• 한국자기학회지
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• 제15권2호
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• pp.137-141
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• 2005

Spinel계 유화물 $Zn_xFe_{1-x}Cr_2S_4$(x=0.05, 0.1, 0.2)에 대하여 X선 회절법, 자기저항측정, $M\ddot{o}ssbauer$ 분광법을 이용하여 CMR 특성과 자기적 성질을 연구하였다. 결정구조는 상온에서 입방정으로 정상 spinel 구조를 갖는 것으로 나타났다. 자기저항 실험결과 160K 부근 이하에서는 반도체적 전기전도 특성을 보이며, Curie 온도부근에서 최대자기저항 온도가 나타났다. Zn 조성값이 증가함에 따라 Jahn-Teller 효과에 의한 완화 현상이 증가되었으며, 전기 사중극자 이동값 역시 증가되고, 초미세 자기장값은 감소하였다. CMR 특성은 heterovalency에 의한 이중교환 상호작용이나, $Fe^{2+}$와 $Cr^{3+}$ 그리고 $Fe^{3+}$ 사이의 삼중교환 상호작용과는 다른 동적 Jahn-Teller 효과에 의한 도체-반도체전이와 절반 금속성 에너지 밴드구조에서 스핀전자 전이에 의하여 발생되는 것으로 예측된다.

• 한국재료학회지
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• 제29권2호
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• pp.116-120
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• 2019

We prepared $Y_3Al_5O_{12};Ce^{3+},Pr3^{+}$ transparent ceramic phosphor using a solid state reaction method. By XRD pattern analysis and SEM measurement, our phosphors reveal an Ia-3d(230) space group of cubic structure, and the transparent ceramic phosphor has a polycrystal state with some internal cracks and pores. In the Raman scattering measurement with an increasing temperature, lattice vibrations of the transparent ceramic phosphor decrease due to its more perfect crystal structure and symmetry. Thus, low phonon generation is possible at high temperature. Optical properties of the transparent ceramic phosphor have broader excitation spectra due to a large internal reflection. There is a wide emission band from the green to yellow region, and the red color emission between 610 nm and 640 nm is also observed. The red-yellow phosphor optical characteristics enable a high Color Rendering Index (CRI) in combination with blue emitting LED or LD. Due to its good thermal properties of low phonon generation at high temperature and a wide emission range for high CRI characteristics, the transparent ceramic phosphor is shown to be a good candidate for high power solid state white lighting.

• 한국측량학회:학술대회논문집
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• 한국측량학회 2007년도 춘계학술발표회 논문집
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• pp.451-454
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• 2007

There is an inseparable relation between human race and engineering work. As world developed into highly industrialized society, a diversity of large structures is being built up correspondently to limited topographical circumstance. Though large structures are national establishments which provide us with convenience of life, there are some disastrous possibilities which were never predicted such as ground subsidence and degradation. It is very difficult to analyze the volume of total metamorphosis with the relative displacement measurement system which is now used and it is impossible to know whether there is structural metamorphosis within a permissible range of design or not. In this research with an object of 13-year-old earthen dam, through generating point-cloud which has 3D spatial coordinates(x, y, z) of this dam by means of 3D Laser Scanning, we can get real configuration data of slanting surface of this dam with this method of getting a number of 3D spatial coordinates(x, y, z). It gives 3D spatial model to us and we can get various information of this dam such as the distance of slanting surface of dam, dimensions and cubic volume. It can be made full use of as important source material of reinforcement and maintenance works to detect previously the bulging of the dam through this research.

• Bulletin of the Korean Chemical Society
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• 제33권2호
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• pp.505-510
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• 2012

Cobalt oxide nanostructure materials have been prepared by adding several concentrations of spectator Ni ions in solution, and analyzed by electron microscopy, X-day diffraction, calorimetry/thermogravimetric analysis, UV-vis absorption, Raman, and X-ray photoelectron spectroscopy. The electron microscopy results show that the morphology of the nanostructures is dramatically altered by changing the concentration of spectator ions. The bulk XRD patterns of $350^{\circ}C$-annealed samples indicate that the structure of the cobalt oxide is all of cubic Fd-3m $Co_3O_4$, and show that the major XRD peaks shift slightly with the concentration of Ni ions. In Raman spectroscopy, we can confirm the XRD data through a more obvious change in peak position, broadness, and intensity. For the un-sputtered samples in the XPS measurement process, the XPS peaks of Co 2p and O 1s for the samples prepared without Ni ions exhibit higher binding energies than those for the sample prepared with Ni ions. Upon $Ar^+$ ion sputtering, we found $Co_3O_4$ reduces to CoO, on the basis of XPS data. Our study could be further applied to controlling morphology and surface oxidation state.

• 한국측량학회지
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• 제19권3호
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• pp.283-290
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• 2001

저가의 CCTV유형 CCD카메라를 기반으로 하는 수치 근거리사진측량 시스템의 산업정밀측정의 수행능력을 평가하기 위하여 CCD카메라, 프레임그래버, 수치영상 측정 및 자체검정 광속조정 기법을 통합한 수치근거리 사진측량시스템이 구축되었다. 이 시스템의 적용실험을 위하여 정육면체 형상의 인공어초를 대상물로하여 다중지점 수렴 네트워크상에서 수치영상을 획득하였다. 자체검정 광속조정기법에 의해 CCD 카메라의 기하학적 검정과 동시에 대상물 전면에 대한 사진삼각측량을 수행하였다. 또한 이미 높은 정확도 잠재성이 입증된 고해상도 스틸비디오 카메라(Kodak DCS)를 유사한 네트워크 조건에서 이용하여 처리함으로써 서로 다른 유형의 카메라를 기반으로 하는 두 시스템의 사진삼각측량 결과의 정확도를 비교하였다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 하계학술대회 논문집 Vol.3 No.2
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• pp.735-738
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• 2002

Single crystal 3C-SiC(cubic silicon carbide) thin-films were deposited on Si(100) substrate up to a thickness of $4.3{\mu}m$ by APCVD method using HMDS(hexamethyildisilane) at $1350^{\circ}C$. The HMDS flow rate was 0.5 sccm and the carrier gas flow rate was 2.5 slm. The HMDS flow rate was important to get a mirror-like crystal surface. The growth rate of the 3C-SiC films was $4.3{\mu}m/hr$. The 3C-SiC epitaxical films grown on Si(100) were characterized by XRD, AFM, RHEED, XPS and raman scattering, respectively. The 3C-SiC distinct phonons of TO(transverse optical) near $796cm^{-1}$ and LO(longitudinal optical) near $974{\pm}1cm^{-1}$ were recorded by raman scattering measurement. The heteroepitaxially grown films were identified as the single crystal 3C-SiC phase by XRD spectra$(2{\theta}=41.5^{\circ})$.

• 한국전기전자재료학회논문지
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• 제15권11호
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• pp.953-957
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• 2002

Single crystal 3C-SiC (cubic silicon carbide) thin-films were deposited on Si(100) wafer up to the thickness of 4.3 ${\mu}{\textrm}{m}$ by APCVD (atmospheric pressure chemical vapor deposition) method using HMDS (hexamethyildisilane; ｛CH$_{3}$｝$_{6}$ Si$_{2}$) at 135$0^{\circ}C$. The HMDS flow rate was 0.5 sccm and the carrier gas flow rate was 2.5 slm. The HMDS flow rate was important to get a mirror-like crystal surface. The growth rate of the 3C-SiC film was 4.3 ${\mu}{\textrm}{m}$/hr. The 3C-SiC epitaxial film grown on Si(100) wafer was characterized by XRD (X-ray diffraction), AFM (atomic force microscopy), RHEED (reflection high energy electron diffraction), XPS (X-ray photoelecron spectroscopy), and Raman scattering, respectively. Two distinct phonon modes of TO (transverse optical) near 796 $cm^{-1}$ / and LO (longitudinal optical) near 974$\pm$1 $cm^{-1}$ / of 3C-SiC were observed by Raman scattering measurement. The heteroepitaxially grown film was identified as the single crystal 3C-SiC phase by XRD spectra (2$\theta$=41.5。).).

• 한국전기전자재료학회논문지
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• 제29권7호
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• pp.404-407
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• 2016

In this study, to develop low temperature sintering capacitor composition ceramics with the good dielectric properties, $(Ba_{0.86}Ca_{0.14})(Ti_{0.85}Zr_{0.12}Sn_{0.03})O_3$ (BCTZ) ceramics were prepared by the conventional solid-state reaction method. The effects of $B_2O_3$ addition on the dielectric properties and microstructure was investigated. The XRD patterns demonstrated that all the specimens showed Perovskite phase, and secondary phases are indicated in the measurement range of XRD. And also, temperature coefficient of capacitance(TCC) of all the specimen sintered at $1,180^{\circ}C$ showed +3~-56% except for x=0.006. For all the specimens, observed one peak was tetragonal cubic difuse phase transition temperature(Tc), which is located in the vicinity of room temperature.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2001년도 추계학술대회 논문집 Vol.14 No.1
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• pp.533-536
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• 2001

Single crystal cubic silicon carbide(3C-SiC) thin film were deposited on Si(100) substrate up to a thickness of $4.3{\mu}m$ by APCVD(atmospheric pressure chemical vapor deposition) method using hexamethyildisilane(HMDS) at $1350^{\circ}C$. The HMDS flow rate was 0.5 sccm and the carrier gas flow rate was 2.5 slm. The HMDS flow rate was important to get a mirror-like. The growth rate of the 3C-SiC films was $4.3{\mu}m/hr$. The 3C-SiC epitaxical layers on Si(100) were characterized by XRD(X-ray diffraction), raman scattering and RHEED(reflection high-energy electron diffraction), respectively. The 3C-SiC distinct phonons of TO(transverse optical) near $796cm^{-1}$ and LO(longitudinal optical) near $974{\pm}1cm^{-1}$ were recorded by raman scattering measurement. The deposition films were identified as the single crystal 3C-SiC phase by XRD spectra($2{\theta}=41.5^{\circ}$). Also, with increase of films thickness, RHEED patterns gradually changed from a spot pattern to a streak pattern.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 추계학술대회 논문집 Vol.15
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• pp.452-455
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• 2002

Single crystal 3C-SiC(cubic silicon carbide) thin-films were deposited on Si(100) substrate up to a thickness of $4.3{\mu}m$ by APCVD method using HMDS(hexamethyildisilane) at $1350^{\circ}C$. The HMDS flow rate was 0.5 sccm and the carrier gas flow rate was 2.5 slm. The HMDS flow rate was important to get a mirror-like crystal surface. The growth rate of the 3C-SiC films was $4.3{\mu}m/hr$. The 3C-SiC epitaxical films grown on Si(100) were characterized by XRD, AFM, RHEED, XPS and raman scattering, respectively. The 3C-SiC distinct phonons of TO(transverse optical) near $796cm^{-1}$ and LO(longitudinal optical) near $974{\pm}1cm^{-1}$ were recorded by raman scattering measurement. The heteroepitaxially grown films were identified as the single crystal 3C-SiC phase by XRD spectra$(2{\theta}=41.5^{\circ})$.