridge with adjacent solder, overheating problems, and chip breakage. Comparing to conventional flip-chip bonders, the bonding time can be shortened drastically. This laser precision micro bonder can be applied to flip-chip bonding with many advantage in comparison with conventional ones.

Se-base로 한 비정질 칼코게나이드 박막의 훌로그래픽 격자 형성 (A Study on Holographic Grating Formation in Se-base Amorphous Chalcogenide Thin Films)

  • 구용운;최혁;남기현;정홍배
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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    • pp.181-182
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    • 2007
  • In this paper, we investigated the diffraction grating efficiency on $Ge_{75}Se_{25}$ and Ag-doped amorphous chalcogenide $Ag/Ge_{75}Se_{25}$ thin film for used to volume hologram. The film thickness was 2 um and diffraction efficiency was obtained from He-Ne (632.8nm) and DPSS(532nm) (P:P) polarized laser beam on $Ge_{75}Se_{25}$ and Ag/$Ge_{75}Se_{25}$ thin films. As a result. for the films, the diffraction efficiency on Ag/$Ge_{75}Se_{25}$ double layer, was better than single $Ge_{75}Se_{25}$ thin films. The recording speed of DPSS laser is higher than that of He-Ne laser.

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고정 마스크에 의한 레이저 미세패터닝 쾌속 제작 (Rapid Manufacturing of Laser Micro-Patterning Using Fixed Masks)

  • 신보성;오재용
    • 한국레이저가공학회지
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    • 제9권1호
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    • pp.17-23
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    • 2006
  • The technologies of laser micromachining are changed toward more complex-micropatterning, from the micro circle-shaped hole drilling to the micro arbitrary-shaped hole drilling. In this paper, the fundamental experiments by using DPSS 3rd harmonic $Nd:YVO_4\;laser({\lambda}=355nm)$ were carried out in order to obtain the feasibility of flexible micropatterning by various fixed masks. Fixed masks and Galvano scanners were investigatde to make micro patterns. from these experimental results, micropatterns on PEN film were rapidly manufactured in large area.

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입사빔의 파장에 따른 AsGeSes & Ag/AsGeSes 박막의 홀로그래픽 데이터 소거특성 (Holographic Data Grating Formation of AsGeSeS Single & Ag/AsGeSeS Double Layer Thin Films with the Incident Beam Wavelength)

  • 구용운;정홍배
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2006년도 제37회 하계학술대회 논문집 C
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    • pp.1428-1429
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    • 2006
  • We investigated the diffraction efficiency, erasing property and rewriting property of diffraction grating with each wavelength of recording beam. A (P:P) polarized light was exposed on AsGeSeS and Ag/AsGeSeS thin film to form a diffraction grating by HeNe(635nm) laser and DPSS(532nm) laser. At the maximum efficiency condition, unpolarized HeNe laser beam was irradiated to erase 1ha generated diffraction grating. The HeNe laser showed more higher diffraction efficiency and the DPSS laser showed more faster diffraction grating time. At erasing and rewriting process, AsGeSeS(61%-85%)thin film showed better property than Ag doped Ag/AsGeSeS(53%-63%) double layer structured thin film.

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FeMn/NiFe에서 Laser 열처리에 의한 자구연구 (Magnetic Domain Structure in Laser-Annealed NiFe/FeMn Bilayers)

  • 최상대;김선욱;진대현;이미선;안진희;주호완;김영식;이기암;이상석;황도근
    • 한국자기학회지
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    • 제14권6호
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    • pp.224-227
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    • 2004
  • 교환결합된 NiFe/FeMn 이중박막에서 Laser 열처리를 통하여 국소적인 자화반전을 연구하였다. 600 G의 외부 자기장을 시편에 가하면서 DPSS Laser로 자화 반전시켰으며, 300 mW에서 15분 동안 국소적인 부분을 조사하였다. 국소적으로 자화반전 시킨 박막을 다시 원래 방향으로 역 반전시켜 자기저항(MR)곡선 피크가 감소된 것을 관찰하였다. 이는 직접적으로 Laser를 가한 박막의 손상과 계면에서 내부 확산에 의한 것으로 생각된다 국소적인 반전 자화의 자구구조는 MU을 통하여 관찰하였다. 자화반전 영역에서 새로운 자구벽을 형성하였으며, Laser가 조사된 영역근처에서 자구벽이 형성된 것을 관찰하였다.

Ge-Se의 스위칭 특성 향상을 위한 Sb-doping에 관한 연구 (Electrolyte Mechanizm Study of Amorphous Ge-Se Materials for Memory Application)

  • 남기현;정홍배
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2009년도 하계학술대회 논문집
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    • pp.69-69
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    • 2009
  • In other to progress better crystallization transition and long phase-transformation data of phase-change memory (PRAM), we investigated about the effect of Sb doping and Ag ions percolating into Ge-Se-Te phase-change material. Doped Sb concentrations was determined each of 10 wt%, 20 wt% and 30 wt%. As the Sb-doping concentration was increased, the resistivity decreased and the crystallization temperature increased. Ionization of Ag was progressed by DPSS laser (532 nm) for 1 hour. The resistivity was more decreased and the crystallization temperature was more increased in case of adding Ag layer under Sh-(Ge-Se-Te) thin film. At the every condition of thin films included Ag layer more stable states were indicated compare with just Sh-doped Ge-Se-Te thin films.

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