• Korean Journal of Environmental Biology
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• v.37 no.4
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• pp.447-466
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• 2019

The orchard flora where perennial fruit trees are grown may be different than in arable fields where annual crops are grown. The study focused on the floristic composition and characteristics of orchards in South Korea. The flora surveys were conducted in 36 areas in nine provinces at two times (May-June and August-September) in 2014. The results showed that the vascular orchard plants in South Korea included 466 taxa, which contained 91 families, 278 genera, 420 species, two subspecies, 39 varieties, four forms, and one hybrid. Among the 91 families, Compositae was the most diverse in species (66 taxa), followed by Gramineae (51 taxa), Leguminosae (28 taxa), Cyperaceae (18 taxa), Polygonaceae (17 taxa), Cruciferae (16 taxa), and Labiatae (14 taxa). Based on the occurrence frequency of each species, Digitaria ciliaris (Retz.) Koel. (100%) was the highest, followed by Acalypha australis L. (94.4%), Commelina communis L. (94.4%), Persicaria longiseta(Bruijn) Kitag.(91.7), Capsella bursa-pastoris(L.) L. W. Medicus(91.7%), Erigeron annuus (L.) Pers. (91.7%), Mazus pumilus (Burm. f.) Steenis (86.1%), Artemisia princeps Pamp. (86.1%), Cyperus microiria Steud. (86.1%), Stellaria aquatica (L.) Scop. (83.3%), Stellaria media(L.) Vill.(83.3%), and Echinochloa crus-galli (L.) P. Beauv.(83.3%). The biological type of orchards in South Korea was determined to be Th-₅-D₄-e type. Rare plants were found six taxa: Cinnamomum camphora (L.) J. Presl, Aristolochia contorta Bunge, Melothria japonica (Thunb.) Maxim., Ardisia crenata Sims, Gnaphalium hypoleucum DC., and Aster koraiensis Nakai. Eighty-five taxa contained naturalized plants composed of 23 families, 58 genera, 80 species, four varieties, and one form. The urbanization and naturalization indices were 26.3% and 18.2%, respectively.

• Korean Journal of Materials Research
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• v.8 no.3
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• pp.189-194
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• 1998

The redistribution behavior of boron during Co silicidation annealing in the Co/metal/Si system was investigated using SIMS. Ti, Nb and Hf films were used as epitaxy promoting metal layers. After annealing treatment the boron peak height was about 1 order lowered in Co/Ti/Si and Co/Nb/Si systems but the relative peak position from the surface did not change. The distribution of boron was very similar to those of Ti and Nb, because of the strong affinities of boron with them. Also, the position of the main boron peak in the Co/Hf/Si system was almost the same as that of Hf, but the distribution feature of the Co/Hf/Si system somewhat differed from those of Co/Ti/Si and Co/Nb/Si systems. This implies that the affinity between B and Hf is weaker than those of B-Ti and B-Nb. Boron tends to be depleted at the silicidelsi interface while it tends to be piled-up at the Co-metal/Co silicide interface during silicidation annealing.