• Title/Summary/Keyword: DC field

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Fabrications and Properties of Al/$VF_2$/$n^+$-Si(100) Structures by Dip Coating Methode (Dip Coating 법에 의한 Al/$VF_2$-TrFE/Si(100) 구조의 제작 특성)

  • Kim, Ka-Lam;Jeong, Sang-Hyun;Yun, Hyeong-Seon;Lee, Woo-Seok;Kwak, No-Won;Kim, Kwang-Ho
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.20-21
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    • 2008
  • Ferroelectric vinylidene fluoride-trifluoroethylene ($VF_2$-TrFE) copolymer films were directly deposited on degenerated Si ($n^+$, 0.002 $\Omega{\cdot}cm$) using by dip coating method. A 1 ~ 3 wt% diluted solution of purified vinylidene fluoride-trifluoroethylene ($VF_2$:TrFE=70:30) in a dimethylformamide (DMF) solvent were prepared and deposited on silicon wafers using dip coating method for 10 seconds. After Post-Annealing in a vacuum ambient at 100~200 $^{\circ}C$ for 60 min, upper aluminum electrodes were deposited by thermal evaporation through the shadow mask to complete the MFS structure. The ferroelectric $\beta$-phase peak of films, depending on the annealing temperature, started to show up around $125^{\circ}C$, and the intensity of the peak increased with increasing annealing temperature. Above $175^{\circ}C$, the peak started to decrease. The C-V characteristics were measured using a Precision LCR meter (HP 4284A) with frequency of 1MHz and a signal amplitude of 20 mV. The leakage-current versus electric-field characteristics was measured by mean of a pA meter/DC voltage source (HP 4140B).

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Magnetron Sputter내 Plasma 분포 및 Target Erosion Profile 해석

  • 김성구;오재준;신재광;이규상;허재석;이형인;이윤석
    • Proceedings of the Korean Vacuum Society Conference
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    • 1999.07a
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    • pp.209-209
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    • 1999
  • 현재 magnetron sputter는 반도체, LCD 등을 포함하는 microelectronics 산업에서 박막형성을 위한 주요 장비로 널리 쓰이고 있으며, 소자의 고집적화 및 대형화 추세에 따라 그 이용가치는 더욱 증대되고 있다. 본 연구엣는 TFT-LCD용 Color Filter 제조시 ITO박막형성을 위해 사용하는 magnetron sputter 내부의 플라즈마 분포 및 ion kinetic energy에 대한 해석을 실시하였으며, ITO target의 erosion 형상의 원인을 실험결과와 비교하였다. Magnetron sputtering은 target에 가해지는 bias 전압(DC 혹은 RF)에 의해 target과 shield 혹은 target과 substrate 사이에서 생성될 수 잇는 플라즈마를 target 및 부분에 붙어있는 영구자석을 이용하여 target 근처에 집중시키고, target 표면과 플라즈마 사이의 전위차에 의해 가속된 이온들이 target 표면과 충돌하여 이차 전자방출을 일으킴과 동시에 target 표면에서 sputtering을 일으키고, 이들 sputtered 된 중성의 atom 들이 substrate로 날아가 박막을 형성하는 원리로 작동된다. 이때 target에서 방출되는 이차전자들은 영구자석에 의한 자기장 효과에 의해 target 근처에 갇히게 되어 중성 기체분자들과 이온화반응을 통해 플라즈마를 유지하고 그 밀도를 높혀주는 역할을 담당하게 된다. 즉 낮은 압력 및 bias 전압에서도 플라즈마 밀도를 높일수 있고 sputtering 공정이 가능한 장점을 가지고 있다. Magnetron sputtering 현상에 대한 시뮬레이션은 크게 magnetron discharge와 sputtering에 대한 해석 두가지로 나누어 볼 수 있는데, sputtering 현상 자체를 수치묘사할 수 있는 정량적인 모델은 아직까지 명확하게 정립되어 있지 않다. 따라서 본 연구에서는 magnetron plasma 자체에 대한 수치해석에 주안점을 두고 아울러 bulk plasma 영역에서 target으로 입사하는 이온들의 입사에너지 및 입사각도 등을 Monte Carlo 방법으로 추적하여 sputtering 현상을 유추해보았다. Sputtering 현상을 살펴보기 위해 magnetron sputter 내 플라즈마 밀도, 전자온도, 특히 target 및 substrate를 충돌하는 이온의 입사에너지 및 입사각 분포등을 계산하는데 hybrid 방법으로 시뮬레이션을 하였다. 즉 ion과 bulk electron에 대해서는 fluid 방식으로 접근하고, 이차전자 운동과 그로 인한 반응관계 및 target으로 입사하는 이온의 에너지와 입사각 분포는 Monte-Carlo 방법으로 처리하였다. 정지기장해석의 경우 상용 S/W인 Vector Fields를 사용하였다. 이를 통해 sputter 내 플라즈마 특성, target으로 입사하는 이온에너지 및 각 분포, 이들이 target erosion 형상에 미치는 영향을 살펴보았다. 또한 이들 결과로부터 간단한 sputtering 모델을 사용하여 target으로부터 sputter된 입자들이 substrate에 부착되는 현상을 Monte-Carlo 방법으로 추적하여 성막특성도 살펴보았다.

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Research on Speed Estimation Method of Induction Motor based on Improved Fuzzy Kalman Filtering

  • Chen, Dezhi;Bai, Baodong;Du, Ning;Li, Baopeng;Wang, Jiayin
    • Journal of international Conference on Electrical Machines and Systems
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    • v.3 no.3
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    • pp.272-275
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    • 2014
  • An improved fuzzy Kalman filtering speed estimation scheme was proposed by means of measuring stator side voltage and current value based on vector control state equation of induction motor. The designed fuzzy adaptive controller conducted recursive online correction of measurement noise covariance matrix by monitoring the ratio of theory residuals and actual residuals to make it approach real noise level gradually, allowing the filter to perform optimal estimation to improve estimation accuracy of EKF. Meanwhile, co-simulation scheme based on MATLAB and Ansoft was proposed in order to improve simulation accuracy. Field-circuit coupling problems of induction motor under the action of vector control were solved and the parameter optimization accuracy was improved dramatically. The simulation and experimental results show that this algorithm has a strong ability to inhibit the random measurement noise. It is able to estimate motor speed accurately, and has superior static and dynamic characteristics.

An application of the electrostatic spray technology to increase scrubbing efficiency of SO$_{2}$ emitted from thermal systems (열시스템에서 생성된 SO$_{2}$ 가스의 배출저감을 위한 정전기 분무 원리의 응용)

  • Jeong, Jae-Yun;Byeon, Yeong-Cheol;Hwang, Jeong-Ho
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.21 no.8
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    • pp.1068-1076
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    • 1997
  • Emission control of acid exhaust gases from coal-fired power plants and waste incinerators has become an increasing concern of both industries and regulators. Among those gaseous emissions, SO$_{2}$ has been eliminated by a Spray Drying Absorber (SDA) system, where the exhaust gas is mixed with atomized limestone-water slurry droplets and then the chemical reaction of SO$_{2}$ with alkaline components of the liquid feed forms sulfates. Liquid atomization is necessary because it maximizes the reaction efficiency by increasing the total surface area of the alkaline components. An experimental study was performed with a laboratory scale SDA to investigate whether the scrubbing efficiency for SO$_{2}$ reduction increased or not with the application of a DC electric field to the limestone-water slurry. For a selected experimental condition SO$_{2}$ concentrations exited from the reactor were measured with various applied voltages and liquid flow rates. The applied voltage varied from -10 to 10 kV by 1 kV, and the volume flow rate of slurry was set to 15, 25, 35 ml/min which were within the range of emission mode. Consequently, the SO$_{2}$ scrubbing efficiency increased with increasing the applied voltage but was independent of the polarity of the applied voltage. For the electrical and flow conditions considered a theoretical study of estimating average size and charge of the atomized droplets was carried out based on the measured current-voltage characteristics. The droplet charge to mass ratio increased and the droplet diameter decreased as the strength of the applied voltage increased.

열 화학 기상법을 이용한 MWNT의 두께 및 형상 조절에 관한 연구

  • No, Ji-Yeong;Park, Sin-Yeong;An, Seong-Hun;Lee, Tae-Mu;Lee, Seon-Yeong
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2010.05a
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    • pp.25.2-25.2
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    • 2010
  • CNT(Carbon Nanotube)는 특이한 구조 및 뛰어난 물성을 갖고 있어, 여러가지 분야에 응용 가능한 신소재로서 연구되어 왔다. 또한 모양 및 구조에 따라 기계, 전기, 화학적인 특성이 달라 다양한 분야에서 활용이 가능하다. 외국에서는 FED tip, TR, 디스플레이 소자, 수소저장체, 고강도 복합체 및 대 표면적 전극 등 CNT의 다양한 특성을 이용한 응용이 연구되고 있는 반면, 국내에서는 이론연구와 합성연구에 편중되어 있다. 본 연구에서는 열 화학 기상법 (Thermal CVD)을 이용하여 MWNT(Multi-wall nano tube)를 성장시켜 촉매두께, 온도, gas변수에 따른 CNT의 양상을 분석하였다. Ni catalyst는 DC magnetron sputter를 이용하여 5~50nm 두께로 증착하였으며, 성장온도는 $800^{\circ}C$에서 $950^{\circ}C$까지 변화시켰다. 기판의 pre-treatment 로 ammonia($NH_3$) gas를 주입한 후, carbon precursor인 methane($CH_4$) gas와 $H_2$ dilute gas를 1:4의 비율로 주입하여 CNT를 성장시켰다. FE-SEM과 TEM, 그리고 XRD를 이용해 성장된 CNT의 형상 및 구조를 분석한 결과, 낮은 온도에서는 100nm이상의 두께를 갖는 수직형상의 MWNT가 성장되었으며, $900^{\circ}C$이상의 높은 온도에서는 20nm이하의 amorphous carbon nano rod가 성장되었다. 각각의 MWNT, carbon nano rod는 온도가 높을수록 직경이 증가하는 추세를 나타냈으며, Ni catalyst가 얇아질수록 수직형상을 갖는 결과가 나타났다. 또한 ammonia gas의 pre-treatment여부에 따라 CNT의 수직 형상이 좌우되는 결과를 확인하였다. 향후 성장된 MWNT의 최적 조건을 도출하여 디스플레이 소자인 FED(Field Emission Display)분야 등에 응용 가능할 것으로 전망된다.

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Effects of Low Temperature Annealing at Various Atmospheres and Substrate Surface Morphology on the Characteristics of the Amorphous $Ta_2O_5$ Thin Film Capacitors (여러 분위기에서의 저온 열처리와 폴리머 기판의 표면 morphology가 비정질 $Ta_2O_5$ 박막 커패시터의 특성에 미치는 영향)

  • Jo, Seong-Dong;Baek, Gyeong-Uk
    • Korean Journal of Materials Research
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    • v.9 no.5
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    • pp.509-514
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    • 1999
  • Interest in the integrated capacitors, which make it possible to reduce the size of and to obtain improved electrical performance of an electronic system, is expanding. In this study, $Ta_2$O\ulcorner thin film capacitors for MCM integrated capacitors were fabricated on a Upilex-S polymer film by DC magnetron reactive sputtering and the effects of low temperature annealing at various atmospheres and substrate surface morphology on the capacitor characteristics were discussed. The low temperature($150^{\circ}C$) annealing produced improved capacitor yield irrespective of the annealing at mosphere. But the leakage current of the $O_2$-annealed film was larger than that of any other films. This is presumably mosphere. But the leakage current of the $O_2$-annealed film was larger than that of any other films. This is presumably due to the change of the $Ta_2$O\ulcorner film surface by oxygen, which was explained by conduction mechanism study. Leakage current and breakdown field strength of the capacitors fabricated on the Upilex-S film were 7.27$\times$10\ulcornerA/$\textrm{cm}^2$ and 1.0 MV/cm respectively. These capacitor characteristics were inferior to those of the capacitors fabricated on the Si substrate but enough to be used for decoupling capacitors in multilayer package. Roughness Analysis of each layer by AFM demonstrated that the properties of the capacitors fabricated on the polymer film were affected by the surface morphology of the substrate. This substrate effect could be classified into two factors. One is the surface morphology of the polymer film and the other is the surface morphology of the metal bottom electrode determined by the deposition process. Therefore, the control of the two factors is important to obtain improved electrical of capacitors deposited on a polymer film.

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Electrochemical characteristics of Ca, P, Sr, and Si Ions from PEO-treated Ti-6Al-4V Alloy Surface

  • Yu, Ji-Min;Choe, Han-Cheol
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2017.05a
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    • pp.154-154
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    • 2017
  • Ti-6Al-4V alloys are widely used as metal-lic biomaterials in dentistry and orthopedics due to its excellent biocompatibility and me-chanical properties. However, because of low biological activity, it is difficult to form bone growth directly on the surface of titanium implants. For this reason, surface treatment of plasma electrolytic oxidation(PEO) was used for dental implants. To enhance bioac-tivity on the surface, strontium(Sr) and sili-con(Si) ions can be added to PEO treated sur-face in the electrolyte containing these ions. The presence of Sr in the coating enhances osteoblast activity and differentiation, where-as it inhibits osteoclast production and prolif-eration. And Si has been found to be essen-tial for normal bone, cartilage growth, and development. In this study, electrochemical characteristics of Ca, P, Sr, and Si ions from PEO-treated Ti-6Al-4V alloy surface was re-searched using various experimental instruments. DC power is used and Ti-6Al-4V al-loy was subjected to a voltage of 280 V for 3 minutes in the electrolyte containing 5, 10, 20M% Sr ion and 5M% Si ion. The morphol-ogies of PEO-treated Ti-6Al-4V alloy by electrochemical anodization were examined by field-emission scanning electron micro-scopes (FE-SEM), energy dispersive x-ray spectroscopy (EDS), x-ray diffraction (XRD) and corrosion analysis using AC impedance and potentiodynamic polarization test in 0.9% NaCl solution at similar body tempera-ture using a potentiostat with a scan rate of 1.67mV/s and potential range from -1500mV to + 2000mV.

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A fully UHF-powered smart sensor tag in food freshness monitoring (음식물 신선도 모니터링을 위한 풀 패시브 UHF 스마트 센서 태그)

  • Lam, Binh Minh;Chung, Wan-Young
    • Journal of the Institute of Convergence Signal Processing
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    • v.19 no.3
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    • pp.89-96
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    • 2018
  • This study aims to develop a fully passive smart sensing tag utilizing RF (Radio Frequency) energy harvesting technology at UHF (Ultra High Frequency) band of 915MHz. To optimize the power collected under various radiated conditions, an efficient energy harvesting module exploiting a boost circuit with maximum power point tracking (MPPT) is employed. Specifically, the proposed tag features two orthogonal antennas to enhance its capability of both energy scavenging and data transmissions. The experimental result shows that the developed smart sensor tag can scavenge an RF input power of as low as 0.19mW at a distance of 4 meters for a 3.6Vdc output. Furthermore, the proposed smart sensor tag performs the feasibility of completely autonomous monitoring food freshness at 2 meters with a low-power sensor array.

Resistance Development in Au/YBCO Thin Film Meander Lines under High-Power Fault Conditions (과도 사고 시 Au/YBCO 박막 곡선의 저항 거동)

  • Kim, H.R.;Sim, J.;Choi, I.J.;Yim, S.W.;Hyun, O.B.
    • Progress in Superconductivity
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    • v.8 no.1
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    • pp.81-86
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    • 2006
  • We investigated resistance development in $Au/YBa_2Cu_3O_7(YBCO)$ thin film meander lines during high-power faults. The meander lines were fabricated by patterning 300 nm thick YBCO films coated with 200 nm thick gold layers into meander lines. A gold film grown on the back side of the substrate was also patterned into a meander line. The front meander line was connected to a high-power fault-test circuit and the back line to a DC power supply. Resistance of both lines was measured during the fault. They were immersed in liquid nitrogen during the experiment. Behavior of the resistance development prior to quench completion could be understood better by comparing resistance of the front meander lines with that of the back. Quench completion point could be determined clearly. Resistance and temperature at the quench completion point were not affected by applied field strength. The experimental results were analyzed quantitatively with the concept of heat transfer within the meander lines/substrate and to the surrounding liquid nitrogen. In analysis, the fault period was divided into three regions: flux-flow region, region prior to quench completion, and region after quench completion. Resistance was calculated for each region, reflecting the observation for quench completion. The calculated resistance in three regions was joined seamlessly and agreed well with data.

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$CH_4$$N_2$ 가스 혼합비에 따른 a-C:H:N 박막의 물성 연구

  • 유영조;김효근;오재석
    • Proceedings of the Korean Vacuum Society Conference
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    • 1998.02a
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    • pp.94-94
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    • 1998
  • 최근 a-CH:N (hydrogenated amorphous carbon nitride)가 a-CH 보다 팡학적, 기계객성 질이 우수하므로 이에 대한 연구가 활발하게 진행되고 있다. 본 실험에선 원료 가스의 유량 은 5 sccm으로 고정시킨 채 원료가스내의 질소 대 메탄 혼합비 (N2ICHa)훌 O 에서 4 까지 변 화시 키 띤서 DC saddle-field PECVD (plasma enhanced chemical vapour d야Xlsition)훌 이 용하여 a-CH:N 박막융 제작하여, 가스 혼합비가 박막의 미세구조와 광학척 성질에 미치는 영향올 연구하였다. 박막 성장시 진공조 내의 압력온 throttle valve롤 사용하여 90 mTorr로 일정하게 유지하였으며 양극 전압과 기판전업은 각각 500 V, 200 V로 고청하고 상온에서 중 착하였다. a a -step으로 측정 한 a-C:H:N 박막의 두께는 혼합가스내의 질소의 양이 증가할수륙 4800 A에서 2000 A로 두께가 감소하였지만 표면 rot핑비less는 혼합가스내의 질소의 양이 중가할 수록 중가함을 AFM (atomic force mi$\alpha$'0 scopy) 으로 관찰하였다. 박막내의 C와 N의 정량 분석은 RES (Rutherford back scattering s야ctroscopy) 핵공명법을 이용하여 분석하였다. X XPS (X -ray photoelectron spec$\sigma$oscopy) 와 FT-IR (Fo삐er transform-infrared s spectrometry)로 미세구조률 측정한 결과 혼합가스내의 질소의 양이 충가할수록 C-H기는 감 소하였지 만 C르N, N-H기 는 늘어 났다. 또한 PL (photoluminescence) 측정 결과 웬료가스 내 메탄과 질소의 비율이 1:1일 때 최대의 발광올 보였고 UVS (비없 vi이et spec$\sigma$orne$\sigma$y)으 로 측정한 광학쩍 에너지 캡은 혼합비내의 질소의 양이 증가할수록 2.53 eV에서 2.3 eV로 감 소하였다. 이를 결과로부터 원료가스내의 N2ICHa의 중가에 따른 박막의 미세구조 변화와 광학척 생 질의 상관 관계가 고찰될 것이다.

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