• Title/Summary/Keyword: Czochralski Crystal Growth

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The Transient Simulation of Czochralski Single Crystal Growth Process Using New Solidification Model (새로운 응고 모델을 적용한 Czocgralski 단결정 성장 공정 모사)

  • 이경우;윤종규
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.1 no.1
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    • pp.74-81
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    • 1991
  • The temperature profile of Czochralski single crystal growth system was simulated considering the fluid flow and surface radiation heat transfer. View factors of surface elements were calculated for radiation heat transfer. Two phases(solid and liquid) were treated as a continuous phase by assigning artificial large viscosity to the solid phase and latent heat was accounted by iterative heat revolution method. The solidification model was applied to solid front of the pure Ga during the melting to verify the model. The whole simulation model of CZ system was applied to the growth Al single crystal.

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Melt-Crystal Interface Shape Formation by Crystal Growth Rate and Defect Optimization in Single Crystal Silicon Ingot (단결정 실리콘 잉곳 결정성장 속도에 따른 고-액 경계면 형성 및 Defect 최적화)

  • Jeon, Hye Jun;Park, Ju Hong;Artemyev, Vladimir;Jung, Jae Hak
    • Current Photovoltaic Research
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    • v.8 no.1
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    • pp.17-26
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    • 2020
  • It is clear that monocrystalline Silicon (Si) ingots are the key raw material for semiconductors devices. In the present industries markets, most of monocrystalline Silicon (Si) ingots are made by Czochralski Process due to their advantages with low production cost and the big crystal diameters in comparison with other manufacturing process such as Float-Zone technique. However, the disadvantage of Czochralski Process is the presence of impurities such as oxygen or carbon from the quartz and graphite crucible which later will resulted in defects and then lowering the efficiency of Si wafer. The heat transfer plays an important role in the formation of Si ingots. However, the heat transfer generates convection in Si molten state which induces the defects in Si crystal. In this study, a crystal growth simulation software was used to optimize the Si crystal growth process. The furnace and system design were modified. The results showed the melt-crystal interface shape can affect the Si crystal growth rate and defect points. In this study, the defect points and desired interface shape were controlled by specific crystal growth rate condition.

Quality evaluation of diamond wire-sawn gallium-doped silicon wafers

  • Lee, Kyoung Hee
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.23 no.3
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    • pp.119-123
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    • 2013
  • Most of the world's solar cells in photovoltaic industry are currently fabricated using crystalline silicon. Czochralski-grown silicon crystals are more expensive than multicrystalline silicon crystals. The future of solar-grade Czochralski-grown silicon crystals crucially depends on whether it is usable for the mass-production of high-efficiency solar cells or not. It is generally believed that the main obstacle for making solar-grade Czochralski-grown silicon crystals a perfect high-efficiency solar cell material is presently light-induced degradation problem. In this work, the substitution of boron with gallium in p-type silicon single crystal is studied as an alternative to reduce the extent of lifetime degradation. The diamond-wire sawing technology is employed to slice the silicon ingot. In this paper, the quality of the diamond wire-sawn gallium-doped silicon wafers is studied from the chemical, electrical and structural points of view. It is found that the characteristic of gallium-doped silicon wafers including texturing behavior and surface metallic impurities are same as that of conventional boron-doped Czochralski crystals.

Effects of Rotation on the Czochralski Silicon Single Crystal Growth (초크랄스키법에 의한 실리콘 단결정성장에서 회전효과가 미치는 영향에 대한 연구)

  • 김무근
    • Transactions of the Korean Society of Mechanical Engineers
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    • v.19 no.5
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    • pp.1308-1318
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    • 1995
  • The influence of varying rotation speed of both crystal and crucible was numerically investigated for the Czochralski silicon-crystal growth. Based on a simplified model assuming flatness of free surfrae, the Navier-Stokes Boussinesq equations were employed to identify the flow pattern, temperature distribution as well as the shape of the melt/crystal interface. The present results showed that the interface shape was relatively convex with respect to the melt at lower pulling rate and tended to be concave as the pulling rate increased. In particular, the experimentally observed gull-winged shape of the interface was qualitatively in agreement with the predicted shape. The rotation of crystal alone little affected the growth system. When the rotation speed of the crucible was increased, there occurred inversion of the interface shape from convex to concave pattern. At rapid rotation of the crucible, an interesting channel formation was predictied primarily due to the assumption of laminar flow.

Automatic Diameter Control System for Single Crystal Growth by Czochralski Method; Growth of Nd:YAG Single Crystal (Czochralski법에 의한 단결정 자동직경 제어시스템 개발;Nd:YAG 단결정 성장)

  • Bae, So-Ik;Lee, Sang-Ho;Kim, Han-Tae
    • Korean Journal of Crystallography
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    • v.7 no.1
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    • pp.1-7
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    • 1996
  • We developed an automatic diameter control system to control the diameter of single crystal for Czochralski growth. The system is composed of load cell, software program and data acquisition system connected to computer which controls RF power. This study describes the basic principle, characteristics and components of the system. The diameter of Nd:YAG crystal could be controlled within ±5% tolerance by this system.

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Czochralski Growth of $Bi_{12}SiO_{20}$ single Crystals (Czochralski법에 의한 $Bi_{12}SiO_{20}$ 단결정 성장)

  • 정광철;오근호
    • Journal of the Korean Ceramic Society
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    • v.27 no.5
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    • pp.698-701
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    • 1990
  • The necessary conditions for the growth of high quality Bi12SiO20 single crystals by the Czochralski method have been determined. The interface of melt and crystal was transformed convex to concave above 7 rpm. For growth <001> and <111> directions, facet morphology exhibited 4-fold and 6-fold symmetry. When the crystal of <001> growth direction was broadened, minor facet {110} was developed outstandingly.

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Single crystal growth of $ZnWO_4$ by the CZ and its physical properties (CZ법에 의한 $ZnWO_4$단결정 성장 및 물리적 특성)

  • 임창성;오근호
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.11 no.5
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    • pp.211-217
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    • 2001
  • Czochralski법에 의한 ZnWO₄단결정을 [100], [101], [001] 방향으로 성공적으로 성장시켰다. 각 축 방향에 따른 성장조건이 rotation speed, pulling rate, 성장된 결정의 직경 등의 변수를 가지고 조사되어졌다. 성장된 결정의 냉각시 발생되는 균열을 annealing 효과에 의하여 방지할 수 있었다. 성장된 결정의 방위는 Laue back reflection으로 결정하였다. 각 축 방향으로 성장된 결정의 미세구조적 특징이 논하여졌으며, 경도, 열팽창계수 및 유전상수의 물리적 특성이 평가되어졌다.

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Single crystal growth of ZnWO4 by the Czochralski method and characterization (Czochralski법에 의한 ZnWO4 단결정 성장 및 특성분석)

  • Lim, Chang-Sung
    • Analytical Science and Technology
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    • v.23 no.2
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    • pp.103-108
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    • 2010
  • Single crystals of $ZnWO_4$ with [100], [010] and [001] directions were successfully grown by the Czochralski method. The seed crystals for the single crystal growth of $ZnWO_4$ could be induced by the crystal growth using platinum wires applied by the capillary action from the melt. The growth conditions in each direction were investigated in terms of the variations of rotation speed, pulling rate and diameter of the grown crystals. The formation of cracking in the grown crystals during the cooling process could be prevented by annealing effect. The growth directions of the grown crystals were determined using Laue back reflection. The microscopic characteristics of the grown crystals in each direction were discussed, and their physical properties were evaluated for hardness, thermal expansion coefficients and dielectric constants.

Magnetic field effects of silicon melt motion in Czochralski crystal puller (초크랄스키 단결정 장치내 실리콘 용융액 운동의 자기장효과)

  • Lee, Jae-Hee
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.15 no.4
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    • pp.129-134
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    • 2005
  • A numerical analysis was performed on magnetic field effects of silicon melt motion in Czochralski crystal puller. The turbulent modeling was used to simulate the transport phenomena in 18' single crystal growing process. For small crucible angular velocity, the natural convection is dominant. As the crucible angular velocity is increased, the forced convection is increased and the distribution of temperature profiles is broadened. The cusp magnetic field reduces effectively the natural and forced convection near the crucible and the temperature profiles of the silicon fluids is similar in the case of conduction.

Defects analysis of RE : YAG (RE = Nd3+, Er3+) single crystal synthesized by Czochralski method (Czochralski법으로 성장된 RE : YAG(RE = Nd3+, Er3+) 단결정의 결함분석)

  • Park, Cheong Ho;Joo, Young Jun;Kim, Hye Young;Shim, Jang Bo;Kim, Cheol Jin
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.26 no.1
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    • pp.1-7
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    • 2016
  • RE : YAG ($RE=Nd^{3+}$, $Er^{3+}$) single crystals are laser diodes and generally grown by Czochralski method with controlling the various growth parameter. Since the defects occurred by temperature gradient or the rotation speed of solid-liquid growth interface act as the decline of crystal optical property during the growth procedure, crystalline quality improvement via defects analysis is necessary. The etch pit density (EPD) analysis was used to confirm the surface defect of grown RE : YAG single crystal and to select the area of transmission electron microscopy (TEM) analysis. Defects in the specimen produced by tripod polishing method such as buckling, rod shaped, bend contours by internal stress, segregation and others were observed by using 200 kV TEM and 300 kV FE-TEM.