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The Analysis of System Thinking on the Commercialization of Public R&D Research Institute (공공 R&D 기관의 기술 상용화 과정에 관한 시스템 사고 분석)

  • Kim, Soon-Sun;Kim, Dong-Hwan
    • Korean System Dynamics Review
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    • v.8 no.2
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    • pp.191-207
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    • 2007
  • Nowadays almost nations try to promote the competition of nation through the development of national science technology. Also Korea has been engaging in this race of through public research&development institute. But recently the commercialization of R&D products appears a poor result in the royalty of technology according weak technology transfer toward IT small and medium-sized enterprises. Even If we have been trying to find the problems and causes, as yet it is true that we don't solve clearly the problem, make a diagnosis about it. This paper analyzes the process of commercialization in public R&D research institute(ETRI: Electronics and Telecommunications Research Institute) through system thinking and researches an interrelationship among government agency, public R&D research institute, and enterprise. This one can find the fact that between research fund and R&D products, transfer technology and royalty, and enterprise's operating profit and active technology transfer like adding technology development is a positive feedback loop. This positive feedback loop in the commercialization of public R&D research institute carries out very important role in examining problems in R&D product's commercialization. Also this paper looks forward to being a guide in the commercialization of public R&D research institute.

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Factors Affecting on the Performance of Overseas R&D

  • Cho, Jung-Eun;Kim, Dong-Hee;Kim, Soo-W.;Oh, Jung-Suk
    • International Journal of Quality Innovation
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    • v.10 no.2
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    • pp.43-56
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    • 2009
  • Many companies are trying to acquire innovative technologies and relevant knowledge by sending R&D work overseas. Although recent research has been focusing on the aspects that motivate MNCs to establish offshore R&D facilities, such as cost reduction and market expansion, little is known about external or circumstantial factors influencing the performance of global R&D activities. Searching for enhancers of offshore R&D facilities, we investigated the relationships between the performance of offshore R&D and the technological capabilities of a parent company, its home country, and its R&D hosting country. Both patent data of ED and the ED R&D scoreboard of 134 overseas R&D labs from 46 MNCs, dating from the period of 2003 to 2005, are used in the analysis. The same time period is applied in calculating the RTA of each country. Regression analysis results support our main hypothesis that the technological capabilities of the parent company and the hosting country positively affect the performance of overseas R&D.

What Determines the Performance of Multinational Corporation's Global R&D Activities?: Parent Company vs. Host Country vs. Home Country (다국적 기업의 글로벌 R&D 활동 성과 결정 요인에 관한 연구)

  • Cho, Jung-Eun;Kim, Dong-Hee;Kim, Soo-Wook
    • Korean Management Science Review
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    • v.27 no.2
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    • pp.1-20
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    • 2010
  • Many firms are trying to acquire innovative technologies and relative knowledge by offshoring R&D work. Although research to date has focused on the multinational corporations' motivations of R&D offshoring, such as cost reduction and market expansion, little is known about external or environmental factors influencing the performance of global R&D activities. We investigated the relationship between the offshore R&D performance and the technical capabilities of the parent company, the host country and the home country as enhancers from outside R&D facilities. The analysis uses European patent data and EU R&D scoreboard of 134 overseas R&D labs from 46 multinational corporations in 2005. Also, we calculated total patent number of each country for this. Results from path analysis supported our main hypothesis that the technological capabilities of the parent company and the host country positively affect the overseas R&D performances. By multi-group analysis, we also found that the relationships among the variables are different for each industry.

The Analysis of Structural Relationships among Public Technology Transfer, Technological Performance, and R&D Productivity (공공기술 이전, 기술적 성과, 연구개발 생산성 간의 구조적 관계 분석)

  • Jeon, Jieun;Kwon, Sang Jib
    • Knowledge Management Research
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    • v.19 no.2
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    • pp.1-19
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    • 2018
  • This study aims to identify the causal relationship among public technology transfer, technological performance, and research and development (R&D) productivity. Using the impulse-response function(IRF) of a panel vector autoregressive model (panel VAR), this study suggests the results of how long the factors such as technological performance (patent), public technology transfer, and R&D productivity takes and lasts if a one-unit shock of standard deviation occurs. As a result, first, the increase of public technology transfer activities has no power to increase the technology performance but improve the R&D productivity. If the public institute increases its technology transfer activities by one unit, the R&D productivity will increase within five years. Second, the impact of increasing technological performance on improvement of public technology transfer and R&D productivity is an insignificant. Third, the effect of R&D productivity on the public technology transfer creates a substantial reaction after a current time. Considering the structural relationships among public technology transfer, technological performance, and R&D productivity, if policy makers intend to construct the active R&D circumstance, technology suppliers should be motivated to run the active R&D mechanism because they achieve gains.

A Study on the Establishment of Reference Linking System for National R&D Information (국가 R&D정보 참조연계서비스 시스템 구축에 관한 연구)

  • Kwon, Lee-Nam;Kim, Jae-Soo
    • Proceedings of the Korea Contents Association Conference
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    • 2007.11a
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    • pp.172-177
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    • 2007
  • Reference linking based on a identification system is being widely used both domestically and overseas. National R&D information contains all information related to the R&D programs such as the output and equipment information resulting from the participant and project information. The reference linking service enables the user to freely look up output of a certain program, participant of a project, equipment information from the project or participant and all other information that originates from a R&D project without having to search for it. The reference linking service in the area of national R&D will enable the linking of heterogeneous information produced at different sources.

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정부 R&D투자가 중소기업에 미치는 영향 - 대전 지역특화(전략)산업을 중심으로

  • Jang, Gil-Su;Yeom, Myeong-Bae
    • Proceedings of the Korea Technology Innovation Society Conference
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    • 2017.05a
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    • pp.291-305
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    • 2017
  • 대전은 전국에서 R&D투자가 많은 지역으로 이는 출연연 및 출연연 출신 연구원의 기술창업의 증가로 나타나는 현상으로 볼 수 있다. R&D가 많이 투자됨에 따라 이에 따른 효율성에 대한 분석들이 많이 이루어지고 있으며, 주로 R&D 투자가 대한 지역내총생산, 기업의 생산성 등에 미치는 영향 즉 R&D투자의 효율성 분석을 많이 하고 있다. 본고에서는 지역 R&D투자가 기업의 생산성에 어느 정도 영향을 미치는 지를 분석하였다. 특히 지역특화(전략)산업 분야별로 분석하여 지역 R&D 투자의 효율적 배분을 위한 전략방안을 제시하고자 한다. 이러한 분석을 위해서 생산성에 대한 대리변수로 종업원 1인당 매출액 종업원 1인당 부가가치를 종속변수로 설정하였고, 독립변수로 연구개발비, 종업원 1인당 영업이익, 종업원 1인당 자본집약도 등의 변수를 다중회귀모형으로 실증분석 하였다. 분석결과 R&D투자가 매출액과 부가가치에 유의한 영향을 미치지만, 연구개발비가 매출액이나 부가가치 등 생산성 증가에 결정적인 요인으로 나타나지 않았다. 산업별 분석결과 정보통신, 바이오산업보다 부품소재 산업에서 결정계수가 높게 나왔다. 또한 조절회귀모형을 설정하여 조절효과를 분석한 결과 R&D투자는 매출액에 영향을 미치지만, 부가가치는 조절효과가 발생하지 않았다. 이는 지역 R&D투자의 효율적 배분 측면에서 투자의 활성화를 이루고 연구개발 투자가 실질적으로 기업의 생산성 증가에 기여할 수 있도록 견인해야 할 것이다.

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A gas display device with electron emitter

  • Son, Seung-Hyun;Nam, Mun-Ho;Kim, Jung-Min;Cho, Sung-Hee;Jang, Sang-Hun;Kim, Gi-Young;Han, In-Su;Kim, Dae-Hyun;Cho, Young-Mi;Kim, Chang-Wook;Park, Hyoung-Bin
    • 한국정보디스플레이학회:학술대회논문집
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    • 2007.08b
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    • pp.1253-1256
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    • 2007
  • A display device combining plasma display panel (PDP) and field emission display (FED) is proposed to achieve high luminous efficiency. The device can avoid the main energy loss channels of both PDP (ion loss) and FED (low CL efficiency). $2{\sim}6$”-diagonal test panels with carbon nano-tube (CNT) electron emitter and Xenon ambient gas showed the luminous efficiency of 4.14lm/W and brightness of $263cd/m^2$ at 35V (1kHz, 1% duty), indicating that it is a good candidate for the low voltage driven, highly efficient next generation display.

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Antecedents and Effects of R&D Concentration : An Analysis from the Perspective of the Structure-Conduct-Performance paradigm (연구개발(R&D)집중도의 결정요인 및 영향에 관한 연구 : S-C-P 패러다임 관점에서의 접근)

  • Cho, Young-Gon;Shin, Hyuk-Seung;Sul, Won-Sik
    • Journal of Korean Society of Industrial and Systems Engineering
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    • v.37 no.3
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    • pp.24-35
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    • 2014
  • This paper examines, from the perspective of the structure-conduct-performance (S-C-P) paradigm, the structural factors that determine R&D concentration in industries. The results are as follows. First, an industry's R&D concentration is directly related to its market concentration, R&D intensity, capital intensity, and technological opportunities. In contrast, the higher an industry's performance, the more likely the diffusion of R&D investment is for firms belonging to that industry. Second, an industry's R&D concentration has a positive effect on its market concentration but a negative effect on its performance, suggesting that governments should adopt R&D policies that would induce more firms to invest in R&D instead of focusing only on a few firms to enhance industry performance.

Optimization of a-IGZO Thin-Film Transistors for OLED Applications

  • Chung, Hyun-Joong;Yang, Hui-Won;Kim, Min-Kyu;Jeong, Jong-Han;Ahn, Tae-Kyung;Kim, Kwang-Suk;Kim, Eun-Hyun;Kim, Sung-Ho;Im, Jang-Soon;Choi, Jong-Hyun;Park, Jin-Seong;Jeong, Jae-Kyeong;Mo, Yeon-Gon;Kim, Hye-Dong
    • 한국정보디스플레이학회:학술대회논문집
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    • 2008.10a
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    • pp.1097-1100
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    • 2008
  • We demonstrate that the performance of amorphous indium-gallium-zinc-oxide (IGZO) thin-film transistors (TFT) can be optimized by controlling the interfaces between IGZO and sandwiching insulators and by proper deposition of IGZO layer. Specifically, contact and channel resistances are decreased by reducing IGZO bulk resistance and optimizing dry-etch process, respectively. Field-effect mobility ($\mu_{FE}$) and subthreshold gate swing (S) are further enhanced by fine-tuning IGZO deposition condition.

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