• 연구논문집
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• s.33
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• pp.99-109
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• 2003

Recently the utilization of the ozone dissolved de-ionized water(DIW-$O_3$) in semiconductor wet cleaning process and photoresist stripping process to replace the conventional sulfuric acid and hydro peroxide mixture(SPM) method has been studied. In this paper, we propose the water-electrode type ozone generator which has the characteristics of the high concentration and purity to produce the high concentration DIW-$O_3$ for the photoresist strip process in the semiconductor fabrication. The proposed ozone generator has the dual dielectric tube structure of silent discharge type and the water is both used to electrode and cooling water. Through this study, we obtained the results of the 10.3 wt% of ozone gas concentration at the oxygen gas of 0.5 [liter/min.] and the DIW-$O_3$ concentration of 79.5 ppm.. Through the photoresist stripping test using the produced DIW-$O_3$, we confirmed that the photoresist coated on the silicon wafer was removed effectively in the 12 minutes.

• Journal of Electrochemical Science and Technology
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• v.14 no.3
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• pp.283-292
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• 2023

Currently, spray coating has attracted interest in the mass production of anode catalyst layers for proton exchange membrane water electrolysis (PEMWE). The solvent in the spray ink is a critical factor for the catalyst dispersion in ink, the microstructure of the catalyst layer, and the PEMWE performance. Herein, various pure organic solvents were examined as a substitute for conventional isopropanol-deionized water (IPA-DIW) mixture for ink solvent. Among the polar solvents that exhibited better IrO₂ dispersion over nonpolar solvents, 2-butanol (2-BuOH) was selected as a suitable candidate. The PEMWE single cells were fabricated using 2-BuOH at various ionomer contents, spray nozzle types, and drying temperatures, and their performance was compared to the cells fabricated using a conventional IPA-DIW mixture. The PEMWE single cells with 2-BuOH solvent showed good performances comparable to the conventional IPA-DIW mixture case and highly durable performances under accelerated degradation tests.

• Journal of the Korean Institute of Gas
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• v.27 no.1
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• pp.23-32
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• 2023

In this study, the Al₂O₃ nanofluid was synthesized as an additive for improving the injection efficiency and storage capacity of carbon dioxide (CO₂) in a depleted sandstone reservoir or deep saline aquifer. As the base fluid, deionized water (DIW) and saline prepared by referring to the composition of API Brine were used, and the fluid was synthesized by using Al₂O₃ nanofluid with CTAB (cetyltrimethyl-ammonium bromide), a cationic surfactant. After that, the dispersion stability was evaluated by using visual observation, dynamic light scattering (DLS), transmission electron microscope (TEM), and miscibility test. As a result, it was presented that stable nanofluid without agglomeration and precipitation after reaction with 70,000 ppm of brine could be synthesized when the nanoparticle concentration was 0.05 wt% or less.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.11a
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• pp.166-166
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• 2007

ZnO는 육방정계(wurtzite) 결정구조를 지니며 상온에서 3.37eV의 wide band gap을 갖는다. ZnO의 엑시톤 결합 에너지는 GaN에 비해 2.5배 높은 60meV로서 고효율의 광소자 적용 가능성이 높다. 또한 고품위의 박막합성이 가능하다. 이러한 특성 때문에 display소자의 투명전극, 광전소자, 바리스터, 압전소자, 가스센서 등에 폭 넓게 응용되고 있다. ZnO박막의 제조는 스퍼터링, CVD, 진공증착법, 열분해법 등이 있다. 본 논문에서는 RF 마그네트론 스퍼터에 의해 제작된 ZnO 박막에 CMP공정을 수행하여 연마율과 비균일도 특성 및 광투과 특성을 연구하였다. ZnO박막은 $2{\times}2Cm$의 Corning glass위에 증착되었다. 로터리 펌프와 유확산 펌프를 이용하여 초기진공을 $2{\times}10^{-6}$ Torr까지 도달시킨 후 Ar과 $O_2$를 주입하였다. 증착은 상온에서 이루어졌으며 공정압력은 $6{\times}10^{-2}$Torr이였다. 초기의 불안정한 상태의 풀라즈마를 안정시키기 위해 셔터를 이용하여 pre-sputtering을 하였다. CMP 공정조건은 플레이튼 속도, 슬러리 유속, 압력은 칵각 60rpm, 90ml/min, $300g/cm^2$으로 일정하게 유지하였으며 헤드속도는 20rpm에서 100rpm까지 증가시키면서 연마특성을 조사하였다. 실리카슬러리의 적합성을 알아보기 위해 DIW와 병행하여 CMP공정을 수행하고 비교 분석하였다. CMP공정 결과 광투과도는 굉탄화된 표면의 확보로 인해 향상된 특성을 보였다. 실리카 슬러리를 사용하여 CMP를 할 경우는 헤드속도는 저속으로 하여야 양호한 연마특성을 얻을 수 있었다.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.11a
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• pp.527-527
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• 2007

CMP가 1980년 IBM에 의해 반도체 웨이퍼의 표면 연마를 위해 적용된 후, 많은 연구 개발의 노력으로 반도체 집적회로의 제조 공정에서 필수 핵심기술이 되었으나, 소모자재(연마패드, 탄성지지대, 슬러리, 패드 컨디셔너)의 비용이 CMP 공정 비용의 70% 이상을 차지하는 등 제조단가가 높다는 단점을 극복할 수가 없었다. 특히, 고가의 슬러리가 차지하는 비중이 40% 이상을 넘고 있어, 슬러리 원액의 소모량을 줄이기 위한 연구들이 현재 활발히 연구 중이다. 슬러리의 변수로는 연마입자의 종류 및 특성, 용액의 pH, 연마입자의 슬러리내 안정성 등이 있다. 슬러리내 연마입자는 연마량과 균일도 측면에서 밀접한 관계를 가지고 있다. 또한, 연마제의 영향에 따라 연마율의 차이 즉, CMP 특성의 변화를 보이고 있기 때문에 투입량 또한 최적화가 필요하다. 본 연구에서는 새로운 연마제의 특성을 알아보기 위해 탈이온수(de-ionized water; DIW)에 $CeO_2,\;MnO_2,\;ZrO_2$ 등을 첨가한 후 분산시간에 따른 연마 특성과 atomic force microscopy (AFM)분석을 통해 표면 거칠기를 비교 분석하였다. 그리고, 세 가지 종류의 연마제를 각각 1wt%, 3wt%, 5wt% 첨가하여 산화막에 대한 CMP 특성을 알아본 후, scanning electron microscopy (SEM) 측정과 입도 분석을 통해 그 가능성을 알아보았다.

• Journal of Wetlands Research
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• v.25 no.4
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• pp.291-296
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• 2023

DIWS system was employed to treat hydrochloric acid gas from cold rolling mill process of iron and steel industry. Chlorine gas generated from the acid regeneration system was combined with hydrogen gas and hydrogen chloride gas was increased to 50%. After the injection of Na₂S₂O₃ to remove chlorine gas, the removal of hydrogen chloride was stably kept 87.5~88.8%, where the inflow was 13.1~13.4ppm and the outflow was 1.5~1.7ppm. DIWS system can be recommended for the real iron and steel plant because it was stably maintained not only the air emission standards but also the reduction of chemical usage.

• Journal of Soil and Groundwater Environment
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• v.11 no.3
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• pp.31-42
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• 2006

Drought indices, such as PDSI (palmer Drought Severity Index), SWSI (Surface Water Supply Index) and SPI (Standardized Precipitation Index), have been developed to assess and forecast an intensity of drought. To find the applicability of groundwater level data to a drought assessment, a correlation analysis between SPI and groundwater levels was conducted for each time series at a drought season in 2001. The comparative results between SPI and groundwater levels of shallow wells of three national groundwater monitoring stations, Chungju Gageum, Yangpyung Gaegun, and Yeongju Munjeong, show that these two factors are highly correlated. In case of SPI with a duration of 1 month, cross-correlation coefficients between two factors are 0.843 at Chungju Gageum, 0.825 at Yangpyung Gaegun, and 0.737 at Yeongju Munjeong. The time lag between peak values of two factors is nearly zero in case of SPI with a duration of 1 month, which means that groundwater level fluctuation is similar to SPI values. Moreover, in case of SPI with a duration of 3 month, it is found that groundwater level can be a leading indicator to predict the SPI values I week later. Some of the national groundwater monitoring stations can be designated as DIW (Drought Index Well) based on the detailed survey of site characteristics and also new DIWs need to be drilled to assess and forecast the drought in this country.