• 한국전기전자재료학회논문지
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• 제16권10호
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• pp.902-907
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• 2003

In this paper, the ITO thin film, which is considered as one of the most currently used material for the high performance transparent conducting films for the PDP cell, was made in a parallel-plate, capacitively coupled DC magnetron sputtering system. Some electrical and optical properties of ITO films were investigated and discussed on the basis of glow discharge characteristics. The optimized thin film fabricating conditions of Ar gas pressure and substrate temperature were derived from the Paschen curve and glow discharge characteristics. The maximum transmittance of 89.61 % in the visible region and optical band gap of 3.89 eV and resistivity of 1.67${\times}$10$\^$-3/ $\Omega$-cm were obtained under the conditions of 300 C of substrate temperature and 10∼15 mtorr of pressure, which corresponds nearly to that of Paschen minimum.

• 대한화학회지
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• 제50권1호
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• pp.14-22
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• 2006

방전을 이용한 화학반응기의 기본 모델은 관통형 속 빈 음극 방전셀을 응용하였다. 최근 글로우 방전은 원자분광학에 있어서 방출원으로서의 역할과 더불어 원자화 장치로서 점차적으로 그 연구의 범위를 넓혀가고 있으며, 미량분석, 철강분석, 표면 분석 등에 널리 사용되고 있으며 타 분석 기기와의 접목 등을 통하여 상당한 기술적 성과가 이루어지고 있다.1 또한 본 연구 이전에 기초적인 글로우방전의 성질과 방출 특성에 대해서도 여러 차례 재검토된 바 있어 본 실험에 활용할 수 있었다.2-3 지난 1993년에는 저온의 플라즈마를 이용하여 대기중의 유독가스의 처리에 대한 연구가 발표되었으며, 이 논문에 의하면 연속적인 공기의 흐름 하에서 직류 글로우 방전을 이용하면 유해성 가스인 SO2와 NO의 제거가 가능하다고 보고되었다.4 이를 바탕으로 본 연구에서는 안정적인 공기 플라즈마의 형성과 관통형 양, 음극관 안으로 모든 흐름공기가 음 글로우(Negative glow)영역을 통과하도록 고효율 반응기를 설계하였다. 현재 본 연구에서 디자인한 속 빈 음극관 형 글로우 방전은 경제성이 우수하며 사용하기 쉽다는 것 외에도 방출원 으로서의 장점도 제공함을 관찰하였다.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2004년도 추계학술대회 논문집 전기물성,응용부문
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• pp.46-48
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• 2004

A micro-scale discharge device has been fabricated using MEMS technology and failure mechanisms during DC discharge are investigated for the microstructure. The failure of sustaining the plasma is mainly caused by either open or short of the micro-electrodes, both resulting from the sputtered metal atoms during the DC discharge. The glow discharge lifetime of the microstructures is found to depend on bias circuit scheme as well as the electrode structure. Based on the understanding of the failure mechanism, a novel microstructure is suggested to improve discharge lifetime and the longer lifetime is experimentally demonstrated. In addition to the failure mechanism, an electric breakdown between two electrodes with microns gap are studied using micromachined metal structures. The electrode gap is able to be accurately controlled by thickness of a sacrificial layer and the electric breakdown was measured while varying the gap from $2{\mu}m$ to $20{\mu}m$. The electric breakdown behavior was found to highly depend on the electrode material, which was not considered in Paschen's law.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2003년도 제24회 학술발표회 초록집
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• pp.218-218
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• 2003

• 한국전기전자재료학회논문지
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• 제14권8호
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• pp.622-628
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• 2001

We developed 1- and 2-dimensional fluid model for the analysis of a capacitively coupled Ar RF(Radio Frequency) glow discharge. This discharge is in pure Ar gas at the pressure 100[mTorr], frequency 13.56[MHz] and voltage amplitude 120[V}. This model is based on the equations of continuity and electron energy conservation coupled with Poison equation. 2-dimensional model is simulated on the condition of GEC(Gaseous Electronic Conference cell). The geometry of the discharge chamber and the electrodes used in the model is cylindrically simmetric; tow cylinders for the electrodes are surrounded by the grounded chamber. It is shown that 1-dimensional model is very useful on the understanding of RF glow discharge property and of the movement of charged particles. 2-dimensional model predicts off-axis maximum structure as in the experiments and has the results in qualitatively and quantitatively good agreement with the experiments. Effects of dc self-bias voltage, guard ring and reactor geometry is discussed.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제49권9호
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• pp.527-532
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• 2000

The performance of ac plasma display panels (PDP) is influenced strongly by the surface glow discharge characteristics on the MgO thin films. This paper deals with the surface glow discharge characteristics and some physical properties of MgO thin films prepared by reactive RF planar unbalanced magnetron sputtering in connection with ac PDP. The samples prepared with dc bias voltage of -10V showed lower discharge voltage and lower erosion rate byion bombardment than those samples prepared by conventional magnetron sputtering or E-beam evaporation. The main factor that improves the discharge characteristics by bias voltage is considered to be due to the morphology changes or crystal structure of the MgO thin film by ion bombardement during deposition process.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2000년도 영호남학술대회 논문집
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• pp.142-145
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• 2000

The performance of ac plasma display panels (PDP) is influenced strongly by the surface glow discharge characteristics on the MgO thin films. This paper deals with the surface glow discharge characteristics and some physical properties of MgO thin films prepared by reactive RF planar unbalanced magnetron sputtering in connection with ac PDP. The samples prepared with the dc bias voltage of -10V showed lower discharge voltage and lower erosion rate by ion bombardment than those samples prepared by conventional magnetron sputtering or E-beam evaporation. The main factor that improves the discharge characteristics by bias voltage is considered to be due to the morphology changes or crystal structure of the MgO thin film by ion bombardment during deposition process.

• 전기전자학회논문지
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• 제23권3호
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• pp.865-872
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• 2019

대기압에서의 Ar 직류 글로우방전 현상을 1차원 유체모델을 통하여 시뮬레이션을 수행하였다. Ar 기체방전의 여기입자들로부터 방출되는 광원으로서 4가지(${\lambda}_{128nm}$, ${\lambda}_{727nm}$, ${\lambda}_{912nm}$ 그리고 ${\lambda}_{966nm}$) 파장의 빛을 검토하였다. 그 결과, 사인형태의 전원 전압을 인가하였을 경우, ${\lambda}_{128nm}$와 ${\lambda}_{727nm}$의 광원이 직류 전압파형을 인가하였을 때보다 거의 2배에 가까운 빛을 방출하는 것을 확인하였다. 또한, 전원전압의 스위칭 시간이 짧을수록, ${\lambda}_{128nm}$와 ${\lambda}_{727nm}$의 방출이 더 많아지는 것을 알 수 있었다. 본 연구에서는 하전입자에 의한 줄 열과 소모 전력에 관해서도 논의하였다.

• 한국표면공학회지
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• 제42권3호
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• pp.133-138
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• 2009

Effects of bipolar pulse driving frequency between 50 kHz and 250 kHz on the discharge shapes were analyzed by measuring plasma characteristics by OES (Optical Emission Spectroscopy) and Langmuir probe. Plasma characteristics were modeled by a simple electric field analysis and fluid plasma modeling. Discharge shapes by a continuous dc and bipolar pulsed dc were different as a dome-type and a vertical column-type at the cathode. From OES, the intensity of 811.5 nm wavelength, the one of the main peaks of Ar, decreased to about 43% from a continuous dc to 100 kHz. For increasing from 100 kHz to 250 kHz, the intensity of 811.5 nm wavelength also decreased by 46%. The electron density decreased by 74% and the electron temperature increased by 36% at the specific position due to the smaller and denser discharge shape for increasing pulse frequency. Through the numerical analysis, the negative glow shape of a continuous dc were similar to the electric potential distribution by FEM (Finite Element Method). For the bipolar pulsed dc, we found that the electron temperature increased to maximum 10 eV due to the voltage spikes by the fast electron acceleration generated in pre-sheath. This may induce the electrons and ions from plasma to increase the energetic substrate bombardment for the dense thin film growth.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2014년도 추계학술대회 논문집
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• pp.199-199
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• 2014

좁은 관경을 갖는 상대 유전율 3 이하인 PTFE와 PE 고분자 튜브 내부에 플라즈마 방전을 일으켜 고분자 튜브 표면 그래프팅 기술을 개발 하고자 하였다. 스텐트 및 인공혈관 등에 적용이 가능한 내부지름 3 mm 이하의 원통형 고분자 생체 식립체 내부 표면을 그래프팅하는 기술이다. 좁은 고분자 튜브 내부에 생성되는 방전은 고분자의 관경에 의해 방전개시 전압이 결정되었다. 방전개시 이후 DC glow discharge 에서 나타나는 전압과 전류의 특징들이 나타났다. 전압과 전류의 파형 분석에서는 고분자 표면과 가스 간의 새로운 용량성 임피던스가 형성되는 것을 관찰하였다. 고분자 내부 표면에 플라즈마의 방전 형태는 면 방전 (surface discharge)의 형태로 나타났다.