• Journal of Photoscience
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• v.9 no.2
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• pp.448-450
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• 2002

DNA samples extracted from Japanese cypress leaf tissues contain isopropyl alcohol-precipitable, high molecular weight compounds, which interfere ELISA for cyclobutane pyrimidine dimers (CPD). Removal of the compounds is achieved by DEAE ion-exchange column chromatography and improves the ELISA responses of the DNA. When extracting DNA repeatedly from the same leaf tissues, the DNA samples show CPD responses which increase with the order in sequential extraction, and hence for a reliable detennination of DNA lesion a thorough extraction of DNA is required. Clearing these two problems it was demonstrated that CPD level was slightly higher in the leaves of trees growing under full sunlight than in those growing under UBV -cut sunlight.

• Journal of Photoscience
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• v.9 no.2
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• pp.162-165
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• 2002

Rice is widely cultivated in various regions throughout Asia. Over a five-year period, we investigated the effects of supplemental UVB radiation on the growth and yield of Japanese rice cultivars in the field. The findings of that study indicated that supplemental UVB radiation has inhibitory effects on the growth and grain development. Furthermore, we investigated the sensitivity to UVB radiation of rice cultivars of 5 Asian rice ecotypes, and found that rice cultivars vary widely in UVB sensitivity. The aim of our study is improving UVB resistance in plants by bioengineering or breeding programs. In order to make it, there is need to find the molecular origin of the sensitivity to UVB. Cyclobutane pyrimidine dimer (CPD) is major UV-induced DNA lesions. Plants possess two mechanisms to cope with such DNA damage. The first is the accumulation of UV-absorbing compounds. Our previous data showed that the steady-state CPD levels in leaves of rice grown under chronic radiation in any culture were not so greatly influenced by the increased UV-absorbing compounds content, although there was a significant positive correlation between the CPD levels induced by challenge UVB exposure and the UV-absorbing compounds content. The other is the repair of DNA damage. Photorepair is the major pathway in plants for repairing CPD. We found that the sensitivity to UVB could seriously correlate with the low ability in CPD photorepair in rice plants. These results suggest that photo lyase might be an excellent candidate for restoration by way of selective breeding or engineering in rice.

• Proceedings of the Korean Society of Plant Biotechnology Conference
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• 2004.10a
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• pp.29-34
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• 2004

Reduction in stratospheric ozone layer increases the amount of ultraviolet-B radiation (UVB: 280-320 nm) that reaches the earth ’ s surface. UVB radiationcan damage plants, resulting in decrease in growth and productivity. UVB-augmentation studies have indicated that the sensitivity to UVB radiation in plants varies among the species and cultivars. However. there are no definitive answers for the mechanisms of UVB-resistance in higher plants and for bioengineering design and development of UVB-tolerant plants. We have been studying physiological and biochemical aspects of the effects of UVB radiation on growth and yield of rice COryza sativa LJ. aiming to clarify the mechanism of resistance to UVB radiationin rice. At this meeting. weintroduce our research as followed: (1) supplementary UVB radiation has inhibitory effects on the growth. yield and grain development of rice; (2) UVB sensitivity of rice varies widely among cultivars; (3) among Japanese rice cultivars. Sasanishiki. a leading variety in northeast Japan. is more resistant to UVB. while Norin 1. a progenitor of Sasanishiki. is less resistant; (4)UV-sensitive Norin 1 cultivar is deficient in photorepair of UVB-induced cyclobutane pyrimidine dimer (CPD). and this deficiency results from one amino acid residue alteration of CPD photolyase. These results suggest that spontaneously occurring mutation in CPD photolyase gene could lead to difference in UVB sensitivity in rice. and that CPD photolyase might be a useful target for improving UVB-sensitivity in rice by selective breeding or bioengineering of UVB-tolerant rice.

• Journal of Photoscience
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• v.9 no.2
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• pp.329-331
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• 2002

There is a difference in the inhibitory effects to supplemental UVB (wavelengths 280 to 320 nm) among Japanese rice (Oryza sativa L.), the cultivar Norin I is less resistant while the cultivar Sasanishiki is resistant. UVB induces photodamage in DNA. Cyclobutane pyrimidine dimer (CPD) is a major UV-induced DNA lesion. Photorepair, which is mediated by photolyase, is the major pathway in plants for repairing CPD. We have analyzed CPD induction and repair in Sasanishiki and its close relative Norin I using alkaline agarose gel electrophoresis. Norin I is deficient in CPD photoreactivation and excision, thus UV sensitivity correlates with deficient dimer repair [I]. The photorepair deficiency in Norin I results from a functionally altered photolyase with a photoflash analysis [2]. In this paper, we examined the UVB-sensitivity of several other UV-sensitive and -resistant cultivars and found that the CPD photolyase activity was deficient in UV-sensitive ones. It was also evident that there was a variation in the deduced amino acid sequences of CPD photolyases of the UV-sensitive and -resistant cultivars, whereas each deduced amino acid sequence of the UV-sensitive cultivars and of the UV-resistant ones was the same. These results suggest that the difference in the CPD photolyases of UV-sensitive and -resistant rice might be due to the structural alteration of CPD photolyase.

• Journal of Photoscience
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• v.9 no.2
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• pp.186-189
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• 2002

Many of the adverse effects of solar UV exposure appear to be directly attributable to damage to epidermal DNA. In particular, cyclobutane pyrimidine dimers (CPD) may initiate mutagenic changes as well as induce signal transduction responses that lead to a loss of skin immune surveillance and micro-destruction of skin structure. Our approach is to reverse the DNA damage using prokaryotic DNA repair enzymes delivered into skin using specially engineered liposomes. T4 endonuclease V encapsulated in liposomes (T4N5 liposome lotion) enhanced DNA repair by shifting repair of CPD from the nucleotide excision to the base excision repair pathway. Following topical application to humans, increased repair limited UV-induction of cytokines, many of which are immunosuppressive. In a recent clinical study, topical treatment of UV-irradiated human skin with T4N5 liposome lotion reduced the suppression of the nickel sulfate contact hypersensitivity response. Similarly, the photoreactivating enzyme enhances repair by directly reversing CPDs after absorbing activating light. Here also treatment of UV-irradiated human skin with photoreactivating enzyme in liposomes and photoreactivating light restored the response to the contact allergen nickel sulfate. These findings confirm in humans the observation in mice that UV induced suppression of contact hypersensitivity is caused in part by CPDs. We have tested the ability of T4N5 liposome lotion to prevent UV-induced skin cancer in patients with xeroderma pigmentosum (XP), who have an elevated incidence of skin cancer resulting from a genetic defect in DNA repair. Daily use of the lotion for one year in a group of 20 XP patients reduced the average number of actinic keratoses by 68% and basal cell cancers by 30% compared to 9 patients in the placebo control group. Delivery of DNA repair enzymes to skin is a promising new approach to photoprotection.

• Journal of Life Science
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• v.24 no.2
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• pp.112-117
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• 2014

We investigated the effects of extracts from Rubus coreanus (RC) and Artemisia princeps var. orientalis (AP) on DNA damage response in ultraviolet B (UVB)-exposed HaCaT cells. Cell activity upon treatment for 24 h with RC or AP alone was similar to or greater than that of the nontreated control. When UVB-exposed cells were postincubated for 24 h in medium containing RC or AP, cell activity increased in a concentration-dependent manner. Nuclear fragmentation analysis showed that postincubation with RC or AP decreased UVB-induced apoptosis by about 20% and 15%, respectively, of that in cells postincubated with growth medium. When UVB-exposed cells were postincubated for 24 h in medium containing RC or AP, the level of cyclobutane pyrimidine dimer decreased in a concentration- dependent manner. Western blot analysis showed that treatment of cells not exposed to UVB with RC or AP alone did not significantly change the levels of phospho-p53 and GADD45 protein. Interestingly, when UVB-exposed cells were postincubated for 24 h in medium containing RC or AP, phospho-p53 and GADD45 levels decreased in a concentration dependent manner. Our results suggest that RC and AP extract assist the survival of UVB-exposed cells in parallel with a decrease in levels of UVB-induced DNA damage and damage-response proteins, such as p53 and GADD45.

• Journal of Microbiology and Biotechnology
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• v.16 no.10
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• pp.1583-1590
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• 2006

T4 endonuclease V (T4 endo V) [EC 3. 1. 25. 1], found in bacteriophage T4, is responsible for excision repair of damaged DNA. The enzyme possesses two activities: a cyclobutane pyrimidine dimer DNA glycosylase (CPD glycosylase) and an apyrimidic/apurinic endonuclease (AP lyase). T4 denV (414 bp cDNA) encoding T4 en do V (138 amino acid) was synthesized and expressed using either an expression vector, pTriEx-4, in E. coli or a baculovirus AcNPV vector, pBacPAK8, in insect cells. The recombinant His-Tag/T4 endo V (rHis-Tag/T4 endo V) protein expressed from bacteria was purified using one-step affinity chromatography with a HiTrap Chelating HP column and used to make rabbit anti-His-Tag/T4 endo V polyclonal antibody for detection of recombinant T4 endo V (rT4 endo V) expressed in insect cells. In the meantime, the recombinant baculovirus was obtained by cotransfection of BacPAK6 viral DNA and pBP/T4 endo V in Spodoptera frugiperda (Sf21) insect cells, and used to infect Sf21 cells to overexpress T4 endo V protein. The level of rT4 endo V protein expressed in Sf21 cells was optimized by varying the virus titers and time course of infection. The optimal expression condition was set as follows; infection of the cells at a MOI of 10 and harvest at 96 h post-infection. Under these conditions, we estimated the amount of rT4 endo V produced in the baculovirus expression vector system to be 125 mg/l. The rT4 endo V was purified to homogeneity by a rapid procedure, consisting of ion-exchange, affinity, and reversed phase chromatographies, based on FPLC. The rT4 endo V positively reacted to an antiserum made against rHis-Tag/T4 endo V and showed a residual nicking activity against CPD-containing DNA caused by UV. This is the first report to have T4 endo V expressed in an insect system to exclude the toxic effect of a bacterial expression system, retaining enzymatic activity.